Projection optical system and projection exposure apparatus

Claim 2

A projection optical system that projects an image of an object in an object surface onto an image surface with a reduction magnification comprising, in light path order from said object surface: a first group of lenses with positive refractive power, said first group of lenses comprising at least two positive lenses; a second group of lenses forming an approximately afocal system, said second group of lenses comprising, in light path order from said object surface, a first subgroup of lenses with negative refractive power, said first subgroup of lenses comprising at least two negative lenses, a second subgroup of lenses with positive refractive power, said second subgroup of lenses comprising at least four positive lenses, a third subgroup of lenses with negative refractive power, said third subgroup of lenses comprising at least two negative lenses, and a fourth subgroup of lenses with positive refractive power, said fourth subgroup of lenses comprising at least two positive lenses; and a third group of lenses with positive refractive power, said third group of lenses comprising at least two positive lenses; wherein: said projection optical system has a focal length F, said projection optical system has a projection magnification B, said object surface and said image surface are separated by a distance L, a lens surface in said first group of lenses that is closest to said object surface is separated from said object surface by a distance d 0 , said first group of lenses has a focal length f 1 , said third group of lenses has a focal length f 3 , 1.8≦|F/(B·L)|, d.sub.0 /L≦0.2, and 0.80≦|f.sub.3 /f.sub.1 |≦1.5.

Claim 3

The projection optical system of claim 1, wherein: said first group of lenses has a focal length f 1 ; and 0.05≦f 1 /L≦0.3.

Claim 4

The projection optical system of claim 2, wherein: a maximum height of the object from the optical axis of said projection optical system on said object surface is represented by H MAX ; and 0.04≦H MAX /L≦0.2.

Claim 5

The projection optical system of claim 1, wherein: said first subgroup of lenses has a focal length f 21 ; said second subgroup of lenses has a focal length f 22 ; and 1.5≦|f 22 /f 21 |≦5.

Claim 6

The projection optical system of claim 4, wherein: said third subgroup of lenses has a focal length f 23 ; and 0.02≦|f 23 /L|≦0.10.

Claim 7

The projection optical system of claim 1, wherein: said first subgroup of lenses has a focal length f 21 ; said second subgroup of lenses has a focal length f 22 ; and 1.7≦|f 22 /f 21 |≦5.

Claim 8

The projection optical system of claim 1, wherein said second subgroup of lenses comprises two biconvex lenses.

Claim 9

The projection optical system of claim 6, wherein: the paraxial marginal ray from the axial object point on said object surface enters said first group of lenses at an angle of incidence u 1 ; the paraxial marginal ray from the axial object point on said object surface enters said second group of lenses at an angle of incidence u 2 ; the paraxial marginal ray from the axial object point on said object surface emerges from said second group of lenses at an angle of emergence u 2 '; the paraxial marginal ray from the axial object point on said object surface emerges from said third group of lenses at an angle of emergence u 3 '; |u 2 /u 1 |≦0.5; and |u 2 '/u 3 '|≦0.5.

Claim 10

The projection optical system of claim 8, wherein: said second group of lenses has a focal length f 2 ; said third group of lenses has a focal length f 3 ; |f 2 |>f 1 ; and |f 2 |>f 3 .

Claim 11

The projection optical system of claim 3, wherein: said first subgroup of lenses has a focal length f 21 ; said second subgroup of lenses has a focal length f 22 ; and 1.5≦|f 22 /f 21 |≦5.

Claim 12

The projection optical system of claim 10, wherein: said third group of lenses has a focal length f 23 ; and

Claim 13

02≦|f 23 /L|≦0.10.

Claim 14

02≦|f 23 /L|≦0.10.

Claim 15

The projection optical system of claim 11, wherein 1.7≦|f 22 /f 21 |≦5.

Claim 16

An exposure method for exposing a predetermined pattern formed on a mask onto a substrate by using the projection optical system according to claim 1, the method comprising the steps of: illuminating the mask in said object surface with light of a predetermined exposure wavelength; and projecting an image of said pattern formed on said mask onto said substrate in said image surface through said projection optical system.

Claim 17

The exposure method of claim 13 wherein said predetermined pattern formed on said mask is an integrated circuit pattern.

Claim 18

An exposure method for exposing a predetermined pattern formed on a mask onto a substrate by using the projection optical system according to claim 5, the method comprising the steps of: illuminating the mask in said object surface with light of a predetermined exposure wavelength; and projecting an image of said pattern formed on said mask onto said substrate in said image surface through said projection optical system.

Claim 19

The exposure method of claim 15 wherein said predetermined pattern formed on said mask is an integrated circuit pattern.

