Patent US6064108A successfully refreshed from Google Patents.
US6064108A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Integrated interdigitated capacitor
Assignee: The AT&T MVPD Group LLC
•
Filing: 1997-09-02
•
Granted: 2000-05-16
•
Expires: 2017-09-02
Abstract
Abstract An integrated, interdigitated capacitor incorporates all layers of an I.C. fabrication process into its design to produce a multi-layer high-capacitance device. For example, a "two-metal, two-poly" CMOS fabrication process is used to produce a capacitor having five interdigitated conductive plates, which when interconnected produce a total capacitance at least twice as great as a conventional two-plate capacitor of the same area, while requiring no additional I.C. processing steps. The invention's conductive plates and interconnections are arranged so that interconnection traces stay within strict design limits intended to insure reliable connections, while keeping the area required for the interconnections small.
Inventors
- 👤 Gerald M. Martinez
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 14:01
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/40; H10W20/495; H10W20/496; H10D; H10D1/00; H10D1/60; H10D1/68
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
154 words
An integrated circuit (I.C.) capacitor structure, comprising: a substrate, at least three conductive plates stacked on said substrate, said plates arranged approximately parallel to said substrate and interdigitated such that each conductive plate at least partially overlaps at least one adjacent conductive plate, a plurality of dielectric layers electrically isolating respective conductive plates from their adjacent conductive plates and from said substrate, at least two interconnection traces, each of said traces arranged to interconnect at least two of said conductive plates, the edges of said conductive plates staggered to reduce the number of dielectric layers and conductive plates through which said interconnection traces must traverse, and a plurality of vias through which said interconnection traces traverse said dielectric layers and conductive plates, none of said vias superimposed over any other of said vias such that any one of said conductive plates contacts only one other of said conductive plates at any given spatial location.
Claim 2
Dependent Claim
154 words
An integrated circuit (I.C.) capacitor structure, comprising: a substrate, at least three conductive plates stacked on said substrate, said plates arranged approximately parallel to said substrate and interdigitated such that each conductive plate at least partially overlaps at least one adjacent conductive plate, a plurality of dielectric layers electrically isolating respective conductive plates from their adjacent conductive plates and from said substrate, at least two interconnection traces, each of said traces arranged to interconnect at least two of said conductive plates, the edges of said conductive plates staggered to reduce the number of dielectric layers and conductive plates through which said interconnection traces must traverse, and a plurality of vias through which said interconnection traces traverse said dielectric layers and conductive plates, none of said vias superimposed over any other of said vias such that any one of said conductive plates contacts only one other of said conductive plates at any given spatial location.
Claim 3
Dependent Claim
96 words
An integrated circuit (I.C.) capacitor structure, comprising: a substrate, four conductive plates stacked on said substrate, said plates arranged approximately parallel to said substrate and interdigitated such that each conductive plate at least partially overlaps at least one adjacent conductive plate, the two conductive plates nearest said substrate being polysilicon and the two conductive plates farthest from said substrate being metal, a plurality of dielectric layers electrically isolating respective conductive plates from their adjacent conductive plates and from said substrate, and two interconnection traces, each of said traces arranged to interconnect two of said conductive plates.
Claim 4
Dependent Claim
96 words
An integrated circuit (I.C.) capacitor structure, comprising: a substrate, four conductive plates stacked on said substrate, said plates arranged approximately parallel to said substrate and interdigitated such that each conductive plate at least partially overlaps at least one adjacent conductive plate, the two conductive plates nearest said substrate being polysilicon and the two conductive plates farthest from said substrate being metal, a plurality of dielectric layers electrically isolating respective conductive plates from their adjacent conductive plates and from said substrate, and two interconnection traces, each of said traces arranged to interconnect two of said conductive plates.
Claim 5
Dependent Claim
31 words
The capacitor structure of claim 2, wherein at least one of said polysilicon conductive plates is doped to a level of at least 10 17 atoms/cm 3 to improve its conductivity.
Claim 6
Dependent Claim
42 words
The capacitor structure of claim 2, wherein said substrate comprises a fifth conductive plate and one of said interconnection traces is arranged to interconnect said substrate to at least one other of said conductive plates. conductive plates at any given spatial location.
Claim 7
Dependent Claim
25 words
The capacitor structure of claim 4, wherein said substrate is doped to a level of at least 10 17 atoms/cm 3 to improve its conductivity.
Claim 8
Dependent Claim
61 words
The capacitor structure of claim 2, wherein at least one of said interconnection traces comprises a metal strip which contacts and thereby interconnects at least two of said conductive plates at respective contact areas and is physically isolated from said conductive plates except at said contact areas, said metal strip tending to reduce the area required to interconnect said conductive plates.
Claim 9
Dependent Claim
21 words
The capacitor structure of claim 2, wherein said conductive plates are photolithographically defined within respective conductive plates deposited on said substrate.
Claim 10
Dependent Claim
156 words
An integrated, interdigitated capacitor structure suitable for implementation with a two-metal, two-poly CMOS fabrication process, comprising: a silicon substrate, a first oxide layer on said substrate, a first polysilicon plate on said first oxide layer, a second oxide layer on said first polysilicon plate, a second polysilicon plate on said second oxide layer, a third oxide layer on said second polysilicon plate, a first metal plate on said third oxide layer, a fourth oxide layer on said first metal plate, a second metal plate on said fourth oxide layer, and at least two interconnection traces, each of said traces arranged to interconnect at least two of said four polysilicon and metal plates, said polysilicon and metal plates arranged approximately parallel to said substrate and interdigitated such that each of said plates at least partially overlaps at least one other of said plates, said interconnected and interdigitated plates and said dielectric layers forming an integrated, interdigitated capacitor.
Claim 11
Dependent Claim
156 words
An integrated, interdigitated capacitor structure suitable for implementation with a two-metal, two-poly CMOS fabrication process, comprising: a silicon substrate, a first oxide layer on said substrate, a first polysilicon plate on said first oxide layer, a second oxide layer on said first polysilicon plate, a second polysilicon plate on said second oxide layer, a third oxide layer on said second polysilicon plate, a first metal plate on said third oxide layer, a fourth oxide layer on said first metal plate, a second metal plate on said fourth oxide layer, and at least two interconnection traces, each of said traces arranged to interconnect at least two of said four polysilicon and metal plates, said polysilicon and metal plates arranged approximately parallel to said substrate and interdigitated such that each of said plates at least partially overlaps at least one other of said plates, said interconnected and interdigitated plates and said dielectric layers forming an integrated, interdigitated capacitor.
Claim 12
Dependent Claim
72 words
The capacitor structure of claim 8, wherein said polysilicon and metal plates are photolithographically defined within respective material layers deposited on said substrate, and one of said interconnection traces comprises a metal strip defined from said first metal layer but physically isolated from said first metal plate, said metal strip interconnecting said second polysilicon plate and said second metal plate and tending to reduce the area required to interconnect said conductive plates.
Claim 13
Dependent Claim
24 words
The capacitor structure of claim 9, wherein said metal strip further interconnects said substrate to said second poly plate and said second metal plate.
References Cited (Backward Citations)
US4700457A
Cited
JPS6329962A
Cited
JPH02240958A
Cited
JPH02305460A
Cited
JPH04196583A
Cited
US5773872A
Cited
US5861648A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-05-16 | 2003-11-15 | 2004-05-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-05-16 | 2007-11-15 | 2008-05-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-05-16 | 2011-11-15 | 2012-05-16 | $7700.00 | Window Closed / Lapsed |