US5796469A — Exposure apparatus and device manufacturing metho…

Claim 1

Independent Claim 112 words

An exposure apparatus in which a portion of a pattern of an original is projected onto a substrate and in which the original and the substrate are scanned synchronously such that the pattern of the original is transferred to the substrate, said apparatus comprising: first and second stages, one of which is for scanningly moving the original and the other of which is for scanningly moving the substrate; measuring means for measuring a deviation of said first stage relative to said second stage in a predetermined direction other than the direction of scanning movement; and adjusting means for adjusting the second stage on the basis of the measurement by said measuring means.

Claim 2

Dependent Claim 112 words

An exposure apparatus in which a portion of a pattern of an original is projected onto a substrate and in which the original and the substrate are scanned synchronously such that the pattern of the original is transferred to the substrate, said apparatus comprising: first and second stages, one of which is for scanningly moving the original and the other of which is for scanningly moving the substrate; measuring means for measuring a deviation of said first stage relative to said second stage in a predetermined direction other than the direction of scanning movement; and adjusting means for adjusting the second stage on the basis of the measurement by said measuring means.

Claim 3

Dependent Claim 25 words

An apparatus according to claim 1, wherein said adjusting means adjusts movement of the second stage on the basis of measurement by said measuring means.

Claim 4

Dependent Claim 14 words

An apparatus according to claim 1, wherein said measuring means comprises a laser interferometer.

Claim 5

Dependent Claim 18 words

An apparatus according to claim 1, wherein said predetermined direction is perpendicular to the direction of scanning movement.

Claim 6

Dependent Claim 26 words

An apparatus according to claim 1, wherein said predetermined direction is a rotational direction about an axis which is perpendicular to the original or the substrate.

Claim 7

Dependent Claim 35 words

An apparatus according to claim 1, further comprising means for projecting the pattern of the original onto the substrate in a reduced scale, so that reduced-scale patterns are printed in different zones of the substrate.

Claim 8

Dependent Claim 31 words

An apparatus according to claim 1, wherein said first stage holds the original and said second stage holds the substrate, and wherein said first stage is provided above said second stage.

Claim 9

Dependent Claim 31 words

An apparatus according to claim 7, further comprising a frame member which supports said first stage and a projection optical system for projecting the pattern of the original onto the substrate.

Claim 10

Dependent Claim 26 words

An apparatus according to claim 1, wherein at least one of said first and second stages comprises an air bearing for guiding movement of said stages.

Claim 11

Dependent Claim 130 words

An exposure apparatus in which a portion of a pattern of an original is projected onto a substrate and in which the original and the substrate are scanned synchronously such that the pattern of the original is transferred to the substrate, said apparatus comprising: a stage for scanningly moving one of the original and the substrate in a scanning direction; a reference member provided on said stage and being adapted to be used for measurement of the position of said stage; and detecting means for detecting, with the use of said reference member, the direction of scanning movement of said stage on the basis of measurement, at different locations along the stage movement direction of the position of the stage with respect to a direction different from the scanning direction.

Claim 12

Dependent Claim 130 words

An exposure apparatus in which a portion of a pattern of an original is projected onto a substrate and in which the original and the substrate are scanned synchronously such that the pattern of the original is transferred to the substrate, said apparatus comprising: a stage for scanningly moving one of the original and the substrate in a scanning direction; a reference member provided on said stage and being adapted to be used for measurement of the position of said stage; and detecting means for detecting, with the use of said reference member, the direction of scanning movement of said stage on the basis of measurement, at different locations along the stage movement direction of the position of the stage with respect to a direction different from the scanning direction.

Claim 13

Dependent Claim 25 words

An apparatus according to claim 10, further comprising means for correcting the direction of scanning movement on the basis of detection by said detecting means.

Claim 14

Dependent Claim 35 words

An apparatus according to claim 10, further comprising a laser interferometer for measuring the position of said stage, wherein said reference mirror member comprises a reference reflection mirror to be used with said laser interferometer.

Claim 15

Dependent Claim 18 words

An apparatus according to claim 10, wherein said detecting means comprises an autocollimator provided independently of said stage.

Claim 16

Dependent Claim 35 words

An apparatus according to claim 10, further comprising means for projecting the pattern of the original onto the substrate in a reduced scale, so that reduced-scale patterns are printed in different zones of the substrate.

Claim 17

Dependent Claim 30 words

An apparatus according to claim 10, further comprising a frame member which supports said stage and a projection optical system for projecting the pattern of the original onto the substrate.

Claim 18

Dependent Claim 19 words

An apparatus according to claim 10, wherein said stage comprises an air bearing for guiding movement of said stage.

