US5981367A
Expired / Lapsed
US
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Method for making an access transistor
Assignee: Micron Technology Inc
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Filing: 1996-10-17
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Granted: 1999-11-09
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Expires: 2016-10-17
Abstract
Abstract Methods are disclosed for the fabrication of novel polysilicon structures having increased surface areas to achieve lower resistances after silicidation. The structures are applicable, for example, to semiconductor interconnects, polysilicon gate, and capacitor applications. The inventive method provides additional means of obtaining suitable sheet resistivity and resistances for deep submicron applications. Techniques are disclosed for improving the conductivities of a silicided gate structure, a silicided interconnect structure, and capacitor component structures, each of such are situated on a substrate assembly, such as a semiconductor wafer.
Inventors
- 👤 Fernando Gonzalez
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 14:41
CPC Classifications
H; H10; H10D; H10D64/00; H10D64/20; H10D64/27; H10D64/311; H10D64/411; H10D64/511; H10D64/517; H10D64/518; H10D64/01; H10D64/013; H10D64/01302; H10D64/01304; H10D64/01306; H10D64/01308; H10D64/01312; H10D64/01324; H10D1/00; H10D1/60; H10D1/68; H10D1/692; H10D1/711; H10D1/712
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
231 words
A method of making a gate structure on a substrate assembly comprising: forming a gate oxide layer on a substrate assembly; forming a first silicon layer on the gate oxide layer; forming a first refractory metal silicide layer on the first silicon layer; forming a first electrically insulating layer on the first refractory metal silicide layer; forming a second silicon layer on the first electrically insulating layer; forming a silicon riser, the silicon riser having a riser silicon layer that is a portion of the second silicon layer and a riser oxide layer that is a portion of the first electrically insulting layer, the silicon riser having exposed surfaces including a top surface thereon and a width; forming a lower gate stack having a lower gate refractory metal silicide layer that is a portion of the first refractory metal silicide layer and a lower gate silicon layer that is a portion of the first silicon layer, the silicon riser projecting from the lower gate stack away from the substrate assembly, said lower gate stack having a width greater than the width of the silicon riser; and forming a second refractory metal silicide layer substantially covering exposed surfaces of the silicon riser including the top surface and contacting the lower gate refractory metal silicide layer such that the first refractory metal silicide with the second refractory metal silicide surround the silicon riser.
Claim 2
Independent Claim
231 words
A method of making a gate structure on a substrate assembly comprising: forming a gate oxide layer on a substrate assembly; forming a first silicon layer on the gate oxide layer; forming a first refractory metal silicide layer on the first silicon layer; forming a first electrically insulating layer on the first refractory metal silicide layer; forming a second silicon layer on the first electrically insulating layer; forming a silicon riser, the silicon riser having a riser silicon layer that is a portion of the second silicon layer and a riser oxide layer that is a portion of the first electrically insulting layer, the silicon riser having exposed surfaces including a top surface thereon and a width; forming a lower gate stack having a lower gate refractory metal silicide layer that is a portion of the first refractory metal silicide layer and a lower gate silicon layer that is a portion of the first silicon layer, the silicon riser projecting from the lower gate stack away from the substrate assembly, said lower gate stack having a width greater than the width of the silicon riser; and forming a second refractory metal silicide layer substantially covering exposed surfaces of the silicon riser including the top surface and contacting the lower gate refractory metal silicide layer such that the first refractory metal silicide with the second refractory metal silicide surround the silicon riser.
Claim 3
Dependent Claim
42 words
A method of making a gate structures on a substrate assembly as defined in claim 1, further comprising forming an active region within the substrate assembly below the gate oxide layer extending on the substrate assembly adjacent to said lower gate stack.
Claim 4
Dependent Claim
151 words
A method of making a gate structure on a substrate assembly as defined in claim 1, wherein each of said lower gate stack and said silicon riser has a substantially rectangular cross-section, the width of the rectangular cross-section of the lower gate stack being greater than the width of the rectangular cross-section of the silicon riser; wherein each of the lower gate stack and the silicon riser has a thickness that is substantially the same and equal to L, the width of the cross-section of the lower gate stack is equal to W, the height of the rectangular cross-section of the silicon riser is equal to H, and the width of the cross-section of the silicon riser is equal to W-(2*U), and wherein the combined end-to-end electrical resistance of the first and second refractory metal silicide layers respectively on the lower gate stack and the silicon riser is equal to L/(2*(W+H-U)).
Claim 5
Dependent Claim
39 words
A method of making a gate structure on a substrate assembly as defined in claim 1, wherein forming a silicon riser comprises: selectively removing material from the second silicon layer; and removing material from the first electrically insulating layer.
