US5950082A
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US
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Transistor formation for multilevel transistors
Assignee: Advanced Micro Devices Inc
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Filing: 1996-09-30
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Granted: 1999-09-07
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Expires: 2016-09-30
Abstract
Abstract A dual level transistor and a fabrication technique for making the transistor. The dual level transistor is an integrated circuit in which a first transistor is formed on an upper surface of a global dielectric and a second transistor is formed on an upper surface of a first local substrate such that the second transistor is vertically displaced from the first transistor. The first local substrate is formed upon a first inter-substrate dielectric. By vertically displacing the first and second transistors, the lateral separation required to isolate first and second transistors in a typical single plane process is eliminated. The integrated circuit includes a semiconductor global substrate. The integrated circuit further includes a first transistor. The first transistor includes a first gate dielectric formed on an upper surface of the global substrate and a first conductive gate structure formed on an upper surface of the first dielectric. The integrated circuit further includes a first inter-substrate dielectric that is formed on the first conductive gate structure and the global substrate. A first local substrate is formed on an upper surface of the first inter-substrate dielectric. A second transistor is located within the first local substrate. The second transistor includes a second gate dielectric formed on an upper surface of the first local substrate and a second conductive gate structure formed on an upper surface of the second gate dielectric.
Inventors
- 👤 Mark I. Gardner
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 15:21
CPC Classifications
H; H10; H10D; H10D84/00; H10D84/01; H10D84/0123; H10D84/0126; H10D84/02; H10D84/03; H10D84/038; H10D88/00
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
300 words
A semiconductor process for forming an integrated circuit, wherein said process comprises: providing a global substrate, wherein said global substrate comprises a semiconductor; forming a first transistor within an active region of said global substrate, wherein said first transistor comprises a first gate dielectric formed on an upper surface of said global substrate, a first conductive gate structure formed on an upper surface of said first gate dielectric, and source/drain impurity distributions within said global substrate laterally disposed on either side of said first conductive gate structure; forming a first inter-substrate dielectric layer on said first conductive gate structure and said global substrate, wherein said first inter-substrate dielectric layer completely covers exposed upper surfaces of said first transistor and said global substrate, and wherein an entire upper surface of said first inter-substrate dielectric layer is at a substantially uniform elevation level; forming a first local substrate on an upper surface of said first inter-substrate dielectric; implanting a well impurity region, a punchthrough impurity region and a threshold adjust impurity region into the first local substrate; removing said first local substrate from above the entirety of said first transistor; and forming a second transistor within an active region of said first local substrate, wherein said second transistor comprises a second gate dielectric formed on an upper surface of said first local substrate, a second conductive gate structure formed on an upper surface of said second dielectric layer, and source/drain impurity distributions within said first local substrate laterally disposed on either side of said second conductive gate structure, such that said second transistor is vertically displaced from said first transistor, and wherein said second transistor is laterally displaced from said first transistor such that a lateral extent of said second transistor does not substantially overlap a lateral extent of said first transistor.
Claim 2
Dependent Claim
300 words
A semiconductor process for forming an integrated circuit, wherein said process comprises: providing a global substrate, wherein said global substrate comprises a semiconductor; forming a first transistor within an active region of said global substrate, wherein said first transistor comprises a first gate dielectric formed on an upper surface of said global substrate, a first conductive gate structure formed on an upper surface of said first gate dielectric, and source/drain impurity distributions within said global substrate laterally disposed on either side of said first conductive gate structure; forming a first inter-substrate dielectric layer on said first conductive gate structure and said global substrate, wherein said first inter-substrate dielectric layer completely covers exposed upper surfaces of said first transistor and said global substrate, and wherein an entire upper surface of said first inter-substrate dielectric layer is at a substantially uniform elevation level; forming a first local substrate on an upper surface of said first inter-substrate dielectric; implanting a well impurity region, a punchthrough impurity region and a threshold adjust impurity region into the first local substrate; removing said first local substrate from above the entirety of said first transistor; and forming a second transistor within an active region of said first local substrate, wherein said second transistor comprises a second gate dielectric formed on an upper surface of said first local substrate, a second conductive gate structure formed on an upper surface of said second dielectric layer, and source/drain impurity distributions within said first local substrate laterally disposed on either side of said second conductive gate structure, such that said second transistor is vertically displaced from said first transistor, and wherein said second transistor is laterally displaced from said first transistor such that a lateral extent of said second transistor does not substantially overlap a lateral extent of said first transistor.
