Projection optical system and exposure apparatus provided therewith

Claim 1

A projection optical system for projecting an image of a first object onto a second object, comprising: a first lens group disposed between said first object and said second object and having a positive refractive power; a second lens group disposed between said first lens group and said second object and not including a positive lens, wherein said second lens group comprises, a front lens disposed nearest to said first object, having a concave surface directed to said second object, and having a negative refractive power, a rear lens disposed nearest to said second object, having a concave surface directed to said first object, and having a negative refractive power, and an intermediate lens group disposed between said front lens in the second lens group and said rear lens in the second lens group and having at least two negative lenses; a third lens group disposed between said second lens group and said second object and having a positive refractive power; a fourth lens group disposed between said third lens group and said second object and having a negative refractive power; a fifth lens group disposed between said fourth lens group and said second object and having a positive refractive power, wherein said fifth lens group comprises at least seven positive lenses; and a sixth lens group disposed between said fifth lens group and said second object and having a positive refractive power.

Claim 32

A method for fabricating at least semiconductor devices or liquid crystal display devices, comprising the steps of: preparing a projection optical system for projecting an image of a first object onto a second object, said projection optical system comprising: a first lens group disposed between said first object and said second object and having a positive refractive power; a second lens group disposed between said first lens group and said second object and not including a positive lens, wherein said second lens group comprises, a front lens disposed nearest to said first object, having a concave surface directed to said second object, and having a negative refractive power, a rear lens disposed nearest to said second object, having a concave surface directed to said first object, and having a negative refractive power, and an intermediate lens group disposed between said front lens in the second lens group and said rear lens in the second lens group and having at least two negative lenses a third lens group disposed between said second lens group and said second object and having a positive refractive power; a fourth lens group disposed between said third lens group and said second object and having a negative refractive power; a fifth lens group disposed between said fourth lens group and said second object and having a positive refractive power, wherein said fifth lens group comprises at least seven positive lenses; and a sixth lens group disposed between said fifth lens group and said second object and having a positive refractive power, wherein said projection optical system satisfies the following conditions 0.1<f.sub.1 /f.sub.3 <17 0.05<f.sub.2 /f.sub.4 <7 0.01<f.sub.5 /L<0.9 0.02<f.sub.6 /L<1.6 1.1<f.sub.2m /f.sub.2 <9 where f 1 is a focal length of said first lens group, f 2 a focal length of said second lens croup, f 3 a focal length of said third lens group, f 4 a focal length of said fourth lens group, f 5 a focal length of said fifth lens group, f 6 a focal length of said sixth lens group, f 2m a composite focal length of the intermediate lens group in said second lens group, and L a distance from said first object to said second object, wherein said projection optical system satisfies the following condition: 1.0<I/L where I is an axial distance from said first object to a first object side focal point of the whole of said projection optical system and L the distance from said first object to said second object, wherein said first lens group comprises at least two positive lenses, said third lens group comprises at least three positive lenses, said fourth lens group comprises at least three negative lenses, said fifth lens group comprises said at least seven positive lenses and at least one negative lens, and said sixth lens group comprises at least one positive lens, wherein said fifth lens group comprises a negative meniscus lens and a first positive lens of said at least seven positive lenses disposed adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens, wherein said fifth lens group satisfies the following condition: 0<(r.sub.5p -r.sub.5n)/(r.sub.5p +r.sub.5n)<1 where r 5n is a radius of curvature of said concave surface of said negative meniscus lens in said fifth lens group and r 5p a radius of curvature of said convex surface opposed to the concave surface of said negative meniscus lens, in said first positive lens an said fifth lens group, wherein said fifth lens group comprises at least one second positive lens on the side of a convex surface of said negative meniscus lens, and wherein said fifth lens group comprises at least one third positive lens on the opposite side to said negative meniscus lens with respect to said first positive lens disposed adjacent to the concave surface of said negative meniscus lens; illuminating a mask prepared as said first object with light having a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 33

