Patent US6368763B2 successfully refreshed from Google Patents.
US6368763B2
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Method of detecting aberrations of an optical imaging system
Assignee: ASML Netherlands BV
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Filing: 2001-06-12
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Granted: 2002-04-09
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Expires: 2021-06-12
Abstract
Abstract Aberrations of an imaging system (PL) can be detected in an accurate and reliable way by imaging, by means of the imaging system, a circular phase structure ( 22 ) on a photoresist (PR), developing the resist and scanning it with a scanning detection device (SEM) which is coupled to an image processor (IP). The circular phase structure is imaged in a ring structure ( 25 ) and each type of aberration, like coma, astigmatism, three-point aberration, etc. causes a specific change in the shape of the inner contour (CI) and the outer contour (CE) of the ring and/or a change in the distance between these contours, so that the aberrations can be detected independently of each other. Each type of aberration is represented by a specific Fourier harmonic (Z-), which is composed of Zernike coefficients (Z-), each representing a specific lower or higher order sub-aberration. The new method enables to determine these sub-aberrations The new method may be used for measuring a projection system for a lithographic projection apparatus.
Inventors
- 👤 Peter Dirksen
- 👤 Casparus A. H. Juffermans
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 09:16
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/70591; G03F7/706; G03F7/70216; G03F7/70241; G03F7/70358; Y; Y10; Y10S; Y10S430/00; Y10S430/143
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
240 words
A method of detecting aberrations of an optical imaging system, comprising the steps of arranging a test object, which comprises at least one closed single figure having a phase structure, in the object plane of the system; providing a photoresist layer in the image plane of the system; imaging the test object by means of the system and an imaging beam; developing the photoresist layer; observing the developed image by means of a scanning detection device having a resolution which is considerably larger than that of the imaging system; subjecting the observed image to a Fourier analysis in order to ascertain at least one of different types of changes of shape in the image of the single figure, each type of shape change being indicative of a given kind of aberration, which is represented by a specific Fourier harmonic being a combination of a number of Zernike polynominals each preceded by a weighting factor, the measurement of the Zernike coefficients being carried out by the steps: setting at least one of the illumination parameters successively at a number of different values, the number being at least equal to the number of Zernike polynomials to be determined; measuring a same Fourier harmonic for each of said different values, and calculating the Zernike coefficients from of the measured values for the said Fourier harmonic and by means of stored weighting factors which have been obtained by a previously carried out simulation program.
Claim 2
Independent Claim
240 words
A method of detecting aberrations of an optical imaging system, comprising the steps of arranging a test object, which comprises at least one closed single figure having a phase structure, in the object plane of the system; providing a photoresist layer in the image plane of the system; imaging the test object by means of the system and an imaging beam; developing the photoresist layer; observing the developed image by means of a scanning detection device having a resolution which is considerably larger than that of the imaging system; subjecting the observed image to a Fourier analysis in order to ascertain at least one of different types of changes of shape in the image of the single figure, each type of shape change being indicative of a given kind of aberration, which is represented by a specific Fourier harmonic being a combination of a number of Zernike polynominals each preceded by a weighting factor, the measurement of the Zernike coefficients being carried out by the steps: setting at least one of the illumination parameters successively at a number of different values, the number being at least equal to the number of Zernike polynomials to be determined; measuring a same Fourier harmonic for each of said different values, and calculating the Zernike coefficients from of the measured values for the said Fourier harmonic and by means of stored weighting factors which have been obtained by a previously carried out simulation program.
Claim 3
Independent Claim
205 words
A method of detecting aberrations of an optical imaging system, comprising the steps of: arranging a test object, which comprises at least one closed single figure having a phase structure, in the object plane of the system; providing a photoresist layer in the image plane of the system; imaging the test object by means of the system and an imaging beam; developing the photoresist layer; observing the developed image by means of a scanning detection device having a resolution which is considerably larger than that of the imaging system; subjecting the observed image to a Fourier analysis in order to ascertain at least one of different types of changes of shape in the image of the single figure, each type of shape change being indicative of a given kind of aberration, which is represented by Fourier harmonics each composed of a combination of Zernike coefficients, and determining the Zernike coefficients of an observed image by comparing the observed image with an number of reference images, which are stored together with data about their Zernike coefficients in a look-up table, to determine which of the reference images fits best to the observed image, the look-up table having been obtained by a previously carried out simulation program.