Claim 19

Dependent Claim 144 words

An exposure apparatus in which a portion of a pattern of an original is projected onto a substrate and in which the original and the substrate are scanned in a timed relation such that the pattern of the original is transferred to the substrate, said apparatus comprising: first and second stages, one of which is for scanningly moving the original and the other of which is for scanningly moving the substrate; a projection optical system for projecting the pattern of the original onto the substrate; first measuring means for measuring positional information of said first stage; second measuring means for measuring positional information of said second stage; a frame member for supporting at least said first stage and for supporting both of said first and second measuring means; and a flow passageway, provided in said frame member, for flowing therethrough a temperature adjusting medium.

Claim 20

Dependent Claim 144 words

An exposure apparatus in which a portion of a pattern of an original is projected onto a substrate and in which the original and the substrate are scanned in a timed relation such that the pattern of the original is transferred to the substrate, said apparatus comprising: first and second stages, one of which is for scanningly moving the original and the other of which is for scanningly moving the substrate; a projection optical system for projecting the pattern of the original onto the substrate; first measuring means for measuring positional information of said first stage; second measuring means for measuring positional information of said second stage; a frame member for supporting at least said first stage and for supporting both of said first and second measuring means; and a flow passageway, provided in said frame member, for flowing therethrough a temperature adjusting medium.

Claim 21

Dependent Claim 23 words

An apparatus according to claim 17, further comprising means for projecting the pattern of the original onto the substrate in a reduced scale.

Claim 22

Dependent Claim 138 words

An exposure apparatus in which a portion of a pattern of an original is projected onto a substrate and in which the original and the substrate are scanned synchronously such that the pattern of the original is transferred to the substrate, said apparatus comprising: first and second stages, one of which is for scanningly moving the original and the other of which is for scanningly moving the substrate, wherein said first and second stages are guided by air bearing means; a projection optical system for projecting the pattern of the original onto the substrate; first measuring means for measuring positional information of said first stage; second measuring means for measuring positional information of said second stage; and a frame member for supporting at least said first stage and for supporting both of said first and second measuring means.

Claim 23

Dependent Claim 138 words

An exposure apparatus in which a portion of a pattern of an original is projected onto a substrate and in which the original and the substrate are scanned synchronously such that the pattern of the original is transferred to the substrate, said apparatus comprising: first and second stages, one of which is for scanningly moving the original and the other of which is for scanningly moving the substrate, wherein said first and second stages are guided by air bearing means; a projection optical system for projecting the pattern of the original onto the substrate; first measuring means for measuring positional information of said first stage; second measuring means for measuring positional information of said second stage; and a frame member for supporting at least said first stage and for supporting both of said first and second measuring means.

Claim 24

Dependent Claim 31 words

An apparatus according to claim 19, wherein said first stage holds the original and said second stage holds the substrate, and wherein said first stage is provided above said second stage.

Claim 25

Dependent Claim 19 words

An apparatus according to claim 20, wherein said frame member supports said first stage and said projection optical system.

Claim 26

Dependent Claim 28 words

An apparatus according to claim 19, wherein said first and second measuring means each comprise a laser interferometer, and further comprising a reference mirror mounted on said stages.

Claim 27

Dependent Claim 22 words

An apparatus according to claim 19, wherein a plurality of patterns are transferred to the substrate in accordance with a step-and-scan sequence.

Claim 28

Dependent Claim 27 words

An apparatus according to claim 19, further comprising compensating means for reducing an effect of relative deviation of said first and second stages attributable to the movement.

Claim 29

Dependent Claim 119 words

An exposure method for the manufacture of microdevices, in which a portion of a pattern of an original is projected onto a substrate and in which the original and the substrate are scanned in a timed relation such that the pattern of the original is transferred to the substrate, said method comprising the steps of: providing first and second stages, one of which is for scanningly moving the original and the other of which is for scanningly moving the substrate; measuring a deviation of the first stage relative to the second stage with respect to a predetermined direction other than the scanning movement direction; and adjusting the second stage, on the basis of the measurement in said measuring step.

Claim 30

Dependent Claim 119 words

An exposure method for the manufacture of microdevices, in which a portion of a pattern of an original is projected onto a substrate and in which the original and the substrate are scanned in a timed relation such that the pattern of the original is transferred to the substrate, said method comprising the steps of: providing first and second stages, one of which is for scanningly moving the original and the other of which is for scanningly moving the substrate; measuring a deviation of the first stage relative to the second stage with respect to a predetermined direction other than the scanning movement direction; and adjusting the second stage, on the basis of the measurement in said measuring step.

Claim 31

Dependent Claim 27 words

A method according to claim 25, wherein said adjusting step comprises adjusting movement of the second stage on the basis of the measurement in said measuring step.

