US6128030A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Semiconductor exposure device
Assignee: Nikon Corp
•
Filing: 1998-01-27
•
Granted: 2000-10-03
•
Expires: 2018-01-27
Abstract
Abstract A semiconductor light exposure device reducing coherency of laser light to an appropriate value by a simplified structure without producing speckles. The semiconductor light exposure device includes an ultraviolet light generating device, a uniform illumination device having the operation of inducing an optical path length difference and a projection device for projecting the laser light from the uniform illumination device. The ultraviolet light generating device includes an Nd:YAG Q-switch laser unit with a wavelength of 1064 nm, oscillated with a longitudinal single mode, a phase modulation unit or phase-modulating the fundamental laser light outgoing from the Nd:YAG Q-switch laser unit with voltage signals having plural frequency components, and a wavelength conversion unit for converting the wavelength of the fundamental laser light phase-modulated by the phase modulation unit into an ultraviolet laser light with a wavelength of 213 nm as a fifth harmonics.
Inventors
- 👤 Hiroki Kikuchi
- 👤 Yushi Kaneda
- 👤 Masato Hamatani
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 03:33
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/70; G03F7/70483; G03F7/7055; G03F7/70575; G03F7/70058; G03F7/70091; G03F7/70208; G03F7/70583
Claims Analysis
Total Claims: 61
Claim 1
Independent Claim
47 words
A light exposure method comprising the steps of: (a) phase-modulating a fundamental wavelength laser light, generated by a laser light source, simultaneously using a plurality of frequencies to provide a phase-modulated laser light; and (b) exposing a substrate with a predetermined pattern using the phase-modulated laser light.
Claim 2
Dependent Claim
47 words
A light exposure method comprising the steps of: (a) phase-modulating a fundamental wavelength laser light, generated by a laser light source, simultaneously using a plurality of frequencies to provide a phase-modulated laser light; and (b) exposing a substrate with a predetermined pattern using the phase-modulated laser light.
Claim 3
Dependent Claim
27 words
The light exposure method according to claim 1, wherein phase modulator by said plurality of frequencies is effected by a signal having a plurality of frequency components.
Claim 4
Dependent Claim
24 words
The light exposure method according to claim 1, wherein phase modulation by said plurality of frequencies is effected serially by signals having different frequencies.
Claim 5
Dependent Claim
49 words
The light exposure method according to claim 1 further comprising, after step (a) and before step (b): (c) converting the wavelength of the phase-modulated fundamental wavelength laser light into a pre-set wavelength; and (d) separating the wavelength-converted laser light into respective wavelength components to extract only said pre-set wavelength.
Claim 6
Dependent Claim
47 words
The light exposure method according to claim 4 further comprising, after step (d) and before step (b): (e) effecting to the laser light an operation of decreasing visibility of the interference noise generated on the substrate in dependence upon a coherent length of the extracted laser light.
Claim 7
Dependent Claim
30 words
The light exposure method according to claim 5, wherein step (e) includes separating the extracted laser light to provide an optical path length difference and subsequently recombining the laser light.
Claim 8
Dependent Claim
24 words
The light exposure method according to claim 6, wherein said optical path length difference is longer than the coherent length of the laser light.
Claim 9
Dependent Claim
37 words
The light exposure method according to claim 5, wherein step (a) includes minutely changing an angle of incidence of the extracted laser light on an optical integrator along with pulsed oscillations of a pulsed laser light source.
Claim 10
Dependent Claim
23 words
The light exposure method according to claim 5, wherein step (e) includes transmitting and diffusing the extracted laser light in a random direction.
Claim 11
Dependent Claim
39 words
The light exposure method according to claim 4, wherein said laser light source includes a Nd:YAG laser oscillated by a Q-switching method, and wherein said wavelength conversion includes conversion of the wavelength of said laser light into fifth harmonics.
Claim 12
Dependent Claim
18 words
The light exposure method according to claim 4, wherein said pre-set wavelength includes a wavelength of ultra-violet light.
