Patent US6238824B1 successfully refreshed from Google Patents.
US6238824B1
Expired / Lapsed
US
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Method for designing and making photolithographic reticle, reticle, and photolithographic process
Assignee: Micron Technology Inc
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Filing: 1999-08-31
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Granted: 2001-05-29
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Expires: 2019-08-31
Abstract
Abstract There are provided methods for making a reticle for use in a photolithography process, comprising generating an first reticle layout having at least one printable reticle feature, generating a modified reticle layout having the first reticle layout and at least one correction area, generating an alignment budget-containing reticle layout having at least one different printable reticle feature and at least one alignment budget border area, and removing from the modified reticle layout any area of overlap between the at least one correction area and the at least one alignment budget border area. There are also provided reticles formed according to such methods. In addition, there are provided computer-implemented methods for designing such a reticle, as well as computer readable storage media, and computer systems for use in making such reticles. In addition, there are provided photolithographic processes using such a reticle.
Inventors
- 👤 John R. Futrell
- 👤 Christophe Pierrat
- 👤 William Stanton
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 14:30
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7003; G03F1/00; G03F1/36; G03F7/00; G03F7/70; G03F7/70425; G03F7/70433; G03F7/70441
Claims Analysis
Total Claims: 76
Claim 1
Independent Claim
234 words
A method for designing a reticle, comprising: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one alignment budget border area; and removing said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout.
Claim 2
Independent Claim
234 words
A method for designing a reticle, comprising: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one alignment budget border area; and removing said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout.
Claim 3
Dependent Claim
45 words
A method as recited in claim 1 , further comprising checking said final reticle layout to analyze differences between features contained in said circuit layout and a pattern that will be produced by exposing a resist through a reticle corresponding to said final reticle layout.
Claim 4
Dependent Claim
19 words
A method as recited in claim 2 , further comprising altering said final reticle layout depending on said differences.
Claim 5
Dependent Claim
18 words
A method as recited in claim 1 , wherein said final reticle layout is generated on a computer.
Claim 6
Dependent Claim
39 words
A method as recited in claim 1 , further comprising forming a reticle comprising transparent areas at locations corresponding to locations in said final reticle layout where said printable features and said at least one correction area are located.
Claim 7
Dependent Claim
41 words
A method as recited in claim 1 , further comprising forming a reticle comprising transparent areas at locations corresponding to locations in said final reticle layout other than where said printable features and said at least one correction area are located.
Claim 8
Dependent Claim
29 words
A method as recited in claim 1 , further comprising: removing said alignment budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 9
Dependent Claim
74 words
A method as recited in claim 7 , further comprising: forming a first reticle comprising transparent areas at locations corresponding to locations in said first final reticle layout where said at least one first printable feature and said at least one correction area are located; and forming a second reticle comprising transparent areas at locations corresponding to locations in said second final reticle layout where said at least one second printable feature is located.
Claim 10
Dependent Claim
78 words
A method as recited in claim 7 , further comprising: forming a first reticle comprising transparent areas at locations corresponding to locations in said first final reticle layout other than where said at least one first printable feature and said at least one correction area are located; and forming a second reticle comprising transparent areas at locations corresponding to locations in said second final reticle layout other than where said at least one second printable feature is located.
Claim 11
Independent Claim
300 words
A method for designing a reticle, comprising: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a first modified reticle layout, said first modified reticle layout comprising said first initial reticle layout and at least one first layout correction area; generating a second modified reticle layout, said second modified reticle layout comprising said second initial reticle layout and at least one second layout correction area; generating an alignment budget-containing reticle layout comprising said second modified reticle layout and at least one alignment budget border area around said second at least one second printable reticle feature and said at least one second layout correction area; positioning said first modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one first layout correction area and said at least one alignment budget border area; removing said overlap from said at least one first layout correction area in said first modified reticle layout to form a first final reticle layout; and removing said alignment budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 12
Independent Claim
300 words
A method for designing a reticle, comprising: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a first modified reticle layout, said first modified reticle layout comprising said first initial reticle layout and at least one first layout correction area; generating a second modified reticle layout, said second modified reticle layout comprising said second initial reticle layout and at least one second layout correction area; generating an alignment budget-containing reticle layout comprising said second modified reticle layout and at least one alignment budget border area around said second at least one second printable reticle feature and said at least one second layout correction area; positioning said first modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one first layout correction area and said at least one alignment budget border area; removing said overlap from said at least one first layout correction area in said first modified reticle layout to form a first final reticle layout; and removing said alignment budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 13
Dependent Claim
85 words
A method as recited in claim 10 , further comprising: forming a first reticle comprising transparent areas at locations corresponding to locations in said first final reticle layout where said at least one first printable feature and said at least one first layout correction area are located; and forming a second reticle comprising transparent areas at locations corresponding to locations in said second final reticle layout where said at least one second printable feature and said at least one second layout correction area are located.