Claim 32

Dependent Claim 20 words

A method according to claim 25, wherein said measuring step comprises measuring the deviation by use of a laser interferometer.

Claim 33

Dependent Claim 17 words

A method according to claim 25, wherein the predetermined direction is perpendicular to the scanning movement direction.

Claim 34

Dependent Claim 28 words

A method according to claim 25, wherein the predetermined direction is a rotational direction about an axis that is perpendicular to one of the original and the substrate.

Claim 35

Dependent Claim 21 words

A method according to claim 25, further comprising projecting the pattern of the original onto the substrate in a reduced scale.

Claim 36

Dependent Claim 139 words

An exposure method for the manufacture of microdevices, in which a portion of a pattern of an original is projected onto a substrate and in which the original and the substrate are scanned in a timed relation such that the pattern of the original is transferred to the substrate, said method comprising the steps of: providing a stage for scanningly moving one of the original and the substrate in a scanning direction; providing a reference member on the stage, which reference member is adapted to be used for measurement of the position of the stage; and detecting, by using the reference member, the direction of scanning movement of the stage on the basis of measurement, at different locations along the stage movement direction, of the position of the stage with respect to a direction different from the scanning direction.

Claim 37

Dependent Claim 139 words

An exposure method for the manufacture of microdevices, in which a portion of a pattern of an original is projected onto a substrate and in which the original and the substrate are scanned in a timed relation such that the pattern of the original is transferred to the substrate, said method comprising the steps of: providing a stage for scanningly moving one of the original and the substrate in a scanning direction; providing a reference member on the stage, which reference member is adapted to be used for measurement of the position of the stage; and detecting, by using the reference member, the direction of scanning movement of the stage on the basis of measurement, at different locations along the stage movement direction, of the position of the stage with respect to a direction different from the scanning direction.

Claim 38

Dependent Claim 25 words

A method according to claim 31, further comprising correcting the direction of the scanning movement on the basis of the detection in said detecting step.

Claim 39

Dependent Claim 36 words

A method according to claim 31, further comprising measuring the position of the stage by use of a laser interferometer, wherein the reference member comprises a reference reflection mirror to be used with the laser interferometer.

Claim 40

Dependent Claim 25 words

A method according to claim 31, wherein said detecting step uses an autocollimator for detecting the deviation, which autocollimator is provided independently of the stage.

Claim 41

Dependent Claim 21 words

A method according to claim 31, further comprising projecting the pattern of the original onto the substrate in a reduced scale.

Claim 42

Independent Claim 159 words

An apparatus for projecting a portion of a pattern of a reticle onto a wafer while scanning the reticle and the wafer so that the pattern of the reticle is transferred to the wafer, said apparatus comprising: a reticle stage for scanningly moving the reticle, and being guided by first air bearing means; a wafer stage for scanningly moving the wafer, and being guided by second air bearing means; a projection optical system for projecting the pattern of the reticle onto the wafer in a predetermined reduction scale; a first laser interferometer for measuring positional information of said reticle stage; a first mirror for use with said first laser interferometer and mounted on said reticle stage; a second laser interferometer for measuring positional information of said wafer stage; and a second mirror for use with said second laser interferometer and mounted on said wafer stage, wherein said first and second laser interferometers are fixed to the same frame member.

Claim 43

Independent Claim 159 words

An apparatus for projecting a portion of a pattern of a reticle onto a wafer while scanning the reticle and the wafer so that the pattern of the reticle is transferred to the wafer, said apparatus comprising: a reticle stage for scanningly moving the reticle, and being guided by first air bearing means; a wafer stage for scanningly moving the wafer, and being guided by second air bearing means; a projection optical system for projecting the pattern of the reticle onto the wafer in a predetermined reduction scale; a first laser interferometer for measuring positional information of said reticle stage; a first mirror for use with said first laser interferometer and mounted on said reticle stage; a second laser interferometer for measuring positional information of said wafer stage; and a second mirror for use with said second laser interferometer and mounted on said wafer stage, wherein said first and second laser interferometers are fixed to the same frame member.

Claim 44

Dependent Claim 21 words

An apparatus according to claim 36, wherein said wafer stage comprises an X stage, a Y stage, and a θ stage.

Claim 45

Dependent Claim 20 words

An apparatus according to claim 36, wherein plural patterns are transferred to the wafer in accordance with a step-and-scan sequence.

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	2001-08-17	2002-02-16	2002-08-18	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	2005-08-17	2006-02-16	2006-08-18	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	2009-08-17	2010-02-16	2010-08-18	$7700.00	Window Closed / Lapsed

Exposure apparatus and device manufacturing method using the same

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