US6002466A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Lithography exposure device
Assignee: INSTITUTFUER MIKROELEKTRONIK STUTTGART
•
Filing: 1998-03-26
•
Granted: 1999-12-14
•
Expires: 2018-03-26
Abstract
Abstract A lithography exposure device allows more effective production of small structures within a short time by lithography. The device includes a retainer for a substrate, an exposure unit for producing a light spot on the light-sensitive layer of the substrate, a motion unit for producing apparent motion between the exposure unit and the retainer, and a control unit for controlling the intensity and position of the light spot on the light-sensitive layer. The exposure unit has several solid-state lasers, and a focusing unit that guides the laser beam of each solid-state laser to a light spot of a defined light spot pattern. The entire light spot pattern and the retainer are displaceable relative to each other in an exposure motional direction. Moreover, the light spots of the light spot pattern which correspond to the form of the partial areas to be exposed can be activated or deactivated.
Inventors
- 👤 Uwe Brauch
- 👤 Hans Opower
- 👤 Bernd Hoefflinger
- 👤 Reinhard Springer
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 20:20
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70008; G03F7/7005; G03F7/70383; G03F7/704
Claims Analysis
Total Claims: 25
Claim 1
Independent Claim
273 words
A lithography exposure device comprising: a mounting device for a substrate provided with a layer sensitive to light, an exposure unit comprising a plurality of semiconductor lasers and an optical beam guidance means for generating a defined light spot pattern with non-overlapping light spots on the light-sensitive layer of the substrate held in the mounting device, said optical beam guidance means comprising an optical element for guiding the laser radiation of each semiconductor laser to one light spot of said defined light spot pattern, said light spot pattern having light spots arranged at distances in a transverse direction extending at right angles to an exposure movement direction, wherein, in said transverse direction, each light spot of the light spot pattern has a different distance than the remaining light spots from one of said light spots serving as a reference, said distances of all the light spots of the light spot pattern forming a series of distances, each distance being greater by one increment (d) than another one of the distances, and the increment being smaller than an extension of the light spots in the transverse direction, a movement unit for generating relative movement between the one optical element of the exposure unit and the mounting device, and a control for controlling the intensity and position of the light spots on the light-sensitive layer of the substrate, so that the entire light spot pattern and the mounting device are movable relative to one another in an exposure movement direction, and the light spots of the light spot pattern are thereby activatable or deactivatable in accordance with the shape of the sections to be exposed.
Claim 2
Dependent Claim
273 words
A lithography exposure device comprising: a mounting device for a substrate provided with a layer sensitive to light, an exposure unit comprising a plurality of semiconductor lasers and an optical beam guidance means for generating a defined light spot pattern with non-overlapping light spots on the light-sensitive layer of the substrate held in the mounting device, said optical beam guidance means comprising an optical element for guiding the laser radiation of each semiconductor laser to one light spot of said defined light spot pattern, said light spot pattern having light spots arranged at distances in a transverse direction extending at right angles to an exposure movement direction, wherein, in said transverse direction, each light spot of the light spot pattern has a different distance than the remaining light spots from one of said light spots serving as a reference, said distances of all the light spots of the light spot pattern forming a series of distances, each distance being greater by one increment (d) than another one of the distances, and the increment being smaller than an extension of the light spots in the transverse direction, a movement unit for generating relative movement between the one optical element of the exposure unit and the mounting device, and a control for controlling the intensity and position of the light spots on the light-sensitive layer of the substrate, so that the entire light spot pattern and the mounting device are movable relative to one another in an exposure movement direction, and the light spots of the light spot pattern are thereby activatable or deactivatable in accordance with the shape of the sections to be exposed.
Claim 3
Dependent Claim
28 words
A lithography exposure device as defined in claim 1, wherein the increment (d) is at the most half the extension of the light spots in the transverse direction.
Claim 4
Dependent Claim
55 words
A lithography exposure device as defined in claim 1, wherein the light spot pattern comprises at least one series of light spots arranged in a row, said light spots having at right angles to the exposure movement direction a distance from one another smaller than their extension at right angles to the exposure movement direction.
Claim 5
Dependent Claim
29 words
A lithography exposure device as defined in claim 3, wherein the distance between the light spots of the series is constant at right angles to the exposure movement direction.
Claim 6
Dependent Claim
26 words
A lithography exposure device as defined in claim 3, wherein the light spots of said series are arranged in a row extending along a straight line.
