Photolithographic exposure system and method employing a liquid crystal display (LCD) panel as a configurable mask

Claim 2

An exposure system for selectively exposing a portion of a layer of a light-sensitive material to light, comprising: a light source configured to produce light; an LCD panel positioned between the light source and the light-sensitive layer, wherein the LCD panel is configured to selectively pass and block light emitted by the light source thereby displaying a pattern; a fan configured to blow air across the LCD panel in order to cool the LCD panel; and reducing means positioned between the LCD panel and the light-sensitive layer for forming a reduced image of the pattern displayed by the LCD panel upon the layer of the light-sensitive material, wherein the reduced image has dimensions smaller than corresponding dimensions of the pattern displayed by the LCD panel.

Claim 3

The exposure system as recited in claim 1, wherein a pattern is displayed by the LCD panel which comprises a clear portion and an opaque portion, and wherein the clear portion substantially passes light produced by the light source, and wherein the opaque portion substantially blocks light produced by the light source.

Claim 4

The exposure system as recited in claim 2, wherein the LCD panel comprises a plurality of pixel elements, and wherein each of the pixel elements either substantially passes light produced by the light source or substantially blocks light produced by the light source in response to at least one of a plurality of electrical signals.

Claim 5

The exposure system as recited in claim 3, wherein the plurality of pixel elements are arranged in a two-dimensional matrix, and wherein an opaque structure exists between the pixel elements in order to prevent light from passing through the LCD panel between the pixel elements.

Claim 6

The exposure system as recited in claim 4, wherein the clear portion of the LCD panel comprises a subset of the plurality of the pixel elements, and wherein the opaque portion comprises the remaining pixel elements.

Claim 7

The exposure system as recited in claim 4, wherein an LCD system comprises the LCD panel, and wherein the LCD system further comprises: a display driver coupled to the LCD panel and configured to produce the plurality of electrical signals; a memory unit configured to store data; and a control unit coupled between the display driver and the memory unit, wherein the control unit is configured to retrieve data from the memory unit and to provide the data to the display driver.

Claim 8

The exposure system as recited in claim 6, wherein the control unit is adapted for coupling to a computer system, and wherein the control unit is further configured to receive data from the computer system and to store the data within the memory unit.

Claim 9

The exposure system as recited in claim 7, wherein the memory unit comprises at least one volatile semiconductor memory device.

Claim 10

The exposure system as recited in claim 7, wherein the memory unit comprises at least one non-volatile semiconductor memory device.

Claim 11

A step-and-repeat projection exposure system for selectively exposing a portion of a layer of a light-sensitive material to light, wherein the light-sensitive layer is formed upon a surface of a semiconductor wafer, the step-and-repeat projection exposure system comprising: a light source configured to produce light at a plurality of wavelengths; an LCD panel positioned between the light source and the light-sensitive layer and configured to display a pattern; a mirror positioned on a side of light source opposite that of the LCD panel and configured to reflect light back to the light source; a filter positioned between the light source and the LCD panel and configured to pass light produced by the light source and having wavelengths within a desired range; a condenser lens positioned between the filter and the LCD panel and configured to focus light which passes through the filter; a reduction lens positioned between the LCD panel and the light-sensitive layer, wherein the reduction lens is configured to focus light which passes through the LCD panel in order to form an image of the pattern displayed by the LCD panel upon the layer of the light-sensitive material; a fan configured to blow air across the filter and the LCD panel; an x-y stage, wherein the semiconductor wafer is positioned upon the x-y stage, and wherein the x-y stage is configured to move the semiconductor wafer laterally in relation to the light focused by the reduction lens; and a base, wherein the x-y stage is positioned upon the base, and wherein the mirror, the light source, the filter, the condenser lens, the LCD panel, the fan, and the reduction lens are held in a fixed position relative to the base.

Claim 12

A step-and-repeat projection exposure system for selectively exposing a portion of a layer of a light-sensitive material to light, wherein the light-sensitive layer is formed upon a surface of a semiconductor wafer, the step-and-repeat projection exposure system comprising: a light source configured to produce light at a plurality of wavelengths; an LCD panel positioned between the light source and the light-sensitive layer and configured to display a pattern; a mirror positioned on a side of light source opposite that of the LCD panel and configured to reflect light back to the light source; a filter positioned between the light source and the LCD panel and configured to pass light produced by the light source and having wavelengths within a desired range; a condenser lens positioned between the filter and the LCD panel and configured to focus light which passes through the filter; a reduction lens positioned between the LCD panel and the light-sensitive layer, wherein the reduction lens is configured to focus light which passes through the LCD panel in order to form an image of the pattern displayed by the LCD panel upon the layer of the light-sensitive material; a fan configured to blow air across the filter and the LCD panel; an x-y stage, wherein the semiconductor wafer is positioned upon the x-y stage, and wherein the x-y stage is configured to move the semiconductor wafer laterally in relation to the light focused by the reduction lens; and a base, wherein the x-y stage is positioned upon the base, and wherein the mirror, the light source, the filter, the condenser lens, the LCD panel, the fan, and the reduction lens are held in a fixed position relative to the base.

