Semiconductor laser exposure device

Abstract

Abstract A semiconductor laser exposure device, said device having a scanning table (1) on which are mounted a plurality of semiconductor lasers (2) which emit laser beams on to an exposed object W, which lasers (2) are mounted in a row to enable the laser beams to be emitted in parallel, a plurality of optical fibers (3), the number thereof being the same as the number of said semiconductor lasers (2), being placed opposing the semiconducting lasers (2) with one end of the optical fibers (3) being lined up sideways in a row to match the space between each semiconductor laser (2) so that the optical fibers can introduce the laser beams into the fibers, and the other end of the optical fibers also being lined up sideways in a row and being maintained in parallel and close positions, a first condensing lens (4) being mounted a distance A away from the other end of the said optical fibers, a second condensing lens (5) being mounted a distance B away from the first condensing lens (4), and an autofocus lens (6) being mounted a distance C away from the second condensing lens (5), the distance A between the other end of the said optical fibers and the said first condensing lens (4) being determined to enable an appropriate amount of overlapping R to occur between adjacent laser beams when the widened beam of the laser beam emitted from the optical fibers (3) reaches the center part of the said first condensing lens (4), and the distance B between the said first condensing lens (4) and the said second condensing lens (5) being determined at a distance where the focal length (f1) of the first condensing lens (4) and the focal length (f2) of the second condensing lens (5) are added, and the distance C between the second condensing lens (5) and the autofocus lens (6) being determined at a distance where the focal length (f2) of the second condensing lens (5) and the focal length (f3) of the autofocus lens (6) are added, and the distance between the said autofocus lens (6) and the exposed object W being determined to be identical with the focal length (f3) of the autofocus lens (6) after the position of the said scanning table (1) is adjusted in the X-axis direction prior to the exposure, and also such distance is made to be identical with the focal length (f3) of the autofocus lens (6) during the exposure utilising the autofocus function of the autofocus lens (6).

Inventors

• 👤 Hiroshi Taniura

Bibliographic Details