Claim 7
Dependent Claim
37 words
A lithography exposure device as defined in claim 5, wherein in a respective row the light spots have a distance from one another in said series direction which is greater than their extension in the series direction.
Claim 8
Dependent Claim
27 words
A lithography exposure device as defined in claim 6, wherein the series direction forms an angle (α) other than 90° with respect to the exposure movement direction.
Claim 9
Dependent Claim
21 words
A lithography exposure device as defined in claim 1, wherein the exposure unit comprises frequency doublers post-connected to the semiconductor lasers.
Claim 10
Dependent Claim
26 words
A lithography exposure device as defined in claim 1, wherein the exposure unit comprises light guides guiding the laser radiation to the optical beam guidance means.
Claim 11
Dependent Claim
75 words
A lithography exposure device as defined in claim 9, wherein: the light guides have a first end into which the laser radiation is adapted to be coupled, and a second end from which the laser radiation is adapted to exit, and a collimating element is arranged to follow each second end to collimate the laser radiation exiting divergently out of each individual second end of the light guides and form a collimated radiation bundle therefrom.
Claim 12
Dependent Claim
23 words
A lithography exposure device as defined in claim 1, wherein the optical beam guidance means comprises a telescope imaging in a reducing manner.
Claim 13
Dependent Claim
16 words
A lithography exposure device as defined in claim 1, wherein several light spot patterns are generated.
Claim 14
Dependent Claim
204 words
A lithography exposure device, comprising: a mounting device for a substrate provided with a layer sensitive to light; an exposure unit comprising a plurality of semiconductor lasers and an optical beam guidance means for generating a light spot on the light-sensitive layer of the substrate held in the mounting device; the optical beam guidance means being adapted to guide the laser radiation of each semiconductor laser to a light spot of a defined light spot pattern; the optical beam guidance means comprising an optical microscope adapted to generate the light spots; the optical microscope being arranged on a height positioning device for positioning the microscope at a defined distance above the light-sensitive layer during the exposure movement; a movement unit for generating relative movement between the optical beam guidance means of the exposure unit and the mounting device; and a control for controlling the intensity and position of the light spot on the light-sensitive layer of the substrate, wherein: the entire light spot pattern and the mounting device are movable relative to one another in an exposure movement direction and the light spots of the light spot pattern are thereby activatable or deactivatable in accordance with the shape of the sections to be exposed.
Claim 15
Dependent Claim
204 words
A lithography exposure device, comprising: a mounting device for a substrate provided with a layer sensitive to light; an exposure unit comprising a plurality of semiconductor lasers and an optical beam guidance means for generating a light spot on the light-sensitive layer of the substrate held in the mounting device; the optical beam guidance means being adapted to guide the laser radiation of each semiconductor laser to a light spot of a defined light spot pattern; the optical beam guidance means comprising an optical microscope adapted to generate the light spots; the optical microscope being arranged on a height positioning device for positioning the microscope at a defined distance above the light-sensitive layer during the exposure movement; a movement unit for generating relative movement between the optical beam guidance means of the exposure unit and the mounting device; and a control for controlling the intensity and position of the light spot on the light-sensitive layer of the substrate, wherein: the entire light spot pattern and the mounting device are movable relative to one another in an exposure movement direction and the light spots of the light spot pattern are thereby activatable or deactivatable in accordance with the shape of the sections to be exposed.
Claim 16
Dependent Claim
36 words
A lithography exposure device as defined in claim 13, wherein the height positioning device is adapted to maintain a predetermined distance between an underside of the optical microscope facing the light-sensitive layer and the light-sensitive layer.
Claim 17
Dependent Claim
31 words
A lithography exposure device as defined in claim 13, wherein said defined distance is on the order of magnitude of a diameter of the individual light spot on the light-sensitive layer.