Claim 13

The step-and-repeat projection exposure system as recited in claim 10, wherein the light source produces light in the ultra-violet wavelength range extending from about 350 nm to approximately 450 nm.

Claim 14

The step-and-repeat projection exposure system as recited in claim 11, wherein the light source is a mercury-vapor lamp.

Claim 15

The step-and-repeat projection exposure system as recited in claim 10, wherein the pattern displayed by the LCD panel comprises a clear portion and an opaque portion, and wherein the clear portion substantially passes light produced by the light source, and wherein the opaque portion substantially blocks light produced by the light source.

Claim 16

The step-and-repeat projection exposure system as recited in claim 13, wherein the LCD panel comprises a plurality of pixel elements, and wherein each of the pixel elements either substantially passes light produced by the light source or substantially blocks light produced by the light source in response to at least one of a plurality of electrical signals.

Claim 17

The exposure system as recited in claim 14, wherein the plurality of pixel elements are arranged in a two-dimensional matrix, and wherein an opaque structure exists between the pixel elements in order to prevent light from passing through the LCD panel between the pixel elements.

Claim 18

The step-and-repeat projection exposure system as recited in claim 15, wherein the clear portion of the LCD panel comprises a subset of the plurality of the pixel elements, and wherein the opaque portion comprises the remaining pixel elements.

Claim 19

The step-and-repeat projection exposure system as recited in claim 15, wherein an LCD system comprises the LCD panel, and wherein the LCD system further comprises: a display driver coupled to the LCD panel and configured to produce the plurality of electrical signals; a memory unit configured to store data; and a control unit coupled between the display driver and the memory unit, wherein the control unit is configured to retrieve data from the memory unit and to provide the data to the display driver.

Claim 20

The step-and-repeat projection exposure system as recited in claim 17, wherein the control unit is adapted for coupling to a computer system, and wherein the control unit is further configured to receive data from the computer system and to store the data within the memory unit.

Claim 21

The step-and-repeat projection exposure system as recited in claim 18, wherein the memory unit comprises at least one volatile semiconductor memory device.

Claim 22

The step-and-repeat projection exposure system as recited in claim 18, wherein the memory unit comprises at least one non-volatile semiconductor memory device.

Claim 23

The step-and-repeat projection exposure system as recited in claim 10, wherein the dimensions of the image focused upon the light-sensitive layer are smaller than the dimensions of the pattern displayed by the LCD panel.

Claim 24

A projection exposure system for selectively exposing a portion of a layer of a light-sensitive material to light, wherein the light-sensitive layer is formed upon a surface of a semiconductor wafer, the projection exposure system comprising: a light source configured to produce light at a plurality of wavelengths; an LCD panel positioned between the light source and the light-sensitive layer and configured to display a pattern; a fan configured to blow air across the LCD panel in order to cool the LCD panel; and a reduction lens positioned between the LCD panel and the light-sensitive layers wherein the reduction lens is configured to form a reduced image of the pattern displayed by the LCD panel upon the layer of the light-sensitive material, wherein the reduced image has dimensions smaller than corresponding dimensions of the pattern displayed by the LCD panel.

Claim 25

A projection exposure system for selectively exposing a portion of a layer of a light-sensitive material to light, wherein the light-sensitive layer is formed upon a surface of a semiconductor wafer, the projection exposure system comprising: a light source configured to produce light at a plurality of wavelengths; an LCD panel positioned between the light source and the light-sensitive layer and configured to display a pattern; a fan configured to blow air across the LCD panel in order to cool the LCD panel; and a reduction lens positioned between the LCD panel and the light-sensitive layers wherein the reduction lens is configured to form a reduced image of the pattern displayed by the LCD panel upon the layer of the light-sensitive material, wherein the reduced image has dimensions smaller than corresponding dimensions of the pattern displayed by the LCD panel.

Claim 26

The projection exposure system of claim 22, further comprising a mirror positioned on a side of light source opposite that of the LCD panel and configured to reflect light back to the light source.

Claim 27

The projection exposure system of claim 22, further comprising a filter positioned between the light source and the LCD panel and configured to pass light produced by the light source and having wavelengths within a desired range.

Claim 28

The projection exposure system of claim 24, further comprising a condenser lens positioned between the filter and the LCD panel and configured to focus light which passes through the filter.

Claim 29

The projection exposure system of claim 24, wherein the fan is further configured to blow air across the filter in order to cool the filter.

Claim 30

The projection exposure system of claim 22, further comprising means for moving the semiconductor wafer and the reduced image formed by the reduction lens laterally in relation to one another.