US6334209B1
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for exposure-mask inspection and recording medium on which a program for searching for portions to be measured is recorded
Assignee: Toshiba Corp
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Filing: 1999-09-02
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Granted: 2001-12-25
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Expires: 2019-09-02
Abstract
Abstract Disclosed is an exposure mask inspecting method for use in manufacturing semiconductor devices. This inspecting method calculate gradients of a correlation curve of a variation in critical dimension of an exposure mask and a variation in critical dimension of a resist, extracts portions having large slopes of the correlation curve, and slopes the portions having large slopes of the correlation curve as to-be-measured portions at the time of verifying the specifications of the surface critical dimension of the exposure mask.
Inventors
- 👤 Koji Hashimoto
- 👤 Shigeki Nojima
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 07:37
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/68; G03F1/82; G03F1/84
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
71 words
An exposure mask inspecting method comprising the steps of: calculating slopes of a correlation curve of a variation in critical dimension of an exposure mask and a variation in critical dimension of a resist; extracting portions having large slopes of said correlation curve; and selecting to-be-measured portions at which the critical dimension of said exposure mask is to be measured, from said extracted portions having large slopes of said correlation curve.
Claim 2
Dependent Claim
71 words
An exposure mask inspecting method comprising the steps of: calculating slopes of a correlation curve of a variation in critical dimension of an exposure mask and a variation in critical dimension of a resist; extracting portions having large slopes of said correlation curve; and selecting to-be-measured portions at which the critical dimension of said exposure mask is to be measured, from said extracted portions having large slopes of said correlation curve.
Claim 3
Dependent Claim
25 words
The exposure mask inspecting method according to claim 1 , wherein said to-be-measured portions are selected in descending order of slopes of said correlation curve.
Claim 4
Dependent Claim
38 words
The exposure mask inspecting method according to claim 1 , wherein said step of extracting portions having large slopes of said correlation curve includes a step of classifying slopes of said correlation curve into groups of predetermined ranges.
Claim 5
Dependent Claim
27 words
The exposure mask inspecting method according to claim 3 , wherein a group of the largest slopes of said correlation curve is selected as said to-be-measured portions.
Claim 6
Dependent Claim
37 words
The exposure mask inspecting method according to claim 1 , wherein said step of extracting portions having large slopes of said correlation curve includes a step of separating said exposure mask into a plurality of planar blocks.
Claim 7
Dependent Claim
19 words
The exposure mask inspecting method according to claim 5 , wherein said to-be-measured portions are selected block by block.
Claim 8
Dependent Claim
35 words
The exposure mask inspecting method according to claim 1 , wherein said portions having large slopes of said correlation curve are those whose slopes of said correlation curve are equal to or greater than 1.5.
Claim 9
Dependent Claim
41 words
The exposure mask inspecting method according to claim 1 , wherein said slopes of said correlation curve of said variation in critical dimension of said exposure mask and said variation in critical dimension of said resist are calculated using optical simulation.
Claim 10
Dependent Claim
47 words
The exposure mask inspecting method according to claim 8 , wherein a pattern of a CAD layout of an exposure mask to be used in said optical simulation is corrected in such a way that its corner portions match with a pattern of an actual exposure mask.
Claim 11
Dependent Claim
95 words
A machine-readable recording medium on which a program for searching for optimal to-be-measured portions for measuring a critical dimension of an exposure mask is recorded, said program comprising the steps of: calculating slopes of a correlation curve of a variation in critical dimension of an exposure mask and a variation in critical dimension of a resist; extracting portions having large slopes of said correlation curve; and designating said extracted portions having large slopes of said correlation curve as candidates for to-be-measured portions at which the critical dimension of said exposure mask is to be measured.
Claim 12
Dependent Claim
95 words
A machine-readable recording medium on which a program for searching for optimal to-be-measured portions for measuring a critical dimension of an exposure mask is recorded, said program comprising the steps of: calculating slopes of a correlation curve of a variation in critical dimension of an exposure mask and a variation in critical dimension of a resist; extracting portions having large slopes of said correlation curve; and designating said extracted portions having large slopes of said correlation curve as candidates for to-be-measured portions at which the critical dimension of said exposure mask is to be measured.
References Cited (Backward Citations)
US3631772A
Cited
US3743423A
Cited
US3790280A
Cited
US3819376A
Cited
US4639587A
Cited
US4965842A
Cited
US5124927A
Cited
US5358827A
Cited
US6052478A
Cited
US5452090A
Cited
US5789118A
Cited
US5439767A
Cited
US5851702A
Cited
US5913102A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2004-12-24 | 2005-06-25 | 2005-12-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2008-12-24 | 2009-06-25 | 2009-12-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2012-12-24 | 2013-06-25 | 2013-12-25 | $7700.00 | Window Closed / Lapsed |