Claim 13
Dependent Claim
25 words
The light exposure method according to claim 1, wherein said laser light source includes a pulsed laser light source oscillated at a longitudinal single mode.
Claim 14
Dependent Claim
29 words
The light exposure method according to claim 1, wherein said pattern is formed on a mask, and the pattern is projected on said substrate via a projecting optical system.
Claim 15
Dependent Claim
34 words
The light exposure method according to claim 13, wherein said projecting optical system is composed of a sole vitreous material and wherein said laser light has a coherent length of 80 to 180 mm.
Claim 16
Dependent Claim
38 words
The light exposure method according to claim 13, wherein said projecting optical system is composed of a plurality of types of a vitreous material and wherein said laser light has a coherent length of 30 to 80 mm.
Claim 17
Dependent Claim
56 words
The light exposure method according to claim 1, wherein step (a) includes phase-modulating the fundamental wavelength laser light using an electro-optical crystal not permitting transmission of ultraviolet light therethrough, and step (b) includes converting the phase-modulated laser light into a wavelength of ultraviolet light then illuminating the pattern on the mask with the wavelength-converted laser light.
Claim 18
Dependent Claim
52 words
The light exposure method according to claim 16, wherein said electro-optical crystal includes at least one of potassium phosphate titanate (KTiOP 4 :KTP), potassium arsenate titanate (KTiOAsOP 4 :KTP), rubidium arsenate titanate (RbTiOAsO 4 ), cesium arsenate titanate (CsTiOAsO 4 ), lithium niobate (LiNbO 3 ) or lithium tantalate (LiTaO 3 ).
Claim 19
Dependent Claim
54 words
The light exposure method according to claim 1, wherein step (a) includes phase-modulating the fundamental wavelength laser light using an electro-optical crystal not permitting transmission of ultraviolet light therethrough, and step (b) includes converting the phase-modulated laser light into fifth harmonics and then illuminating the pattern formed on the mask with the fifth harmonics.
Claim 20
Dependent Claim
52 words
The light exposure method according to claim 18, wherein said electro-optical crystal includes at least one of potassium phosphate titanate (KTiOP 4 :KTP), potassium arsenate titanate (KTiOAsOP 4 :KTP), rubidium arsenate titanate (RbTiOAsO 4 ), cesium arsenate titanate (CsTiOAsO 4 ), lithium niobate (LiNbO 3 ) or lithium tantalate (LiTaO 3 ).
Claim 21
Independent Claim
67 words
A method for fabricating a micro device comprising the steps of: phase-modulating a fundamental wavelength laser light, generated by a laser light source, simultaneously using a plurality of frequencies to provide a phase-modulated laser light; and illuminating a circuit pattern on a mask with the phase-modulated laser light to expose the circuit pattern on a substrate to transcribe the circuit pattern on the mask onto said substrate.
Claim 22
Independent Claim
67 words
A method for fabricating a micro device comprising the steps of: phase-modulating a fundamental wavelength laser light, generated by a laser light source, simultaneously using a plurality of frequencies to provide a phase-modulated laser light; and illuminating a circuit pattern on a mask with the phase-modulated laser light to expose the circuit pattern on a substrate to transcribe the circuit pattern on the mask onto said substrate.
Claim 23
Independent Claim
73 words
A method for manufacturing a light exposure apparatus that exposes a pattern formed on a mask onto a substrate with light, comprising the steps of: providing a laser light source that generates a fundamental wavelength laser light; and providing a phase modulation system between said laser light source and the mask, said phase modulation system phase-modulates the fundamental wavelength laser light, generated by a laser light source, simultaneously using a plurality of frequencies.
Claim 24
Independent Claim
73 words
A method for manufacturing a light exposure apparatus that exposes a pattern formed on a mask onto a substrate with light, comprising the steps of: providing a laser light source that generates a fundamental wavelength laser light; and providing a phase modulation system between said laser light source and the mask, said phase modulation system phase-modulates the fundamental wavelength laser light, generated by a laser light source, simultaneously using a plurality of frequencies.
