US5206515A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Deep ultraviolet photolithography and microfabrication
Assignee: Excimer Laser Systems Inc
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Filing: 1991-08-29
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Granted: 1993-04-27
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Expires: 2011-08-29
Abstract
Abstract A high resolution, deep UV beam delivery system for exposing a surface, directly or through a mask, for the purpose of photolithography, surface cleaning, microstructuring, pattern microimaging, surface modification or the like includes a deep UV radiation source for generating a beam of deep ultraviolet radiation along a first path; single element variable attenuator apparatus disposed in the first path for adjustment of the deep UV beam energy in the first path; an optical system in the first path for homogenizing and shaping the deep UV beam energy in the first path; a second radiation source for generating visible wavelength radiation along a second beam path; merging structure for merging radiation energy in the first path and radiation energy in the second path for passage along a common third path; beam splitter structure in the third path for directing radiation energy in the third optical path along a fourth optical path angularly offset from the third path; large area mirror structure having a numerical aperture greater than 0.3 disposed in the fourth optical path for directing radiation energy in the fourth optical path onto the surface of a substrate to be processed that is disposed in the fourth path; and an optical sensing system disposed in a fifth optical path aligned with the fourth path and on the side of the beam splitter structure opposite the large area mirror structure for optically viewing the substrate being processed by deep ultraviolet energy in the fourth optical path as illuminated by visible wavelength radiation from the second radiation source.
Inventors
- 👤 David J. Elliott
- 👤 Wolfgang Mueller-Herget
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 04:46
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/20; G03F7/2002; G03F7/2004; B; B23; B23K; B23K26/00; B23K26/02; B23K26/06; B23K26/064; B23K26/066
Claims Analysis
Total Claims: 24
Claim 1
Independent Claim
224 words
A high resolution, deep UV beam delivery system for exposing a surface, directly or through a mask, for the purpose of photolithography surface cleaning, microstructuring, pattern microimaging, surface modification or the like, said delivery system including a deep UV radiation source for generating a beam of deep ultraviolet radiation along a first path; variable attenuator apparatus disposed in said first path for adjustment of the deep UV beam energy in said first path; an optical system in said first path for homogenizing and shaping the deep UV beam energy in said first path; said homogenizing and shaping optical system including two orthogonally disposed cylindrical lenses and a conical surface lens, a second radiation source for generating visible wavelength radiation along a second beam path, merging structure for merging radiation energy in said first path and radiation energy in said second path for passage along a common third path; reticle structure in said third path; beam splitter structure in said third path for directing radiation energy in said third optical path along a fourth optical path angularly offset from said third path; and large area mirror structure having a numerical aperture greater than 0.3 disposed in said fourth optical path for directing radiation energy in said fourth optical path on the surface of a substrate to be processed that is disposed in said fourth path.
Claim 2
Dependent Claim
224 words
A high resolution, deep UV beam delivery system for exposing a surface, directly or through a mask, for the purpose of photolithography surface cleaning, microstructuring, pattern microimaging, surface modification or the like, said delivery system including a deep UV radiation source for generating a beam of deep ultraviolet radiation along a first path; variable attenuator apparatus disposed in said first path for adjustment of the deep UV beam energy in said first path; an optical system in said first path for homogenizing and shaping the deep UV beam energy in said first path; said homogenizing and shaping optical system including two orthogonally disposed cylindrical lenses and a conical surface lens, a second radiation source for generating visible wavelength radiation along a second beam path, merging structure for merging radiation energy in said first path and radiation energy in said second path for passage along a common third path; reticle structure in said third path; beam splitter structure in said third path for directing radiation energy in said third optical path along a fourth optical path angularly offset from said third path; and large area mirror structure having a numerical aperture greater than 0.3 disposed in said fourth optical path for directing radiation energy in said fourth optical path on the surface of a substrate to be processed that is disposed in said fourth path.
Claim 3
Dependent Claim
26 words
The system of claim 1 wherein said attenuator apparatus includes a planar plate member mounted for rotation over an angular range of at least thirty degrees.
Claim 4
Dependent Claim
39 words
The system of claim 1 wherein the spacing between said orthogonally disposed cylindrical lenses is at least five times the spacing between said conical surface lens and the one of said cylindrical lenses closer to said conical surface lens.
Claim 5
Dependent Claim
35 words
The system of claim 1 wherein the conical surface of said conical surface lens has a cone angle per side of less than 10° and its apex is on the axis of said first path.
Claim 6
Dependent Claim
45 words
The system of claim 1 and further including safelight filter structure in said second beam path between said second radiation source and said merging structure for excluding particular visible wavelength radiation and ultraviolet radiation in said second beam path from impinging on said merging structure.
Claim 7
Dependent Claim
63 words
The system of claim 1 wherein said merging structure includes a member with two parallel, opposed, planar surfaces, one of said surfaces reflecting at least ninety five percent of incident deep UV radiation and transmitting at least fifty percent of visible radiation transmitted by the other of said surfaces, said other of said surfaces transmitting at least fifty percent of incident visible radiation.
Claim 8
Dependent Claim
39 words
The system of claim 1 wherein said reticle structure includes structure for receiving mask structure with an array of lines of about one micrometer width and said large area mirror structure has a reduction ratio of at least 1:2.
Claim 9
Dependent Claim
66 words
The system of claim 1 and further including an optical sensing system disposed in a fifth optical path aligned with said fourth path and on the side of said beam splitter structure opposite said large area mirror structure for optically viewing the substrate being processed by deep ultraviolet energy in said fourth optical path as illuminated by said visible wavelength radiation from said second radiation source.