Claim 20

An exposure method for exposing a predetermined pattern formed on a mask onto a substrate by using the projection optical system according to claim 9, the method comprising the steps of: illuminating the mask in said object surface with light of a predetermined exposure wavelength; and projecting an image of said pattern formed on said mask onto said substrate in said image surface through said projection optical system.

Claim 21

The exposure method of claim 17 wherein said predetermined pattern formed on said mask is an integrated circuit pattern.

Claim 22

An exposure method for exposing a predetermined pattern formed on a mask onto a substrate by using the projection optical system according to claim 12, the method comprising the steps of: illuminating the mask in said object surface with light of a predetermined exposure wavelength; and projecting an image of said pattern formed on said mask onto said substrate in said image surface through said projection optical system.

Claim 23

The exposure method of claim 19 wherein said predetermined pattern formed on said mask is an integrated circuit pattern.

Claim 24

A projection optical system that projects an image of an object in an object surface onto an image surface with a reduction magnification comprising, in light path order from said object surface: a first group of lenses with positive refractive power, said first group of lenses comprising at least two positive lenses; a second group of lenses forming an approximately afocal system, said second group of lenses comprising, in light path order from said object surface, a first subgroup of lenses with negative refractive power, said first subgroup of lenses comprising at least two negative lenses, a second subgroup of lenses with positive refractive power, said second subgroup of lenses comprising at least four positive lenses, and a third subgroup of lenses with negative refractive power, said third subgroup of lenses comprising at least two negative lenses; and a third group of lenses with positive refractive power, said third group of lenses comprising at least two positive lenses; wherein: said projection optical system has a focal length F, said projection optical system has a projection magnification B, said object surface and said image surface are separated by a distance L, a lens surface in said first group of lenses that is closest to said object surface is separated from said object surface by a distance d 0 , said first group of lenses has a focal length f 1 , said third group of lenses has a focal length f 3 , 1.8≦|F/(B·L)|≦6, d.sub.0 /L≦0.2, and 0.80≦|f.sub.3 /f.sub.1 |≦1.5.

Claim 25

A projection optical system that projects an image of an object in an object surface onto an image surface with a reduction magnification comprising, in light path order from said object surface: a first group of lenses with positive refractive power, said first group of lenses comprising at least two positive lenses; a second group of lenses forming an approximately afocal system, said second group of lenses comprising, in light path order from said object surface, a first subgroup of lenses with negative refractive power, said first subgroup of lenses comprising at least two negative lenses, a second subgroup of lenses with positive refractive power, said second subgroup of lenses comprising at least four positive lenses, and a third subgroup of lenses with negative refractive power, said third subgroup of lenses comprising at least two negative lenses; and a third group of lenses with positive refractive power, said third group of lenses comprising at least two positive lenses; wherein: said projection optical system has a focal length F, said projection optical system has a projection magnification B, said object surface and said image surface are separated by a distance L, a lens surface in said first group of lenses that is closest to said object surface is separated from said object surface by a distance d 0 , said first group of lenses has a focal length f 1 , said third group of lenses has a focal length f 3 , 1.8≦|F/(B·L)|≦6, d.sub.0 /L≦0.2, and 0.80≦|f.sub.3 /f.sub.1 |≦1.5.

Claim 26

The projection optical system of claim 21, wherein: said first group of lenses has a focal length f 1 ; said third group of lenses has a focal length f 3 ; and 0.8≦f 3 /f 1 ≦1.2.

Claim 27

The projection optical system of claim 21, wherein said first subgroup of lenses comprises: a negative lens with its stronger curvature facing the image surface side; a negative biconcave lens; and a negative lens with its stronger curvature facing the object surface side.

Claim 28

The projection optical system of claim 23, wherein said second subgroup of lenses comprises: a positive lens with its stronger curvature facing the image surface side; at least two positive biconvex lenses; and a positive lens with its stronger curvature facing said object surface side.

Claim 29

The projection optical system of claim 24, wherein said third subgroup of lenses comprises: a negative lens with its stronger curvature facing the image surface side; a negative biconcave lens; and a negative lens with its stronger curvature facing the object surface side.

Claim 30

The projection optical system of claim 25, wherein: said second group of lenses further comprises, on the image surface side of said third subgroup of lenses, a fourth subgroup of lenses with positive refractive power; and said fourth subgroup of lenses comprises at least two positive lenses with their convex surfaces facing the image surface side.

Claim 31

The projection optical system of claim 26, wherein said first group of lenses comprises: a positive lens with its stronger curvature facing the image surface side; and a positive biconvex lens.

Claim 32

The projection optical system of claim 27, wherein said third group of lenses comprises at least three positive lenses with their convex surfaces facing the object surface side.

