US6452662B2
Expired / Lapsed
US
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Lithography apparatus
Assignee: ASML Netherlands BV
•
Filing: 1999-04-06
•
Granted: 2002-09-17
•
Expires: 2019-04-06
Abstract
Abstract An illumination system for a microlithographic exposure apparatus comprised of an adjustable axicon, a variable zoom element, and a multipole illumination mode generating element. By controlling the optical components, the illumination mode can be varied continuously between conventional, annular, and multipole.
Inventors
- 👤 Johannesq Catharinus Hubertus Mulkens
- 👤 Gavin Charles Rider
- 👤 Jan Wietse Ricolt Ten Cate
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 10:44
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/70; G03F7/70058; G03F7/70091; G03F7/701; G03F7/70108
Claims Analysis
Total Claims: 34
Claim 1
Independent Claim
182 words
A lithography apparatus, comprising: a radiation system constructed and arranged to supply a beam of radiation; a first object table arranged to intercept radiation from said beam of radiation and adapted to hold a mask, a second object table arranged to intercept radiation from said beam of radiation after passing said object table and adapted to hold a substrate, a projection system constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate, wherein said radiation system comprises an illumination system which comprises: an adjustable axicon; a variable zoom element; and a lens array comprising a plurality of lens segments arranged substantially in a plane, wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens, and wherein said lens array is adapted to redirect light into a multipole illumination pattern.
Claim 2
Dependent Claim
182 words
A lithography apparatus, comprising: a radiation system constructed and arranged to supply a beam of radiation; a first object table arranged to intercept radiation from said beam of radiation and adapted to hold a mask, a second object table arranged to intercept radiation from said beam of radiation after passing said object table and adapted to hold a substrate, a projection system constructed and arranged to image an irradiated portion of the mask onto a target portion of the substrate, wherein said radiation system comprises an illumination system which comprises: an adjustable axicon; a variable zoom element; and a lens array comprising a plurality of lens segments arranged substantially in a plane, wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens, and wherein said lens array is adapted to redirect light into a multipole illumination pattern.
Claim 3
Dependent Claim
15 words
An apparatus according to claim 1 , wherein the illumination pattern is a quadrupole pattern.
Claim 4
Dependent Claim
18 words
An apparatus according to claim 1 , wherein said lens array comprises an array of Fresnel lens segments.
Claim 5
Dependent Claim
28 words
An apparatus according to claim 1 , wherein said lens array is a plurality of lens arrays each of which is disposable in and removable from said beam.
Claim 6
Dependent Claim
28 words
An apparatus according to claim 4 , wherein at least one of said arrays is rotatable about an axis parallel to a principal optical axis of the system.
Claim 7
Dependent Claim
16 words
An apparatus according to claim 1 , further comprising a light pipe having a quadrilateral cross-section.
Claim 8
Dependent Claim
18 words
An apparatus according to claim 6 , wherein the light pipe comprises a glass, quartz or calcium-fluoride rod.
Claim 9
Dependent Claim
34 words
An apparatus according to claim 1 , wherein the radiation system further comprises an excimer laser source, and wherein said lens array is locatable in a collimated beam path of the excimer laser source.
Claim 10
Dependent Claim
22 words
An apparatus according to claim 1 , wherein the multipole illumination pattern comprises an on-axis pole and at least one off-axis pole.
Claim 11
Dependent Claim
17 words
A lithography apparatus according to claim 1 , wherein said lens array comprises a diffractive optical element.
Claim 12
Independent Claim
158 words
A device manufacturing method, comprising: producing a beam of illumination radiation; illuminating at least one array of lens segments with said beam of illumination radiation to provide a multipole illumination beam having a multipole intensity distribution along a cross-section thereof; illuminating a mask with at least a portion of said multipole illumination beam, wherein said illuminating said mask produces a pattern of radiation radiating from said mask; and projecting at least a portion of said pattern of radiation radiating from said mask onto a substrate, wherein said at least one array comprises a plurality of lens segments arranged substantially in a plane, and wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens.
Claim 13
Independent Claim
158 words
A device manufacturing method, comprising: producing a beam of illumination radiation; illuminating at least one array of lens segments with said beam of illumination radiation to provide a multipole illumination beam having a multipole intensity distribution along a cross-section thereof; illuminating a mask with at least a portion of said multipole illumination beam, wherein said illuminating said mask produces a pattern of radiation radiating from said mask; and projecting at least a portion of said pattern of radiation radiating from said mask onto a substrate, wherein said at least one array comprises a plurality of lens segments arranged substantially in a plane, and wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens.
Claim 14
Dependent Claim
24 words
A method according to claim 11 , wherein said multipole illumination beam includes an on-axis illumination pole in addition to off-axis poles of illumination.
