Patent US5976769A successfully refreshed from Google Patents.
US5976769A
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Intermediate layer lithography
Assignee: Texas Instruments Inc
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Filing: 1996-07-12
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Granted: 1999-11-02
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Expires: 2016-07-12
Abstract
Abstract An isotropic or partially isotropic etch shrinks lithographically patterned photoresist (211, 212) to yield reduced linewidth patterned photoresist (213, 214) with a buried antireflective coating also acting as an etchstop or a sacrificial layer. The reduced linewidth pattern (213, 214) provide an etch mask for subsequent anisotropic etching of underlying material such as polysilicon (206) or metal or insulator or ferroelectric.
Inventors
- 👤 Richard Alexander Chapman
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 09:01
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/091; H; H10; H10P; H10P76/00; G02; G02B; G02B1/00; G02B1/10; G02B1/11; G03F7/26; G03F7/40; H10D; H10D64/00; H10D64/01; H10D64/013; H10D64/01302; H10D64/01304; H10D64/01326; H10P50/00; H10P50/71; H10P76/20; H10P76/204; H10P76/2041; H10P76/2043
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
113 words
A method of lithography, comprising the steps of: (a) providing a bottom layer to be patterned; (b) forming an intermediate layer over said bottom layer; (c) forming a radiation sensitive top layer over said intermediate layer; (d) patterning said top layer with radiation to form a patterned top layer; (e) removing exposed portions of said intermediate layer to form a first patterned intermediate layer under said patterned top layer; (f) laterally removing portions of said first patterned intermediate layer under said patterned top layer to form a second patterned intermediate layer under said patterned top layer; and (g) removing portions of said bottom layer using said second patterned intermediate layer as a mask.
Claim 2
Independent Claim
113 words
A method of lithography, comprising the steps of: (a) providing a bottom layer to be patterned; (b) forming an intermediate layer over said bottom layer; (c) forming a radiation sensitive top layer over said intermediate layer; (d) patterning said top layer with radiation to form a patterned top layer; (e) removing exposed portions of said intermediate layer to form a first patterned intermediate layer under said patterned top layer; (f) laterally removing portions of said first patterned intermediate layer under said patterned top layer to form a second patterned intermediate layer under said patterned top layer; and (g) removing portions of said bottom layer using said second patterned intermediate layer as a mask.
Claim 3
Dependent Claim
23 words
The method of claim 1, wherein: (a) said intermediate layer is made of TiN; and (b) said top layer is made of photoresist.
Claim 4
Dependent Claim
21 words
The method of claim 2, wherein: (a) said removing of portions of said first patterned intermediate layer is by plasma etching.
Claim 5
Dependent Claim
26 words
The method of claim 3, wherein: (a) said bottom layer is polysilicon; and (b) said removing portions of said bottom layer is by anisotropic plasma etching.
Claim 6
Independent Claim
169 words
A method of patterning, comprising the steps of: (a) providing a bottom layer to be patterned; (b) forming a bottom antireflective coating (BARC) layer on said bottom layer, said BARC layer absorptive of radiation of a first wavelength; (c) forming a photoresist layer on said BARC layer, said photoresist layer exposible by radiation with said first wavelength; (d) patterning said photoresist layer with radiation including said first wavelength to form a patterned layer of photoresist with minimum linewidth of W; (e) anisotropically etching said BARC layer using said patterned layer of photoresist to form a first patterned BARC layer with minimum linewidth of W; (f) isotropically etching said first patterned BARC layer to remove an amount ΔW from all exposed surfaces of said first patterned BARC layer in a direction along a surface of said bottom layer to form a second patterned BARC layer with minimum linewidth of W-2ΔW on said bottom layer; and (g) anisotropically etching said bottom layer using said second patterned BARC layer as etch mask.
Claim 7
Independent Claim
169 words
A method of patterning, comprising the steps of: (a) providing a bottom layer to be patterned; (b) forming a bottom antireflective coating (BARC) layer on said bottom layer, said BARC layer absorptive of radiation of a first wavelength; (c) forming a photoresist layer on said BARC layer, said photoresist layer exposible by radiation with said first wavelength; (d) patterning said photoresist layer with radiation including said first wavelength to form a patterned layer of photoresist with minimum linewidth of W; (e) anisotropically etching said BARC layer using said patterned layer of photoresist to form a first patterned BARC layer with minimum linewidth of W; (f) isotropically etching said first patterned BARC layer to remove an amount ΔW from all exposed surfaces of said first patterned BARC layer in a direction along a surface of said bottom layer to form a second patterned BARC layer with minimum linewidth of W-2ΔW on said bottom layer; and (g) anisotropically etching said bottom layer using said second patterned BARC layer as etch mask.
Claim 8
Dependent Claim
14 words
The method of claim 5, wherein: (a) said BARC layer is made of TiN.
Claim 9
Independent Claim
158 words
A method of lithography, comprising the steps of: (a) providing a bottom layer to be patterned; (b) forming a bottom antireflective coating (BARC) layer on said bottom layer, said BARC layer absorptive of radiation of a first wavelength; (c) forming a photoresist layer on said BARC layer, said photoresist layer exposible by radiation with said first wavelength; (d) patterning said photoresist layer with radiation including said first wavelength to form a patterned layer of photoresist with minimum linewidth of W; (e) anisotropically etching said BARC layer using said patterned layer of photoresist to form a patterned BARC layer with minimum linewidth of W under said patterned layer of photoresist; (f) anisotropically etching said bottom layer using said patterned BARC layer and patterned layer of photoresist as etch mask; (g) stripping said patterned layer of photoresist; and (h) removing said patterned BARC layer, whereby any residue from said stripping is lifted off with said removing said patterend BARC layer.
Claim 10
Independent Claim
158 words
A method of lithography, comprising the steps of: (a) providing a bottom layer to be patterned; (b) forming a bottom antireflective coating (BARC) layer on said bottom layer, said BARC layer absorptive of radiation of a first wavelength; (c) forming a photoresist layer on said BARC layer, said photoresist layer exposible by radiation with said first wavelength; (d) patterning said photoresist layer with radiation including said first wavelength to form a patterned layer of photoresist with minimum linewidth of W; (e) anisotropically etching said BARC layer using said patterned layer of photoresist to form a patterned BARC layer with minimum linewidth of W under said patterned layer of photoresist; (f) anisotropically etching said bottom layer using said patterned BARC layer and patterned layer of photoresist as etch mask; (g) stripping said patterned layer of photoresist; and (h) removing said patterned BARC layer, whereby any residue from said stripping is lifted off with said removing said patterend BARC layer.
Claim 11
Dependent Claim
14 words
The method of claim 5, wherein: (a) said BARC layer is made of TiN.
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