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US5882823A Expired / Lapsed US ⏱️ 0.0 years remaining

Fib repair method

Assignee: GlobalFoundries Inc
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Filing: 1997-05-21
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Granted: 1999-03-16
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Expires: 2017-05-21
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Abstract

Abstract A method of repairing a defect on a substrate includes the steps of shining a beam, such as a focused ion beam, on a substrate to remove a portion of the defect and to leave a thin wall of the defect, and then providing a second removal step, such as an isotropic etch, to substantially remove the thin wall, wherein the second removal step comprises a process different from the original shining step.

Inventors

  • 👤 Timothy Edward Neary

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 20:56
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/68; G03F1/72; G03F1/74

Claims Analysis

Total Claims: 39
Claim 1
Independent Claim 70 words
A method of repairing a mask comprising the steps of: (a) providing a substrate; (b) shining a beam on a portion of said substrate to remove a portion of said substrate and to leave a portion of said substrate comprising a thin wall; and (c) providing a second removal step to substantially remove said thin wall, wherein said second removal step comprises a process different from said shining step (b).
Claim 2
Independent Claim 70 words
A method of repairing a mask comprising the steps of: (a) providing a substrate; (b) shining a beam on a portion of said substrate to remove a portion of said substrate and to leave a portion of said substrate comprising a thin wall; and (c) providing a second removal step to substantially remove said thin wall, wherein said second removal step comprises a process different from said shining step (b).
Claim 3
Dependent Claim 21 words
A method as recited in claim 1, wherein said shining step (b) comprises the step of shining a focused ion beam.
Claim 4
Dependent Claim 12 words
A method as recited in claim 2, wherein said substrate comprises quartz.
Claim 5
Dependent Claim 25 words
A method as recited in claim 3, wherein in said providing step (a) said substrate comprises a defect, said defect comprising an unwanted quartz region.
Claim 6
Dependent Claim 34 words
A method as recited in claim 4, wherein said shining step (b) comprises the step of coring out a center portion of said unwanted quartz region, said thin wall surrounding said removed center portion.
Claim 7
Dependent Claim 34 words
A method as recited in claim 4, wherein said shining step (b) comprises the step of forming a plurality of trenches in said defect to leave a plurality of thin walls in said defect.
Claim 8
Dependent Claim 40 words
A method as recited in claim 4, wherein said defect comprises a divot and wherein said shining step (b) comprises the step of shining a focused ion beam to remove quartz surrounding said divot, said thin wall surrounding said divot.
Claim 9
Dependent Claim 19 words
A method as recited in claim 1, wherein said further processing step (c) comprises isotropically etching said thin wall.
Claim 10
Dependent Claim 21 words
A method as recited in claim 1, further comprising the step of providing a conductive coating before said shining step (b).
Claim 11
Dependent Claim 38 words
A method as recited in claim 9, wherein said further processing step (c) comprises isotropically etching said thin wall while said conductive coating remains in place to protect other portions of the mask during said isotropic etching step.
Claim 12
Dependent Claim 62 words
A method as recited in claim 1, wherein in said shining step (b) said beam is directed in a first direction to provide a wall extending in said first direction, said method futher comprising after said sputtering step (b) the step of FIB sputtering said thin wall with an ion beam, said ion beam aimed at an angle to said first direction.
Claim 13
Dependent Claim 25 words
A method as recited in claim 11, wherein said substrate comprises an approximately planar surface, said first direction being perpendicular to said approximately planar surface.
Claim 14
Dependent Claim 15 words
A method as recited in claim 12, wherein said angle is greater than 30 degrees.
Claim 15
Dependent Claim 64 words
A method as recited in claim 1, wherein in said shining step (b) said beam is directed in a first direction to provide a wall extending in said first direction, wherein said second removal step (c) comprises the step of shining a beam on said thin wall, said beam aimed at an angle to said first direction, said angle being greater than 10 degrees.
Claim 16
Dependent Claim 22 words
A method as recited in claim 14, wherein in said shining steps (b) and (c) said beam is a focused ion beam.
Claim 17
Dependent Claim 15 words
A method as recited in claim 14, wherein said angle is greater than 30 degrees.
Claim 18
Independent Claim 58 words
A method of repairing a mask comprising the steps of: (a) providing a mask substrate having a defect, the substrate having a substantially planar surface, there being a normal to said planar surface; and (b) shining a beam on said defect, said beam aimed at an angle greater than 10 degrees to said normal to repair sold defect.