A method for fabricating at least semiconductor devices or liquid crystal display devices, comprising the steps of: preparing a projection optical system for projecting an image of a first object onto a second object, said projection optical system comprising: a first lens group disposed between said first object and said second object and having a positive refractive power; a second lens group disposed between said first lens group and said second object and not including a positive lens, wherein said second lens group comprises, a front lens disposed nearest to said first object, having a concave surface directed to said second object, and having a negative refractive power, a rear lens disposed nearest to said second object, having a concave surface directed to said first object, and having a negative refractive power, and an intermediate lens group disposed between said front lens in the second lens group and said rear lens in the second lens group and having at least two negative lenses a third lens group disposed between said second lens group and said second object and having a positive refractive power; a fourth lens group disposed between said third lens group and said second object and having a negative refractive power; a fifth lens group disposed between said fourth lens group and said second object and having a positive refractive power, wherein said fifth lens group comprises at least seven positive lenses; and a sixth lens group disposed between said fifth lens group and said second object and having a positive refractive power, wherein said projection optical system satisfies the following conditions 0.1<f.sub.1 /f.sub.3 <17 0.05<f.sub.2 /f.sub.4 <7 0.01<f.sub.5 /L<0.9 0.02<f.sub.6 /L<1.6 1.1<f.sub.2m /f.sub.2 <9 where f 1 is a focal length of said first lens group, f 2 a focal length of said second lens croup, f 3 a focal length of said third lens group, f 4 a focal length of said fourth lens group, f 5 a focal length of said fifth lens group, f 6 a focal length of said sixth lens group, f 2m a composite focal length of the intermediate lens group in said second lens group, and L a distance from said first object to said second object, wherein said projection optical system satisfies the following condition: 1.0<I/L where I is an axial distance from said first object to a first object side focal point of the whole of said projection optical system and L the distance from said first object to said second object, wherein said first lens group comprises at least two positive lenses, said third lens group comprises at least three positive lenses, said fourth lens group comprises at least three negative lenses, said fifth lens group comprises said at least seven positive lenses and at least one negative lens, and said sixth lens group comprises at least one positive lens, wherein said fifth lens group comprises a negative meniscus lens and a first positive lens of said at least seven positive lenses disposed adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens, wherein said fifth lens group satisfies the following condition: 0<(r.sub.5p -r.sub.5n)/(r.sub.5p +r.sub.5n)<1 where r 5n is a radius of curvature of said concave surface of said negative meniscus lens in said fifth lens group and r 5p a radius of curvature of said convex surface opposed to the concave surface of said negative meniscus lens, in said first positive lens an said fifth lens group, wherein said fifth lens group comprises at least one second positive lens on the side of a convex surface of said negative meniscus lens, and wherein said fifth lens group comprises at least one third positive lens on the opposite side to said negative meniscus lens with respect to said first positive lens disposed adjacent to the concave surface of said negative meniscus lens; illuminating a mask prepared as said first object with light having a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 41

A method for fabricating at least semiconductor devices or liquid crystal display devices, comprising the steps of: preparing a projection optical system for projecting an image of a first object onto a second object, said projection optical system comprising: a first lens group disposed between said first object and said second object and having a positive refractive power; a second lens group disposed between said first lens group and said second object and not including a positive lens, wherein said second lens group comprises, a front lens disposed nearest to said first object, having a concave surface directed to said second object, and having a negative refractive power, a rear lens disposed nearest to said second object, having a concave surface directed to said first object, and having a negative refractive power, and an intermediate lens group disposed between said front lens in the second lens group and said rear lens in the second lens group and having at least two negative lenses; a third lens group disposed between said second lens group and said second object and having a positive refractive power; a fourth lens group disposed between said third lens group and said second object and having a negative refractive power; a fifth lens group disposed between said fourth lens group and said second object and having a positive refractive power, wherein said fifth lens group comprises at least seven positive lenses; and a sixth lens group disposed between said fifth lens group and said second object and having a positive refractive power, wherein said projection optical system satisfies the following conditions: 0.1<f.sub.1 /f.sub.3 <17 0.05<f.sub.2 /f.sub.4 <7 0.01<f.sub.5 /L<0.9 0.02<f.sub.6 /L<1.6 1.1<f.sub.2m /f.sub.2, <9 wherein f 1 , is a Local length of said first lens group, f 2 a focal length of said second lens group, f 3 a focal length of said third lens group, f 4 a focal length of said fourth length group, f 5 a focal length of said fifth lens group, f 6 a focal length of said sixth lens group, f 2m a composite focal length of the intermediate lens group in said second lens group, and L a distance from said first object to said second object, wherein said fifth lens group comprises a negative lens disposed nearest to said second object and having a concave surface directed to said second object, and wherein said sixth lens group satisfies the following condition: 0.50<d.sub.6 /r.sub.6f <1.50 where r 6f is a radius of curvature of a lens surface nearest to the first object in said sixth lens group and d 6 an axial distance from the lens surface nearest to the first object in said sixth lens group to the second object; illuminating a mask prepared as said first object with light having a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 42

