US6017826A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Chlorine containing plasma etch method with enhanced sidewall passivation and attenuated microloading effect
Assignee: GlobalFoundries Singapore Pte Ltd
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Filing: 1998-10-05
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Granted: 2000-01-25
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Expires: 2018-10-05
Abstract
Abstract A method for forming a patterned layer within a microelectronics fabrication. There is first provided a substrate. There is then formed over the substrate a blanket chlorine containing plasma etchable layer. There is then formed upon the blanket chlorine containing plasma etchable layer a blanket hard mask layer. There is then formed upon the blanket hard mask layer a patterned photoresist layer. There is then etched the blanket hard mask layer to form a patterned hard mask layer while employing a first plasma etch method in conjunction with the patterned photoresist layer as a first etch mask layer. There is then etched the blanket chlorine containing plasma etchable layer to form a patterned chlorine containing plasma etchable layer while employing a second plasma etch method in conjunction with at least the patterned hard mask layer as a second etch mask layer. The second plasma etch method employs a second etchant gas composition which upon plasma activation forms a chlorine containing etchant species and a sidewall passivation layer forming species. The patterned chlorine containing plasma etchable layer has incident to the second plasma etch method a sidewall passivation layer formed upon a sidewall of the patterned chlorine containing plasma etchable layer. Finally, there is then stripped from the sidewall of the patterned chlorine containing plasma etchable layer the sidewall passivation layer while sequentially oxidizing the sidewall of the patterned chlorine containing plasma etchable layer to form an oxidized chlorine containing plasma etchable material sidewall layer upon a partially oxidized patterned chlorine containing plasma etchable layer while employing a third plasma etch method. The third plasma etch method employs a third etchant gas composition which upon plasma activation forms an oxygen containing oxidizing species.
Inventors
- 👤 Mei-Sheng Zhou
- 👤 Paul Kwok Keung Ho
- 👤 Thomas Schuelke
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 06:35
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/26; H10P50/264; H10P50/266; H10P50/267
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
288 words
A method for forming a patterned layer within a microelectronics fabrication comprising: providing a substrate; forming over the substrate a blanket chlorine containing plasma etchable layer; forming upon the blanket chlorine containing plasma etchable layer a blanket hard mask layer; forming upon the blanket hard mask layer a patterned photoresist layer; etching the blanket hard mask layer to form a patterned hard mask layer while employing a first plasma etch method in conjunction with the patterned photoresist layer as a first etch mask layer, the first plasma etch method employing a first etchant gas composition appropriate to a hard mask material from which is formed the blanket hard mask layer; etching the blanket chlorine containing plasma etchable layer to form a patterned chlorine containing plasma etchable layer while employing a second plasma etch method in conjunction with at least the patterned hard mask layer as a second etch mask layer, the second plasma etch method employing a second etchant gas composition which upon plasma activation forms a chlorine containing etchant species and a sidewall passivation layer forming species, the patterned chlorine containing plasma etchable layer having incident to the second plasma etch method a sidewall passivation layer formed upon a sidewall of the patterned chlorine containing plasma etchable layer; and stripping from the sidewall of the patterned chlorine containing plasma etchable layer the sidewall passivation layer while sequentially oxidizing the sidewall of the patterned chlorine containing plasma etchable layer to form an oxidized chlorine containing plasma etchable material sidewall layer upon a partially oxidized patterned chlorine containing plasma etchable layer while employing a third plasma etch method, the third plasma etch method employing a third etchant gas composition which upon plasma activation forms an oxygen containing oxidizing species.
