US6323935B1
Expired / Lapsed
US
⏱️ 0.0 years remaining
Electromagnetic alignment and scanning apparatus
Assignee: Nikon Corp
•
Filing: 2000-01-14
•
Granted: 2001-11-27
•
Expires: 2020-01-14
Abstract
Abstract An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.
Inventors
- 👤 Akimitsu Ebihara
- 👤 Thomas Novak
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 11:56
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03F7/70766; G03F7/20; G03F7/70216; G03F7/70358; G03F7/70716; G03F7/70725; G03F7/70775; G03F7/708; G03F7/70858; G03F7/709; G03F7/70991; G03F9/00; Y; Y10; Y10S; Y10S414/00; Y10S414/135; Y10S414/136
Claims Analysis
Total Claims: 101
Claim 1
Independent Claim
158 words
A microlithographic system for exposing a pattern of a mask onto an object, comprising: an exposure device disposed between said mask and said object to expose said pattern onto said object: a stage that moves while holding one of said mask and said object, the stage having a first reflective portion along a first direction; a first drive device connected to said stage to move said stage in the first direction; a position detector having a first interferometer system that cooperates with the first reflective portion to detect a position of the stage; and a balancing portion having a moving member along the first direction that moves in a direction opposite to the direction of movement of said stage without holding either said mask or said object, said moving member being heavier than said entire stage having the first reflective portion, and a length of the moving member being longer than a length of the first reflective portion.
Claim 2
Dependent Claim
158 words
A microlithographic system for exposing a pattern of a mask onto an object, comprising: an exposure device disposed between said mask and said object to expose said pattern onto said object: a stage that moves while holding one of said mask and said object, the stage having a first reflective portion along a first direction; a first drive device connected to said stage to move said stage in the first direction; a position detector having a first interferometer system that cooperates with the first reflective portion to detect a position of the stage; and a balancing portion having a moving member along the first direction that moves in a direction opposite to the direction of movement of said stage without holding either said mask or said object, said moving member being heavier than said entire stage having the first reflective portion, and a length of the moving member being longer than a length of the first reflective portion.
Claim 3
Dependent Claim
30 words
A microlithographic system according to claim 1 , wherein said first drive device has a first portion connected to said stage and a second portion connected to said moving member.
Claim 4
Dependent Claim
23 words
A microlithographic system according to claim 2 , wherein said first portion and said second portion are not in contact with each other.
Claim 5
Dependent Claim
22 words
A microlithographic system according to claim 2 , wherein said first portion comprises a coil and said second portion comprises a magnet.
Claim 6
Dependent Claim
27 words
A microlithographic system according to claim 2 , wherein the movements of said stage and of said moving member cooperatively follow the law of conservation of momentum.
Claim 7
Dependent Claim
17 words
A microlithographic system according to claim 1 , wherein said first drive device comprises a linear motor.
Claim 8
Dependent Claim
18 words
A microlithographic system according to claim 1 , further comprising a base structure that movably supports said stage.
Claim 9
Dependent Claim
19 words
A microlithographic system according to claim 7 , wherein said moving member is movably supported by said base structure.
Claim 10
Dependent Claim
23 words
A microlithographic system according to claim 7 , wherein said stage is movable over a surface of said base structure via a bearing.
Claim 11
Dependent Claim
26 words
A microlithographic system according to claim 9 , wherein said bearing is a non-contact bearing that supports said stage on said base structure without contact therebetween.
Claim 12
Dependent Claim
21 words
A microlithographic system according to claim 10 , wherein said moving member is heavier than said stage including said non-contact bearing.
Claim 13
Dependent Claim
56 words
A microlithographic system according to claim 7 , further comprising: a first non-contact bearing directly between said base structure and said stage; and a second non-contact bearing directly between said base structure and said moving member, wherein said first and second non-contact bearings directly support said stage and said moving member, respectively, on said base structure.
Claim 14
Dependent Claim
18 words
A microlithographic system according to claim 12 , wherein said first and second non-contact bearings are gas bearings.
Claim 15
Dependent Claim
30 words
A microlithographic system according to claim 1 , wherein said position detector detects a position of said stage with regard to said first direction during the movement of said stage.
Claim 16
Dependent Claim
29 words
A microlithographic system according to claim 1 , further comprising a second drive device that moves said stage in a second direction that is different from said first direction.
Claim 17
Dependent Claim
23 words
A microlithographic system according to claim 1 , wherein said exposure device includes a projection system that projects the pattern onto said object.