Claim 15
Dependent Claim
12 words
A device manufactured in accordance with the method of claim 11 .
Claim 16
Dependent Claim
24 words
A device manufacturing method according to claim 11 , wherein at least one of said arrays of lens segments comprises a diffractive optical element.
Claim 17
Dependent Claim
127 words
An illumination system for a lithographic apparatus, comprising: an adjustable axicon; a variable zoom element disposed in an optical path of said adjustable axicon; and a lens array disposed in an optical path of said adjustable axicon and said variable zoom element, wherein said lens array comprises a plurality of lens segments arranged substantially in a plane, wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens, and wherein said lens array is adapted to redirect light into a multipole illumination pattern.
Claim 18
Dependent Claim
127 words
An illumination system for a lithographic apparatus, comprising: an adjustable axicon; a variable zoom element disposed in an optical path of said adjustable axicon; and a lens array disposed in an optical path of said adjustable axicon and said variable zoom element, wherein said lens array comprises a plurality of lens segments arranged substantially in a plane, wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens, and wherein said lens array is adapted to redirect light into a multipole illumination pattern.
Claim 19
Dependent Claim
23 words
An illumination system for a lithographic apparatus according to claim 15 , wherein said lens array is an array of Fresnel lens segments.
Claim 20
Dependent Claim
24 words
An illumination system for a lithographic apparatus according to claim 16 , wherein said Fresnel lens segments are arranged into a substantially square array.
Claim 21
Dependent Claim
22 words
An illumination system for a lithographic apparatus according to claim 15 , wherein said multipole illumination pattern comprises a quadrupole illumination pattern.
Claim 22
Dependent Claim
25 words
An illumination system for a lithographic apparatus according to claim 18 , wherein said multipole illumination pattern is a mix of quadrupole and annular illumination.
Claim 23
Dependent Claim
23 words
An illumination system for a lithographic apparatus according to claim 15 , wherein said multipole illumination pattern is a hard quadrupole illumination pattern.
Claim 24
Dependent Claim
27 words
An illumination system for a lithographic apparatus according to claim 15 , wherein said lens array comprises a plurality of lens segments tessellated to form a surface.
Claim 25
Dependent Claim
29 words
An illumination system for a lithographic apparatus according to claim 15 , wherein said lens array comprises a plurality of lens segments tessellated to form a plurality of rectangles.
Claim 26
Dependent Claim
155 words
An illumination system for a lithographic apparatus, comprising: an adjustable axicon; a variable zoom element disposed in an optical path of said adjustable axicon; and a diffractive optical element disposed in an optical path of said adjustable axicon and said variable zoom element, wherein said illumination system forms a multipole illumination beam from an input beam of radiation, and wherein said diffractive optical element is an array of lens segments, comprising: a lens array comprising a plurality of lens segments arranged substantially in a plane, wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens, and wherein said lens array is adapted to redirect light into a multipole illumination pattern.
Claim 27
Dependent Claim
155 words
An illumination system for a lithographic apparatus, comprising: an adjustable axicon; a variable zoom element disposed in an optical path of said adjustable axicon; and a diffractive optical element disposed in an optical path of said adjustable axicon and said variable zoom element, wherein said illumination system forms a multipole illumination beam from an input beam of radiation, and wherein said diffractive optical element is an array of lens segments, comprising: a lens array comprising a plurality of lens segments arranged substantially in a plane, wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens, and wherein said lens array is adapted to redirect light into a multipole illumination pattern.
Claim 28
Dependent Claim
22 words
An illumination system for a lithographic apparatus according to claim 23 , wherein said multipole illumination pattern comprises a quadrupole illumination pattern.
Claim 29
Dependent Claim
25 words
An illumination system for a lithographic apparatus according to claim 24 , wherein said multipole illumination pattern is a mix of quadrupole and annular illumination.
Claim 30
Dependent Claim
23 words
An illumination system for a lithographic apparatus according to claim 23 , wherein said multipole illumination pattern is a hard quadrupole illumination pattern.
Claim 31
Dependent Claim
213 words
A lithographic apparatus, comprising: a radiation system adapted to supply a beam of radiation; a mask table arranged in a path of radiation from said beam of radiation; a substrate table arranged in a path of radiation from said beam of radiation after passing said mask table; a projection system arranged in a path of radiation from said beam of radiation and between said mask table and said substrate table, said projection system being adapted to image an irradiated portion of a mask held by said mask table onto a target portion of a substrate held by said substrate table, wherein said radiation system comprises an illumination system, said illumination system comprising: an adjustable axicon; a variable zoom element disposed in an optical path of said adjustable axicon; and a lens array comprising a plurality of lens segments arranged substantially in a plane, wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens, and wherein said lens array is adapted to redirect light into a multipole illumination pattern.
