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Method for growing thin oxide films

Assignee: ASM International NV
•
Filing: 2000-10-13
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Granted: 2003-10-14
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Expires: 2020-10-13
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Abstract

Abstract A method is provided for growing thin oxide films on the surface of a substrate by alternatively reacting the surface of the substrate with a metal source material and an oxygen source material. The oxygen source material is preferably a metal alkoxide. The metal source material may be a metal halide, hydride, alkoxide, alkyl, a cyclopentadienyl compound, or a diketonate.</PTEXT>

Inventors

  • 👤 Mikko Ritala
  • 👤 Antti Rahtu
  • 👤 Markku Leskela
  • 👤 Kaupo Kukli

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 01:40
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45523; C23C16/45525; C23C16/45527; H; H10; H10P; H10P14/00; H10P14/20; C23C16/02; C23C16/0209; C23C16/0218; C23C16/0272; C23C16/22; C23C16/30; C23C16/40; C23C16/45531; C30; C30B; C30B25/00; C30B25/02; C30B25/18; C30B29/00; C30B29/10; C30B29/16

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 120 words
A process for the fabrication of oxide films on a readily oxidized substrate, comprising: depositing a protective thin oxide film onto the substrate by an atomic layer deposition process comprising alternately reacting the surface of the substrate with a metal source material and an oxygen source material, wherein the oxygen source material is a boron, silicon or metal compound which has at least one organic ligand and wherein an oxygen is bonded to at least one boron, silicon or metal atom; and depositing a second oxide film on the substrate by a second process employing a different oxygen source, wherein the protective thin oxide film protects the surface of the substrate from oxidation during deposition of the second oxide film.
Claim 2
Dependent Claim 120 words
A process for the fabrication of oxide films on a readily oxidized substrate, comprising: depositing a protective thin oxide film onto the substrate by an atomic layer deposition process comprising alternately reacting the surface of the substrate with a metal source material and an oxygen source material, wherein the oxygen source material is a boron, silicon or metal compound which has at least one organic ligand and wherein an oxygen is bonded to at least one boron, silicon or metal atom; and depositing a second oxide film on the substrate by a second process employing a different oxygen source, wherein the protective thin oxide film protects the surface of the substrate from oxidation during deposition of the second oxide film.
Claim 3
Dependent Claim 21 words
A process according to claim 1 , wherein the thickness of the protective thin oxide film is 1-20 atom layers thick.
Claim 4
Dependent Claim 21 words
A process according to claim 1 , wherein the thickness of the protective thin oxide film is 1-10 atom layers thick.
Claim 5
Dependent Claim 21 words
A process according to claim 1 , wherein the thickness of the protective thin oxide film is 1-5 atom layers thick.
Claim 6
Dependent Claim 21 words
The process of claim 1 , wherein the protective thin oxide film and the second oxide film have the same composition.
Claim 7
Dependent Claim 21 words
The process of claim 1 , wherein the protective thin oxide film and the second oxide film have a different composition.
Claim 8
Dependent Claim 26 words
The process of claim 1 wherein the oxygen source material used in the second process is selected from the group consisting of water and hydrogen peroxide.

References Cited (Backward Citations)

US4058430A Cited
US5922405A Cited
US6037003A Cited
WO1998046617A1 Cited
US6258157B1 Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2006-10-13 2007-04-14 2007-10-14 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2010-10-13 2011-04-14 2011-10-14 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2014-10-13 2015-04-14 2015-10-14 $7700.00 Window Closed / Lapsed

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