Claim 18
Dependent Claim
26 words
A microlithographic system according to claim 1 , wherein said moving member moves so that a center of gravity of said microlithographic system does not shift.
Claim 19
Dependent Claim
28 words
A microlithographic system according to claim 1 , wherein the microlithographic system is a scanning exposure apparatus that moves the mask and the object in a scanning manner.
Claim 20
Dependent Claim
17 words
A microlithographic system according to claim 1 , wherein said balancing portion operates without a drive source.
Claim 21
Dependent Claim
21 words
A microlithographic system according to claim 1 , wherein said stage holds said mask above an opening defined in said stage.
Claim 22
Dependent Claim
17 words
An object on which a pattern has been exposed utilizing the microlithographic system of claim 1 .
Claim 23
Dependent Claim
43 words
A microlithographic system according to claim 1 , wherein the stage has a second reflective portion along a second direction which is different from the first direction, and the position detector has a second interferometer system that cooperates with the second reflective portion.
Claim 24
Dependent Claim
17 words
A microlithographic system according to claim 22 , wherein said second reflective portion is a corner-cube mirror.
Claim 25
Dependent Claim
30 words
A microlithographic system according to claim 22 , wherein said position detector detects a position of said stage with regard to the second direction during the movement of said stage.
Claim 26
Dependent Claim
29 words
A microlithographic system according to claim 22 , further comprising a control system that corrects yaw rotation of said stage based on a detection result of said position detector.
Claim 27
Dependent Claim
19 words
A microlithographic system according to claim 25 , wherein said control system is connected to said first drive device.
Claim 28
Dependent Claim
143 words
A microlithographic system for exposing a pattern of a mask onto an object, comprising: means for exposing said pattern onto said object: movable holding means for holding one of said mask and said object, the movable holding means having a reflective portion along a first direction; first moving means for moving said holding means in the first direction; position detecting means having an interferometer system that cooperates with the reflective portion to detect a position of the holding means; and balancing means having a moving member along the first direction for moving in a direction opposite to the direction of movement of said holding means without holding either said mask or said object, said balancing means being heavier than said entire holding means having the reflective portion, and a length of the moving member being longer than a length of the reflective portion.
Claim 29
Dependent Claim
143 words
A microlithographic system for exposing a pattern of a mask onto an object, comprising: means for exposing said pattern onto said object: movable holding means for holding one of said mask and said object, the movable holding means having a reflective portion along a first direction; first moving means for moving said holding means in the first direction; position detecting means having an interferometer system that cooperates with the reflective portion to detect a position of the holding means; and balancing means having a moving member along the first direction for moving in a direction opposite to the direction of movement of said holding means without holding either said mask or said object, said balancing means being heavier than said entire holding means having the reflective portion, and a length of the moving member being longer than a length of the reflective portion.
Claim 30
Independent Claim
169 words
A method of making a microlithographic system for exposing a pattern of a mask onto an object, comprising the steps of: providing an exposure device between said mask and said object to expose said pattern onto said object: providing a stage that moves while holding one of said mask and said object, the stage having a first reflective portion along a first direction; providing a first drive device that is connected to said stage to move said stage in the first direction; providing a position detector having a first interferometer system that cooperates with the reflective portion to detect a position of the stage; and providing a balancing portion having a moving member along the first direction that moves in a direction opposite to the direction of movement of said stage without holding either said mask or said object, said moving member being heavier than said entire stage having the reflective portion, and a length of the moving member being longer than a length of the first reflective portion.
Claim 31
Independent Claim
169 words
A method of making a microlithographic system for exposing a pattern of a mask onto an object, comprising the steps of: providing an exposure device between said mask and said object to expose said pattern onto said object: providing a stage that moves while holding one of said mask and said object, the stage having a first reflective portion along a first direction; providing a first drive device that is connected to said stage to move said stage in the first direction; providing a position detector having a first interferometer system that cooperates with the reflective portion to detect a position of the stage; and providing a balancing portion having a moving member along the first direction that moves in a direction opposite to the direction of movement of said stage without holding either said mask or said object, said moving member being heavier than said entire stage having the reflective portion, and a length of the moving member being longer than a length of the first reflective portion.
Claim 32
Dependent Claim
29 words
A method according to claim 28 , wherein said first drive device has a first portion connected to said stage and a second portion connected to said moving member.
Claim 33
Dependent Claim
20 words
A method according to claim 29 , wherein said first portion and said second portion do not contact each other.