Claim 6
Dependent Claim
44 words
A method of making a gate structure on a substrate assembly as defined in claim 1, wherein forming a lower gate stack comprises selectively removing material from the first refractory metal silicide layer and the first silicon layer to form the lower gate stack.
Claim 7
Dependent Claim
103 words
A method of making a gate structure on a substrate assembly as defined in claim 1, wherein forming a second refractory metal silicide layer substantially covering exposed surfaces of the silicon riser including the top surface and contacting the lower gate refractory metal silicide layer comprises: forming a refractory metal layer upon the exposed surfaces of the silicon riser; heating the substrate assembly sufficient to substantially react the riser silicon layer with the refractory metal layer and thereby form said second refractory metal silicide layer; and removing substantially all of the unreacted refractory metal of the refractory metal layer upon the silicon riser.
Claim 8
Dependent Claim
26 words
A method of making a gate structure on a substrate assembly as defined in claim 6, wherein the refractory metal layer is substantially composed of titanium.
Claim 9
Dependent Claim
32 words
A method of making a gate structure on a substrate assembly as defined in claim 1, wherein the first and second refractory metal silicide layers are substantially composed of TiSi x .
Claim 10
Dependent Claim
22 words
A method of making a gate structure on a substrate assembly as defined in claim 8, wherein x is equal to 2.
Claim 11
Dependent Claim
32 words
A method of making a gate structure on a substrate assembly as defined in claim 1, wherein at least one of the first and second silicon layers are substantially composed of polysilcon.
Claim 12
Dependent Claim
33 words
A method of making a gate structure on a substrate assembly as defined in claim 1, wherein at least one of the first and second silicon layers is substantially composed of amorphous silicon.
Claim 13
Dependent Claim
38 words
A method of making a gate structure on a substrate assembly as defined in claim 1, wherein the first electrically insulating layer is substantially composed of a material selected from a group consisting of silica and silicon nitride.
Claim 14
Dependent Claim
257 words
A method of making a gate structure on a substrate assembly as defined in claim 1, wherein: forming a silicon riser comprises forming a plurality of silicon risers, each of said plurality of silicon risers having a riser silicon layer that is a portion of the second silicon layer and a riser oxide layer that is a portion of the first electrically insulating layer, the silicon riser having exposed surfaces including a top surface thereon and a width; forming a lower gate stack comprises forming a plurality of lower gate stacks, each of said plurality of lower gate stacks having a lower gate refractory metal silicide layer that is a portion of the first refractory metal silicide layer and a lower gate silicon layer that is a portion of the first silicon layer; each said silicon riser of said plurality of silicon risers projecting from a respective lower gate stack away from the substrate assembly, each said lower gate stack of said plurality of lower gate stacks having a width greater than the width of the silicon riser projecting therefrom; and forming a second refractory metal silicide layer comprises substantially covering the exposed surfaces of each said silicon riser of said plurality of silicon risers including the top surface so as to contact the lower gate refractory metal silicide layer of a respective lower gate stack of said plurality of lower gate stacks such that the first refractory metal silicide with the second refractory metal silicide surround each said silicon riser of said plurality of silicon risers.
Claim 15
Dependent Claim
211 words
A method of making a gate structure on a substrate assembly as defined in claim 13, wherein each said lower gate stack of said plurality of lower gate stacks has a substantially rectangular cross-section, the width of the rectangular cross-section of each said lower gate stack of said plurality of lower gate stacks being greater than the width of the rectangular cross-section of the silicon riser projecting therefrom, and wherein each lower gate stack of said plurality of lower gate stacks and each respective silicon riser of said plurality of silicon risers has a thickness that is substantially the same and equal to L, the width of the cross-section of each lower gate stack of said plurality of lower gate stacks is equal to W, the height of the rectangular cross-section of each silicon riser of said plurality of silicon risers is equal to H, and the width of the cross-section of each silicon riser of said plurality of silicon risers is equal to W-(2*U), and wherein the combined end-to-end electrical resistance of the first and second refractory metal silicide layers respectively on each said lower gate stack of said plurality of lower gate stacks and on each said silicon riser of said plurality of silicon risers is equal to L/(2*(W+H-U)).
Claim 16
Dependent Claim
45 words
A method of making a gate structure on a substrate assembly as defined in claim 13, further comprising forming an active region within the substrate assembly below the gate oxide layer extending on the substrate assembly between two or more of said lower gate stacks.
