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US6071809A
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Methods for forming high-performing dual-damascene interconnect structures
Assignee: Lakestar Semi Inc
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Filing: 1998-09-25
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Granted: 2000-06-06
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Expires: 2018-09-25
Abstract
Abstract Dual damascene methods and structures are provided for IC interconnects which use a dual-damascene process incorporating a low-k dielectric material, high conductivity metal, and an improved hard mask scheme. A pair of hard masks are employed: a silicon dioxide layer and a silicon nitride layer, wherein the silicon dioxide layer acts to protect the silicon nitride layer during dual damascene etch processing, but is subsequently sacrificed during CMP, allowing the silicon nitride layer to act as a the CMP hard mask. In this way, delamination of the low-k material is prevented, and any copper-contaminated silicon dioxide material is removed.
Inventors
- 👤 Bin Zhao
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 05:11
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/071; H10W20/081; H10W20/084; H10W20/086; H10W20/031; H10W20/062; H10W20/092; H10W20/40; H10W20/45; H10W20/48; H10W20/495
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
108 words
A method for forming a multi-level interconnect in an integrated circuit comprising a conductor, a cap dielectric layer, and a low-k dielectric layer, said method comprising the steps of: depositing a first hard mask layer over the low-k dielectric layer; depositing a second hard mask layer over said first hard mask layer, wherein said second hard mask layer exhibits etch-selectivity with respect to the cap dielectric layer and the low-k dielectric layer, and said first hard mask layer is resistant to polishing-induced erosion; polishing said second hard mask layer such that said second hard mask layer is substantially removed, and said first hard mask layer is substantially intact.
Claim 2
Independent Claim
108 words
A method for forming a multi-level interconnect in an integrated circuit comprising a conductor, a cap dielectric layer, and a low-k dielectric layer, said method comprising the steps of: depositing a first hard mask layer over the low-k dielectric layer; depositing a second hard mask layer over said first hard mask layer, wherein said second hard mask layer exhibits etch-selectivity with respect to the cap dielectric layer and the low-k dielectric layer, and said first hard mask layer is resistant to polishing-induced erosion; polishing said second hard mask layer such that said second hard mask layer is substantially removed, and said first hard mask layer is substantially intact.
Claim 3
Dependent Claim
25 words
The method of claim 1, wherein said step of depositing a first hard mask layer comprises the step of forming a layer of silicon nitride.
Claim 4
Dependent Claim
25 words
The method of claim 1, wherein said step of depositing a second hard mask layer comprises the step of forming a layer of silicon dioxide.
Claim 5
Dependent Claim
25 words
The method of claim 1, wherein said step of depositing a first hard mask layer comprises the step of depositing a plurality of dielectric layers.
Claim 6
Dependent Claim
38 words
The method of claim 1, wherein said step of depositing a first hard mask layer comprises the steps of: forming a layer of silicon dioxide; and forming a layer of silicon nitride on said layer of silicon dioxide.
Claim 7
Independent Claim
225 words
A method for forming an interconnect in an integrated circuit, said method comprising the steps of: (a) providing a substantially planar layer comprising a conductor and cap dielectric layer disposed thereupon; (b) forming a first low-k dielectric layer on said cap dielectric layer; (c) forming an etch stop layer over said first low-k dielectric layer; (d) patterning said etch stop layer in accordance with a via pattern; (e) forming a second low-k dielectric layer on said etch stop layer; (f) forming a first hard mask layer over said second low-k dielectric layer; (g) forming a second hard mask layer over said first hard mask layer; (h) patterning said first and second hard mask layers and said second low-k dielectric layer in accordance with a metal wiring pattern; (i) etching said first low-k dielectric layer in accordance with said via pattern, wherein said etch stop layer exhibits etch selectivity with respect to said first and second low-k dielectric layers; (j) etching said cap dielectric layer to expose said conductor, wherein said etch stop layer and said second hard mask layer exhibit etch selectivity with respect to said cap dielectric layer; (k) depositing a metal-layer such that said metal layer is electrically continuous with said conductor; (l) polishing away excess regions of said metal layer, wherein said first hard mask layer acts as a stop during polishing.
Claim 8
Independent Claim
225 words
A method for forming an interconnect in an integrated circuit, said method comprising the steps of: (a) providing a substantially planar layer comprising a conductor and cap dielectric layer disposed thereupon; (b) forming a first low-k dielectric layer on said cap dielectric layer; (c) forming an etch stop layer over said first low-k dielectric layer; (d) patterning said etch stop layer in accordance with a via pattern; (e) forming a second low-k dielectric layer on said etch stop layer; (f) forming a first hard mask layer over said second low-k dielectric layer; (g) forming a second hard mask layer over said first hard mask layer; (h) patterning said first and second hard mask layers and said second low-k dielectric layer in accordance with a metal wiring pattern; (i) etching said first low-k dielectric layer in accordance with said via pattern, wherein said etch stop layer exhibits etch selectivity with respect to said first and second low-k dielectric layers; (j) etching said cap dielectric layer to expose said conductor, wherein said etch stop layer and said second hard mask layer exhibit etch selectivity with respect to said cap dielectric layer; (k) depositing a metal-layer such that said metal layer is electrically continuous with said conductor; (l) polishing away excess regions of said metal layer, wherein said first hard mask layer acts as a stop during polishing.
Claim 9
Dependent Claim
25 words
The method of claim 6, wherein said step of depositing a first hard mask layer comprises the step of forming a layer of silicon nitride.
Claim 10
Dependent Claim
25 words
The method of claim 6, wherein said step of depositing a second hard mask layer comprises the step of forming a layer of silicon dioxide.
Claim 11
Dependent Claim
25 words
The method of claim 6, wherein said step of depositing a first hard mask layer comprises the step of forming a plurality of dielectric layers.
Claim 12
Dependent Claim
38 words
The method of claim 9, wherein said step of forming a plurality of dielectric layers comprises the steps of: forming a layer of silicon dioxide; and forming a layer of silicon nitride on said layer of silicon dioxide.
Claim 13
Dependent Claim
26 words
The method of claim 9, further comprising the step of substantially removing at least one of said plurality of dielectric layers prior to said step (k).
Claim 14
Dependent Claim
22 words
The method of claim 10, further comprising the step of substantially removing said layer of silicon nitride prior to said step (k).
Claim 15
Dependent Claim
26 words
The method of claim 6, wherein said providing step comprises the step of providing a copper metal layer and a silicon nitride cap layer disposed thereupon.
Claim 16
Dependent Claim
43 words
The method of claim 6, wherein said step of forming said first low-k dielectric layer comprises the step of forming a layer of material chosen from the group consisting of polyimide, polyarylether, parylene, benzocyclobutene, polytetrafluoroethylene, porous silicon dioxide, silsesquioxane, and fluorinated silicon oxide.
Claim 17
Dependent Claim
43 words
The method of claim 6, wherein said step of forming said second low-k dielectric layer comprises the step of forming a layer of material chosen from the group consisting of polyimide, polyarylether, parylene, benzocyclobutene, polytetrafluoroethylene, porous silicon dioxide, silsesquioxane, and fluorinated silicon oxide.
Claim 18
Dependent Claim
23 words
The method of claim 6, wherein said step of depositing a metal layer comprises the step of depositing a bulk layer of copper.
Claim 19
Dependent Claim
19 words
The method of claim 16, further comprising the steps of forming a barrier layer and a copper seed layer.
References Cited (Backward Citations)
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