Patent US5888907A successfully refreshed from Google Patents.
US5888907A
Expired / Lapsed
US
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Plasma processing method
Assignee: Tokyo Electron Ltd
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Filing: 1997-04-24
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Granted: 1999-03-30
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Expires: 2017-04-24
Abstract
Abstract In a plasma etching apparatus, an inactive gas and a reactive gas are supplied from a gas spouting surface of a shower head, and are turned into plasma by means of RF discharge, so that a semiconductor wafer placed on a susceptor is etched by the plasma. The inactive gas is continuously supplied from inactive gas spouting holes formed all over the gas spouting surface. The reactive gas is supplied from reactive gas spouting holes, which are formed all over the gas spouting surface and divided into a plurality of groups, by repeatedly scanning the groups in a time-sharing manner.
Inventors
- 👤 Masayuki Tomoyasu
- 👤 Shinji Himori
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:52
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/3244; H10; H10P; H10P14/00; H10P14/60
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
140 words
A plasma etching processing method of etching a target object, using plasma, comprising the steps of: placing said target object on a work table arranged in a process chamber; supplying an inactive gas and a reactive gas into said process chamber from a gas spouting surface facing said work table, while exhausting said process chamber, such that said inactive gas is continuously supplied from a number of inactive gas spouting holes formed on said gas spouting surface, and said reactive gas is supplied from reactive gas spouting holes, which are formed on said gas spouting surface and divided into a plurality of groups, by intermittently opening and closing said groups in a time-sharing manner; turning said inactive gas and reactive gas into plasma by means of RF discharge in said process chamber; and etching said target object, using said plasma.
Claim 2
Dependent Claim
140 words
A plasma etching processing method of etching a target object, using plasma, comprising the steps of: placing said target object on a work table arranged in a process chamber; supplying an inactive gas and a reactive gas into said process chamber from a gas spouting surface facing said work table, while exhausting said process chamber, such that said inactive gas is continuously supplied from a number of inactive gas spouting holes formed on said gas spouting surface, and said reactive gas is supplied from reactive gas spouting holes, which are formed on said gas spouting surface and divided into a plurality of groups, by intermittently opening and closing said groups in a time-sharing manner; turning said inactive gas and reactive gas into plasma by means of RF discharge in said process chamber; and etching said target object, using said plasma.
Claim 3
Dependent Claim
24 words
The method according to claim 1, wherein said inactive gas spouting holes and said reactive gas spouting holes are alternately arranged in a direction.
Claim 4
Dependent Claim
21 words
The method according to claim 1, wherein said groups of said reactive gas spouting holes have an equal number of holes.
Claim 5
Dependent Claim
34 words
The method according to claim 1, wherein said groups of said reactive gas spouting holes are selected to supply said reactive gas in a sequential order relative to an arrayed order of said groups.
Claim 6
Dependent Claim
34 words
The method according to claim 1, wherein said groups of said reactive gas spouting holes are selected to supply said reactive gas in a non-sequential order relative to an arrayed order of said groups.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-03-29 | 2002-09-28 | 2003-03-30 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-03-29 | 2006-09-28 | 2007-03-30 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-03-29 | 2010-09-28 | 2011-03-30 | $7700.00 | Window Closed / Lapsed |