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US6111301A Expired / Lapsed US ⏱️ 0.0 years remaining

Interconnection with integrated corrosion stop

Assignee: International Business Machines Corp
•
Filing: 1998-04-24
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Granted: 2000-08-29
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Expires: 2018-04-24
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Abstract

Abstract An interconnection structure for a semiconductor circuit is provided employing a conductor structure electrically connected to conductive wiring located on a different level than the conductor structure. The conductor structure comprises a relatively low resistivity metal. A barrier layer of a corrosion resistant metal is located intermediate the relatively low resistivity metal and wiring to thereby separate the wiring and relatively low resistivity metal.

Inventors

  • 👤 Anthony K. Stamper

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 11:25
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W42/00; H10W20/40; H10W20/49; H10W20/493

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 109 words
An interconnection structure for a semiconductor circuit comprising: (A) a fuse structure; and (B) conductive wiring located on a different level than said fuse structure; wherein said fuse structure is electrically connected to said conductive wiring and wherein said fuse structure comprises a relatively low resistivity metal; and (C) a conformal barrier layer of a chemical vapor deposited corrosion resistant metal conductively contacting said relatively low resistivity metal and wherein said barrier layer of a corrosion resistant metal is located intermediate said relatively low resistivity metal and said wiring and along the sides of said relatively low resistivity metal thereby separating said wiring from said relatively low resistivity metal.
Claim 2
Dependent Claim 109 words
An interconnection structure for a semiconductor circuit comprising: (A) a fuse structure; and (B) conductive wiring located on a different level than said fuse structure; wherein said fuse structure is electrically connected to said conductive wiring and wherein said fuse structure comprises a relatively low resistivity metal; and (C) a conformal barrier layer of a chemical vapor deposited corrosion resistant metal conductively contacting said relatively low resistivity metal and wherein said barrier layer of a corrosion resistant metal is located intermediate said relatively low resistivity metal and said wiring and along the sides of said relatively low resistivity metal thereby separating said wiring from said relatively low resistivity metal.
Claim 3
Dependent Claim 19 words
The interconnection structure of claim 1 wherein said low resistivity metal is located on top of said barrier layer.
Claim 4
Dependent Claim 28 words
The interconnection structure of claim 2 wherein said fuse structure further comprises adhesion promoting layer or diffusion barrier between said low resistivity metal and said corrosion resistant metal.
Claim 5
Dependent Claim 14 words
The interconnection structure of claim 3 wherein said adhesion promoting layer includes tantalum nitride.
Claim 6
Dependent Claim 13 words
The interconnection structure of claim 1 wherein said low resistivity metal is copper.
Claim 7
Dependent Claim 13 words
The interconnection structure of claim 5 wherein said corrosion resistant metal is tungsten.
Claim 8
Dependent Claim 14 words
The interconnection structure of claim 6 wherein said tungsten is chemical vapor deposited tungsten.
Claim 9
Dependent Claim 13 words
The interconnection structure of claim 1 further comprising via between the different levels.
Claim 10
Dependent Claim 35 words
The interconnection structure of claim 1 wherein the fuse structure is located in a trench in the interconnection structure and said conformal barrier layer is located adjacent the side walls and bottom of the trench.

References Cited (Backward Citations)

US5262354A Cited
US5300813A Cited
US5612254A Cited
US5399507A Cited
US5599747A Cited
US5760674A Cited
US5712206A Cited
US5851903A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2003-08-29 2004-02-28 2004-08-29 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2007-08-29 2008-02-28 2008-08-29 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2011-08-29 2012-02-28 2012-08-29 $7700.00 Window Closed / Lapsed

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