A method for fabricating at least semiconductor devices or liquid crystal display devices, comprising the steps of: preparing a projection optical system for projecting an image of a first object onto a second object, said projection optical system comprising: a first lens group disposed between said first object and said second object and having a positive refractive power; a second lens group disposed between said first lens group and said second object and not including a positive lens, wherein said second lens group comprises, a front lens disposed nearest to said first object, having a concave surface directed to said second object, and having a negative refractive power, a rear lens disposed nearest to said second object, having a concave surface directed to said first object, and having a negative refractive power, and an intermediate lens group disposed between said front lens in the second lens group and said rear lens in the second lens group and having at least two negative lenses; a third lens group disposed between said second lens group and said second object and having a positive refractive power; a fourth lens group disposed between said third lens group and said second object and having a negative refractive power; a fifth lens group disposed between said fourth lens group and said second object and having a positive refractive power, wherein said fifth lens group comprises at least seven positive lenses; and a sixth lens group disposed between said fifth lens group and said second object and having a positive refractive power, wherein said projection optical system satisfies the following conditions: 0.1<f.sub.1 /f.sub.3 <17 0.05<f.sub.2 /f.sub.4 <7 0.01<f.sub.5 /L<0.9 0.02<f.sub.6 /L<1.6 1.1<f.sub.2m /f.sub.2, <9 wherein f 1 , is a Local length of said first lens group, f 2 a focal length of said second lens group, f 3 a focal length of said third lens group, f 4 a focal length of said fourth length group, f 5 a focal length of said fifth lens group, f 6 a focal length of said sixth lens group, f 2m a composite focal length of the intermediate lens group in said second lens group, and L a distance from said first object to said second object, wherein said fifth lens group comprises a negative lens disposed nearest to said second object and having a concave surface directed to said second object, and wherein said sixth lens group satisfies the following condition: 0.50<d.sub.6 /r.sub.6f <1.50 where r 6f is a radius of curvature of a lens surface nearest to the first object in said sixth lens group and d 6 an axial distance from the lens surface nearest to the first object in said sixth lens group to the second object; illuminating a mask prepared as said first object with light having a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 50

A method for fabricating at least semiconductor devices or liquid crystal display devices, comprising the steps of: preparing a projection optical system for protecting an image of a first object onto a second object, said projection optical system comprising: a first lens group disposed between said first object and said second object and having a positive refractive power; a second lens group disposed between said first lens group and said second object and not including a positive lens, wherein said second lens group comprises, a front lens disposed nearest to said first object, having a concave surface directed to said second object, and having a negative refractive power, a rear lens disposed nearest to said second object, having a concave surface directed to said first object, and having a negative refractive power, and an intermediate lens group disposed between said front lens in the second lens group and said rear lens in the second lens group and having at least two negative lenses; a third lens group disposed between said second lens group and said second object and having a positive refractive power; a fourth lens group disposed between said third lens group and said second object and having a negative refractive power; a fifth lens group disposed between said fourth lens group and said second object and having a positive refractive power, wherein said fifth lens group comprises at least seven positive lenses; and a sixth lens group disposed between said fifth lens group and said second object and having a positive refractive power; illuminating a mask prepared as said first object with light having a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 51

A method for fabricating at least semiconductor devices or liquid crystal display devices, comprising the steps of: preparing a projection optical system for protecting an image of a first object onto a second object, said projection optical system comprising: a first lens group disposed between said first object and said second object and having a positive refractive power; a second lens group disposed between said first lens group and said second object and not including a positive lens, wherein said second lens group comprises, a front lens disposed nearest to said first object, having a concave surface directed to said second object, and having a negative refractive power, a rear lens disposed nearest to said second object, having a concave surface directed to said first object, and having a negative refractive power, and an intermediate lens group disposed between said front lens in the second lens group and said rear lens in the second lens group and having at least two negative lenses; a third lens group disposed between said second lens group and said second object and having a positive refractive power; a fourth lens group disposed between said third lens group and said second object and having a negative refractive power; a fifth lens group disposed between said fourth lens group and said second object and having a positive refractive power, wherein said fifth lens group comprises at least seven positive lenses; and a sixth lens group disposed between said fifth lens group and said second object and having a positive refractive power; illuminating a mask prepared as said first object with light having a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 53