Claim 17
Independent Claim
361 words
A method of making a gate structure comprising: forming a gate oxide layer on a silicon substrate; forming a first silicon layer on the gate oxide layer; forming a first refractory metal silicide layer on the first silicon layer; forming a first electrically insulating layer on the first refractory metal silicide layer; forming a second silicon layer on the first electrically insulating layer; selectively removing material from the second silicon layer and removing material from the first electrically insulating layer so as to form a plurality of silicon risers, each of said plurality of silicon risers having a riser silicon layer that is a portion of the second silicon layer and a riser oxide layer that is a portion of the first electrically insulting layer, each said silicon riser having exposed surfaces thereon including a top surface and a width; selectively removing material from the refractory metal silicide layer and the first silicon layer to form a plurality of lower gate stacks, each said lower gate stack having a lower gate refractory metal silicide layer that is a portion of the first refractory metal silicide layer and a lower gate silicon layer that is a portion of the first silicon layer, each said silicon riser of said plurality of silicon risers projecting from a respective the lower gate stack away from the silicon substrate, each said lower gate stack of said plurality of lower gate stacks having a width greater than the width of the respective silicon riser projecting therefrom; and forming a refractory metal layer upon the exposed surfaces of each of said silicon risers including the top surfaces thereof; heating the silicon substrate sufficient to substantially react the riser silicon layer of each said silicon riser with the refractory metal layer and thereby form a second refractory metal silicide layer substantially covering exposed surfaces of each said silicon riser including the top surfaces thereof, the second refractory metal silicide making contact with the lower gate refractory metal silicide layer of the respective lower gate stack such that the first refractory metal silicide with the second refractory metal silicide surround each said silicon riser of said plurality of silicon risers.
Claim 18
Independent Claim
361 words
A method of making a gate structure comprising: forming a gate oxide layer on a silicon substrate; forming a first silicon layer on the gate oxide layer; forming a first refractory metal silicide layer on the first silicon layer; forming a first electrically insulating layer on the first refractory metal silicide layer; forming a second silicon layer on the first electrically insulating layer; selectively removing material from the second silicon layer and removing material from the first electrically insulating layer so as to form a plurality of silicon risers, each of said plurality of silicon risers having a riser silicon layer that is a portion of the second silicon layer and a riser oxide layer that is a portion of the first electrically insulting layer, each said silicon riser having exposed surfaces thereon including a top surface and a width; selectively removing material from the refractory metal silicide layer and the first silicon layer to form a plurality of lower gate stacks, each said lower gate stack having a lower gate refractory metal silicide layer that is a portion of the first refractory metal silicide layer and a lower gate silicon layer that is a portion of the first silicon layer, each said silicon riser of said plurality of silicon risers projecting from a respective the lower gate stack away from the silicon substrate, each said lower gate stack of said plurality of lower gate stacks having a width greater than the width of the respective silicon riser projecting therefrom; and forming a refractory metal layer upon the exposed surfaces of each of said silicon risers including the top surfaces thereof; heating the silicon substrate sufficient to substantially react the riser silicon layer of each said silicon riser with the refractory metal layer and thereby form a second refractory metal silicide layer substantially covering exposed surfaces of each said silicon riser including the top surfaces thereof, the second refractory metal silicide making contact with the lower gate refractory metal silicide layer of the respective lower gate stack such that the first refractory metal silicide with the second refractory metal silicide surround each said silicon riser of said plurality of silicon risers.
Claim 19
Dependent Claim
176 words
A method of making a gate structure as defined in claim 16, wherein each of said lower gate stack of said plurality of lower gate stacks and the respective silicon riser projecting therefrom has a substantially rectangular cross-section, the width of the rectangular cross-section of each said lower gate stack of said plurality of lower gate stacks being greater than the width of the rectangular cross-section of the respective silicon riser projecting therefrom, and wherein each said lower gate stack and each said respective silicon riser has a thickness that is substantially the same and equal to L, the width of the cross-section of each said lower gate stack is equal to W, the height of the rectangular cross-section of each said silicon riser is equal to H, and the width of the cross-section of each said silicon riser is equal to W-(2*U), and wherein the combined end-to-end electrical resistance of the first and second refractory metal silicide layers respectively on each said lower gate stack and on each said silicon riser is equal to L/(2*(W+H-U)).
Claim 20
Dependent Claim
41 words
A method of making a gate structure as defined in claim 17, further comprising forming an active region within the silicon substrate below the gate oxide layer extending on the silicon substrate between two or more of said lower gate stacks.
