Patent US6540838B2 successfully refreshed from Google Patents.
US6540838B2
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US
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Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition
Assignee: Eugenus Inc
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Filing: 2002-06-28
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Granted: 2003-04-01
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Expires: 2022-06-28
Abstract
Abstract A new method and apparatus for avoiding contamination of films deposited in layered depositions, such as Atomic Layer Deposition (ALD) and other sequential chemical vapor deposition (CVD) processes, is taught, wherein CVD-deposited contamination of ALD films is prevented by use of a pre-reaction chamber that effectively causes otherwise-contaminating gaseous constituents to deposit on wall elements of gas-delivery apparatus prior to entering the ALD chamber.
Inventors
- 👤 Ofer Sneh
- 👤 Carl J. Galewski
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:48
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45523; C23C16/45525; C23C16/45544; C23C16/4401; C23C16/448; C23C16/452; C23C16/45527; C23C16/45536; C23C16/4554; C23C8/00; H; H10; H10P; H10P14/00; H10P14/40; H10P14/42; H10P14/43; H10P14/60; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; H10P14/6336; H10P14/6339; H10P14/69; H10P14/692; H10P14/6938; H10P14/6939; H10P14/69391
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
149 words
A coating system, comprising: a coating chamber having a support for a substrate to be coated; a gas distribution apparatus within the coating chamber; a gas sourcing and pulsing apparatus producing alternating pulses of at least first and second gases; a treatment apparatus connected to and accepting gases from the gas sourcing and pulsing apparatus, said treatment apparatus forming into radicals at least of a portion of the gases received; and a pre-reactor apparatus connected to both the treatment apparatus and the gas distribution apparatus, and having an energy provision system; characterized in that, after a pulse of a first gas, and prior to a pulse of a second gas, the pre-reactor apparatus, through the energy provision system, causes trace amounts of the first gas to coat on surfaces of the pre-reactor apparatus, preventing said trace amounts from existing in the coating chamber as the second gas is pulsed.
Claim 2
Dependent Claim
149 words
A coating system, comprising: a coating chamber having a support for a substrate to be coated; a gas distribution apparatus within the coating chamber; a gas sourcing and pulsing apparatus producing alternating pulses of at least first and second gases; a treatment apparatus connected to and accepting gases from the gas sourcing and pulsing apparatus, said treatment apparatus forming into radicals at least of a portion of the gases received; and a pre-reactor apparatus connected to both the treatment apparatus and the gas distribution apparatus, and having an energy provision system; characterized in that, after a pulse of a first gas, and prior to a pulse of a second gas, the pre-reactor apparatus, through the energy provision system, causes trace amounts of the first gas to coat on surfaces of the pre-reactor apparatus, preventing said trace amounts from existing in the coating chamber as the second gas is pulsed.
Claim 3
Dependent Claim
29 words
The coating system of claim 1 wherein, by repeated pulses of the at least first and second gases into the coating chamber, an Atomic Layer Deposition process is accomplished.
Claim 4
Dependent Claim
25 words
The coating system of claim 1 wherein the pre-reactor apparatus comprises a separate chamber between the gas sourcing and pulsing apparatus and the coating chamber.
Claim 5
Dependent Claim
22 words
The coating system of claim 3 wherein the energy provision system comprises heating a surface within the confines of the separate chamber.
Claim 6
Dependent Claim
19 words
The coating system of claim 3 wherein the energy provision system comprises striking a plasma in the separate chamber.
Claim 7
Dependent Claim
25 words
The coating system of claim 1 wherein the pre-reactor apparatus comprises gas supply tubing between the gas sourcing and pulsing apparatus and the coating chamber.
Claim 8
Dependent Claim
19 words
The coating system of claim 6 wherein the energy provision system comprises heating walls of the gas supply tubing.
Claim 9
Dependent Claim
25 words
The coating system of claim 1 wherein the pre-reactor apparatus is incorporated in the gas distribution apparatus, comprising an energy-activated showerhead within the coating chamber.
Claim 10
Dependent Claim
30 words
The coating system of claim 8 wherein the substrate support is heated, and the energy provision system comprises heat transfer to a wall of the showerhead facing the substrate support.
Claim 11
Dependent Claim
18 words
The coating system of claim 8 wherein the energy provision system comprises striking a plasma within the showerhead.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2006-03-31 | 2006-09-30 | 2007-04-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2010-03-31 | 2010-09-30 | 2011-04-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2014-03-31 | 2014-09-30 | 2015-04-01 | $7700.00 | Window Closed / Lapsed |