Patent US6177670B1 successfully refreshed from Google Patents.
US6177670B1
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Method of observing secondary ion image by focused ion beam
Assignee: Hitachi High-Tech Analysis Corp
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Filing: 1999-01-22
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Granted: 2001-01-23
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Expires: 2019-01-22
Abstract
Abstract A high-resolution secondary ion image is observed by first and second processing steps. In the first step, the focus of the ion optics is adjusted while observing a secondary electron image at an image refresh rate of a few or several seconds. In the second step, secondary ions are detected with a secondary charged-particle detector without readjusting the focus of the ion optics. A secondary ion image is observed at a scanning rate of tens to hundreds of seconds/frame. Thus, a focused high-resolution secondary ion image is derived.
Inventors
- 👤 Yasuhiko Sugiyama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 03:00
CPC Classifications
H; H01; H01J; H01J37/00; G; G01; G01N; G01N23/00; G01N23/22; G01N23/225
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
165 words
A method of observing a secondary ion image by a focused ion beam, comprising the steps of: adjusting the focus of a ion optics while detecting secondary electrons with a secondary charged-particle detector and observing a secondary electron image, using a focused ion beam (FIB) system, said FIB system comprising: a focused ion beam-generating portion comprising a liquid metal ion source, the ion optics for focusing an ion beam extracted from said ion source, and a blanking electrode for turning on and of f said ion beam over a sample; a deflection electrode for deflecting and scanning said focused ion beam; a movable sample stage on which a specimen illuminated with said focused ion beam is placed; and a secondary charged-particle detector for detecting secondary charged particles emitted by the illumination of said focused ion beam; and detecting the secondary ions with the secondary charged-particle detector without readjusting the focus of the ion optics adjusted by the first-mentioned step and observing a secondary ion image.
Claim 2
Independent Claim
165 words
A method of observing a secondary ion image by a focused ion beam, comprising the steps of: adjusting the focus of a ion optics while detecting secondary electrons with a secondary charged-particle detector and observing a secondary electron image, using a focused ion beam (FIB) system, said FIB system comprising: a focused ion beam-generating portion comprising a liquid metal ion source, the ion optics for focusing an ion beam extracted from said ion source, and a blanking electrode for turning on and of f said ion beam over a sample; a deflection electrode for deflecting and scanning said focused ion beam; a movable sample stage on which a specimen illuminated with said focused ion beam is placed; and a secondary charged-particle detector for detecting secondary charged particles emitted by the illumination of said focused ion beam; and detecting the secondary ions with the secondary charged-particle detector without readjusting the focus of the ion optics adjusted by the first-mentioned step and observing a secondary ion image.
Claim 3
Dependent Claim
44 words
A method of observing a secondary ion image by a focused ion beam as set forth in claim 1 , wherein said secondary charged-particle detector consists of a detector used to detect only secondary ions and another detector used to detect only secondary electrons.
Claim 4
Dependent Claim
186 words
A method of observing a secondary ion image by a focused ion beam as set forth in claim 1 , wherein said secondary charged-particle detector is a secondary charged-particle detector for detecting secondary electrons while setting a pull-in voltage to positive polarity and for detecting secondary ions while setting the pull-in voltage to negative polarity and is provided with a compensating means for compensating for variations in the position hit by said focused ion beam by switching the polarity of said pull-in voltage, said method comprising the steps of: adjusting the focus of the ion optics while detecting secondary electrons with the secondary charged-particle detector and observing a secondary electron image; and detecting secondary ions with the secondary charged-particle detector without readjusting the focus of the ion optics adjusted by the first-mentioned step, making an adjustment such that the field of view of the secondary electron image and the field of view of the secondary ion image are brought into the same position by the compensating means for compensating for variations in the position hit by the focused ion beam, and observing the secondary ion image.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2004-01-23 | 2004-07-24 | 2005-01-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2008-01-23 | 2008-07-24 | 2009-01-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2012-01-23 | 2012-07-24 | 2013-01-23 | $7700.00 | Window Closed / Lapsed |