Claim 32
Dependent Claim
213 words
A lithographic apparatus, comprising: a radiation system adapted to supply a beam of radiation; a mask table arranged in a path of radiation from said beam of radiation; a substrate table arranged in a path of radiation from said beam of radiation after passing said mask table; a projection system arranged in a path of radiation from said beam of radiation and between said mask table and said substrate table, said projection system being adapted to image an irradiated portion of a mask held by said mask table onto a target portion of a substrate held by said substrate table, wherein said radiation system comprises an illumination system, said illumination system comprising: an adjustable axicon; a variable zoom element disposed in an optical path of said adjustable axicon; and a lens array comprising a plurality of lens segments arranged substantially in a plane, wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens, and wherein said lens array is adapted to redirect light into a multipole illumination pattern.
Claim 33
Dependent Claim
234 words
A lithographic apparatus, comprising: a radiation system adapted to supply a beam of radiation; a mask table arranged in a path of radiation from said beam of radiation; a substrate table arranged in a path of radiation from said beam of radiation after passing said mask table; a projection system arranged in a path of radiation from said beam of radiation and between said mask table and said substrate table, said projection system being adapted to image an irradiated portion of a mask held by said mask table onto a target portion of a substrate held by said substrate table, wherein said radiation system comprises an illumination system, said illumination system comprising: an adjustable axicon; a variable zoom element disposed in an optical path of said adjustable axicon; and a diffractive optical element disposed in an optical path of said adjustable axicon and said variable zoom element, wherein said diffractive optical element comprises a plurality of lens segments arranged substantially in a plane, and wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens, and wherein said illumination system forms a multipole illumination beam from said beam of radiation.
Claim 34
Dependent Claim
234 words
A lithographic apparatus, comprising: a radiation system adapted to supply a beam of radiation; a mask table arranged in a path of radiation from said beam of radiation; a substrate table arranged in a path of radiation from said beam of radiation after passing said mask table; a projection system arranged in a path of radiation from said beam of radiation and between said mask table and said substrate table, said projection system being adapted to image an irradiated portion of a mask held by said mask table onto a target portion of a substrate held by said substrate table, wherein said radiation system comprises an illumination system, said illumination system comprising: an adjustable axicon; a variable zoom element disposed in an optical path of said adjustable axicon; and a diffractive optical element disposed in an optical path of said adjustable axicon and said variable zoom element, wherein said diffractive optical element comprises a plurality of lens segments arranged substantially in a plane, and wherein said plurality of lens segments includes a first lens segment and a second lens segment effectively from a single lens, said first and second lens segments being at least one of displaced or rotated with respect to each other in said planar arrangement of lens segments compared to corresponding positions in said single lens, and wherein said illumination system forms a multipole illumination beam from said beam of radiation.
References Cited (Backward Citations)
US3639039A
Cited
US3492635A
Cited
US3658420A
Cited
US3729252A
Cited
US3776633A
Cited
US3770340A
Cited
US4291938A
Cited
EP0011709A2
Cited
US4241389A
Cited
US4370026A
Cited
US4472023A
Cited
US4497015A
Cited
US4789222A
Cited
US4619508A
Cited
JPS6191662A
Cited
US4851882A
Cited
US5337097A
Cited
US4780747A
Cited
US4814829A
Cited
US4841341A
Cited
US4939630A
Cited
US4854669A
Cited
US5004348A
Cited
US4988188A
Cited
US4936665A
Cited
US4970546A
Cited
US4947413A
Cited
US4931830A
Cited
US5191374A
Cited
US5153773A
Cited
US5638211A
Cited
US6211944B1
Cited
WO1992003842A1
Cited
US6233041B1
Cited
US6252647B1
Cited
US20010007495A1
Cited
US20010015797A1
Cited
US6084655A
Cited
US5673102A
Cited
US5305054A
Cited
US6128068A
Cited
US6016187A
Cited
EP0564264A1
Cited
US5742376A
Cited
US5517279A
Cited
US6285443B1
Cited
US5598250A
Cited
US5675401A
Cited
DE4421053A1
Cited
US5659408A
Cited
EP0747772A1
Cited
US5712698A
Cited
EP0794462A2
Cited
US6049374A
Cited
US6285855B1
Cited
US6259512B1
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2005-09-16 | 2006-03-18 | 2006-09-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2009-09-16 | 2010-03-18 | 2010-09-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2013-09-16 | 2014-03-18 | 2014-09-17 | $7700.00 | Window Closed / Lapsed |