Claim 18
Dependent Claim
218 words
A lithography exposure device, comprising: a mounting device for a substrate provided with a layer sensitive to light; an exposure unit comprising a plurality of semiconductor lasers and an optical beam guidance means for generating a light spot on the light-sensitive layer of the substrate held in the mounting device; the optical beam guidance means being adapted to guide the laser radiation of each semiconductor laser to a light spot of a defined light spot pattern; the optical beam guidance means comprising an optical microscope adapted to generate the light spots; said optical microscope being provided with a near-field optical means for defining the size of the light spots on the light-sensitive layer; the near-field optical means being arranged directly on an underside of the optical microscope facing the light-sensitive layer; a movement unit for generating relative movement between the optical beam guidance means of the exposure unit and the mounting device; and a control for controlling the intensity and position of the light spot on the light-sensitive layer of the substrate; wherein: the entire light spot pattern and the mounting device are movable relative to one another in an exposure movement direction and the light spots of the light spot pattern are thereby activatable or deactivatable in accordance with the shape of the sections to be exposed.
Claim 19
Dependent Claim
218 words
A lithography exposure device, comprising: a mounting device for a substrate provided with a layer sensitive to light; an exposure unit comprising a plurality of semiconductor lasers and an optical beam guidance means for generating a light spot on the light-sensitive layer of the substrate held in the mounting device; the optical beam guidance means being adapted to guide the laser radiation of each semiconductor laser to a light spot of a defined light spot pattern; the optical beam guidance means comprising an optical microscope adapted to generate the light spots; said optical microscope being provided with a near-field optical means for defining the size of the light spots on the light-sensitive layer; the near-field optical means being arranged directly on an underside of the optical microscope facing the light-sensitive layer; a movement unit for generating relative movement between the optical beam guidance means of the exposure unit and the mounting device; and a control for controlling the intensity and position of the light spot on the light-sensitive layer of the substrate; wherein: the entire light spot pattern and the mounting device are movable relative to one another in an exposure movement direction and the light spots of the light spot pattern are thereby activatable or deactivatable in accordance with the shape of the sections to be exposed.
Claim 20
Dependent Claim
218 words
A lithography exposure device, comprising: a mounting device for a substrate provided with a layer sensitive to light; an exposure unit comprising a plurality of semiconductor lasers and an optical beam guidance means for generating a light spot on the light-sensitive layer of the substrate held in the mounting device; the optical beam guidance means adapted to guide the laser radiation of each semiconductor laser to a light spot of a defined light spot pattern; the optical beam guidance means comprising an optical microscope adapted to generate the light spots; said optical microscope being provided with a near-field optical means for defining the size of the light spots on the light-sensitive layer; the near-field optical means defining the light spots of the light spot pattern by way of aperture-like through regions; a movement unit for generating relative movement between the optical beam guidance means of the exposure unit and the mounting device; and a control for controlling the intensity and position of the light spot on the light-sensitive layer of the substrate; wherein: the entire light spot pattern and the mounting device are movable relative to one another in an exposure movement direction and the light spots of the light spot pattern are thereby activatable or deactivatable in accordance with the shape of the sections to be exposed.
Claim 21
Dependent Claim
218 words
A lithography exposure device, comprising: a mounting device for a substrate provided with a layer sensitive to light; an exposure unit comprising a plurality of semiconductor lasers and an optical beam guidance means for generating a light spot on the light-sensitive layer of the substrate held in the mounting device; the optical beam guidance means adapted to guide the laser radiation of each semiconductor laser to a light spot of a defined light spot pattern; the optical beam guidance means comprising an optical microscope adapted to generate the light spots; said optical microscope being provided with a near-field optical means for defining the size of the light spots on the light-sensitive layer; the near-field optical means defining the light spots of the light spot pattern by way of aperture-like through regions; a movement unit for generating relative movement between the optical beam guidance means of the exposure unit and the mounting device; and a control for controlling the intensity and position of the light spot on the light-sensitive layer of the substrate; wherein: the entire light spot pattern and the mounting device are movable relative to one another in an exposure movement direction and the light spots of the light spot pattern are thereby activatable or deactivatable in accordance with the shape of the sections to be exposed.
Claim 22
Dependent Claim
221 words
A lithography exposure device, comprising: a mounting device for a substrate provided with a layer sensitive to light; an exposure unit comprising a plurality of semiconductor lasers and an optical beam guidance means for generating a light spot on the light-sensitive layer of the substrate held in the mounting device; the optical beam guidance means being adapted to guide the laser radiation of each semiconductor laser to a light spot of a defined light spot pattern; the optical beam guidance means comprising an optical microscope adapted to generate the light spots; said optical microscope being provided with a near-field optical means for defining the size of the light spots on the light-sensitive layer; the near-field optical means defining the size of the light spots of the light spot pattern by way of beam-concentrating elements; a movement unit for generating relative movement between the optical beam guidance means of the exposure unit and the mounting device; and a control for controlling the intensity and position of the light spot on the light-sensitive layer of the substrate; wherein: the entire light spot pattern and the mounting device are movable relative to one another in an exposure movement direction and the light spots of the light spot pattern are thereby activatable or deactivatable in accordance with the shape of the sections to be exposed.