Claim 3
Dependent Claim
40 words
The process of claim 1 wherein said global substrate comprises a p- single crystal silicon upper region formed over a p+ silicon bulk, wherein a resistivity of said p- single crystal silicon upper region is approximately equal to 10-15 Ω-cm.
Claim 4
Dependent Claim
89 words
The process of claim 1 wherein the step of forming said first transistor comprises: thermally growing an oxide film on said upper surface of said global substrate to form said first gate dielectric layer; depositing polysilicon on said first gate dielectric layer, heavily doping said polysilicon, and patterning said polysilicon to form said first conductive gate structure; and ion implanting a source/drain impurity distribution into a first pair of source/drain regions within an upper region of said global substrate laterally displaced on either side of said conductive gate structure.
Claim 5
Dependent Claim
35 words
The process of claim 3 further comprising ion implanting a first p-well impurity distribution, a first p-type punchthrough impurity distribution, and a first n-channel adjust impurity distribution into an n-channel region of said global substrate.
Claim 6
Dependent Claim
29 words
The process of claim 1 wherein the process of forming said first inter-substrate dielectric layer comprises depositing a material selected from the group consisting of oxide and silicon nitride.
Claim 7
Dependent Claim
31 words
The process of claim 1, wherein the step of forming said first local substrate comprises chemically vapor depositing a silicon bearing film at a pressure of less than approximately 2.0 torr.
Claim 8
Dependent Claim
58 words
The process of claim 6, wherein said silicon bearing film is deposited at a temperature of less than approximately 580° C. such that said first local substrate comprises amorphous silicon, and further comprising the step of annealing said amorphous silicon at a temperature of approximately 400 to 800° C. for a duration of approximately 2 to 24 hours.
Claim 9
Dependent Claim
92 words
The process of claim 1 wherein the step of forming said second transistor comprises: thermally growing an oxide film on said upper surface of said first local substrate to form said second gate dielectric layer; depositing polysilicon on said second gate dielectric layer, heavily doping said polysilicon, and patterning said polysilicon to form said second conductive gate structure; and ion implanting a source/drain impurity distribution into a second pair of source/drain regions within an upper region of said first local substrate laterally displaced on either side of said second conductive gate structure.
Claim 10
Dependent Claim
36 words
The process of claim 8 further comprising ion implanting a second p-well impurity distribution, a second p-type punchthrough impurity distribution, and a second n-channel adjust impurity distribution into an n-channel region of said first local substrate.
Claim 11
Dependent Claim
21 words
The process as recited in claim 1, wherein said forming a first inter-substrate dielectric layer comprises planarizing a deposited dielectric layer.
Claim 12
Dependent Claim
13 words
The process as recited in claim 10, wherein said planarizing comprises chemical-mechanical polishing.
Claim 13
Dependent Claim
57 words
The process as recited in claim 1, wherein said forming a second transistor further comprises making a separation between a lateral edge of said first transistor nearest said second transistor and a lateral edge of said second transistor nearest said first transistor less than or equal to an approximate lateral width of said second conductive gate structure.
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2002-09-06 | 2003-03-08 | 2003-09-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-09-06 | 2007-03-08 | 2007-09-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-09-06 | 2011-03-08 | 2011-09-07 | $7700.00 | Window Closed / Lapsed |