US5880037A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Oxide etch process using a mixture of a fluorine-substituted hydrocarbon and acetylene that provides high selectivity to nitride and is suitable for use on surfaces of uneven topography
Assignee: Applied Materials Inc
•
Filing: 1997-10-09
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Granted: 1999-03-09
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Expires: 2017-10-09
Abstract
Abstract A method of plasma etching oxide in the presence of nitride includes contacting the oxide with a mixture of gases including one or more flourine-substituted hydrocarbon etching gases and acetylene. The method exhibits high selectivity to nitride, including nitride on uneven surfaces.
Inventors
- 👤 Paul Arleo
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 08:21
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/282; H10P50/283; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/321; H01J37/32431; H01J37/32798; H01J37/32853; H01J37/32871; H01J2237/00; H01J2237/32; H01J2237/33; H01J2237/334; H01J2237/3343; H01J2237/3346; H01J2237/3347
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
51 words
A method of plasma etching silicon oxide in the presence of silicon nitride capable of exhibiting high selectivity to silicon nitride, including silicon nitride on uneven surfaces, the method comprising: contacting the silicon oxide with a mixture of gases including a) one or more fluorine-substituted hydrocarbon etching gases; and b) acetylene.
Claim 2
Independent Claim
51 words
A method of plasma etching silicon oxide in the presence of silicon nitride capable of exhibiting high selectivity to silicon nitride, including silicon nitride on uneven surfaces, the method comprising: contacting the silicon oxide with a mixture of gases including a) one or more fluorine-substituted hydrocarbon etching gases; and b) acetylene.
Claim 3
Dependent Claim
18 words
The method of claim 1, and wherein the fluorine-substituted hydrocarbon etching gas is C 4 F 8 .
Claim 4
Dependent Claim
17 words
The method of claim 1, wherein the fluorine-substituted hydrocarbon etching gas is C 2 F 6 .
Claim 5
Dependent Claim
15 words
The method of claim 1, and wherein the mixture of gases includes an inert gas.
Claim 6
Dependent Claim
12 words
The method of claim 4, and wherein the inert gas is argon.
Claim 7
Independent Claim
82 words
A method of plasma etching silicon oxide in the presence of silicon nitride, the method having high selectivity to silicon nitride and comprising: contacting the silicon oxide with a mixture of gases including: a) one or more fluorine-substituted hydrocarbon etching gases selected from C 4 F 8 and C 2 F 6 ; and b) C 2 H 2 , and wherein the amount of C 2 H 2 mixed with the etching gas is 20-70 volume percent of the etching gas.
Claim 8
Independent Claim
82 words
A method of plasma etching silicon oxide in the presence of silicon nitride, the method having high selectivity to silicon nitride and comprising: contacting the silicon oxide with a mixture of gases including: a) one or more fluorine-substituted hydrocarbon etching gases selected from C 4 F 8 and C 2 F 6 ; and b) C 2 H 2 , and wherein the amount of C 2 H 2 mixed with the etching gas is 20-70 volume percent of the etching gas.
Claim 9
Dependent Claim
27 words
The method of claim 6, and wherein the amount of C 2 H 2 mixed with the etching gas is 30-60 volume percent of the etching gas.
Claim 10
Independent Claim
13 words
The method of 6, wherein the mixture of gases includes an inert gas.
Claim 11
Independent Claim
13 words
The method of 6, wherein the mixture of gases includes an inert gas.
Claim 12
Dependent Claim
12 words
The method of claim 7, and wherein the inert gas is argon.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2002-03-08 | 2002-09-07 | 2003-03-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-03-08 | 2006-09-07 | 2007-03-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-03-08 | 2010-09-07 | 2011-03-09 | $7700.00 | Window Closed / Lapsed |