Chemical vapor growth apparatus

Abstract

Abstract PURPOSE:To prevent the clogging of a hole of the gas squirting-out part due to the reaction of two kinds of gas by a method wherein the titled apparatus is so constructed that the first gas is ejected out of the projection of the recess form and the second gas is ejected out of the bottom of the recess form. CONSTITUTION:The first gas squirting-out part 12 is formed in the projection of the section recess-shaped in cross section, and the bottom of the recess form is provided with the second gas quirting out part 13. The first gas A and the secong gas B are separately squirting out of respective ejections without mixing in the gas ejection part 11. Then, for example, the number of holes 16 of the first gas ejection part 12 is formed larger than that of holes 16 of the second gas quirting out part 13, thereby improving the distribution of two gases on a wafer. Thus, the first and second gases react slightly in the neighborhood of the gas ejection part 11. In other words, the amount of the first gas coming close to the second gas squirting out part 13 is approximately none, and the second gas straightly advances a fixed distance; therefore, the reaction of the two gases in the neighborhood of the gas squirting out part 11 is markedly relaxed.

Inventors

• 👤 Takahiro Ito
• 👤 隆弘 伊藤
• 👤 Yoshimi Shiotani
• 👤 喜美 塩谷
• 👤 Shinichi Inoue
• 👤 井上　信市

Bibliographic Details