Claim 21
Independent Claim
520 words
A method of making a gate structure on a silicon substrate comprising: forming a gate oxide layer on a silicon substrate; forming a first silicon layer on the gate oxide layer; forming a first refractory metal silicide layer on the first silicon layer; forming a first electrically insulating layer on the first refractory metal silicide layer; forming a second silicon layer on the first electrically insulating layer; selectively removing material from the second silicon layer and removing material from the first electrically insulating layer so as to form a plurality of silicon risers, each of said plurality of silicon risers having a riser silicon layer that is a portion of the second silicon layer and a riser oxide layer that is a portion of the first electrically insulting layer, each said silicon riser having exposed surfaces including a top surface thereon and a substantially rectangular cross-section; selectively removing material from the refractory metal silicide layer and the first silicon layer to form a plurality of lower gate stacks, each said lower gate stack having a lower gate refractory metal silicide layer that is a portion of the refractory metal silicide layer and a lower gate silicon layer that is a portion of the first silicon layer, each said silicon riser of said plurality of silicon risers projecting from a respective the lower gate stack away from the silicon substrate, each said lower gate stack of said plurality of lower gate stacks having a substantially rectangular cross-section, the width of the rectangular cross-section of each said lower gate stack of said plurality of lower gate stacks being greater than the width of the rectangular cross-section of the respective silicon riser projecting therefrom; and forming a refractory metal layer upon the exposed surfaces including the top surface of each of said silicon risers; heating the silicon substrate sufficient to substantially react the riser silicon layer of each said silicon riser with the refractory metal layer and thereby form a second refractory metal silicide layer substantially covering exposed surfaces including the top surface of each said silicon riser, the second refractory metal silicide making contact with the lower gate refractory metal silicide layer of the respective lower gate stack such that the first refractory metal silicide with the second refractory metal silicide surround each said silicon riser of said plurality of silicon risers, wherein each said lower gate stack and each said respective silicon riser has a thickness that is substantially the same and equal to L, the width of the cross-section of each said lower gate stack is equal to W, the height of the rectangular cross-section of each said silicon riser is equal to H, and the width of the cross-section of each said silicon riser is equal to W-(2*U), and wherein the combined end-to-end electrical resistance of the first and second refractory metal silicide layers respectively on each said lower gate stack and on each said silicon riser is equal to L/(2*(W+H-U)); and forming an active region within the silicon substrate below the gate oxide layer on the silicon substrate extending between two or more of said lower gate stacks.
Claim 22
Independent Claim
520 words
A method of making a gate structure on a silicon substrate comprising: forming a gate oxide layer on a silicon substrate; forming a first silicon layer on the gate oxide layer; forming a first refractory metal silicide layer on the first silicon layer; forming a first electrically insulating layer on the first refractory metal silicide layer; forming a second silicon layer on the first electrically insulating layer; selectively removing material from the second silicon layer and removing material from the first electrically insulating layer so as to form a plurality of silicon risers, each of said plurality of silicon risers having a riser silicon layer that is a portion of the second silicon layer and a riser oxide layer that is a portion of the first electrically insulting layer, each said silicon riser having exposed surfaces including a top surface thereon and a substantially rectangular cross-section; selectively removing material from the refractory metal silicide layer and the first silicon layer to form a plurality of lower gate stacks, each said lower gate stack having a lower gate refractory metal silicide layer that is a portion of the refractory metal silicide layer and a lower gate silicon layer that is a portion of the first silicon layer, each said silicon riser of said plurality of silicon risers projecting from a respective the lower gate stack away from the silicon substrate, each said lower gate stack of said plurality of lower gate stacks having a substantially rectangular cross-section, the width of the rectangular cross-section of each said lower gate stack of said plurality of lower gate stacks being greater than the width of the rectangular cross-section of the respective silicon riser projecting therefrom; and forming a refractory metal layer upon the exposed surfaces including the top surface of each of said silicon risers; heating the silicon substrate sufficient to substantially react the riser silicon layer of each said silicon riser with the refractory metal layer and thereby form a second refractory metal silicide layer substantially covering exposed surfaces including the top surface of each said silicon riser, the second refractory metal silicide making contact with the lower gate refractory metal silicide layer of the respective lower gate stack such that the first refractory metal silicide with the second refractory metal silicide surround each said silicon riser of said plurality of silicon risers, wherein each said lower gate stack and each said respective silicon riser has a thickness that is substantially the same and equal to L, the width of the cross-section of each said lower gate stack is equal to W, the height of the rectangular cross-section of each said silicon riser is equal to H, and the width of the cross-section of each said silicon riser is equal to W-(2*U), and wherein the combined end-to-end electrical resistance of the first and second refractory metal silicide layers respectively on each said lower gate stack and on each said silicon riser is equal to L/(2*(W+H-U)); and forming an active region within the silicon substrate below the gate oxide layer on the silicon substrate extending between two or more of said lower gate stacks.
References Cited (Backward Citations)
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2002-11-08 | 2003-05-10 | 2003-11-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-11-08 | 2007-05-10 | 2007-11-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-11-08 | 2011-05-10 | 2011-11-09 | $7700.00 | Window Closed / Lapsed |