Claim 14
Dependent Claim
89 words
A method as recited in claim 10 , further comprising: forming a first reticle comprising transparent areas at locations corresponding to locations in said first final reticle layout other than where said at least one first printable feature and said at least one first layout correction area are located; and forming a second reticle comprising transparent areas at locations corresponding to locations in said second final reticle layout other than where said at least one second printable feature and said at least one second layout correction area are located.
Claim 15
Independent Claim
252 words
A method for designing a reticle, comprising: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating a budget-containing reticle layout comprising said second initial reticle layout and at least one budget border area, said budget border area including alignment budget and process budget; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one budget border area; removing said overlap from said at least one correction area in said modified reticle layout to form a first final reticle layout; and removing said budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 16
Independent Claim
252 words
A method for designing a reticle, comprising: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating a budget-containing reticle layout comprising said second initial reticle layout and at least one budget border area, said budget border area including alignment budget and process budget; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one budget border area; removing said overlap from said at least one correction area in said modified reticle layout to form a first final reticle layout; and removing said budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 17
Dependent Claim
74 words
A method as recited in claim 13 , further comprising: forming a first reticle comprising transparent areas at locations corresponding to locations in said first final reticle layout where said at least one first printable feature and said at least one correction area are located; and forming a second reticle comprising transparent areas at locations corresponding to locations in said second final reticle layout where said at least one second printable feature is located.
Claim 18
Dependent Claim
78 words
A method as recited in claim 13 , further comprising: forming a first reticle comprising transparent areas at locations corresponding to locations in said first final reticle layout other than where said at least one first printable feature and said at least one correction area are located; and forming a second reticle comprising transparent areas at locations corresponding to locations in said second final reticle layout other than where said at least one second printable feature is located.
Claim 19
Dependent Claim
307 words
A reticle comprising: at least one substantially opaque section having an opaque section pattern; and at least one substantially transparent section having a transparent section pattern, said opaque section pattern and said transparent section pattern being formed by: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one alignment budget border area; removing said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout; and forming a reticle comprising opaque areas and transparent areas, one of said opaque areas as transparent areas being positioned at locations corresponding to locations in said final reticle layout where said printable features and said at least one correction area are located.
Claim 20
Dependent Claim
307 words
A reticle comprising: at least one substantially opaque section having an opaque section pattern; and at least one substantially transparent section having a transparent section pattern, said opaque section pattern and said transparent section pattern being formed by: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one alignment budget border area; removing said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout; and forming a reticle comprising opaque areas and transparent areas, one of said opaque areas as transparent areas being positioned at locations corresponding to locations in said final reticle layout where said printable features and said at least one correction area are located.
Claim 21
Dependent Claim
18 words
A reticle as recited in claim 16 , wherein said final reticle layout is generated on a computer.
Claim 22
Dependent Claim
34 words
A reticle as in claim 15 wherein opaque areas are positioned at locations corresponding to locations in said final reticle layout where said printable features are said at least one connection area are located.
Claim 23
Dependent Claim
34 words
A reticle as in claim 15 wherein transparent areas are positioned at locations corresponding to locations in said final reticle layout where said printable features are said at least one connection area are located.
Claim 24
Dependent Claim
312 words
A phase shift reticle comprising: at least one phase shift section having a phase shift pattern; and at least one substantially transparent section having a transparent section pattern, said phase shift pattern and said transparent section pattern being formed by: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one alignment budget border area; removing said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout; and forming a reticle comprising phase shift areas and transparent areas, one of said phase shift areas and said transparent areas being positioned at locations corresponding to locations in said final reticle layout where said printable features and said at least one correction area are located.
Claim 25
Dependent Claim
312 words
A phase shift reticle comprising: at least one phase shift section having a phase shift pattern; and at least one substantially transparent section having a transparent section pattern, said phase shift pattern and said transparent section pattern being formed by: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one alignment budget border area; removing said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout; and forming a reticle comprising phase shift areas and transparent areas, one of said phase shift areas and said transparent areas being positioned at locations corresponding to locations in said final reticle layout where said printable features and said at least one correction area are located.
