Patent US6007635A successfully refreshed from Google Patents.
US6007635A
Expired / Lapsed
US
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Platform for supporting a semiconductor substrate and method of supporting a substrate during rapid high temperature processing
Assignee: Kokusai Semiconductor Equipment Corp
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Filing: 1997-11-26
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Granted: 1999-12-28
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Expires: 2017-11-26
Abstract
Abstract A platform for processing a substrate in a processing chamber of a reactor includes an annular body with a recessed, generally planar substrate support surface for supporting the substrate during processing. The platform includes at least one coupler for releasably securing the platform to a platform support surface positioned inside the processing chamber. The platform is releasably secured to the platform support surface in the processing in a manner which permits unrestrained relative thermal expansion of the platform. The substrate support surface is sized to permit unrestrained radial thermal expansion of the substrate and, preferably, recessed to support the device side of the substrate substantially flush with an upper surface of the platform. The platform is suitable for use in a processing reactor which includes a heater housing and an outer reactor housing. The heater housing encloses a heater assembly and provides the support surface for supporting the platform during processing. The reactor also includes at least one gas injector for injecting at least one processing gas into the processing chamber for deposition on the substrate.
Inventors
- 👤 Imad Mahawili
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:47
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/70; H10P72/76; H10P72/7604; H10P72/7624; C; C23; C23C; C23C16/00; C23C16/44; C23C16/458; C23C16/4582; C23C16/4583; C23C16/4584; C30; C30B; C30B25/00; C30B25/02; C30B25/12; C30B31/00; C30B31/06; C30B31/14; H10P72/04; H10P72/0431; H10P72/0436
Claims Analysis
Total Claims: 27
Claim 1
Independent Claim
107 words
A platform for supporting a semiconductor substrate during processing in a processing chamber, the processing chamber having a rotatable housing, said platform comprising: an annular member having a central opening, a first side with a generally planar recessed surface, and a second side configured for being supported by the rotatable housing, said recessed surface configured to support the substrate thereon and to permit unrestrained thermal expansion of the substrate; and a coupler positioned on said second side of said annular member, said coupler for rotatably coupling said annular member to the rotatable housing and being configured to permit unrestrained thermal expansion of said annular member during processing.
Claim 2
Dependent Claim
107 words
A platform for supporting a semiconductor substrate during processing in a processing chamber, the processing chamber having a rotatable housing, said platform comprising: an annular member having a central opening, a first side with a generally planar recessed surface, and a second side configured for being supported by the rotatable housing, said recessed surface configured to support the substrate thereon and to permit unrestrained thermal expansion of the substrate; and a coupler positioned on said second side of said annular member, said coupler for rotatably coupling said annular member to the rotatable housing and being configured to permit unrestrained thermal expansion of said annular member during processing.
Claim 3
Dependent Claim
15 words
The platform according to claim 1, wherein said support surface comprises an annular support surface.
Claim 4
Dependent Claim
33 words
The platform according to claim 1, wherein said annular member includes central recessed portion, said central recessed portion including said central opening, and said central recessed portion defining said generally planar recessed surface.
Claim 5
Dependent Claim
36 words
The platform according to claim 1, wherein said coupler comprises a projecting member configured to extend into a corresponding receiving structure provided on the rotatable housing for rotatably coupling said annular member to the rotatable housing.
Claim 6
Dependent Claim
33 words
The platform according to claim 1, wherein said coupler comprises a recessed structure configured to receive a corresponding coupler of the rotatable housing for rotatably coupling said annular member to the rotatable housing.
Claim 7
Dependent Claim
24 words
The platform according to claim 1, wherein said recessed surface is sized to permit unrestrained radial thermal expansion of the substrate during thermal processing.
Claim 8
Dependent Claim
31 words
The platform according to claim 1, wherein said annular member comprises a generally disc-shaped member, said disc-shaped member having a recessed central portion, said recessed central portion defining said recessed surface.
Claim 9
Dependent Claim
24 words
The platform according to claim 1, wherein said recessed surface comprises an annular recessed surface, said annular recessed surface extending around said central opening.
Claim 10
Dependent Claim
33 words
The platform according to claim 1, wherein said annular member includes an upper surface, said recessed surface being adapted to support the substrate substantially flush with said upper surface of said annular member.
Claim 11
Dependent Claim
30 words
The platform according to claim 1, wherein said annular member comprises a material selected from the group comprising quartz, silicon carbide, zirconia, alumina, aluminum, steel, and silicon carbide coated graphite.
Claim 12
Dependent Claim
30 words
The platform according to claim 1, further comprising an insert, said insert being supported on said generally planar recessed surface for covering said central opening and providing a gas barrier.
Claim 13
Dependent Claim
12 words
The platform according to claim 11, wherein said insert comprises a disc.