Claim 2
Independent Claim
288 words
A method for forming a patterned layer within a microelectronics fabrication comprising: providing a substrate; forming over the substrate a blanket chlorine containing plasma etchable layer; forming upon the blanket chlorine containing plasma etchable layer a blanket hard mask layer; forming upon the blanket hard mask layer a patterned photoresist layer; etching the blanket hard mask layer to form a patterned hard mask layer while employing a first plasma etch method in conjunction with the patterned photoresist layer as a first etch mask layer, the first plasma etch method employing a first etchant gas composition appropriate to a hard mask material from which is formed the blanket hard mask layer; etching the blanket chlorine containing plasma etchable layer to form a patterned chlorine containing plasma etchable layer while employing a second plasma etch method in conjunction with at least the patterned hard mask layer as a second etch mask layer, the second plasma etch method employing a second etchant gas composition which upon plasma activation forms a chlorine containing etchant species and a sidewall passivation layer forming species, the patterned chlorine containing plasma etchable layer having incident to the second plasma etch method a sidewall passivation layer formed upon a sidewall of the patterned chlorine containing plasma etchable layer; and stripping from the sidewall of the patterned chlorine containing plasma etchable layer the sidewall passivation layer while sequentially oxidizing the sidewall of the patterned chlorine containing plasma etchable layer to form an oxidized chlorine containing plasma etchable material sidewall layer upon a partially oxidized patterned chlorine containing plasma etchable layer while employing a third plasma etch method, the third plasma etch method employing a third etchant gas composition which upon plasma activation forms an oxygen containing oxidizing species.
Claim 3
Dependent Claim
43 words
The method of claim 1 wherein the substrate is employed within a microelectronics fabrication selected from the group consisting of a semiconductor integrated circuit microelectronics fabrication, a solar cell microelectronics fabrication, a ceramic substrate microelectronics fabrication and a flat panel display microelectronics fabrication.
Claim 4
Dependent Claim
35 words
The method of claim 1 wherein the blanket chlorine containing plasma etchable layer is formed from a chlorine containing plasma etchable material selected from the group consisting of aluminum containing conductor materials and silicon materials.
Claim 5
Dependent Claim
67 words
The method of claim 1 wherein: the chlorine containing etchant species is derived from a gas selected from at least one of the group of chlorine, hydrogen chloride and boron trichloride; and the sidewall passivation layer forming species is derived from a gas selected from the group consisting of perfluorocarbons of up to four carbon atoms, hydrofluorocarbons of up to four carbon atoms, hydrogen halides and nitrogen.
Claim 6
Dependent Claim
28 words
The method of claim 1 wherein the second plasma etch method does not employ an etchant gas composition which upon plasma activation forms an oxygen containing oxidizing species.
Claim 7
Dependent Claim
26 words
The method of claim 1 wherein the third etchant gas composition comprises an oxygen containing etchant gas selected from the group consisting of oxygen and ozone.
Claim 8
Dependent Claim
82 words
The method of claim 1 wherein: the sidewall passivation layer is stripped from the sidewall of the patterned chlorine containing plasma etchable layer simultaneously with stripping the patterned photoresist layer from the patterned hard mask layer; and a thickness of the patterned photoresist layer is selected such that the patterned photoresist layer is completely stripped from the patterned hard mask layer before the patterned chlorine containing plasma etchable layer is oxidized to form the partially oxidized patterned chlorine containing plasma etchable layer.
Claim 9
Independent Claim
281 words
A method for forming a patterned aluminum containing conductor layer within a microelectronics fabrication comprising: providing a substrate; forming over the substrate a blanket aluminum containing conductor layer; forming upon the blanket aluminum containing conductor layer a blanket hard mask layer; forming upon the blanket hard mask layer a patterned photoresist layer; etching the blanket hard mask layer to form a patterned hard mask layer while employing a first plasma etch method in conjunction with the patterned photoresist layer as a first etch mask layer, the first plasma etch method employing a first etchant gas composition appropriate to a hard mask material from which is formed the blanket hard mask layer; etching the blanket aluminum containing conductor layer to form a patterned aluminum containing conductor layer while employing a second plasma etch method in conjunction with at least the patterned hard mask layer as a second etch mask layer, the second plasma etch method employing a second etchant gas composition which upon plasma activation forms a chlorine containing etchant species and a sidewall passivation layer forming species, the patterned aluminum containing conductor layer having incident to the second plasma etch method a sidewall passivation layer formed upon a sidewall of the patterned aluminum containing conductor layer; and stripping from the sidewall of the patterned aluminum containing conductor layer the sidewall passivation layer while sequentially oxidizing the sidewall of the patterned aluminum containing conductor layer to form an oxidized aluminum containing conductor material sidewall layer upon a partially oxidized patterned aluminum containing conductor layer while employing a third plasma etch method, the third plasma etch method employing a third etchant gas composition which upon plasma activation forms an oxygen containing oxidizing species.