Claim 26
Dependent Claim
20 words
A phase shift reticle as recited in claim 20 , wherein said final reticle layout is generated on a computer.
Claim 27
Dependent Claim
24 words
A phase shift reticle as recited in claim 20 , wherein said phase shift areas comprise phase shift areas and attenuated phase shift areas.
Claim 28
Dependent Claim
37 words
A phase shift reticle as in claim 20 wherein said transparent areas are positioned at locations corresponding to locations in said final reticle layout where said printable features and said at least one correction area are located.
Claim 29
Dependent Claim
38 words
A phase shift reticle as in claim 20 wherein said phase shift areas are positioned at locations corresponding to locations in said final reticle layout where said printable features and said at least one correction area are located.
Claim 30
Dependent Claim
320 words
A photolithographic process, comprising: directing exposure onto a resist through a reticle, said reticle comprising: at least one substantially opaque section having an opaque section pattern; and at least one substantially transparent section having a transparent section pattern, said opaque section pattern and said transparent section pattern being formed by: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one alignment budget border area; removing said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout; and forming a reticle comprising opaque areas and transparent areas, one of said opaque areas and said transparent areas being positioned at locations corresponding to locations in said final reticle layout where said printable features and said at least one correction area are located.
Claim 31
Dependent Claim
320 words
A photolithographic process, comprising: directing exposure onto a resist through a reticle, said reticle comprising: at least one substantially opaque section having an opaque section pattern; and at least one substantially transparent section having a transparent section pattern, said opaque section pattern and said transparent section pattern being formed by: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one alignment budget border area; removing said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout; and forming a reticle comprising opaque areas and transparent areas, one of said opaque areas and said transparent areas being positioned at locations corresponding to locations in said final reticle layout where said printable features and said at least one correction area are located.
Claim 32
Dependent Claim
35 words
A photolithic process as in claim 25 wherein transparent areas are positioned at locations corresponding to locations in said final reticle layout where said printable features and said at least one correction area are located.
Claim 33
Dependent Claim
35 words
A photolithic process as in claim 25 wherein opaque areas are positioned at locations corresponding to locations in said final reticle layout where said printable features and said at least one correction area are located.
Claim 34
Dependent Claim
322 words
A photolithographic process, comprising: directing exposure onto a resist through a reticle, said reticle comprising: at least one phase shift section having a phase shift pattern; and at least one substantially transparent section having a transparent section pattern, said phase shift pattern and said transparent section pattern being formed by: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one alignment budget border area; removing said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout; and forming a reticle comprising phase shift areas and transparent areas, one of said phase shift areas and said transparent areas being positioned at locations corresponding to locations in said final reticle layout where said printable features and said at least one correction area are located.
Claim 35
Dependent Claim
322 words
A photolithographic process, comprising: directing exposure onto a resist through a reticle, said reticle comprising: at least one phase shift section having a phase shift pattern; and at least one substantially transparent section having a transparent section pattern, said phase shift pattern and said transparent section pattern being formed by: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one alignment budget border area; removing said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout; and forming a reticle comprising phase shift areas and transparent areas, one of said phase shift areas and said transparent areas being positioned at locations corresponding to locations in said final reticle layout where said printable features and said at least one correction area are located.
Claim 36
Dependent Claim
36 words
A photolithographic process as in claim 28 wherein said transparent areas are positioned at locations corresponding to locations in said final reticle layout where said printable features and said at least one correction area are located.
Claim 37
Dependent Claim
36 words
photolithographic process as in claim 28 wherein said phase shift areas are positioned at locations corresponding to locations in said final reticle layout where said printable features and said at least one correction area are located.
Claim 38
Dependent Claim
252 words
A computer readable storage medium containing a computer readable code for operating a computer to perform a method of designing a reticle, said method comprising: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one alignment budget border area; and removing said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout.
Claim 39
Dependent Claim
252 words
A computer readable storage medium containing a computer readable code for operating a computer to perform a method of designing a reticle, said method comprising: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one alignment budget border area; and removing said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout.
Claim 40
Dependent Claim
18 words
A computer readable storage medium as recited in claim 31 , wherein said reticle is a binary mask.
Claim 41
Dependent Claim
19 words
A computer readable storage medium as recited in claim 31 , wherein said reticle is a phase shift mask.
Claim 42
Dependent Claim
20 words
A computer readable storage medium as recited in claim 31 , wherein said reticle is an attenuated phase shift mask.
Claim 43
Dependent Claim
34 words
A computer readable storage medium as in claim 31 , wherein said method further comprises: removing said alignment budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 44
Dependent Claim
318 words
A computer readable storage medium containing a computer readable code for operating a computer to perform a method of designing a reticle, said method comprising: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a first modified reticle layout, said first modified reticle layout comprising said first initial reticle layout and at least one first layout correction area; generating a second modified reticle layout, said second modified reticle layout comprising said second initial reticle layout and at least one second layout correction area; generating an alignment budget-containing reticle layout comprising said second modified reticle layout and at least one alignment budget border area around said second at least one second printable reticle feature and said at least one second layout correction area; positioning said first modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one first layout correction area and said at least one alignment budget border area; removing said overlap from said at least one first layout correction area in said first modified reticle layout to form a first final reticle layout; and removing said alignment budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 45
Dependent Claim
318 words
A computer readable storage medium containing a computer readable code for operating a computer to perform a method of designing a reticle, said method comprising: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a first modified reticle layout, said first modified reticle layout comprising said first initial reticle layout and at least one first layout correction area; generating a second modified reticle layout, said second modified reticle layout comprising said second initial reticle layout and at least one second layout correction area; generating an alignment budget-containing reticle layout comprising said second modified reticle layout and at least one alignment budget border area around said second at least one second printable reticle feature and said at least one second layout correction area; positioning said first modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one first layout correction area and said at least one alignment budget border area; removing said overlap from said at least one first layout correction area in said first modified reticle layout to form a first final reticle layout; and removing said alignment budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 46
Dependent Claim
18 words
A computer readable storage medium as recited in claim 36 , wherein said reticle is a binary mask.
Claim 47
Dependent Claim
19 words
A computer readable storage medium as recited in claim 36 , wherein said reticle is a phase shift mask.
Claim 48
Dependent Claim
20 words
A computer readable storage medium as recited in claim 36 , wherein said reticle is an attenuated phase shift mask.
Claim 49
Dependent Claim
270 words
A computer readable storage medium containing a computer readable code for operating a computer to perform a method of designing a reticle, said method comprising: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating a budget-containing reticle layout comprising said second initial reticle layout and at least one budget border area, said budget border area including alignment budget and process budget; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one budget border area; removing said overlap from said at least one correction area in said modified reticle layout to form a first final reticle layout; and removing said budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 50
Dependent Claim
270 words
A computer readable storage medium containing a computer readable code for operating a computer to perform a method of designing a reticle, said method comprising: generating at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generating a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generating a budget-containing reticle layout comprising said second initial reticle layout and at least one budget border area, said budget border area including alignment budget and process budget; positioning said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determining any overlap between said at least one correction area and said at least one budget border area; removing said overlap from said at least one correction area in said modified reticle layout to form a first final reticle layout; and removing said budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 51
Dependent Claim
18 words
A computer readable storage medium as recited in claim 40 , wherein said reticle is a binary mask.
Claim 52
Dependent Claim
19 words
A computer readable storage medium as recited in claim 40 , wherein said reticle is a phase shift mask.
Claim 53
Dependent Claim
20 words
A computer readable storage medium as recited in claim 40 , wherein said reticle is an attenuated phase shift mask.
Claim 54
Dependent Claim
273 words
A processor system, comprising: a computer readable storage medium containing program instructions for execution by a processor to design a reticle; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable storage medium to: generate at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generate a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generate an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; position said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determine any overlap between said at least one correction area and said at least one alignment budget border area; and remove said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout.
Claim 55
Dependent Claim
273 words
A processor system, comprising: a computer readable storage medium containing program instructions for execution by a processor to design a reticle; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable storage medium to: generate at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generate a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generate an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; position said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determine any overlap between said at least one correction area and said at least one alignment budget border area; and remove said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout.
Claim 56
Dependent Claim
15 words
A system as recited in claim 44 , wherein said reticle is a binary mask.
Claim 57
Dependent Claim
16 words
A system as recited in claim 44 , wherein said reticle is a phase shift mask.
Claim 58
Dependent Claim
17 words
A system as recited in claim 44 , wherein said reticle is an attenuated phase shift mask.
Claim 59
Dependent Claim
38 words
A processor system, as in claim 44 , wherein said processor is further responsive to said program instructions to: remove said alignment budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 60
Dependent Claim
339 words
A processor system, comprising: a computer readable storage medium containing program instructions for execution by a processor to design a reticle; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable storage medium to: generate at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generate a first modified reticle layout, said second modified reticle layout comprising said first initial reticle layout and at least one first layout correction area; generate a second modified reticle layout, said second modified reticle layout comprising said second initial reticle layout and at least one second layout correction area; generate an alignment budget-containing reticle layout comprising said second modified reticle layout and at least one alignment budget border area around said second at least one second printable reticle feature and said at least one second layout correction area; position said first modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determine any overlap between said at least one first layout correction area and said at least one alignment budget border area; remove said overlap from said at least one first layout correction area in said first modified reticle layout to form a first final reticle layout; and remove said alignment budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 61
Dependent Claim
339 words
A processor system, comprising: a computer readable storage medium containing program instructions for execution by a processor to design a reticle; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable storage medium to: generate at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generate a first modified reticle layout, said second modified reticle layout comprising said first initial reticle layout and at least one first layout correction area; generate a second modified reticle layout, said second modified reticle layout comprising said second initial reticle layout and at least one second layout correction area; generate an alignment budget-containing reticle layout comprising said second modified reticle layout and at least one alignment budget border area around said second at least one second printable reticle feature and said at least one second layout correction area; position said first modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determine any overlap between said at least one first layout correction area and said at least one alignment budget border area; remove said overlap from said at least one first layout correction area in said first modified reticle layout to form a first final reticle layout; and remove said alignment budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 62
Dependent Claim
15 words
A system as recited in claim 49 , wherein said reticle is a binary mask.
Claim 63
Dependent Claim
16 words
A system as recited in claim 49 , wherein said reticle is a phase shift mask.
Claim 64
Dependent Claim
17 words
A system as recited in claim 49 , wherein said reticle is an attenuated phase shift mask.
Claim 65
Dependent Claim
291 words
A processor system, comprising: a computer readable storage medium containing program instructions for execution by a processor to design a reticle; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable storage medium to: generate at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generate a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generate a budget-containing reticle layout comprising said second initial reticle layout and at least one budget border area, said budget border area including alignment budget and process budget; position said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determine any overlap between said at least one correction area and said at least one budget border area; remove said overlap from said at least one correction area in said modified reticle layout to form a first final reticle layout; and remove said budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 66
Dependent Claim
291 words
A processor system, comprising: a computer readable storage medium containing program instructions for execution by a processor to design a reticle; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable storage medium to: generate at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generate a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generate a budget-containing reticle layout comprising said second initial reticle layout and at least one budget border area, said budget border area including alignment budget and process budget; position said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determine any overlap between said at least one correction area and said at least one budget border area; remove said overlap from said at least one correction area in said modified reticle layout to form a first final reticle layout; and remove said budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 67
Dependent Claim
15 words
A system as recited in claim 53 , wherein said reticle is a binary mask.
Claim 68
Dependent Claim
16 words
A system as recited in claim 53 , wherein said reticle is a phase shift mask.
Claim 69
Dependent Claim
17 words
A system as recited in claim 53 , wherein said reticle is an attenuated phase shift mask.
Claim 70
Independent Claim
310 words
A system for designing a reticle comprising: a plurality of computer systems, each computer system comprising: a computer readable storage medium containing program instructions for execution by a processor to design and/or check a reticle; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable medium, said plurality of computer systems operating in conjunction with each other to: generate at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generate a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generate an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; position said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determine any overlap between said at least one correction area and said at least one alignment budget border area; and remove said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout, wherein each computer system processes different tasks associated with formation of said reticle.
Claim 71
Independent Claim
310 words
A system for designing a reticle comprising: a plurality of computer systems, each computer system comprising: a computer readable storage medium containing program instructions for execution by a processor to design and/or check a reticle; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable medium, said plurality of computer systems operating in conjunction with each other to: generate at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generate a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generate an alignment budget-containing reticle layout comprising said second initial reticle layout and at least one alignment budget border area; position said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determine any overlap between said at least one correction area and said at least one alignment budget border area; and remove said overlap from said at least one correction area in said modified reticle layout to form at least one modified correction area, thereby forming a final reticle layout, wherein each computer system processes different tasks associated with formation of said reticle.
Claim 72
Dependent Claim
36 words
A system as in claim 57 wherein said plurality of computer systems work in conjunction to further: remove said alignment budget border area from said alignment budget-containing reticle layout to form a second final reticle layout.
Claim 73
Independent Claim
376 words
A system for designing a reticle comprising: a plurality of computer systems, each computer system comprising: a computer readable storage medium containing program instructions for execution by a processor to design and/or check a reticle; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable medium, said plurality of computer systems operating in conjunction with each other to: generate at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generate a first modified reticle layout, said second modified reticle layout comprising said first initial reticle layout and at least one first layout correction area; generate a second modified reticle layout, said second modified reticle layout comprising said second initial reticle layout and at least one second layout correction area; generate an alignment budget-containing reticle layout comprising said second modified reticle layout and at least one alignment budget border area around said second at least one second printable reticle feature and said at least one second layout correction area; position said first modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determine any overlap between said at least one first layout correction area and said at least one alignment budget border area; remove said overlap from said at least one first layout correction area in said first modified reticle layout to form a first final reticle layout; and remove said alignment budget border area from said alignment budget-containing reticle layout to form a second final reticle layout, wherein each computer system processes different tasks associated with formation of said reticle.
Claim 74
Independent Claim
376 words
A system for designing a reticle comprising: a plurality of computer systems, each computer system comprising: a computer readable storage medium containing program instructions for execution by a processor to design and/or check a reticle; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable medium, said plurality of computer systems operating in conjunction with each other to: generate at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generate a first modified reticle layout, said second modified reticle layout comprising said first initial reticle layout and at least one first layout correction area; generate a second modified reticle layout, said second modified reticle layout comprising said second initial reticle layout and at least one second layout correction area; generate an alignment budget-containing reticle layout comprising said second modified reticle layout and at least one alignment budget border area around said second at least one second printable reticle feature and said at least one second layout correction area; position said first modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determine any overlap between said at least one first layout correction area and said at least one alignment budget border area; remove said overlap from said at least one first layout correction area in said first modified reticle layout to form a first final reticle layout; and remove said alignment budget border area from said alignment budget-containing reticle layout to form a second final reticle layout, wherein each computer system processes different tasks associated with formation of said reticle.
Claim 75
Independent Claim
328 words
A system for designing a reticle comprising: a plurality of computer systems, each computer system comprising: a computer readable storage medium containing program instructions for execution by a processor to design and/or check a reticle; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable medium, said plurality of computer systems operating in conjunction with each other to: generate at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generate a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generate a budget-containing reticle layout comprising said second initial reticle layout and at least one budget border area, said budget border area including alignment budget and process budget; position said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determine any overlap between said at least one correction area and said at least one budget border area; remove said overlap from said at least one correction area in said modified reticle layout to form a first final reticle layout; and remove said budget border area from said alignment budget-containing reticle layout to form a second final reticle layout, wherein each computer system processes different tasks associated with formation of said reticle.
Claim 76
Independent Claim
328 words
A system for designing a reticle comprising: a plurality of computer systems, each computer system comprising: a computer readable storage medium containing program instructions for execution by a processor to design and/or check a reticle; and a processor in communication with said computer readable storage medium, said processor executing said program instructions stored on said computer readable medium, said plurality of computer systems operating in conjunction with each other to: generate at least a first initial reticle layout and a second initial reticle layout, said first initial reticle layout comprising at least one first printable reticle feature, said second initial reticle layout comprising at least one second printable reticle feature, said at least one first printable reticle feature and said at least one second printable reticle feature to be provided according to a circuit feature layout on a single layer of a semiconductor device; generate a modified reticle layout, said modified reticle layout comprising said first initial reticle layout and at least one correction area; generate a budget-containing reticle layout comprising said second initial reticle layout and at least one budget border area, said budget border area including alignment budget and process budget; position said modified reticle layout and said alignment budget-containing reticle layout such that the relative alignment of said at least one first printable reticle feature and said at least one second printable reticle feature is the same as the relative alignment of said at least one first printable reticle feature and said at least one second printable feature in said circuit feature layout; determine any overlap between said at least one correction area and said at least one budget border area; remove said overlap from said at least one correction area in said modified reticle layout to form a first final reticle layout; and remove said budget border area from said alignment budget-containing reticle layout to form a second final reticle layout, wherein each computer system processes different tasks associated with formation of said reticle.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2004-05-28 | 2004-11-27 | 2005-05-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2008-05-28 | 2008-11-27 | 2009-05-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2012-05-28 | 2012-11-27 | 2013-05-29 | $7700.00 | Window Closed / Lapsed |