Projection exposure apparatus and device manufacturing method

Claim 1

A projection exposure apparatus, comprising: a projection optical system for projecting a pattern of a mask onto a substrate; and a stage for the substrate arranged to be movable in directions X and Y each of which is perpendicular to an optical axis of said projection optical system and which are perpendicular to each other, wherein said projection optical system has a pair of aspherical members, at least one of which is displaceable in a direction P which is perpendicular to the optical axis of said projection optical system and which differs from the directions X and Y, the direction P being at an angle of not less than 10 degrees and not greater than 80 degrees with respect to each of the directions X and Y, wherein a shape of an aspheric surface of each of said pair of aspherical members is determined such that a refractive power of said pair of aspherical members functioning as one system obtained at a section including the direction P varies accordingly as a positional relation in the direction P between the aspheric surfaces of said pair of aspherical members varies, said pair of aspherical members functioning as one system having no refractive power at a section including a direction perpendicular to the direction P, and wherein a refractive power at the section of said projection optical system is varied by displacing the at least one of said pair of aspherical members in the direction P.

Claim 6

A device manufacturing method, comprising the steps of: projecting, using a projection optical system, a pattern of a mask onto a substrate; arranging a stage for the substrate to be movable in directions X and Y each of which is perpendicular to an optical axis of the projection optical system and which are perpendicular to each other; providing the projection optical system with a pair of aspherical members, at least one of which is displaceable in a direction P which is perpendicular to the optical axis of the projection optical system and which differs from the directions X and Y, the direction P being at an angle of not less than 10 degrees and not greater than 80 degrees with respect to each of the directions X and Y, wherein a shape of an aspheric surface of each of the pair of aspherical members is determined such that a refractive power of the pair of aspherical members functioning as one system obtained at a section including the direction P varies accordingly as a positional relation in the direction P between the aspheric surfaces of the pair of aspherical members varies, said pair of aspherical members function as one system having no refractive power at a section including a direction perpendicular to the direction P; varying a refractive power at the section of the projection optical system by displacing the at least one of the pair of aspherical members in the direction P; exposing a wafer to a device pattern through the projection optical system; and developing the exposed wafer.

Claim 7

A device manufacturing method, comprising the steps of: projecting, using a projection optical system, a pattern of a mask onto a substrate; arranging a stage for the substrate to be movable in directions X and Y each of which is perpendicular to an optical axis of the projection optical system and which are perpendicular to each other; providing the projection optical system with a pair of aspherical members, at least one of which is displaceable in a direction P which is perpendicular to the optical axis of the projection optical system and which differs from the directions X and Y, the direction P being at an angle of not less than 10 degrees and not greater than 80 degrees with respect to each of the directions X and Y, wherein a shape of an aspheric surface of each of the pair of aspherical members is determined such that a refractive power of the pair of aspherical members functioning as one system obtained at a section including the direction P varies accordingly as a positional relation in the direction P between the aspheric surfaces of the pair of aspherical members varies, said pair of aspherical members function as one system having no refractive power at a section including a direction perpendicular to the direction P; varying a refractive power at the section of the projection optical system by displacing the at least one of the pair of aspherical members in the direction P; exposing a wafer to a device pattern through the projection optical system; and developing the exposed wafer.