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US6139624A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for producing an electrical contact on a SIC surface

Assignee: Infineon Technologies AG
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Filing: 1996-03-29
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Granted: 2000-10-31
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Expires: 2016-03-29
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Abstract

Abstract Method for producing an electrical contact on a SiC surface A carbon coating (4), preferably a graphite coating, is first created on the silicon carbide surface (3). Said carbon coating (4) is then converted, with a carbide-forming metal (Me), into a metal carbide coating (7). The SiC/metal carbide contact produced thereby forms, in particular, an almost perfect Schottky contact.

Inventors

  • 👤 Roland Rupp

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 13:39
CPC Classifications
H; H10; H10D; H10D62/00; H10D62/80; H10D62/83; H10D62/832; H10D62/8325; H10D64/00; H10D64/01; H10D64/012; H10D64/0121; H10D64/0123

Claims Analysis

Total Claims: 26
Claim 1
Independent Claim 76 words
A method for producing an electrical contact on a silicon carbide surface (3), comprising the steps of: a) producing by epitaxial deposition a SiC crystal (2) having said silicon carbide surface (3); b) producing a carbon coating (4) on said silicon carbide surface (3) by interrupting silicon delivery during said epitaxial deposition and by delivering only carbon; and c) converting the carbon coating (4) at least largely into metal carbide with at least one carbide-forming metal.
Claim 2
Independent Claim 76 words
A method for producing an electrical contact on a silicon carbide surface (3), comprising the steps of: a) producing by epitaxial deposition a SiC crystal (2) having said silicon carbide surface (3); b) producing a carbon coating (4) on said silicon carbide surface (3) by interrupting silicon delivery during said epitaxial deposition and by delivering only carbon; and c) converting the carbon coating (4) at least largely into metal carbide with at least one carbide-forming metal.
Claim 3
Dependent Claim 24 words
The method as defined in claim 1, wherein the SiC single crystal (2) and the carbon coating (4) are produced by chemical vapor deposition.
Claim 4
Dependent Claim 24 words
The method as defined in claim 1, wherein the SiC single crystal (2) and the carbon coating (4) are produced by molecular beam epitaxy.
Claim 5
Dependent Claim 63 words
The method as defined in claim 1, wherein the silicon carbide surface (3) is formed with a silicon plane of the SiC single crystal (2) that corresponds in the case of a cubic polytype of SiC (β-SiC) to a (1 1 1) crystal surface, and that corresponds in the case of a non-cubic polytype (α-SiC) to a (0 0 0 1) crystal surface.
Claim 6
Dependent Claim 63 words
The method as defined in claim 1, wherein the silicon carbide surface (3) is formed with a carbon plane of the SiC single crystal (2) that corresponds in the case of a cubic polytype of SiC (β-SiC) to a (-1 -1 -1) crystal surface, and that corresponds in the case of a non-cubic polytype (α-SiC) to a (0 0 0 -1) crystal surface.
Claim 7
Dependent Claim 23 words
The method as defined in claim 1, wherein the carbon coating (4) has a substantially graphite crystalline structure or a graphite-like crystalline structure.
Claim 8
Dependent Claim 23 words
The method as defined in claim 1, wherein the carbon coating (4) is created to have a thickness of less than 1 nm.
Claim 9
Dependent Claim 37 words
The method as defined in claim 1, wherein an element selected from the group consisting of tungsten (W), titanium (Ti), tantalum (Ta), boron (B), aluminum (Al), nickel (Ni), and scandium (Sc) is used as the carbide-forming metal.
Claim 10
Dependent Claim 23 words
The method as defined in claim 1, wherein the at least one carbide-forming metal is brought to the carbon coating (4) by sputtering.
Claim 11
Dependent Claim 36 words
The method as defined in claim 9, wherein the kinetic energy of the metal atoms or metal ions is set to be at least as great as the chemical formation energy of the associated metal carbide.
Claim 12
Dependent Claim 34 words
The method as defined in claim 1, wherein the carbide-forming metal is first applied onto the carbon coating (4) and then caused to react chemically with the carbon by means of a temperature treatment.