Claim 14
Dependent Claim
11 words
The platform according to claim 11, wherein said insert comprises quartz.
Claim 15
Dependent Claim
97 words
A reactor for processing a substrate, said reactor comprising: a reactor housing defining a processing chamber; a platform having an annular body defining a central opening, said annular body having opposed sides, one of said opposed sides including a recessed substrate support surface adapted to support the substrate thereon, the other of said sides being rotatably supported in said housing; a heater adapted to heat the substrate, said heater being supported in said housing; and at least one gas injector adapted to inject at least one processing gas into said processing chamber for deposition onto the substrate.
Claim 16
Dependent Claim
97 words
A reactor for processing a substrate, said reactor comprising: a reactor housing defining a processing chamber; a platform having an annular body defining a central opening, said annular body having opposed sides, one of said opposed sides including a recessed substrate support surface adapted to support the substrate thereon, the other of said sides being rotatably supported in said housing; a heater adapted to heat the substrate, said heater being supported in said housing; and at least one gas injector adapted to inject at least one processing gas into said processing chamber for deposition onto the substrate.
Claim 17
Dependent Claim
29 words
The reactor according to claim 14, further comprising a heater housing, said heater housing including a recessed platform support surface, said recessed platform support surface supporting said platform thereon.
Claim 18
Dependent Claim
31 words
The reactor according to claim 14, wherein said recessed substrate support surface is sized to support the substrate substantially flush with an upper surface of said one side of said platform.
Claim 19
Dependent Claim
25 words
The reactor according to claim 14, wherein said platform is rotatably coupled to said heater housing whereby said platform and said heater housing rotate together.
Claim 20
Dependent Claim
26 words
The reactor according to claim 17, wherein said platform includes means for rotatably securing to said heater housing while permitting unrestrained thermal growth of said platform.
Claim 21
Dependent Claim
29 words
The reactor according to claim 18, wherein said means for securing comprises a coupler, said coupler cooperating with said recessed platform support surface to rotatably support said platform thereon.
Claim 22
Dependent Claim
39 words
The reactor according to claim 19, wherein said heater housing includes a cooperating recess receiving said coupler to thereby releasably secure said platform to said heater housing, said recess being slotted to permit unrestrained thermal expansion of said platform.
Claim 23
Independent Claim
147 words
A method of supporting a substrate during processing, the substrate including a non-device side and a device side, said method comprising the steps of: providing a processing chamber having a heater and a platform support surface; providing a removable platform having a recessed substrate support surface and a central opening; supporting the non-device side of the substrate on the recessed substrate support surface of the removable platform; supporting the removable platform on the platform support surface in the processing chamber over the heater to permit the thermal flux of the heater to directly impinge on the non-device side of the substrate through the central opening of the platform; and adapting the platform support surface of the processing chamber and the substrate support surface of the removable platform to permit unrestrained relative radial thermal expansion of the platform and the substrate, respectively, during thermal processing of the substrate.
Claim 24
Independent Claim
147 words
A method of supporting a substrate during processing, the substrate including a non-device side and a device side, said method comprising the steps of: providing a processing chamber having a heater and a platform support surface; providing a removable platform having a recessed substrate support surface and a central opening; supporting the non-device side of the substrate on the recessed substrate support surface of the removable platform; supporting the removable platform on the platform support surface in the processing chamber over the heater to permit the thermal flux of the heater to directly impinge on the non-device side of the substrate through the central opening of the platform; and adapting the platform support surface of the processing chamber and the substrate support surface of the removable platform to permit unrestrained relative radial thermal expansion of the platform and the substrate, respectively, during thermal processing of the substrate.
Claim 25
Dependent Claim
31 words
A method according to claim 21, further comprising recessing the substrate support surface whereby the device side of the substrate is substantially flush with an upper surface of the removable platform.
Claim 26
Dependent Claim
44 words
A method according to claim 22, further comprising: providing a rotatable housing in the processing chamber, the rotatable housing including the platform support surface; and adapting the platform support surface to support the platform substantially flush with an upper surface of the rotatable housing.
Claim 27
Dependent Claim
16 words
A method according to claim 21, further comprising covering the central opening with a gas barrier.
References Cited (Backward Citations)
US4550684A
Cited
US4680447A
Cited
US4993358A
Cited
US5155336A
Cited
US5317492A
Cited
US5487127A
Cited
US5310260A
Cited
US5490728A
Cited
US5366002A
Cited
US5566744A
Cited
US5673167A
Cited
US5531835A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-12-27 | 2003-06-28 | 2003-12-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-12-27 | 2007-06-28 | 2007-12-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-12-27 | 2011-06-28 | 2011-12-28 | $7700.00 | Window Closed / Lapsed |