Claim 34
Dependent Claim
21 words
A method according to claim 29 , wherein said first portion comprises a coil and said second portion comprises a magnet.
Claim 35
Dependent Claim
26 words
A method according to claim 28 , wherein the movements of said stage and of said moving member cooperatively follow the law of conservation of momentum.
Claim 36
Dependent Claim
16 words
A method according to claim 28 , wherein said first drive device comprises a linear motor.
Claim 37
Dependent Claim
15 words
A method according to claim 28 , wherein a base structure movably supports said stage.
Claim 38
Dependent Claim
22 words
A method according to claim 34 , wherein said stage is movable over a surface of said base structure via a bearing.
Claim 39
Dependent Claim
31 words
A method according to claim 35 , wherein said bearing is a non-contact bearing that supports said stage on said base structure without contact between said stage and said base structure.
Claim 40
Dependent Claim
20 words
A method according to claim 36 , wherein said moving member is heavier than said stage including said non-contact bearing.
Claim 41
Dependent Claim
18 words
A method according to claim 34 , wherein said moving member is movably supported by said base structure.
Claim 42
Dependent Claim
57 words
A method according to claim 34 , further comprising: providing a first non-contact bearing directly between said base structure and said stage; and providing a second non-contact bearing directly between said base structure and said moving member, wherein said first and second non-contact bearings directly support said stage and said moving member, respectively, on said base structure.
Claim 43
Dependent Claim
17 words
A method according to claim 39 , wherein said first and second non-contact bearings are gas bearings.
Claim 44
Dependent Claim
29 words
A method according to claim 28 , wherein said position detector detects a position of said stage with regard to said first direction during the movement of said stage.
Claim 45
Dependent Claim
29 words
A method according to claim 28 , further comprising providing a second drive device that moves said stage in a second direction that is different from said first direction.
Claim 46
Dependent Claim
20 words
A method according to claim 28 , wherein said exposure device includes a projection system that projects onto said object.
Claim 47
Dependent Claim
25 words
A method according to claim 28 , wherein said moving member moves so that a center of gravity of said microlithographic system does not shift.
Claim 48
Dependent Claim
27 words
A method according to claim 28 , wherein said microlithographic system is a scanning exposure apparatus that moves said mask and said object in a scanning manner.
Claim 49
Dependent Claim
16 words
A method according to claim 28 , wherein said balancing portion operates without a drive source.
Claim 50
Dependent Claim
20 words
A method according to claim 28 , wherein said stage holds said mask above an opening defined in said stage.
Claim 51
Dependent Claim
21 words
An object on which a pattern has been exposed utilizing the microlithographic system made by the method of claim 28 .
Claim 52
Dependent Claim
42 words
A method according to claim 28 , wherein the stage has a second reflective portion along a second direction which is different from the first direction, and the position detector has a second interferometer system that cooperates with the second reflective portion.
Claim 53
Dependent Claim
16 words
A method according to claim 49 , wherein said second reflective portion is a corner-cube mirror.
Claim 54
Dependent Claim
29 words
A method according to claim 49 , wherein said position detector detects a position of said stage with regard to the second direction during the movement of said stage.
Claim 55
Dependent Claim
29 words
A method according to claim 49 , further comprising providing a control system that adjusts yaw rotation of said stage based on a detection result of said position detector.
Claim 56
Dependent Claim
18 words
A method according to claim 52 , wherein said control system is connected to said first drive device.
Claim 57
Dependent Claim
142 words
An exposure method for forming a pattern of a mask onto an object utilizing a microlithographic system, the method comprising the steps of: moving a stage, which holds one of said mask and said object, in a first direction, the stage having a first reflective portion along the first direction; measuring a position of the stage by a position detector comprising a first interferometer system that cooperates with the first reflective portion; moving a balancing portion having a moving member along the first direction in a direction opposite to the direction of movement of said stage without holding either said mask or said object, said balancing portion being heavier than said entire stage having the first reflective portion, and a length of the moving member being longer than a length of the first reflective portion; and exposing said pattern onto said object.
Claim 58
Dependent Claim
142 words
An exposure method for forming a pattern of a mask onto an object utilizing a microlithographic system, the method comprising the steps of: moving a stage, which holds one of said mask and said object, in a first direction, the stage having a first reflective portion along the first direction; measuring a position of the stage by a position detector comprising a first interferometer system that cooperates with the first reflective portion; moving a balancing portion having a moving member along the first direction in a direction opposite to the direction of movement of said stage without holding either said mask or said object, said balancing portion being heavier than said entire stage having the first reflective portion, and a length of the moving member being longer than a length of the first reflective portion; and exposing said pattern onto said object.