Claim 23
Dependent Claim
221 words
A lithography exposure device, comprising: a mounting device for a substrate provided with a layer sensitive to light; an exposure unit comprising a plurality of semiconductor lasers and an optical beam guidance means for generating a light spot on the light-sensitive layer of the substrate held in the mounting device; the optical beam guidance means being adapted to guide the laser radiation of each semiconductor laser to a light spot of a defined light spot pattern; the optical beam guidance means comprising an optical microscope adapted to generate the light spots; said optical microscope being provided with a near-field optical means for defining the size of the light spots on the light-sensitive layer; the near-field optical means defining the size of the light spots of the light spot pattern by way of beam-concentrating elements; a movement unit for generating relative movement between the optical beam guidance means of the exposure unit and the mounting device; and a control for controlling the intensity and position of the light spot on the light-sensitive layer of the substrate; wherein: the entire light spot pattern and the mounting device are movable relative to one another in an exposure movement direction and the light spots of the light spot pattern are thereby activatable or deactivatable in accordance with the shape of the sections to be exposed.
Claim 24
Dependent Claim
229 words
A lithography exposure device, comprising: a mounting device for a substrate provided with a layer sensitive to light; an exposure unit comprising a plurality of semiconductor lasers and an optical beam guidance means for generating a light spot on the light-sensitive layer of the substrate held in the mounting device; the optical beam guidance means being adapted to guide the laser radiation of each semiconductor laser to a light spot of a defined light spot pattern; the optical beam guidance means comprising an optical microscope adapted to generate the light spots; said optical microscope being provided with a near-field optical means for defining the size of the light spots on the light-sensitive layer; the near-field optical means being adapted to reduce the size of the light spots in at least one direction to values smaller than the wavelength of the laser radiation; a movement unit for generating relative movement between the optical beam guidance means of the exposure unit and the mounting device; and a control for controlling the intensity and position of the light spot on the light-sensitive layer of the substrate; wherein: the entire light spot pattern and the mounting device are movable relative to one another in an exposure movement direction and the light spots of the light spot pattern are thereby activatable or deactivatable in accordance with the shape of the sections to be exposed.
Claim 25
Dependent Claim
229 words
A lithography exposure device, comprising: a mounting device for a substrate provided with a layer sensitive to light; an exposure unit comprising a plurality of semiconductor lasers and an optical beam guidance means for generating a light spot on the light-sensitive layer of the substrate held in the mounting device; the optical beam guidance means being adapted to guide the laser radiation of each semiconductor laser to a light spot of a defined light spot pattern; the optical beam guidance means comprising an optical microscope adapted to generate the light spots; said optical microscope being provided with a near-field optical means for defining the size of the light spots on the light-sensitive layer; the near-field optical means being adapted to reduce the size of the light spots in at least one direction to values smaller than the wavelength of the laser radiation; a movement unit for generating relative movement between the optical beam guidance means of the exposure unit and the mounting device; and a control for controlling the intensity and position of the light spot on the light-sensitive layer of the substrate; wherein: the entire light spot pattern and the mounting device are movable relative to one another in an exposure movement direction and the light spots of the light spot pattern are thereby activatable or deactivatable in accordance with the shape of the sections to be exposed.
References Cited (Backward Citations)
DE2558788A1
Cited
US4393387A
Cited
US4541712A
Cited
US4577926A
Cited
US5091744A
Cited
DE3624163A1
Cited
US4947186A
Cited
DE4106423A1
Cited
DE4022732A1
Cited
EP0467076A2
Cited
US5121256A
Cited
WO1993024326A1
Cited
US5339737A
Cited
US5339737B1
Cited
US5343271A
Cited
DE4426107A1
Cited
EP0655707A1
Cited
DE19521390A1
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-12-13 | 2003-06-14 | 2003-12-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-12-13 | 2007-06-14 | 2007-12-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-12-13 | 2011-06-14 | 2011-12-14 | $7700.00 | Window Closed / Lapsed |