US6022805A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of fabricating semiconductor device with a multi-layered interconnection structure having a low contact resistance
Assignee: Sony Corp
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Filing: 1996-11-08
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Granted: 2000-02-08
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Expires: 2016-11-08
Abstract
Abstract A method of fabricating a semiconductor device includes the step of removing native oxide on the surface of a metal silicide layer formed on a shallow impurity diffusion layer and exposed at the bottom portion of a contact hole by sputter etching under an incident ion condition of a high density and a low energy. In this sputter etching, the side surface of the contact hole is prevented from being sputtered and re-deposited on the bottom portion of the contact hole, whereby the native oxide is effectively removed while the impurity diffusion layer is prevented from being damaged. In addition, a substrate may be heated during sputter etching for preventing ion species such as Ar+ from being entrapped in the metal silicide layer.
Inventors
- 👤 Hirofumi Sumi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 11:34
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/071; H10W20/081; C; C23; C23C; C23C14/00; C23C14/06; C23C14/14; C23C14/16; C23C14/165; H10D; H10D30/00; H10D30/01; H10D30/021; H10D30/0212; H10D64/00; H10D64/01; H10D64/011; H10D64/0111; H10D64/0112; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/282; H10P50/283; H10P70/00; H10P70/20; H10P70/23; H10P70/234
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
188 words
A method of fabricating a semiconductor device, comprising the steps of: forming an interlayer insulating film on a conductive material layer, and forming a contact hole facing said conductive material layer in said interlayer insulating film; removing native oxide which is formed on the surface of said conductive material layer and exposed at the bottom portion of said contact hole; and forming either a contact plug or an upper layer interconnection at least in said contact hole; wherein said native oxide is removed by sputter etching using an incident ion energy having an intensity more than a value allowing said native oxide to be removed by sputter etching and less than a value allowing a side surface of said contact hole to be sputtered and re-deposited on the surface of said conductive material layer exposed at the bottom portion of said contact hole; and either said contact plug or said upper layer interconnection is formed in said contact hole continuously after removal of said native oxide without exposing, to an oxidizing atmosphere, the surface of said conductive material layer exposed at the bottom portion of said contact hole.
Claim 2
Independent Claim
188 words
A method of fabricating a semiconductor device, comprising the steps of: forming an interlayer insulating film on a conductive material layer, and forming a contact hole facing said conductive material layer in said interlayer insulating film; removing native oxide which is formed on the surface of said conductive material layer and exposed at the bottom portion of said contact hole; and forming either a contact plug or an upper layer interconnection at least in said contact hole; wherein said native oxide is removed by sputter etching using an incident ion energy having an intensity more than a value allowing said native oxide to be removed by sputter etching and less than a value allowing a side surface of said contact hole to be sputtered and re-deposited on the surface of said conductive material layer exposed at the bottom portion of said contact hole; and either said contact plug or said upper layer interconnection is formed in said contact hole continuously after removal of said native oxide without exposing, to an oxidizing atmosphere, the surface of said conductive material layer exposed at the bottom portion of said contact hole.
Claim 3
Dependent Claim
28 words
A method of fabricating a semiconductor device according to claim 1, wherein the incident ion energy intensity is in a range of from 20 eV to 1,000 eV.
Claim 4
Dependent Claim
26 words
A method of fabricating a semiconductor device according to claim 1, wherein said conductive material layer is an impurity diffusion layer formed on a semiconducting substrate.
Claim 5
Dependent Claim
28 words
A method of fabricating a semiconductor device according to claim 3, wherein the depth of said impurity diffusion layer is in a range of 150 nm or less.
Claim 6
Dependent Claim
35 words
A method of fabricating a semiconductor device according to claim 1, wherein said conductive material layer is a metal silicide layer formed on the surface of an impurity diffusion layer formed on a semiconducting substrate.
Claim 7
Dependent Claim
19 words
A method of fabricating a semiconductor device according to claim 5, said metal silicide layer is made from CoSix.
Claim 8
Dependent Claim
28 words
A method of fabricating a semiconductor device according to claim 5, wherein the depth of said impurity diffusion layer is in a range of 150 nm or less.
Claim 9
Independent Claim
161 words
A method of fabricating a semiconductor device, comprising the steps of: forming an interlayer insulating film on a conductive material layer, and forming a contact hole facing said conductive material layer in said interlayer insulating film; removing native oxide which is formed on the surface of said conductive material layer and exposed at the bottom portion of said contact hole; and forming either a contact plug or an upper layer interconnection at least in said contact hole; wherein said native oxide is removed by sputter etching performed at a substrate temperature more than a value allowing sputter ion species to be entrapped in said conductive material layer exposed at the bottom portion of said contact hole; and either said contact plug or said upper layer interconnection is formed in said contact hole continuously after removal of said native oxide without exposing, to an oxidizing atmosphere, the surface of said conductive material layer exposed at the bottom portion of said contact hole.
Claim 10
Independent Claim
161 words
A method of fabricating a semiconductor device, comprising the steps of: forming an interlayer insulating film on a conductive material layer, and forming a contact hole facing said conductive material layer in said interlayer insulating film; removing native oxide which is formed on the surface of said conductive material layer and exposed at the bottom portion of said contact hole; and forming either a contact plug or an upper layer interconnection at least in said contact hole; wherein said native oxide is removed by sputter etching performed at a substrate temperature more than a value allowing sputter ion species to be entrapped in said conductive material layer exposed at the bottom portion of said contact hole; and either said contact plug or said upper layer interconnection is formed in said contact hole continuously after removal of said native oxide without exposing, to an oxidizing atmosphere, the surface of said conductive material layer exposed at the bottom portion of said contact hole.
Claim 11
Dependent Claim
24 words
A method of fabricating a semiconductor device according to claim 8, wherein said substrate temperature is in a range of 300° C. or more.
Claim 12
Dependent Claim
26 words
A method of fabricating a semiconductor device according to claim 8, wherein said conductive material layer is an impurity diffusion layer formed on a semiconducting substrate.
Claim 13
Dependent Claim
28 words
A method of fabricating a semiconductor device according to claim 10, wherein the depth of said impurity diffusion layer is in a range of 150 nm or less.
Claim 14
Dependent Claim
35 words
A method of fabricating a semiconductor device according to claim 8, wherein said conductive material layer is a metal silicide layer formed on the surface of an impurity diffusion layer formed on a semiconducting substrate.
Claim 15
Dependent Claim
19 words
A method of fabricating a semiconductor device according to claim 12, said metal silicide layer is made from CoSix.
Claim 16
Dependent Claim
28 words
A method of fabricating a semiconductor device according to claim 11, wherein the depth of said impurity diffusion layer is in a range of 150 nm or less.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-02-07 | 2003-08-09 | 2004-02-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-02-07 | 2007-08-09 | 2008-02-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-02-07 | 2011-08-09 | 2012-02-08 | $7700.00 | Window Closed / Lapsed |