Claim 59
Dependent Claim
34 words
A method according to claim 54 , wherein said stage is moved with a first drive device having a first portion connected to said stage and a second portion connected to said balancing portion.
Claim 60
Dependent Claim
20 words
A method according to claim 55 , wherein said first portion and said second portion do not contact each other.
Claim 61
Dependent Claim
21 words
A method according to claim 55 , wherein said first portion comprises a coil and said second portion comprises a magnet.
Claim 62
Dependent Claim
26 words
A method according to claim 54 , wherein the movements of said stage and of said balancing portion cooperatively follow the law of conservation of momentum.
Claim 63
Dependent Claim
16 words
A method according to claim 54 , wherein said stage is moved by a linear motor.
Claim 64
Dependent Claim
17 words
A method according to claim 54 , further comprising movably supporting said stage on a base structure.
Claim 65
Dependent Claim
18 words
A method according to claim 60 , wherein said balancing portion is movably supported by said base structure.
Claim 66
Dependent Claim
23 words
A method according to claim 60 , wherein said stage is movably supported over a surface of said base structure via a bearing.
Claim 67
Dependent Claim
31 words
A method according to claim 62 , wherein said bearing is a non-contact bearing that supports said stage on said base structure without contact between said stage and said base structure.
Claim 68
Dependent Claim
20 words
A method according to claim 63 , wherein said balancing portion is heavier than said stage including said non-contact bearing.
Claim 69
Dependent Claim
54 words
A method according to claim 60 , further comprising: supporting said stage on said base structure with a first non-contact bearing located directly between said base structure and said stage; and supporting said balancing portion on said base structure with a second non-contact bearing located directly between said base structure and said balancing portion.
Claim 70
Dependent Claim
17 words
A method according to claim 65 , wherein said first and second non-contact bearings are gas bearings.
Claim 71
Dependent Claim
29 words
A method according to claim 54 , wherein said position detector detects a position of said stage with regard to said first direction during the movement of said stage.
Claim 72
Dependent Claim
23 words
A method according to claim 54 , further comprising moving said stage in a second direction that is different from said first direction.
Claim 73
Dependent Claim
17 words
A method according to claim 54 , wherein said pattern is exposed by projecting the pattern optically.
Claim 74
Dependent Claim
25 words
A method according to claim 54 , wherein said balancing portion moves so that a center of gravity of said microlithographic system does not shift.
Claim 75
Dependent Claim
25 words
A method according to claim 54 , wherein the microlithographic system is a scanning exposure apparatus that moves the mask and the object during exposure.
Claim 76
Dependent Claim
16 words
A method according to claim 54 , wherein said balancing portion operates without a drive source.
Claim 77
Dependent Claim
13 words
A method according to claim 54 , wherein said stage holds said mask.
Claim 78
Dependent Claim
42 words
A method according to claim 54 , wherein the stage has a second reflective portion along a second direction which is different from the first direction, and the position detector has a second interferometer system that cooperates with the second reflective portion.
Claim 79
Dependent Claim
16 words
A method according to claim 74 , wherein said second reflective portion is a corner-cube mirror.
Claim 80
Dependent Claim
29 words
A method according to claim 74 , wherein said position detector detects a position of said stage with regard to the second direction during the movement of said stage.
Claim 81
Dependent Claim
24 words
A method according to claim 74 , further comprising adjusting yaw rotation of said stage based on a detection result of said position detector.
Claim 82
Dependent Claim
150 words
A microlithographic system that exposes a pattern of a mask onto an object, comprising: an exposure device disposed between the mask and the object to expose the pattern onto the object; a stage that holds the mask; a first electromagnetic driver connected to the stage to move the stage in a first direction; a second electromagnetic driver connected to the stage to move the stage in a second direction different from the first direction, a moving distance of the stage in the second direction by the second electromagnetic driver being shorter than a moving distance of the stage in the first direction by the first electromagnetic driver; and a balancing portion having a moving member that moves in a direction opposite to the direction of movement of the stage by the first electromagnetic driver without holding either the mask or the object, the balancing portion being heavier than the stage.
