EP0747772A1
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Illumination device for a projection microlithography tool
Assignee: Carl Zeiss SMT GmbH
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Filing: 1996-04-30
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Granted: —
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Expires: 2016-04-30
Abstract
Abstract The illumination source uses a laser (1) and an objective (2), with respective diffractive optical rasters (8,9), with a 2-dimensional raster structure, positioned in the exit pupil and object plane of the objective. Pref. the first raster (9) is used to convert the rectangular divergence distribution of the lase beam into a circular, annular or quadrupole output divergence distribution, the second raster (8) providing a direction-dependent divergence.
Inventors
- 👤 Johannes Wangler
- 👤 Gerhard Ittner
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-08 11:09
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70066; G02; G02B; G02B27/00; G03F7/70075; G03F7/70483; G03F7/7055; G03F7/70583
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References Cited (Backward Citations)
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