Patent US6444373B1 successfully refreshed from Google Patents.
US6444373B1
Expired / Lapsed
US
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Modification of mask layout data to improve mask fidelity
Assignee: GlobalFoundries Inc
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Filing: 2000-06-16
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Granted: 2002-09-03
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Expires: 2020-06-16
Abstract
Abstract The present invention relates to a system and method of modifying mask layout data to improve the fidelity of mask manufacture. The system and method include determining the difference between the mask layout design and the mask features as written, and generating sizing corrections. The sizing corrections can be used to modify the mask layout data, and/or stored in a database.
Inventors
- 👤 Ramkumar Subramanian
- 👤 Khoi A. Phan
- 👤 Bhanwar Singh
- 👤 Bharath Rangarajan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 23:36
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/68; G03F1/70; G03F7/00; G03F7/70; G03F7/70425; G03F7/70433; G03F7/70441
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
79 words
A system for manufacturing a mask, comprising: an edge detector, the edge detector determining one or more edge data of a portion of a mask feature; a processor, the processor receiving the one or more edge data and operatively coupled to an algorithm for calculating one or more area loss data from the one or more edge data; and a mask writer, the mask writer operatively coupled to the processor to receive the one or more area loss data.
Claim 2
Independent Claim
79 words
A system for manufacturing a mask, comprising: an edge detector, the edge detector determining one or more edge data of a portion of a mask feature; a processor, the processor receiving the one or more edge data and operatively coupled to an algorithm for calculating one or more area loss data from the one or more edge data; and a mask writer, the mask writer operatively coupled to the processor to receive the one or more area loss data.
Claim 3
Dependent Claim
29 words
The system of claim 1 , wherein the mask writer includes an algorithm for determining one or more sizing correction data from the one or more area loss data.
Claim 4
Dependent Claim
25 words
The system of claim 2 , further comprising a database operatively coupled to the mask writer to store the one or more sizing correction data.
Claim 5
Dependent Claim
15 words
The system of claim 1 , wherein the edge detector comprises a scanning electron microscope.
Claim 6
Dependent Claim
28 words
The system of claim 4 , wherein the mask writer includes an algorithm for modifying a mask layout in accordance with the one or more sizing correction data.
Claim 7
Dependent Claim
17 words
The system of claim 5 , wherein the mask layout is an optical proximity corrected mask layout.
Claim 8
Dependent Claim
19 words
The system of claim 1 , wherein the portion of the mask feature is an optical proximity correction feature.
Claim 9
Dependent Claim
10 words
A mask created by the system of claim 1 .
Claim 10
Independent Claim
101 words
A system for manufacturing a mask, comprising: an edge detector, the edge detector determining one or more edge data; a processor, the processor receiving the one or more edge data and operatively coupled to the one or more algorithms for determining one or more sizing correction data from the one or more edge data, wherein the one or more algorithms for determining sizing correction data utilize one or more area loss data generated from the one or more edge data; and a mask writer, the mask writer operatively coupled to the processor to receive the one or more sizing correction data.
Claim 11
Independent Claim
101 words
A system for manufacturing a mask, comprising: an edge detector, the edge detector determining one or more edge data; a processor, the processor receiving the one or more edge data and operatively coupled to the one or more algorithms for determining one or more sizing correction data from the one or more edge data, wherein the one or more algorithms for determining sizing correction data utilize one or more area loss data generated from the one or more edge data; and a mask writer, the mask writer operatively coupled to the processor to receive the one or more sizing correction data.
Claim 12
Dependent Claim
31 words
The system of claim 9 , wherein the mask writer further includes at least one algorithm for modifying a mask layout in accordance with the one or more sizing correction data.
Claim 13
Dependent Claim
18 words
The system of claim 10 , wherein the mask layout includes one or more optical proximity correction features.
Claim 14
Dependent Claim
17 words
The system of claim 10 , wherein the mask layout is an optical proximity corrected mask layout.
Claim 15
Dependent Claim
25 words
The system of claim 9 , further comprising a database operatively coupled to the mask writer to store the one or more sizing correction data.
Claim 16
Dependent Claim
15 words
The system of claim 9 , wherein the edge detector is a scanning electron microscope.
Claim 17
Dependent Claim
10 words
A mask created by the system of claim 9 .
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2005-09-02 | 2006-03-04 | 2006-09-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2009-09-02 | 2010-03-04 | 2010-09-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2013-09-02 | 2014-03-04 | 2014-09-03 | $7700.00 | Window Closed / Lapsed |