Claim 83
Dependent Claim
150 words
A microlithographic system that exposes a pattern of a mask onto an object, comprising: an exposure device disposed between the mask and the object to expose the pattern onto the object; a stage that holds the mask; a first electromagnetic driver connected to the stage to move the stage in a first direction; a second electromagnetic driver connected to the stage to move the stage in a second direction different from the first direction, a moving distance of the stage in the second direction by the second electromagnetic driver being shorter than a moving distance of the stage in the first direction by the first electromagnetic driver; and a balancing portion having a moving member that moves in a direction opposite to the direction of movement of the stage by the first electromagnetic driver without holding either the mask or the object, the balancing portion being heavier than the stage.
Claim 84
Dependent Claim
31 words
A microlithographic system according to claim 78 , further comprising a position detector having an interferometer system and a reflective portion of the stage to detect a position of the stage.
Claim 85
Dependent Claim
30 words
A microlithographic system according to claim 79 , wherein the position detector detects a position of said stage with respect to the first direction during the movement of the stage.
Claim 86
Dependent Claim
30 words
A microlithographic system according to claim 79 , wherein the position detector detects a position of the stage with respect to the second direction during the movement of the stage.
Claim 87
Dependent Claim
30 words
A microlithographic system according to claim 79 , of further comprising a control system that corrects yaw rotation of the stage based on a detection result of the position detector.
Claim 88
Dependent Claim
22 words
A microlithographic system according to claim 79 , wherein the balancing portion is heavier than the entire stage having the reflective portion.
Claim 89
Dependent Claim
36 words
A microlithography system according to claim 79 , wherein a length of the moving member with regard to the first direction is longer than a length of the reflective portion with regard to the first direction.
Claim 90
Dependent Claim
26 words
A microlithographic system according to claim 78 , wherein at least one of the first electromagnetic driver and the second electromagnetic driver comprises a linear motor.
Claim 91
Dependent Claim
28 words
A microlithographic system according to claim 78 , wherein the microlithographic system is a scanning exposure apparatus that moves the mask and the object in a scanning manner.
Claim 92
Dependent Claim
127 words
An exposure method that forms a pattern of a mask onto an object utilizing a microlithographic system, the method comprising the steps of: moving a stage, that holds said mask, in a first direction by a first electromagnetic actuator and in a second direction different from said first direction by a second electromagnetic actuator, a moving distance of the stage in the second direction by the second electromagnetic actuator being shorter than a moving distance of the stage in the first direction by the first electromagnetic actuator; moving a balancing portion in a direction opposite to the first direction of movement of said stage without holding either said mask or said object; said balancing portion being heavier than said stage; and exposing said pattern onto said object.
Claim 93
Dependent Claim
127 words
An exposure method that forms a pattern of a mask onto an object utilizing a microlithographic system, the method comprising the steps of: moving a stage, that holds said mask, in a first direction by a first electromagnetic actuator and in a second direction different from said first direction by a second electromagnetic actuator, a moving distance of the stage in the second direction by the second electromagnetic actuator being shorter than a moving distance of the stage in the first direction by the first electromagnetic actuator; moving a balancing portion in a direction opposite to the first direction of movement of said stage without holding either said mask or said object; said balancing portion being heavier than said stage; and exposing said pattern onto said object.
Claim 94
Dependent Claim
33 words
A method according to claim 87 , further comprising detecting a position of the stage with a position detector, the position detector comprising an interferometer system and a reflective portion of the stage.
Claim 95
Dependent Claim
29 words
A method according to claim 88 , wherein the position detector detects a position of the stage with respect to the first direction during the movement of the stage.
Claim 96
Dependent Claim
29 words
A method according to claim 88 , wherein the position detector detects a position of the stage with respect to the second direction during the movement of the stage.
Claim 97
Dependent Claim
24 words
A method according to claim 88 , further comprising correcting yaw rotation of the stage based on a detection result of the position detector.
Claim 98
Dependent Claim
21 words
A method according to claim 88 , wherein the balancing portion is heavier than the entire stage having the reflective portion.
Claim 99
Dependent Claim
35 words
A method according to claim 88 , wherein the length of the balancing portion with regard to the first direction is longer than a length of the reflective portion with regard to the first direction.
Claim 100
Dependent Claim
22 words
A method according to claim 87 , wherein at least one of the first and second electromagnetic actuators is a linear motor.
Claim 101
Dependent Claim
27 words
A method according to claim 87 , wherein the microlithographic system is a scanning exposure apparatus that moves the mask and the object in a scanning manner.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2004-11-26 | 2005-05-28 | 2005-11-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2008-11-26 | 2009-05-28 | 2009-11-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2012-11-26 | 2013-05-28 | 2013-11-27 | $7700.00 | Window Closed / Lapsed |