Claim 25
Dependent Claim
22 words
The method according to claim 21, wherein a signal having a plurality of frequency components is applied to said phase modulation system.
Claim 26
Dependent Claim
33 words
The method according to claim 21, wherein said phase modulation system includes a plurality of series-connected phase modulation devices; and wherein signals having respective different frequencies are applied to said phase modulation devices.
Claim 27
Dependent Claim
41 words
The method according to claim 21, comprising the step of providing a wavelength conversion device between said phase modulation system and the mask, said wavelength conversion device converting the wavelength of the phase-modulated fundamental wavelength laser light into a pre-set wavelength.
Claim 28
Dependent Claim
46 words
The method according to claim 24, comprising the step of providing an interference reducing device between the wavelength conversion device and the mask, said interference reducing device reducing visibility of interference noise generated on said substrate in dependence upon a coherent length of the laser light.
Claim 29
Dependent Claim
56 words
The method according to claim 21, comprising the step of providing a projecting optical system for projecting the pattern on the mask on said substrate between said mask and the substrate; and wherein said projecting optical system is formed of a sole vitreous material, said laser light having a coherent length of 80 to 180 mm.
Claim 30
Dependent Claim
58 words
The method according to claim 21, comprising the step of providing a projecting optical system for projecting the pattern on the mask on said substrate between said mask and the substrate; and wherein said projecting optical system is formed of plural sorts of a vitreous material, said laser light having a coherent length of 30 to 80 mm.
Claim 31
Dependent Claim
77 words
The method according to claim 21, wherein said phase-modulation system includes an electro-optical crystal not permitting transmission of ultraviolet light therethrough, which electro-optical crystal is arranged between the laser light source and the mask and which phase-modulates the fundamental wavelength laser light, and said method further comprising providing a wavelength conversion device arranged between the electro-optical crystal and the mask, the wavelength conversion device converting the laser light phase-modulated laser light into a wavelength of ultraviolet light.
Claim 32
Dependent Claim
49 words
The method of claim 28, wherein said electro-optical crystal includes at least one of potassium phosphate titanate (KTiOPO 4 :KTP), potassium arsenate titanate (KTiOAsO 4 ), rubidium arsenate titanate (RbTiOAsO 4 ), cesium arsenate titanate (CsTiOAsO 4 ), lithium niobate (LiNbO 3 ) or lithium tantalate (LiTaO 3 ).
Claim 33
Dependent Claim
70 words
The method according to claim 21, wherein said phase-modulation system includes an electro-optical crystal not permitting transmission of ultraviolet light therethrough, which is arranged between the laser light source and the mask, and which phase-modulates the fundamental wavelength laser light, and said method further comprising providing a wavelength conversion device arranged between the electro-optical crystal and the mask, which wavelength conversion device converts the phase-modulated laser light into fifth harmonics.
Claim 34
Dependent Claim
50 words
The method according to claim 30, wherein said electro-optical crystal includes at least one of potassium phosphate titanate (KTiOPO 4 :KTP), potassium arsenate titanate (KTiOAsO 4 ), rubidium arsenate titanate (RbTiOAsO 4 ), cesium arsenate titanate (CsTiOAsO 4 ), lithium niobate (LiNbO 3 ) or lithium tantalate (LiTaO 3 ).
Claim 35
Dependent Claim
51 words
A light exposure method comprising the steps of: phase-modulating a fundamental wave laser light generated by a laser light source; and wavelength-converting the phase-modulated laser light; said phase modulation being performed so that a coherent length of the laser light following the wavelength conversion will be not less than 30 mm.
Claim 36
Dependent Claim
51 words
A light exposure method comprising the steps of: phase-modulating a fundamental wave laser light generated by a laser light source; and wavelength-converting the phase-modulated laser light; said phase modulation being performed so that a coherent length of the laser light following the wavelength conversion will be not less than 30 mm.