Claim 33

The projection optical system of claim 21, wherein said second group of lenses has weak positive refractive power.

Claim 34

The projection optical system of claim 21, wherein: said first group of lenses has a focal length f 1 ; and 0.05≦f 1 /L≦0.3.

Claim 35

The projection optical system of claim 30, wherein: said first subgroup of lenses has a focal length f 21 ; said second subgroup of lenses has a focal length f22; and 1.5≦|f 22 /f 21 |≦5.

Claim 36

The projection optical system of claim 31, wherein: said third subgroup of lenses has a focal length f 23 ; and 0.02≦|f 23 /L|≦0.10.

Claim 37

The projection optical system of claim 32, wherein: the paraxial marginal ray from the axial object point on said object surface enters said first group of lenses at an angle of incidence u 1 ; the paraxial marginal ray from the axial object point on said object surface enters said second group of lenses at an angle of incidence u 2 ; the paraxial marginal ray from the axial object point on said object surface emerges from said second group of lenses at an angle of emergence u 2 '; the paraxial marginal ray from the axial object point on said object surface emerges from said third group of lenses at an angle of emergence u 3 '; |u 2 /u 1 |≦0.5; and |u 2 '/u 3 '|≦0.5.

Claim 38

The projection optical system of claim 33, wherein: said second group of lenses has a focal length f 2 ; said third group of lenses has a focal length f 3 ; |f 2 |>f 1 ; and |f 2 |>f 3 .

Claim 39

An exposure method for exposing a predetermined pattern formed on a mask onto a substrate by using the projection optical system according to claim 31, the method comprising the steps of: illuminating the mask in said object surface with light of a predetermined exposure wavelength; and projecting an image of said pattern formed on said mask onto said substrate in said image surface through said projection optical system.

Claim 40

The exposure method of claim 35 wherein said predetermined pattern formed on said mask is an integrated circuit pattern.

Claim 41

An exposure method for exposing a predetermined pattern formed on a mask onto a substrate by using the projection optical system according to claim 21, the method comprising the steps of: illuminating the mask in said object surface with light of a predetermined exposure wavelength; and projecting an image of said pattern formed on said mask onto said substrate in said image surface through said projection optical system.

Claim 42

The exposure method of claim 37 wherein said predetermined pattern formed on said mask is an integrated circuit pattern.

Claim 43

An exposure method for exposing a predetermined pattern formed on a mask onto a substrate by using the projection optical system according to claim 26, the method comprising the steps of: illuminating the mask in said object surface with light of a predetermined exposure wavelength; and projecting an image of said pattern formed on said mask onto said substrate in said image surface through said projection optical system.

Claim 44

The exposure method of claim 39 wherein said predetermined pattern formed on said mask is an integrated circuit pattern.

Claim 45

A projection aligner comprising: an illumination system that illuminates a first object having an object surface on which a pattern is formed; a projection optical system which projects an image of said pattern onto an image surface on a second object; a first supporting unit that supports said first object; a second supporting unit that supports said second object; and said projection optical system comprising, in light path order from said object surface: a first group of lenses with positive refractive power, said first group of lenses comprising at least two positive lenses; a second group of lenses forming an approximately afocal system, said second group of lenses comprising, in light path order from said object surface, a first subgroup of lenses with negative refractive power, said first subgroup of lenses comprising at least two negative lenses, a second subgroup of lenses with positive refractive power, said second subgroup of lenses comprising at least four positive lenses, a third subgroup of lenses with negative refractive power, said third subgroup of lenses comprising at least two negative lenses, and a fourth subgroup of lenses with positive refractive power, said fourth subgroup of lenses comprising at least two positive lenses; and a third group of lenses with positive refractive power, said third group of lenses comprising at least two positive lenses; wherein: said projection optical system has a focal length F, said projection optical system has a projection magnification B, said object surface and said image surface are separated by a distance L, a lens surface in said first group of lenses that is closest to said object surface is separated from said object surface by a distance d 0 , said first group of lenses has a focal length f 1 , said third group of lenses has a focal length f 3 , 1.8≦|F/(B·L)|, d 0 /L≦0.2, and 0.80≦|f 3 /f 1 |≦1.5.