Claim 10
Independent Claim
281 words
A method for forming a patterned aluminum containing conductor layer within a microelectronics fabrication comprising: providing a substrate; forming over the substrate a blanket aluminum containing conductor layer; forming upon the blanket aluminum containing conductor layer a blanket hard mask layer; forming upon the blanket hard mask layer a patterned photoresist layer; etching the blanket hard mask layer to form a patterned hard mask layer while employing a first plasma etch method in conjunction with the patterned photoresist layer as a first etch mask layer, the first plasma etch method employing a first etchant gas composition appropriate to a hard mask material from which is formed the blanket hard mask layer; etching the blanket aluminum containing conductor layer to form a patterned aluminum containing conductor layer while employing a second plasma etch method in conjunction with at least the patterned hard mask layer as a second etch mask layer, the second plasma etch method employing a second etchant gas composition which upon plasma activation forms a chlorine containing etchant species and a sidewall passivation layer forming species, the patterned aluminum containing conductor layer having incident to the second plasma etch method a sidewall passivation layer formed upon a sidewall of the patterned aluminum containing conductor layer; and stripping from the sidewall of the patterned aluminum containing conductor layer the sidewall passivation layer while sequentially oxidizing the sidewall of the patterned aluminum containing conductor layer to form an oxidized aluminum containing conductor material sidewall layer upon a partially oxidized patterned aluminum containing conductor layer while employing a third plasma etch method, the third plasma etch method employing a third etchant gas composition which upon plasma activation forms an oxygen containing oxidizing species.
Claim 11
Dependent Claim
43 words
The method of claim 8 wherein the substrate is employed within a microelectronics fabrication selected from the group consisting of a semiconductor integrated circuit microelectronics fabrication, a solar cell microelectronics fabrication, a ceramic substrate microelectronics fabrication and a flat panel display microelectronics fabrication.
Claim 12
Dependent Claim
67 words
The method of claim 8 wherein: the chlorine containing etchant species is derived from a gas selected from at least one of the group of chlorine, hydrogen chloride and boron trichloride; and the sidewall passivation layer forming species is derived from a gas selected from the group consisting of perfluorocarbons of up to four carbon atoms, hydrofluorocarbons of up to four carbon atoms, hydrogen halides and nitrogen.
Claim 13
Dependent Claim
28 words
The method of claim 8 wherein the second plasma etch method does not employ an etchant gas composition which upon plasma activation forms an oxygen containing oxidizing species.
Claim 14
Dependent Claim
26 words
The method of claim 8 wherein the third etchant gas composition comprises an oxygen containing etchant gas selected from the group consisting of oxygen and ozone.
Claim 15
Dependent Claim
79 words
The method of claim 8 wherein: the sidewall passivation layer is stripped from the sidewall of the patterned aluminum containing conductor layer simultaneously with stripping the patterned photoresist layer from the patterned hard mask layer; and a thickness of the patterned photoresist layer is selected such that the patterned photoresist layer is completely stripped from the patterned hard mask layer before the patterned aluminum containing conductor layer is oxidized to form the partially oxidized patterned aluminum containing conductor layer.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-01-24 | 2003-07-26 | 2004-01-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-01-24 | 2007-07-26 | 2008-01-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-01-24 | 2011-07-26 | 2012-01-25 | $7700.00 | Window Closed / Lapsed |