US6133062A
Expired / Lapsed
US
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Method of fabricating focusing and color-filtering structure for semiconductor light-sensitive device
Assignee: United Microelectronics Corp
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Filing: 1998-08-24
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Granted: 2000-10-17
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Expires: 2018-08-24
Abstract
Abstract An improved focusing and color-filtering structure is provided for use in a semiconductor light-sensitive device, such as CMOS (complementary metal-oxide semiconductor) light-sensitive device, that can be used, for example, on a digital camera or a PC camera to convert photographed image directly into digital form. The focusing and color-filtering structure is used for the focusing and color-filtering of the light incident thereon prior to the light being detected by the light-sensitive device. The focusing and color-filtering structure is characterized in the forming of a dummy pattern layer in the non-filter area surrounding the array of color-filter layers, which allows the subsequently formed planarization layer to be highly planarization with a substantially uniformly flat top surface without having slopes such that the subsequently formed microlenses can all be disposed upright in position without being slanted. The focusing and color-filtering structure has the benefit of allowing the quality of the photographed image to be more assured without being degraded by the ambient scatting light as in the prior art.
Inventors
- 👤 Yuan-Chi Pai
- 👤 Wei-Chiang Lin
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 04:20
CPC Classifications
H; H10; H10F; H10F39/00; H10F39/011; H10F39/024; H10F39/10; H10F39/12; H10F39/18; H10F39/182; H10F39/80; H10F39/805; H10F39/8053; H10F39/806; H10F39/8063
Claims Analysis
Total Claims: 24
Claim 1
Independent Claim
109 words
A method for fabricating a focusing and color-filtering structure for a light-sensitive device constructed on a semiconductor substrate, comprising the steps of: (1) forming a passivation layer over the substrate; (2) forming an array of color-filter layers over a predefined filter area on the passivation layer; (3) forming a dummy pattern layer over a predefined non-filter area on the passivation layer surrounding the array of color-filter layers; (4) forming a planarization layer which covers all of the color-filter layers and the dummy pattern layer; and (5) forming an array of microlenses over the planarization layer, with each of the microlenses being aligned with one of the underneath color-filter layers.
Claim 2
Independent Claim
109 words
A method for fabricating a focusing and color-filtering structure for a light-sensitive device constructed on a semiconductor substrate, comprising the steps of: (1) forming a passivation layer over the substrate; (2) forming an array of color-filter layers over a predefined filter area on the passivation layer; (3) forming a dummy pattern layer over a predefined non-filter area on the passivation layer surrounding the array of color-filter layers; (4) forming a planarization layer which covers all of the color-filter layers and the dummy pattern layer; and (5) forming an array of microlenses over the planarization layer, with each of the microlenses being aligned with one of the underneath color-filter layers.
Claim 3
Dependent Claim
14 words
The method of claim 1, wherein the passivation layer is formed from silicon oxide.
Claim 4
Dependent Claim
14 words
The method of claim 1, wherein the passivation layer is formed from silicon nitride.
Claim 5
Dependent Claim
20 words
The method of claim 1, wherein the color-filter layers are formed from acrylics of red, green, and blue filter qualities.
Claim 6
Dependent Claim
15 words
The method of claim 1 wherein the planarization layer is formed from an acrylic material.
Claim 7
Dependent Claim
49 words
The method of claim 1, wherein each of the color-filter layers includes: a red-filter region formed over the passivation layer; a green-filter region formed beside the red-filter region over the passivation layer; and a blue-filter region formed beside the red-filter region and the green-filter region over the passivation layer.
Claim 8
Dependent Claim
35 words
The method of claim 6, wherein the dummy pattern layer is formed from an acrylic material of a blue-filter quality that is also used to form the blue-filter region in each of the color-filter layers.
Claim 9
Dependent Claim
15 words
The method of claim 1, wherein the dummy pattern layer is formed an acrylic material.
Claim 10
Dependent Claim
25 words
The method of claim 1, wherein the dummy pattern layer is substantially equal in thickness as each of the color-filter layers over the passivation layer.
Claim 11
Dependent Claim
18 words
The method of claim 1, wherein the dummy pattern layer is formed into a plurality of separate blocks.
Claim 12
Dependent Claim
26 words
The method of claim 10, wherein each of the blocks of the dummy pattern layer is substantially equal in dimensions as each of the color-filter layers.
Claim 13
Dependent Claim
13 words
The method of claim 1, wherein the microlenses are each convex in shape.
Claim 14
Independent Claim
130 words
A method for fabricating a focusing and color-filtering structure for a light-sensitive device constructed on a semiconductor substrate, comprising the steps of: (1) forming a passivation layer over the substrate; (2) forming an array of color-filter layers over a predefined filter area on the passivation layer; (3) forming a dummy pattern layer over a predefined non-filter area on the passivation layer surrounding the array of color-filter layers, with the dummy pattern layer being substantially equal in thickness as each of the color-filter layers; (4) forming a planarization layer which covers all of the color-filter layers and the dummy pattern layer; and (5) forming an array of microlenses over the planarization layer, with each of the microlenses being aligned with one of the underneath color-filter layers and being convex in shape.
Claim 15
Independent Claim
130 words
A method for fabricating a focusing and color-filtering structure for a light-sensitive device constructed on a semiconductor substrate, comprising the steps of: (1) forming a passivation layer over the substrate; (2) forming an array of color-filter layers over a predefined filter area on the passivation layer; (3) forming a dummy pattern layer over a predefined non-filter area on the passivation layer surrounding the array of color-filter layers, with the dummy pattern layer being substantially equal in thickness as each of the color-filter layers; (4) forming a planarization layer which covers all of the color-filter layers and the dummy pattern layer; and (5) forming an array of microlenses over the planarization layer, with each of the microlenses being aligned with one of the underneath color-filter layers and being convex in shape.
Claim 16
Dependent Claim
14 words
The method of claim 13, wherein the passivation layer is formed from silicon oxide.
Claim 17
Dependent Claim
14 words
The method of claim 13, wherein the passivation layer is formed from silicon nitride.
Claim 18
Dependent Claim
20 words
The method of claim 13, wherein the color-filter layers are formed from acrylics of red, green, and blue filter qualities.
Claim 19
Dependent Claim
15 words
The method of claim 13, wherein the planarization layer is formed from an acrylic material.
Claim 20
Dependent Claim
49 words
The method of claim 13, wherein each of the color-filter layers includes: a red-filter region formed over the passivation layer; a green-filter region formed beside the red-filter region over the passivation layer; and a blue-filter region formed beside the red-filter region and the green-filter region over the passivation layer.
Claim 21
Dependent Claim
29 words
The method of claim 18, wherein the dummy pattern layer is formed from an acrylic material of a blue-filter quality that is also used to form the blue-filter region.
Claim 22
Dependent Claim
16 words
The method of claim 13, wherein the dummy pattern layer is formed from an acrylic material.
Claim 23
Dependent Claim
18 words
The method of claim 13, wherein the dummy pattern layer is formed into a plurality of separate blocks.
Claim 24
Dependent Claim
26 words
The method of claim 21, wherein each of the blocks of the dummy pattern layer is substantially equal in dimensions as each of the color-filter layers.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-10-17 | 2004-04-17 | 2004-10-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-10-17 | 2008-04-17 | 2008-10-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-10-17 | 2012-04-17 | 2012-10-17 | $7700.00 | Window Closed / Lapsed |