Claim 37
Dependent Claim
40 words
The light exposure method according to claim 32, wherein said phase modulation is effected so that the coherent length of the laser light following the wavelength conversion will be not less than 30 mm and not larger than 180 mm.
Claim 38
Dependent Claim
45 words
The light exposure method according to claim 33, wherein the exposure method further includes transferring a predetermined pattern formed on a mask onto a substrate, via a projection optical system formed of plural sorts of vitreous material, using the laser light following said wavelength conversion.
Claim 39
Dependent Claim
23 words
The light exposure method according to claim 32, wherein said phase modulation is effected on the fundamental wavelength laser light using plural frequencies.
Claim 40
Dependent Claim
45 words
The light exposure method according to claim 32, wherein said phase modulation is effected using an electro-optical crystal not transmitting ultraviolet light and wherein in said wavelength conversion, the phase modulated laser light is converted to light of an ultraviolet wavelength or to fifth harmonics.
Claim 41
Dependent Claim
28 words
A method for manufacturing a micro device by transcribing a circuit pattern formed on a mask onto a substrate using the light exposure method according to claim 32.
Claim 42
Dependent Claim
53 words
A light exposure method comprising the steps of: phase modulating the fundamental wavelength laser light generated by a laser light source; and wavelength converting the phase modulated laser light; wherein phase modulation is effected so that a coherent length of the laser light following wavelength conversion will be not larger than 180 mm.
Claim 43
Dependent Claim
53 words
A light exposure method comprising the steps of: phase modulating the fundamental wavelength laser light generated by a laser light source; and wavelength converting the phase modulated laser light; wherein phase modulation is effected so that a coherent length of the laser light following wavelength conversion will be not larger than 180 mm.
Claim 44
Dependent Claim
39 words
The light exposure method according to claim 38, wherein said phase modulation is effected so that the coherent length of the laser light following wavelength conversion will be not less than 80 mm and not larger than 180 mm.
Claim 45
Dependent Claim
48 words
The light exposure method according to claim 39, wherein the light exposure method further includes transferring a predetermined pattern formed on a mask onto a substrate, via a projection optical system formed of a sole sort of a vitreous material, using the laser light following said wavelength conversion.
Claim 46
Dependent Claim
23 words
The light exposure method according to claim 38, wherein said phase modulation is effected on the fundamental wavelength laser light using plural frequencies.
Claim 47
Dependent Claim
45 words
The light exposure method according to claim 38, wherein said phase modulation is effected using an electro-optical crystal not transmitting ultraviolet light and wherein, in said wavelength conversion, the phase modulated laser light is converted to light of an ultraviolet wavelength or to fifth harmonics.
Claim 48
Independent Claim
75 words
A method for manufacturing a micro device by transcribing a circuit pattern formed on a mask onto a substrate using a light exposure method, said method comprising the steps of: phase modulating the fundamental wavelength laser light generated by a laser light source; and wavelength converting the phase modulated laser light; wherein phase modulation is effected so that a coherent length of the laser light following wavelength conversion will be not larger than 180 mm.
Claim 49
Independent Claim
75 words
A method for manufacturing a micro device by transcribing a circuit pattern formed on a mask onto a substrate using a light exposure method, said method comprising the steps of: phase modulating the fundamental wavelength laser light generated by a laser light source; and wavelength converting the phase modulated laser light; wherein phase modulation is effected so that a coherent length of the laser light following wavelength conversion will be not larger than 180 mm.
Claim 50
Dependent Claim
126 words
A manufacturing method for manufacturing a light exposure device used for exposing a pattern on a mask onto a substrate, comprising the steps of: providing a laser light source that generates a fundamental wavelength laser light; providing a phase modulation system that effects phase modulation for the fundamental wavelength laser light generated from said laser light source between said laser light source and the mask; providing a wavelength conversion system that converts the wavelength of the laser light phase modulated by the phase modulation system between the phase modulation system and the mask; and effecting phase modulation by said phase modulation system so that a coherent length of the laser light following wavelength conversion by said wavelength conversion system will be not less than 30 mm.