Claim 19
Independent Claim 58 words
A method of repairing a mask comprising the steps of: (a) providing a mask substrate having a defect, the substrate having a substantially planar surface, there being a normal to said planar surface; and (b) shining a beam on said defect, said beam aimed at an angle greater than 10 degrees to said normal to repair sold defect.
Claim 20
Dependent Claim 77 words
A method as recited in claim 17, wherein said substrate further comprises a non-transmissive layer adjacent said defect, said non-transmissive layer being on a plane, said plane being above said defect, wherein in said shining step (b) said beam is capable of damaging said substrate, and further wherein in said shining step (b) said beam is aimed on said defect at said angle to said normal to provide said damage to said substrate substantially under said layer.
Claim 21
Dependent Claim 12 words
A method as recited in claim 17, wherein said substrate comprises quartz.
Claim 22
Dependent Claim 20 words
A method as recited in claim 19, wherein said defect comprises an unwanted extension of quartz adjacent a chrome line.
Claim 23
Dependent Claim 21 words
A method as recited in claim 17, wherein said shining step (b) comprises the step of shining a focused ion beam.
Claim 24
Dependent Claim 20 words
A method as recited in claim 17, wherein in said shining step (b) said angle is greater than 30 degrees.
Claim 25
Dependent Claim 18 words
A method as recited in claim 17, further comprising after said step (b) the step of isotropically etching.
Claim 26
Dependent Claim 21 words
A method as recited in claim 17 further comprising the step of providing a conductive coating before said shining step (b).
Claim 27
Dependent Claim 37 words
A method as recited in claim 24, further comprising after said step (b) the step of isotropically etching wherein said conductive coating remains in place to protect other portions of the mask during said isotropic etching step.
Claim 28
Independent Claim 99 words
A method of repairing an alternating phase shift mask comprising the steps of: (a) providing a mask substrate having a surface, said surface comprising a first transparent region and a second transparent region, there being an optical thickness difference to provide a phase shift there between; and (b) shining a beam on said first region and on said second region to remove a portion of said substrate in said first region and in said second region, said portions of said substrate remaining retaining said optical thickness difference and said phase shift there between when said removing step is complete.
Claim 29
Independent Claim 99 words
A method of repairing an alternating phase shift mask comprising the steps of: (a) providing a mask substrate having a surface, said surface comprising a first transparent region and a second transparent region, there being an optical thickness difference to provide a phase shift there between; and (b) shining a beam on said first region and on said second region to remove a portion of said substrate in said first region and in said second region, said portions of said substrate remaining retaining said optical thickness difference and said phase shift there between when said removing step is complete.
Claim 30
Dependent Claim 44 words
A method as recited in claim 26, wherein said first region comprises a divot defect, said divot defect having a depth, and wherein in said shining step (b) said portion of said substrate in said first region being a portion surrounding said divot defect.
Claim 31
Dependent Claim 22 words
A method as recited in claim 27, wherein said shining step (b) removes said substrate surrounding said defect to approximately said depth.
Claim 32
Dependent Claim 19 words
A method as recited in claim 28, wherein said shining step (b) leaves a thin wall surrounding said defect.
Claim 33
Dependent Claim 16 words
A method as recited in claim 29, further comprising the step of removing said thin wall.
Claim 34
Dependent Claim 17 words
A method as recited in claim 30, wherein said thin wall removing step comprises an isotropic etch.
Claim 35
Dependent Claim 21 words
A method as recited in claim 26, further comprising the step of providing a conductive coating before said shining step (b).
Claim 36
Dependent Claim 37 words
A method as recited in claim 32, further comprising after said step (b) the step of isotropically etching wherein said conductive coating remains in place to protect other portions of the mask during said isotropic etching step.
Claim 37
Dependent Claim 21 words
A method as recited in claim 26, wherein said shining step (b) comprises the step of shining a focused ion beam.
Claim 38
Dependent Claim 16 words
A method as recited in claim 26, wherein said substrate being removed comprises a homogeneous material.
Claim 39
Dependent Claim 12 words
A method as recited in claim 35, wherein said material comprises quartz.

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3.5 Years (Year 4) 2002-03-15 2002-09-14 2003-03-16 $2000.00 Window Closed / Lapsed
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