Claim 13
Dependent Claim 18 words
The method as defined in claim 11, wherein the carbide-forming metal is evaporated onto the carbon coating (4).
Claim 14
Independent Claim 102 words
A method for producing an electrical contact on a silicon surface (3), comprising the steps of: a) producing a SiC crystal (2) by epitaxial deposition at a temperature between approximately 1000° C. and approximately 1800° C. said SiC single crystal (2) having said silicon carbide surface (3), immediately followed by b) cooling the SiC single crystal (2) in vacuum or in an inert gas atmosphere, wherein the carbon coating (4) is produced by evaporating silicon atoms off from said silicon carbide surface (3), and c) converting the carbon coating (4) at least largely into metal carbide with at least one carbide-forming metal.
Claim 15
Independent Claim 102 words
A method for producing an electrical contact on a silicon surface (3), comprising the steps of: a) producing a SiC crystal (2) by epitaxial deposition at a temperature between approximately 1000° C. and approximately 1800° C. said SiC single crystal (2) having said silicon carbide surface (3), immediately followed by b) cooling the SiC single crystal (2) in vacuum or in an inert gas atmosphere, wherein the carbon coating (4) is produced by evaporating silicon atoms off from said silicon carbide surface (3), and c) converting the carbon coating (4) at least largely into metal carbide with at least one carbide-forming metal.
Claim 16
Dependent Claim 19 words
The method as defined in claim 13, wherein the SiC single crystal (2) is produced by chemical vapour deposition.
Claim 17
Dependent Claim 19 words
The method as defined in claim 13, wherein the SiC single crystal (2) is produced by molecular beam epitaxy.
Claim 18
Dependent Claim 63 words
The method as defined in claim 13, wherein the silicon carbide surface (3) is formed with a silicon plane of the SiC single crystal (2) that corresponds in the case of a cubic polytype of SiC (β-SiC) to a (1 1 1) crystal surface, and that corresponds in the case of a non-cubic polytype (α-SiC) to a (0 0 0 1) crystal surface.
Claim 19
Dependent Claim 63 words
The method as defined in claim 13, wherein the silicon carbide surface (3) is formed with a carbon plane of the SiC single crystal (2) that corresponds in the case of a cubic polytype of SiC (β-SiC) to a (--1 -1 -1) crystal surface, and that corresponds in the case of a non-cubic polytype (α-SiC) to a (0 0 0 -1) crystal surface.
Claim 20
Dependent Claim 23 words
The method as defined in claim 13, wherein the carbon coating (4) has a substantially graphite crystalline structure or a graphite-like crystalline structure.
Claim 21
Dependent Claim 23 words
The method as defined in claim 13, wherein the carbon coating (4) is created to have a thickness of less than 1 nm.
Claim 22
Dependent Claim 37 words
The method as defined in claim 13, wherein an element selected from the group consisting of tungsten (W), titanium (Ti), tantalum (Ta), boron (B), aluminum (Al), nickel (Ni), and scandium (Sc) is used as the carbide-forming metal.
Claim 23
Dependent Claim 23 words
The method as defined in claim 13, wherein the at least one carbide-forming metal is brought to the carbon coating (4) by sputtering.
Claim 24
Dependent Claim 36 words
The method as defined in claim 21, wherein the kinetic energy of the metal atoms or metal ions is set to be at least as great as the chemical formation energy of the associated metal carbide.
Claim 25
Dependent Claim 34 words
The method as defined in claim 13, wherein the carbide-forming metal is first applied onto the carbon coating (4) and then caused to react chemically with the carbon by means of a temperature treatment.
Claim 26
Dependent Claim 18 words
The method as defined in claim 23, wherein the carbide-forming metal is evaporated onto the carbon coating (4).

References Cited (Backward Citations)

GB1112016A Cited
US4402771A Cited
US5010035A Cited
US5114745A Cited
US5119540A Cited
US5352636A Cited
US5667586A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2003-10-31 2004-05-01 2004-10-31 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2007-10-31 2008-05-01 2008-10-31 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2011-10-31 2012-05-01 2012-10-31 $7700.00 Window Closed / Lapsed

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