Patent US6362099B1 successfully refreshed from Google Patents.
US6362099B1
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Method for enhancing the adhesion of copper deposited by chemical vapor deposition
Assignee: Applied Materials Inc
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Filing: 1999-03-09
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Granted: 2002-03-26
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Expires: 2019-03-09
Abstract
Abstract The present invention provides a method for improving the adhesion of copper and other metal-comprising conductive metals to a barrier layer. A barrier layer is provided that has a first surface that is substantially unoxidized, wherein at least a portion of the first surface is free from the presence of oxygen atoms. A conductive layer is then deposited onto the first surface of the barrier layer. The substantially unoxidized state of the first surface enhances the adhesion of the metal-comprising layer to the barrier layer. The method is particularly useful in obtaining excellent adhesion of a copper nucleation layer to an underlying barrier layer surface.
Inventors
- 👤 Srinivas Gandikota
- 👤 Dennis Cong
- 👤 Liang Chen
- 👤 Sesh Ramaswami
- 👤 Daniel Carl
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 14:38
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/40; H10P14/42; H10P14/43; H10W; H10W20/00; H10W20/40; H10W20/41; H10W20/44; H10W20/4403; H10W20/4421; H10W20/4424; H10P14/44; H10P14/46; H10P14/47; H10W20/01; H10W20/031; H10W20/032; H10W20/425
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
51 words
A method for depositing copper, comprising: (a) providing a barrier layer having a first surface that is substantially unoxidized; and (b) depositing a first copper layer onto the first surface of the barrier layer, wherein the first copper layer is deposited from a precursor containing less than about 2,000 ppm water.
Claim 2
Independent Claim
51 words
A method for depositing copper, comprising: (a) providing a barrier layer having a first surface that is substantially unoxidized; and (b) depositing a first copper layer onto the first surface of the barrier layer, wherein the first copper layer is deposited from a precursor containing less than about 2,000 ppm water.
Claim 3
Independent Claim
110 words
A method for depositing copper, comprising. (a) providing a barrier layer having a first surface that is substantially unoxidized, wherein the first surface that is substantially unoxidized is provided by removing oxide from the first surface of the barrier layer, and wherein the oxide is removed using a process selected from the group consisting of ion bombardment, reactive cleaning by contact with a gas which reacts with the oxide to produce a volatile reaction product, and reactive cleaning by contact with a plasma species which reacts with the oxide to produce a volatile reaction product; and (b) depositing a first copper layer onto the first surface of the barrier layer.
Claim 4
Independent Claim
110 words
A method for depositing copper, comprising. (a) providing a barrier layer having a first surface that is substantially unoxidized, wherein the first surface that is substantially unoxidized is provided by removing oxide from the first surface of the barrier layer, and wherein the oxide is removed using a process selected from the group consisting of ion bombardment, reactive cleaning by contact with a gas which reacts with the oxide to produce a volatile reaction product, and reactive cleaning by contact with a plasma species which reacts with the oxide to produce a volatile reaction product; and (b) depositing a first copper layer onto the first surface of the barrier layer.
Claim 5
Independent Claim
55 words
A method for depositing layers onto a substrate, comprising: (a) depositing a barrier layer onto a substrate; and (b) depositing a first copper layer by chemical vapor deposition (CVD) onto a first surface of the barrier layer, wherein the first copper layer is deposited from a precursor that contains less than about 2,000 ppm water.
Claim 6
Independent Claim
55 words
A method for depositing layers onto a substrate, comprising: (a) depositing a barrier layer onto a substrate; and (b) depositing a first copper layer by chemical vapor deposition (CVD) onto a first surface of the barrier layer, wherein the first copper layer is deposited from a precursor that contains less than about 2,000 ppm water.
References Cited (Backward Citations)
US5186718A
Cited
US5320728A
Cited
US5236868A
Cited
US6160315A
Cited
US5969422A
Cited
US6069068A
Cited
US6147000A
Cited
US6140241A
Cited
US6121149A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2005-03-25 | 2005-09-24 | 2006-03-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2009-03-25 | 2009-09-24 | 2010-03-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2013-03-25 | 2013-09-24 | 2014-03-26 | $7700.00 | Window Closed / Lapsed |