Patent US5869851A successfully refreshed from Google Patents.
← Back to Patent Explorer
US5869851A Expired / Lapsed US ⏱️ 0.0 years remaining

Photoelectric conversion device with graded band gap and carrier concentration

Assignee: Canon Inc
•
Filing: 1997-06-03
•
Granted: 1999-02-09
•
Expires: 2017-06-03
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A photoelectric conversion device wherein, in order to realize a photoelectric conversion device with high multiplication factors and excellent response speeds even under the application of low voltage by eliminating spike and notch in the hetero junction, a light absorbing layer (404) and a carrier multiplication layer (403) are made of non-single crystalline materials, said carrier multiplication layer (403) being comprised of a plurality of layers (411 to 414) with the forbidden band width changed continuously, and wherein the difference between the Fermi level and the vacuum energy level of said carrier multiplication layer (403) in the neighborhood of hetero junction is made substantially constant.

Inventors

  • 👤 Shigetoshi Sugawa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 18:17
CPC Classifications
H; H10; H10F; H10F77/00; H10F77/10; H10F77/16; H10F77/162; H10F77/166; H10F77/1662; H10F77/1665; H10F30/00; H10F30/20; H10F30/21; H10F30/22; H10F30/225; H10F30/2255; H10F39/00; H10F39/10; H10F39/12; H10F39/18; H10F39/184; H10F39/1843; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02E10/548

Claims Analysis

Total Claims: 18
Claim 1
Independent Claim 286 words
A photoelectric conversion device comprising: a light absorbing region, made of non-monocrystalline material, for generating carriers in response to incident light; and a carrier multiplication region, made of non-monocrystalline material, said carrier multiplication region having opposed top and bottom sides spaced apart in a thickness direction of said carrier multiplication region, said carrier multiplication region being joined to said light absorbing region at said top side of said carrier multiplication region, wherein said carrier multiplication region comprises plural laminated layers, each said layer having respective opposed top and bottom sides spaced apart in said thickness direction, and each said layer, except for a top one of said layers adjacent to said light absorbing region, having its top side laminated to the bottom side of an adjacent one of said layers to form a respective heterojunction therebetween, wherein each said layer, when an electric field is applied to said device, has an energy band gap that increases gradually and continuously in a thickness direction away from said light absorbing region, each said layer being doped with a Group III element as an impurity, an impurity concentration in each said layer increasing gradually in the same direction as the increasing energy band gap so that the impurity concentration has a maximum value at a maximum energy band gap side and has a minimum value at a minimum energy band gap side, and a difference between a Fermi level and a vacuum energy level in the vicinity of each of the respective heterojunctions of said carrier multiplication region is substantially constant within in a range of 0.2 eV so that substantially no spikes and notches are formed in a valence band or a conduction band at the respective heterojunctions.
Claim 2
Dependent Claim 286 words
A photoelectric conversion device comprising: a light absorbing region, made of non-monocrystalline material, for generating carriers in response to incident light; and a carrier multiplication region, made of non-monocrystalline material, said carrier multiplication region having opposed top and bottom sides spaced apart in a thickness direction of said carrier multiplication region, said carrier multiplication region being joined to said light absorbing region at said top side of said carrier multiplication region, wherein said carrier multiplication region comprises plural laminated layers, each said layer having respective opposed top and bottom sides spaced apart in said thickness direction, and each said layer, except for a top one of said layers adjacent to said light absorbing region, having its top side laminated to the bottom side of an adjacent one of said layers to form a respective heterojunction therebetween, wherein each said layer, when an electric field is applied to said device, has an energy band gap that increases gradually and continuously in a thickness direction away from said light absorbing region, each said layer being doped with a Group III element as an impurity, an impurity concentration in each said layer increasing gradually in the same direction as the increasing energy band gap so that the impurity concentration has a maximum value at a maximum energy band gap side and has a minimum value at a minimum energy band gap side, and a difference between a Fermi level and a vacuum energy level in the vicinity of each of the respective heterojunctions of said carrier multiplication region is substantially constant within in a range of 0.2 eV so that substantially no spikes and notches are formed in a valence band or a conduction band at the respective heterojunctions.
Claim 3
Dependent Claim 19 words
The photoelectric conversion device according to claim 1, characterized in that said non-monocrystalline material contains at least silicon atoms.
Claim 4
Dependent Claim 30 words
The photoelectric conversion device according to claim 1, characterized in that said difference is held to be no more than 0.2 eV by doping impurities into said carrier multiplication region.
Claim 5
Dependent Claim 19 words
The photoelectric conversion device according to claim 1, wherein the plural layers are selected from amorphous or polycrystalline material.
Claim 6
Dependent Claim 27 words
The photoelectric conversion device according to claim 1, wherein the plural layers have a region represented as Si 1-x Ge x or Si 1-y C y .
Claim 7
Dependent Claim 22 words
The photoelectric conversion device according to claim 5, wherein said x and y is changed in a range from 0 to 0.6.
Claim 8
Dependent Claim 22 words
The photoelectric conversion device according to claim 5, wherein said Si 1-x Ge x or Si 1-y C y contains hydrogen atoms.
Claim 9
Dependent Claim 18 words
The photoelectric conversion device according to claim 1, wherein said light absorbing region is formed of amorphous silicon.
Claim 10
Dependent Claim 16 words
The photoelectric conversion device according to claim 8, wherein said light absorbing region contains hydrogen atoms.
Claim 11
Dependent Claim 13 words
A device according to claim 1, wherein the Group III element is boron.
Claim 12
Dependent Claim 53 words
The photoelectric conversion device according to claim 1, wherein a first charge injection blocking layer is provided on one side of said light absorbing region opposite said carrier multiplication region, and a second charge injection blocking layer is provided on said bottom side of said carrier multiplication region opposite said light absorbing region.
Claim 13
Dependent Claim 27 words
The photoelectric conversion device according to claim 11, wherein said first charge injection blocking layer is formed of a material expressed as Si 1-y 'C y '.
Claim 14
Dependent Claim 18 words
The photoelectric conversion device according to claim 12, wherein said first charge injection blocking layer further contains hydrogen.
Claim 15
Dependent Claim 27 words
The photoelectric conversion device according to claim 11, wherein said second charge injection blocking layer is formed of a material expressed as Si 1-x Ge x .
Claim 16
Dependent Claim 19 words
The photoelectric conversion device according to claim 14, wherein said second charge injection blocking layer further contains hydrogen atoms.
Claim 17
Dependent Claim 91 words
The photoelectric conversion device according to claim 11, wherein said first charge injection blocking layer is formed of a material expressed as Si 1-y' C y' , said second charge injection blocking layer is formed of a material expressed as Si 1-x Ge x , said carrier multiplication region being formed of a material expressed of Si 1-y C y on the side of said first charge injection blocking layer, and formed of a material expressed as Si 1-x Ge x on the side of said second charge injection blocking layer.
Claim 18
Dependent Claim 68 words
The photoelectric conversion device according to claim 1, characterized in that there are provided a plurality of said photoelectric conversion devices, and a signal output unit electrically connected to said photoelectric conversion devices comprises at least one of a storage unit for storing electrical signals produced by said photoelectric conversion devices, a scanning unit for scanning said electrical signals, and a reading unit for reading said electrical signals.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2002-02-08 2002-08-10 2003-02-09 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2006-02-08 2006-08-10 2007-02-09 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2010-02-08 2010-08-10 2011-02-09 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag