Patent US6188464B1 successfully refreshed from Google Patents.
US6188464B1
Expired / Lapsed
US
⏱️ 0.0 years remaining
Exposure apparatus
Assignee: Nikon Corp
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Filing: 1999-04-12
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Granted: 2001-02-13
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Expires: 2019-04-12
Abstract
Abstract A scanning type exposure apparatus comprises a mask stage position-measuring unit, a substrate stage position-measuring unit, an arithmetic processing unit, and a control unit. The arithmetic processing unit multiplies results of measurement (WX, WY, Wθ) by the substrate position-measuring unit by a conversion vector comprising components containing a magnification of a projection optical system and an angle of rotation between a mask and a substrate to determine a target vector quantity (RX*, RY*, Rθ*) of a mask stage. An error vector is determined by subtracting, from the target vector quantity, results of measurement (RX, RY, Rθ) by the mask stage position-measuring unit. The controller controls the mask stage so that the error vector becomes zero. The exposure apparatus includes correcting sections for correcting time lags in measurement by the respective position-measuring units. The arithmetic processing unit uses corrected positional information. The mask stage can accurately follow a substrate stage.
Inventors
- 👤 Susumu Makinouchi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 11:17
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/70; G03F7/70216; G03F7/70358; G03B; G03B27/00; G03B27/32; G03B27/42; G03F7/70691; G03F7/70716; G03F7/70725; G03F7/70775
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
200 words
An expose method for exposing an object with a pattern formed on a mask by relatively moving a mask stage holding the mask thereon and an object stage holding the object thereon, comprising: measuring a position of the mask stage while relatively moving the mask stage and the object stage during exposure of the object; measuring a position of the object stage while relatively moving the mask stage and the object stage during exposure of the object; and performing vector-calculation to calculate information for correcting a positional error between the mask stage and the object stage during exposure of the object based on positional information of the mask stage and positional information of the object stage, the vector-calculation performed with a vector quantity of the mask obtained from the measured position of the mask and a vector quantity of the object obtained from the measured position of the object; the information for correcting the positional error being vector information for correcting the positional error between the mask stage and the object stage together with a rotational error between the mask stage and the object stage while relatively moving the mask stage and the object stage during exposure of the object.
Claim 2
Dependent Claim
200 words
An expose method for exposing an object with a pattern formed on a mask by relatively moving a mask stage holding the mask thereon and an object stage holding the object thereon, comprising: measuring a position of the mask stage while relatively moving the mask stage and the object stage during exposure of the object; measuring a position of the object stage while relatively moving the mask stage and the object stage during exposure of the object; and performing vector-calculation to calculate information for correcting a positional error between the mask stage and the object stage during exposure of the object based on positional information of the mask stage and positional information of the object stage, the vector-calculation performed with a vector quantity of the mask obtained from the measured position of the mask and a vector quantity of the object obtained from the measured position of the object; the information for correcting the positional error being vector information for correcting the positional error between the mask stage and the object stage together with a rotational error between the mask stage and the object stage while relatively moving the mask stage and the object stage during exposure of the object.
Claim 3
Dependent Claim
27 words
The exposing method according to claim 1 , further comprising correcting a relative position between the mask stage and the object stage based on the vector information.
Claim 4
Dependent Claim
67 words
The exposing method according to claim 1 , further comprising: obtaining information on a time lag in position measurement of the mask stage; obtaining information on a time lag in position measurement of the object stage; and correcting a relative position between the mask stage and the object stage based on the information on time lags in position measurement of the mask stage and the object stage.
Claim 5
Dependent Claim
33 words
The exposing method according to claim 1 , wherein degrees of freedom of measurement of not less than three axes is performed by measuring positions of the mask stage and the object stage.
Claim 6
Dependent Claim
34 words
The exposing method according to claim 1 , wherein the mask stage and the object stage are driven by a driving system having degrees of freedom of measurement of not less than three axes.
Claim 7
Dependent Claim
26 words
A method for manufacturing a semiconductor device comprising transferring the pattern of the mask onto the object using the exposure method defined in claim 1 .
Claim 8
Dependent Claim
121 words
An exposure method for exposing an object to be exposed with a pattern formed on a mask by relatively moving a mask stage holding the mask thereon and an object stage holding the object thereon, comprising: measuring a position of the mask stage; measuring a position of the object stage; obtaining information on a time lag in position measurement of the mask stage; obtaining information on a time lag in position measurement of the object stage; and controlling a relative position between the mask stage and the object stage based on results of position measurements of the mask stage and the object stage and the information on time lags in the position measurement of the mask stage and the object stage.
Claim 9
Dependent Claim
121 words
An exposure method for exposing an object to be exposed with a pattern formed on a mask by relatively moving a mask stage holding the mask thereon and an object stage holding the object thereon, comprising: measuring a position of the mask stage; measuring a position of the object stage; obtaining information on a time lag in position measurement of the mask stage; obtaining information on a time lag in position measurement of the object stage; and controlling a relative position between the mask stage and the object stage based on results of position measurements of the mask stage and the object stage and the information on time lags in the position measurement of the mask stage and the object stage.
Claim 10
Dependent Claim
34 words
The exposing method according to claim 7 , wherein degrees of freedom of measurement of not less than three axes is performed by the positional measurement of the mask stage and the object stage.
Claim 11
Independent Claim
251 words
A method for manufacturing an exposure apparatus for transferring a pattern formed on a mask onto an object, the method comprising: providing a mask stage that positions the mask; providing an object stage that positions the object with respect to the mask pattern; providing a mask stage position-measuring unit, connected to the mask stage, that measures a two-dimensional position of the mask stage; providing an object stage position-measuring unit, connected to the object stage, that measures a two-dimensional position of the object stage; providing a processor, connected to at least one of the mask stage position-measuring unit and the object stage position-measuring unit, that determines an error vector quantity, wherein the processor: (a) determines a first vector quantity from the measuring performed by one of the mask stage position-measuring unit and the object stage position-measuring unit, (b) determines from the first vector quantity, a target position vector quantity of the stage corresponding to the other of the mask stage position-measuring unit and the object stage position-measuring unit, (c) determines a second vector quantity from the measuring performed by the other of the mask stage position-measuring unit and the object stage position-measuring unit, and (d) determines the error vector quantity by subtracting the second vector quantity from the target position vector quantity; and providing a controller that controls a position or a velocity of the stage corresponding to the other of the mask stage position-measuring unit and the object stage position-measuring unit in conformity with the error vector determined by the processor.
Claim 12
Independent Claim
251 words
A method for manufacturing an exposure apparatus for transferring a pattern formed on a mask onto an object, the method comprising: providing a mask stage that positions the mask; providing an object stage that positions the object with respect to the mask pattern; providing a mask stage position-measuring unit, connected to the mask stage, that measures a two-dimensional position of the mask stage; providing an object stage position-measuring unit, connected to the object stage, that measures a two-dimensional position of the object stage; providing a processor, connected to at least one of the mask stage position-measuring unit and the object stage position-measuring unit, that determines an error vector quantity, wherein the processor: (a) determines a first vector quantity from the measuring performed by one of the mask stage position-measuring unit and the object stage position-measuring unit, (b) determines from the first vector quantity, a target position vector quantity of the stage corresponding to the other of the mask stage position-measuring unit and the object stage position-measuring unit, (c) determines a second vector quantity from the measuring performed by the other of the mask stage position-measuring unit and the object stage position-measuring unit, and (d) determines the error vector quantity by subtracting the second vector quantity from the target position vector quantity; and providing a controller that controls a position or a velocity of the stage corresponding to the other of the mask stage position-measuring unit and the object stage position-measuring unit in conformity with the error vector determined by the processor.
Claim 13
Dependent Claim
16 words
A substrate processed by the exposure apparatus manufactured by the method according to claim 9 .
Claim 14
Independent Claim
297 words
A method for manufacturing an exposure apparatus for transferring an image of a pattern formed on a mask onto an object by illuminating the mask and synchronously scanning the mask and the object with respect to an illumination area on the mask, comprising: providing a mask stage that positions the mask; providing a substrate stage that positions the object with respect to the mask pattern; providing a mask stage position-measuring unit, connected to the mask stage, that measures a two-dimensional position of the mask stage; providing an object stage position-measuring unit, connected to the object stage, that measures a two-dimensional position of the substrate stage; providing a projection optical system, disposed between the mask and the object, that projects the pattern on the mask onto the object at a predetermined magnification; providing a processor, connected to at least one of the mask stage position-measuring unit and the object stage position-measuring unit, that determines an error vector quantity, wherein the processor: (a) determines a first vector quantity from the measuring performed by one of the mask stage position-measuring unit and the object stage position-measuring unit, (b) determines from the first vector quantity, a target vector quantity of the stage corresponding to the other of the mask stage position-measuring unit and the object stage position-measuring unit, (c) determines a second vector quantity from the measuring performed by the other of the mask stage position-measuring unit and the object stage position-measuring unit, and (d) determines the error vector quantity by subtracting the second vector quantity from the target vector quantity; and providing a controller that controls a position or a velocity of the stage corresponding to the other of the mask stage position-measuring unit and the object stage position-measuring unit in conformity with the error vector determined by the processor.
Claim 15
Independent Claim
297 words
A method for manufacturing an exposure apparatus for transferring an image of a pattern formed on a mask onto an object by illuminating the mask and synchronously scanning the mask and the object with respect to an illumination area on the mask, comprising: providing a mask stage that positions the mask; providing a substrate stage that positions the object with respect to the mask pattern; providing a mask stage position-measuring unit, connected to the mask stage, that measures a two-dimensional position of the mask stage; providing an object stage position-measuring unit, connected to the object stage, that measures a two-dimensional position of the substrate stage; providing a projection optical system, disposed between the mask and the object, that projects the pattern on the mask onto the object at a predetermined magnification; providing a processor, connected to at least one of the mask stage position-measuring unit and the object stage position-measuring unit, that determines an error vector quantity, wherein the processor: (a) determines a first vector quantity from the measuring performed by one of the mask stage position-measuring unit and the object stage position-measuring unit, (b) determines from the first vector quantity, a target vector quantity of the stage corresponding to the other of the mask stage position-measuring unit and the object stage position-measuring unit, (c) determines a second vector quantity from the measuring performed by the other of the mask stage position-measuring unit and the object stage position-measuring unit, and (d) determines the error vector quantity by subtracting the second vector quantity from the target vector quantity; and providing a controller that controls a position or a velocity of the stage corresponding to the other of the mask stage position-measuring unit and the object stage position-measuring unit in conformity with the error vector determined by the processor.
Claim 16
Dependent Claim
16 words
A substrate processed by the exposure apparatus manufactured by the method according to claim 11 .
Claim 17
Independent Claim
236 words
A method for manufacturing an exposure apparatus for transferring an image of a pattern formed on a mask onto an object to be exposed by illuminating the mask and synchronously scanning the mask and the object with respect to an illumination area on the mask, the method comprising: providing a mask stage that positions the mask; providing an object stage that positions the object with respect to the mask pattern; providing a mask stage position-measuring unit, connected to the mask stage, that measures a two-dimensional position of the mask stage; providing an object stage position-measuring unit, connected to the object stage, that measures a two-dimensional position of the object stage; providing a first time lag-correcting system, connected to the mask stage position-measuring unit, that corrects a time lag in measurement by the mask stage position-measuring unit; providing a second time lag-correcting system, connected to the object stage position-measuring unit, that corrects a time lag in measurement by the object stage position-measuring unit; and providing a stage controller, connected to at least one stage of the object stage and the mask stage, that controls movement of the one stage on the basis of positional information on the mask stage of which the time lag has been corrected and positional information on the object stage of which the time lag has been corrected so that the mask stage and the object stage are in a predetermined positional relationship.
Claim 18
Independent Claim
236 words
A method for manufacturing an exposure apparatus for transferring an image of a pattern formed on a mask onto an object to be exposed by illuminating the mask and synchronously scanning the mask and the object with respect to an illumination area on the mask, the method comprising: providing a mask stage that positions the mask; providing an object stage that positions the object with respect to the mask pattern; providing a mask stage position-measuring unit, connected to the mask stage, that measures a two-dimensional position of the mask stage; providing an object stage position-measuring unit, connected to the object stage, that measures a two-dimensional position of the object stage; providing a first time lag-correcting system, connected to the mask stage position-measuring unit, that corrects a time lag in measurement by the mask stage position-measuring unit; providing a second time lag-correcting system, connected to the object stage position-measuring unit, that corrects a time lag in measurement by the object stage position-measuring unit; and providing a stage controller, connected to at least one stage of the object stage and the mask stage, that controls movement of the one stage on the basis of positional information on the mask stage of which the time lag has been corrected and positional information on the object stage of which the time lag has been corrected so that the mask stage and the object stage are in a predetermined positional relationship.
Claim 19
Dependent Claim
16 words
A substrate processed by the exposure apparatus manufactured by the method according to claim 13 .
Claim 20
Dependent Claim
167 words
An exposure method for exposing an object with a pattern formed on a mask while relatively moving the mask and the object, comprising: measuring a position of the mask, which has degrees of freedom of not less than three axes, while relatively moving the mask and the object during exposure of the object; measuring a position of the object, which has degrees of freedom of not less than three axes, while relatively moving the mask and the object during exposure of the object; and controlling the relative movement of the mask and the object during exposure of the object based on a vector-calculation with a vector quantity of the mask obtained from the measured position of the mask having degrees of freedom of not less than three axes and a vector quantity of the object obtained from the measured position of the object having degrees of freedom of not less than three axes, so that relative position and rotation between the mask and the object are optimized.
Claim 21
Dependent Claim
167 words
An exposure method for exposing an object with a pattern formed on a mask while relatively moving the mask and the object, comprising: measuring a position of the mask, which has degrees of freedom of not less than three axes, while relatively moving the mask and the object during exposure of the object; measuring a position of the object, which has degrees of freedom of not less than three axes, while relatively moving the mask and the object during exposure of the object; and controlling the relative movement of the mask and the object during exposure of the object based on a vector-calculation with a vector quantity of the mask obtained from the measured position of the mask having degrees of freedom of not less than three axes and a vector quantity of the object obtained from the measured position of the object having degrees of freedom of not less than three axes, so that relative position and rotation between the mask and the object are optimized.
Claim 22
Dependent Claim
50 words
The exposure method according to claim 15 , wherein the step of controlling the relative movement of the mask and the object further comprises obtaining vector information for correcting positional error between the mask and the object together with rotational error between the mask and the object by the vector-calculation.
Claim 23
Dependent Claim
26 words
A method for manufacturing a semiconductor device comprising transferring the pattern of the mask onto the object using the exposure method defined in claim 15 .
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2004-02-13 | 2004-08-14 | 2005-02-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2008-02-13 | 2008-08-14 | 2009-02-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2012-02-13 | 2012-08-14 | 2013-02-13 | $7700.00 | Window Closed / Lapsed |