Claim 46

A projection aligner comprising: an illumination system that illuminates a first object having an object surface on which a pattern is formed; a projection optical system which projects an image of said pattern onto an image surface on a second object; a first supporting unit that supports said first object; a second supporting unit that supports said second object; and said projection optical system comprising, in light path order from said object surface: a first group of lenses with positive refractive power, said first group of lenses comprising at least two positive lenses; a second group of lenses forming an approximately afocal system, said second group of lenses comprising, in light path order from said object surface, a first subgroup of lenses with negative refractive power, said first subgroup of lenses comprising at least two negative lenses, a second subgroup of lenses with positive refractive power, said second subgroup of lenses comprising at least four positive lenses, a third subgroup of lenses with negative refractive power, said third subgroup of lenses comprising at least two negative lenses, and a fourth subgroup of lenses with positive refractive power, said fourth subgroup of lenses comprising at least two positive lenses; and a third group of lenses with positive refractive power, said third group of lenses comprising at least two positive lenses; wherein: said projection optical system has a focal length F, said projection optical system has a projection magnification B, said object surface and said image surface are separated by a distance L, a lens surface in said first group of lenses that is closest to said object surface is separated from said object surface by a distance d 0 , said first group of lenses has a focal length f 1 , said third group of lenses has a focal length f 3 , 1.8≦|F/(B·L)|, d 0 /L≦0.2, and 0.80≦|f 3 /f 1 |≦1.5.

Claim 47

The projection aligner of claim 41, wherein said first subgroup of lenses comprises: a negative lens with its stronger curvature facing the image surface side; a negative biconcave lens; and a negative lens with its stronger curvature facing the object surface side.

Claim 48

The projection aligner of claim 41, wherein the second subgroup of lenses comprises: a positive lens with its stronger curvature facing the object surface side; at least two positive biconvex lenses; and a positive lens with its stronger curvature facing the image surface side.

Claim 49

The projection aligner of claim 41, wherein said third subgroup of lenses comprises: a negative lens with its stronger curvature facing the image surface side; a negative biconcave lens; and a negative lens with its stronger curvature facing the object surface side.

Claim 50

The projection aligner of claim 41, wherein: said at least two positive lenses in said fourth subgroup of lenses have convex surfaces facing the image surface side.

Claim 51

A projection aligner comprising: an illumination system that illuminates a first object having an object surface on which a pattern is formed; a projection optical system which projects an image of said pattern onto an image surface on a second object; a first supporting unit that supports said first object; a second supporting unit that supports said second object; and said projection optical system comprising, in light path order from said object surface: a first group of lenses with positive refractive power, said first group of lenses comprising at least two positive lenses; a second group of lenses forming an approximately afocal system, said second group of lenses comprising, in light path order from said object surface, a first subgroup of lenses with negative refractive power, said first subgroup of lenses comprising at least two negative lenses, a second subgroup of lenses with positive refractive power, said second subgroup of lenses comprising at least four positive lenses, and a third subgroup of lenses with negative refractive power, said third subgroup of lenses comprising at least two negative lenses; and a third group of lenses with positive refractive power, said third group of lenses comprising at least two positive lenses; wherein: said projection optical system has a focal length F, said projection optical system has a projection magnification B, said object surface and said image surface are separated by a distance L, a lens surface in said first group of lenses that is closest to said object surface is separated from said object surface by a distance d0, said first group of lenses has a focal length f1, said third group of lenses has a focal length f3,

Claim 52

A projection aligner comprising: an illumination system that illuminates a first object having an object surface on which a pattern is formed; a projection optical system which projects an image of said pattern onto an image surface on a second object; a first supporting unit that supports said first object; a second supporting unit that supports said second object; and said projection optical system comprising, in light path order from said object surface: a first group of lenses with positive refractive power, said first group of lenses comprising at least two positive lenses; a second group of lenses forming an approximately afocal system, said second group of lenses comprising, in light path order from said object surface, a first subgroup of lenses with negative refractive power, said first subgroup of lenses comprising at least two negative lenses, a second subgroup of lenses with positive refractive power, said second subgroup of lenses comprising at least four positive lenses, and a third subgroup of lenses with negative refractive power, said third subgroup of lenses comprising at least two negative lenses; and a third group of lenses with positive refractive power, said third group of lenses comprising at least two positive lenses; wherein: said projection optical system has a focal length F, said projection optical system has a projection magnification B, said object surface and said image surface are separated by a distance L, a lens surface in said first group of lenses that is closest to said object surface is separated from said object surface by a distance d0, said first group of lenses has a focal length f1, said third group of lenses has a focal length f3,

Claim 53

8≦|F/(B·L)|≦6, d 0 /L≦0.2, and 0.80≦|f 3 /f 1 ≦1.5.

Claim 54

8≦|F/(B·L)|≦6, d 0 /L≦0.2, and 0.80≦|f 3 /f 1 ≦1.5.

Claim 55

The projection aligner of claim 46, wherein said second group of lenses further comprises, on the image surface side of said third subgroup of lenses, a fourth subgroup of lenses having positive refractive power.

Claim 56

The projection aligner of claim 47, wherein: said fourth subgroup of lenses comprises at least two positive lenses.