Claim 10
Dependent Claim
30 words
The system of claim 1 wherein all of the optical components between said reticle structure and said substrate in said third and fourth optical paths are of the reflective type.
Claim 11
Dependent Claim
20 words
The system of claim 1 wherein said large area mirror structure includes a central obscuration mirror and an apertured mirror.
Claim 12
Dependent Claim
24 words
The system of claim 1 wherein all of the transmitting optical components in said first and third paths are of highly UV transmitting materials.
Claim 13
Dependent Claim
22 words
The system of claim 1 wherein said deep UV radiation source is an excimer laser of wavelength in the 150-250 nanometer range.
Claim 14
Dependent Claim
248 words
A high resolution, deep UV beam delivery system for exposing a surface, directly or through a mask, for the purpose of photolithography surface cleaning, microstructuring, pattern microimaging, surface modification or the like, said delivery system including a deep UV radiation source for generating a beam of deep ultraviolet radiation along a first path; variable attenuator apparatus disposed in said first path for adjustment of the deep UV beam energy in the first path; said attenuator apparatus including a plate member mounted for rotation over an angular range of at least thirty degrees, and said attenuator apparatus attenuates beam energy at said substrate over a range between maximum and minimum of at least five times, an optical system in said first path for homogenizing and shaping the deep UV beam energy in the first path; a second radiation source for generating visible wavelength radiation along a second beam path, merging structure for merging radiation energy in said first path and radiation energy in said second path for passage along a common third path; reticle structure in said third path; beam splitter structure in said third path for directing radiation energy in said third optical path along a fourth optical path angularly offset from the third path; and large area mirror structure having a numerical aperture greater than 0.3 disposed in said fourth optical path for directing radiation energy in said fourth optical path on the surface of a substrate to be processed that is disposed in said fourth path.
Claim 15
Dependent Claim
248 words
A high resolution, deep UV beam delivery system for exposing a surface, directly or through a mask, for the purpose of photolithography surface cleaning, microstructuring, pattern microimaging, surface modification or the like, said delivery system including a deep UV radiation source for generating a beam of deep ultraviolet radiation along a first path; variable attenuator apparatus disposed in said first path for adjustment of the deep UV beam energy in the first path; said attenuator apparatus including a plate member mounted for rotation over an angular range of at least thirty degrees, and said attenuator apparatus attenuates beam energy at said substrate over a range between maximum and minimum of at least five times, an optical system in said first path for homogenizing and shaping the deep UV beam energy in the first path; a second radiation source for generating visible wavelength radiation along a second beam path, merging structure for merging radiation energy in said first path and radiation energy in said second path for passage along a common third path; reticle structure in said third path; beam splitter structure in said third path for directing radiation energy in said third optical path along a fourth optical path angularly offset from the third path; and large area mirror structure having a numerical aperture greater than 0.3 disposed in said fourth optical path for directing radiation energy in said fourth optical path on the surface of a substrate to be processed that is disposed in said fourth path.
Claim 16
Dependent Claim
24 words
The system of claim 13 wherein said homogenizing and beam shaping optical system includes two orthogonally disposed cylindrical lenses and a conical surface lens.
Claim 17
Dependent Claim
67 words
The system of claim 14 wherein the spacing between said orthogonally disposed cylindrical lenses is at least five times the spacing between said conical surface lens and the one of said cylindrical lenses closer to said conical surface lens, the conical surface of said conical surface lens has an inside apex angle of 160° or more and its apex is on the axis of said first path.
Claim 18
Dependent Claim
63 words
The system of claim 14 wherein all of the transmitting optical components in said first and third paths are of high purity (>95%) quartz and all of the optical components between said reticle structure and said substrate in said third and fourth optical paths are of the reflective type; and further including a nitrogen purged housing in which said optical components are housed.
Claim 19
Dependent Claim
39 words
The system of claim 16 wherein said reticle structure includes structure for receiving mask structure with an array of lines of about one micrometer width and said large area mirror structure has a reduction ratio of at least 1:2.
Claim 20
Dependent Claim
28 words
The system of claim 16 wherein and said plate member has a series of layers of high and low refractive index materials on at least one surface thereof.
Claim 21
Dependent Claim
45 words
The system of claim 18 and further including safelight filter structure in said second beam path between said second radiation source and said merging structure for excluding particular visible wavelength radiation and ultraviolet radiation in said second beam path from impinging on said merging structure.
Claim 22
Dependent Claim
63 words
The system of claim 19 wherein said merging structure includes a member with two parallel, opposed, planar surfaces, one of said surfaces reflecting at least ninety five percent of incident deep UV radiation and transmitting at least fifty percent of visible radiation transmitted by the other of said surfaces, said other of said surfaces transmitting at least fifty percent of incident visible radiation.
Claim 23
Dependent Claim
76 words
The system of claim 20 wherein said large area mirror structure includes a central obscuration mirror and a mirror with a cylindrical aperture on the axis of said fourth path between said beamsplitter structure and said obscuration mirror, said obscuration mirror being spaced from said apertured mirror a distance greater than the diameter of said cylindrical aperture; and further including a shield that has an aperture of diameter smaller than the diameter of said cylindrical aperture.
Claim 24
Dependent Claim
66 words
The system of claim 21 and further including an optical sensing system disposed in a fifth optical path aligned with said fourth path and on the side of said beam splitter structure opposite said large area mirror structure for optically viewing the substrate being processed by deep ultraviolet energy in said fourth optical path as illuminated by said visible wavelength radiation from said second radiation source.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-04-26 | 1996-10-26 | 1997-04-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-04-26 | 2000-10-26 | 2001-04-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-04-26 | 2004-10-26 | 2005-04-27 | $7700.00 | Window Closed / Lapsed |