Claim 51
Dependent Claim
126 words
A manufacturing method for manufacturing a light exposure device used for exposing a pattern on a mask onto a substrate, comprising the steps of: providing a laser light source that generates a fundamental wavelength laser light; providing a phase modulation system that effects phase modulation for the fundamental wavelength laser light generated from said laser light source between said laser light source and the mask; providing a wavelength conversion system that converts the wavelength of the laser light phase modulated by the phase modulation system between the phase modulation system and the mask; and effecting phase modulation by said phase modulation system so that a coherent length of the laser light following wavelength conversion by said wavelength conversion system will be not less than 30 mm.
Claim 52
Dependent Claim
40 words
The manufacturing method according to claim 44, wherein said phase modulation system effects phase modulation so that the coherent length of the laser light following wavelength conversion will be not less than 30 mm and not larger than 80 mm.
Claim 53
Dependent Claim
45 words
The method according to claim 45, and wherein the manufacturing method further includes providing a projection optical system formed of plural sorts of a vitreous material between the mask and the substrate, said projection optical system being adapted to project said pattern on said substrate.
Claim 54
Dependent Claim
17 words
The method according to claim 44, wherein said phase modulation system effects phase modulation using plural frequencies.
Claim 55
Dependent Claim
43 words
The method according to claim 44, wherein said phase modulation system includes an electro-optical crystal not transmitting ultraviolet light therethrough and wherein in said wavelength conversion, the phase modulated laser light is converted to light of an ultraviolet wavelength or to fifth harmonics.
Claim 56
Independent Claim
127 words
A method for manufacturing a light exposure device used for exposing a pattern on a mask onto a substrate, said method comprising the steps of: providing a laser light source that generates a fundamental wavelength laser light; providing a phase modulation system that effects phase modulation for the fundamental wavelength laser light generated from said laser light source between said laser light source and the mask; providing a wavelength conversion system that converts the wavelength of the laser light phase modulated by the phase modulation system between the phase modulation system and the mask; and effecting phase modulation by said phase modulation system so that a coherent length of the laser light following wavelength conversion by said wavelength conversion system will be not larger than 180 mm.
Claim 57
Independent Claim
127 words
A method for manufacturing a light exposure device used for exposing a pattern on a mask onto a substrate, said method comprising the steps of: providing a laser light source that generates a fundamental wavelength laser light; providing a phase modulation system that effects phase modulation for the fundamental wavelength laser light generated from said laser light source between said laser light source and the mask; providing a wavelength conversion system that converts the wavelength of the laser light phase modulated by the phase modulation system between the phase modulation system and the mask; and effecting phase modulation by said phase modulation system so that a coherent length of the laser light following wavelength conversion by said wavelength conversion system will be not larger than 180 mm.
Claim 58
Dependent Claim
40 words
The manufacturing method according to claim 49, wherein said phase modulation system effects phase modulation so that the coherent length of the laser light following wavelength conversion will be not less than 80 mm and not larger than 180 mm.
Claim 59
Dependent Claim
44 words
The manufacturing method according to claim 50, wherein the method further includes providing a projection optical system formed of a sole vitreous material between said mask and the substrate, said optical system being adapted to project said pattern on said mask onto said substrate.
Claim 60
Dependent Claim
27 words
The manufacturing method according to claim 49, wherein said phase modulation is effected by said phase modulation system on the fundamental wavelength laser light using plural frequencies.
Claim 61
Dependent Claim
43 words
The manufacturing method according to claim 49, wherein said phase modulation system contains an electro-optical crystal not transmitting ultraviolet light therethrough and wherein said phase modulation system converts the phase-converted laser light to the wavelength of an ultraviolet light or to fifth harmonics.
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