Claim 4
Independent Claim
205 words
A method of detecting aberrations of an optical imaging system, comprising the steps of: arranging a test object, which comprises at least one closed single figure having a phase structure, in the object plane of the system; providing a photoresist layer in the image plane of the system; imaging the test object by means of the system and an imaging beam; developing the photoresist layer; observing the developed image by means of a scanning detection device having a resolution which is considerably larger than that of the imaging system; subjecting the observed image to a Fourier analysis in order to ascertain at least one of different types of changes of shape in the image of the single figure, each type of shape change being indicative of a given kind of aberration, which is represented by Fourier harmonics each composed of a combination of Zernike coefficients, and determining the Zernike coefficients of an observed image by comparing the observed image with an number of reference images, which are stored together with data about their Zernike coefficients in a look-up table, to determine which of the reference images fits best to the observed image, the look-up table having been obtained by a previously carried out simulation program.
Claim 5
Dependent Claim
22 words
A method as claimed in claim 1 , characterized in that a scanning electron microscope is used as a scanning detection device.
Claim 6
Dependent Claim
33 words
A method as claimed in claim 1 , characterized in that every single figure is constituted by an area in a plate located at a different height than the rest of said plate.
Claim 7
Dependent Claim
41 words
A method as claimed in claim 4 , characterized in that the height difference between the area of the single figure and the rest of the plate is such that a phase difference of 180° is introduced in the imaging beam.
Claim 8
Dependent Claim
52 words
A method as claimed in claim 4 , characterized in that the diameter of the area is proportional to λ/(NA.M), in which λ is the wavelength of the imaging beam, NA is the numerical aperture of the imaging system at the image side and M is the magnification of the imaging system.
Claim 9
Dependent Claim
86 words
A method as claimed in claim 1 , of detecting aberrations of a projection system in a lithographic projection apparatus intended to project a mask pattern, present in a production mask, on a production substrate provided with a photoresist layer, characterized in that a mask having at least a single figure with a phase structure is arranged at the position of the production mask in the projection apparatus, and in that a photoresist layer with a support is provided at the position of a production substrate.
Claim 10
Dependent Claim
29 words
A method as claimed in claim 7 , characterized in that use is made of an empty test mask having at least a single area with a phase structure.
Claim 11
Dependent Claim
118 words
A system for performing the method as claimed in claim 1 , which system is constituted by the combination of: an apparatus of which the imaging system forms part; a test object having at least a single figure with a phase structure; a photo resist layer in which the test object is imaged; a scanning detection device for scanning at least a test object image formed and developed in the photo resist layer, and an image processor, coupled to the scanning detection device, for storing and analyzing the observed images, characterized in that the image processor comprises analysis means for detecting at least one of different types of shape changes in the formed image of the single figure.
Claim 12
Dependent Claim
129 words
A lithographic projection apparatus for imaging a mask pattern, present in a mask, on a substrate, which apparatus comprises an illumination unit for supplying a projection beam, a mask holder for accommodating the mask, a substrate holder for accommodating the substrate, and a projection system arranged between the mask holder and the substrate holder, said apparatus being suitable for performing the method as claimed in claim 1 , characterized in that, in the implementation of the method, the projection beam is used as an imaging beam and in that the illumination unit comprises means for reducing the diameter of the projection beam cross-section for the method to a value which is smaller than the diameter of the projection beam cross-section during projection of the mask pattern on the substrate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2005-04-08 | 2005-10-08 | 2006-04-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2009-04-08 | 2009-10-08 | 2010-04-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2013-04-08 | 2013-10-08 | 2014-04-09 | $7700.00 | Window Closed / Lapsed |