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US6464889B1 Expired / Lapsed US ⏱️ 0.0 years remaining

Surface modification of medical implants

Assignee: Etex Corp
•
Filing: 2000-01-25
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Granted: 2002-10-15
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Expires: 2020-01-25
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Abstract

Abstract An irregularly etched metallic medical implant device is provided having random non-uniform relief patterns on the surface ranging from about 0.3 μm to less than about 20 μm in depth. The random, irregular surface as defined by the etch micromorphology and respective dimensional properties is sobtained by exposing a surface to a reactive plasma in a chamber wherein said reactive plasma produces a reaction product with the surface to thereby etch the surface, said reaction product or a complex thereof having a vapor pressure lower than a pressure in the chamber; providing a dynamic masking agent during the etching process; and removing the reaction products.

Inventors

  • 👤 Dosuk D. Lee
  • 👤 Atul Nagras
  • 👤 Pramod Chakravarthy
  • 👤 Anthony M. Majahad

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-08 22:11
CPC Classifications
A; A61; A61L; A61L27/00; A61L27/36; A61L27/38; A61L27/3839; A61L27/50; A61L27/56; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23F; C23F4/00; A61L2400/00; A61L2400/18

Claims Analysis

Total Claims: 29
Claim 1
Independent Claim 80 words
A method for the production of a random, irregular surface on an article, comprising: exposing an article having a metallic surface to a plasma comprised of a reactive etching species that etches the surface by producing a volatile reaction product with the substrate and a second species selected to promote masking of the substrate, said masking comprising in situ deposition and removal of a masking species having etching properties different than the substrate, to obtain non-uniform etching of the substrate.
Claim 2
Independent Claim 80 words
A method for the production of a random, irregular surface on an article, comprising: exposing an article having a metallic surface to a plasma comprised of a reactive etching species that etches the surface by producing a volatile reaction product with the substrate and a second species selected to promote masking of the substrate, said masking comprising in situ deposition and removal of a masking species having etching properties different than the substrate, to obtain non-uniform etching of the substrate.
Claim 3
Independent Claim 95 words
A method of preparing an article for use as a medical device having a roughened surface amenable to bioadhesion, comprising: exposing a metallic surface of a medical device to a plasma comprised of a reactive etching species that etches the surface by producing a volatile reaction product with the substrate and a second species selected to promote masking of the substrate, said masking comprising in situ deposition and removal of a masking species having etching properties different than the substrate; and removing the masking species to obtain a surface having random and irregular etched features.
Claim 4
Independent Claim 95 words
A method of preparing an article for use as a medical device having a roughened surface amenable to bioadhesion, comprising: exposing a metallic surface of a medical device to a plasma comprised of a reactive etching species that etches the surface by producing a volatile reaction product with the substrate and a second species selected to promote masking of the substrate, said masking comprising in situ deposition and removal of a masking species having etching properties different than the substrate; and removing the masking species to obtain a surface having random and irregular etched features.
Claim 5
Dependent Claim 22 words
The method of claim 1 or 2 , wherein said second species comprises a plasma species capable of producing a sputtering effect.
Claim 6
Dependent Claim 21 words
The method of claim 3 , wherein the plasma species is selected from the group consisting of argon, helium and nitrogen.
Claim 7
Dependent Claim 19 words
The method of claim 3 , wherein the masking species comprises ions sputtered from the surface of the substrate.
Claim 8
Dependent Claim 14 words
The method of claim 3 , further comprising redeposition of said volatile reaction product.
Claim 9
Dependent Claim 17 words
The method of claim 3 , wherein the masking species comprises ions sputtered from a sputtering target.
Claim 10
Dependent Claim 16 words
The method of claim 7 , wherein the sputtering target comprises a form of calcium phosphate.
Claim 11
Dependent Claim 48 words
The method of claim 1 or 2 , wherein the second species is a contaminant selected from the group consisting of water vapor, carbon dioxide, dust, particulates and sputtered ions from impurities of the substrate, a holder supporting the article or walls from a chamber housing the article.
Claim 12
Dependent Claim 44 words
The method of claim 1 , wherein the surface comprises a metal selected from the group consisting of tantalum, gold, platinum, silver, palladium, iron, ferrous alloys, stainless steel, carbon steels, chrome steels, cobalt steels, tungsten steels, aluminum, boron, carbon graphite, tungsten, and alloys thereof.
Claim 13
Dependent Claim 14 words
The method of claim 1 , wherein the reactive etching species comprises water vapor.
Claim 14
Dependent Claim 27 words
The method of claim 1 or 2 , wherein pressure of a chamber housing the article is in the range of 0.01 Torr to about 1 Torr.
Claim 15
Dependent Claim 19 words
The method of claim 1 or 2 , wherein power levels of the plasma are modulated over fixed intervals.
Claim 16
Dependent Claim 21 words
The method of claim 13 , wherein the plasma level is at radio frequencies at 13.56 MHz and harmonic multiples thereof.
Claim 17
Dependent Claim 16 words
The method of claim 1 or 2 , wherein the article is isothermally or incrementally cooled.
Claim 18
Dependent Claim 16 words
The method of claim 1 or 3 , wherein the article is isothermally or incrementally heated.
Claim 19
Dependent Claim 15 words
The method of claim 1 or 2 , wherein the surface is sonicated in situ.
Claim 20
Dependent Claim 14 words
The method of claim 11 , wherein the plasma further comprises a noble gas.
Claim 21
Dependent Claim 19 words
The method of claim 1 or 2 , wherein the reactive etching species is a fluoride or chloride-containing species.
Claim 22
Dependent Claim 34 words
The method of claim 2 , wherein the medical device is selected from the group consisting of artificial organs, artificial blood vessels and vascular grafts, heart valves, blood oxygenators, catheters, electrodes, and implant wires.
Claim 23
Dependent Claim 28 words
The method of claim 1 or 2 , further comprising, treating the surface prior to reactive etching to remove an oxide coating on the surface of the article.
Claim 24
Dependent Claim 27 words
The method of claim 1 or 2 , wherein the method produces etching features on the surface having a relief depth of greater than about 1 micron.
Claim 25
Dependent Claim 40 words
The method of claim 1 or 2 , wherein the method produces shallow etching features on the surface having a relief depth in the range of about 1-5 microns and deep etching features in the range of about 5-20 microns.
Claim 26
Dependent Claim 26 words
The method of claim 1 or 2 , further comprising: chemically modifying the surface of the article to increase adhesion or improve biocompatibility of the article.
Claim 27
Dependent Claim 20 words
The method of claim 1 or 2 , further comprising: physical abrasion of the surface before exposure to the plasma.
Claim 28
Dependent Claim 17 words
The method of claim 1 or 2 , further comprising: applying a coating to the irregular surface.
Claim 29
Dependent Claim 23 words
The method of claim 26 , wherein the coating is selected from the group consisting of organic polymers and forms of calcium phosphate.

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