A method for fabricating at least semiconductor devices or liquid crystal display devices, comprising the steps of: preparing a projection optical system for projecting an image of a first object onto a second object, said projection optical system comprising: a first lens group disposed between said first object and said second object and having a positive refractive power; a second lens group disposed between said first lens group and said second object and not including a positive lens, wherein said second lens group comprises, a front lens disposed nearest to said first object, having a concave surface directed to said second object, and having a negative refractive power, a rear lens disposed nearest to said second object, having a concave surface directed to said first object, and having a negative refractive power, and an intermediate lens group disposed between said front lens in the second lens group and said rear lens in the second lens group and having at least two negative lenses; a third lens group disposed between said second lens group and said second object and having a positive refractive power; a fourth lens group disposed between said third lens group and said second object and having a negative refractive power; a fifth lens group disposed between said fourth lens group and having a positive refractive power, wherein said fifth lens group comprises at least seven positive lenses; and a sixth lens group disposed between said fifth lens group and said second object and having a positive refractive power, wherein said projection optical system satisfies the following conditions: 0.1<f.sub.1 /f.sub.3 <17 0.05<f.sub.2 /f.sub.4 <7 0.01<f.sub.5 /L<0.9 0.02<f.sub.6 /L<1.6 1.1<f.sub.2m /f.sub.2 <9 where f 1 is a focal length of said first lens group, f 2 a focal length of said second lens group, f 3 a focal length of said third lens group, f 4 a focal length of said fourth lens group, f 5 a focal length of said fifth lens group, f 6 a focal length of said sixth lens group, f 2m a composite focal length of the intermediate lens group in said second lens group, and L a distance from said first object to said second object to said object; illuminating a mask prepared as said first object with light having a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 54

A method for fabricating at least semiconductor devices or liquid crystal display devices, comprising the steps of: preparing a projection optical system for projecting an image of a first object onto a second object, said projection optical system comprising: a first lens group disposed between said first object and said second object and having a positive refractive power; a second lens group disposed between said first lens group and said second object and not including a positive lens, wherein said second lens group comprises, a front lens disposed nearest to said first object, having a concave surface directed to said second object, and having a negative refractive power, a rear lens disposed nearest to said second object, having a concave surface directed to said first object, and having a negative refractive power, and an intermediate lens group disposed between said front lens in the second lens group and said rear lens in the second lens group and having at least two negative lenses; a third lens group disposed between said second lens group and said second object and having a positive refractive power; a fourth lens group disposed between said third lens group and said second object and having a negative refractive power; a fifth lens group disposed between said fourth lens group and having a positive refractive power, wherein said fifth lens group comprises at least seven positive lenses; and a sixth lens group disposed between said fifth lens group and said second object and having a positive refractive power, wherein said projection optical system satisfies the following conditions: 0.1<f.sub.1 /f.sub.3 <17 0.05<f.sub.2 /f.sub.4 <7 0.01<f.sub.5 /L<0.9 0.02<f.sub.6 /L<1.6 1.1<f.sub.2m /f.sub.2 <9 where f 1 is a focal length of said first lens group, f 2 a focal length of said second lens group, f 3 a focal length of said third lens group, f 4 a focal length of said fourth lens group, f 5 a focal length of said fifth lens group, f 6 a focal length of said sixth lens group, f 2m a composite focal length of the intermediate lens group in said second lens group, and L a distance from said first object to said second object to said object; illuminating a mask prepared as said first object with light having a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 78

A method for fabricating at least semiconductor devices or liquid crystal display devices, comprising the steps of: preparing a projection optical system for projecting an image of a first object onto a second object, said projection optical system comprising: a first lens group disposed between said first object and said second object and having a positive refractive power; a second lens group disposed between said first lens group and said second object and not including a positive lens, wherein said second lens group comprises, a front lens disposed nearest to said first object, having a concave surface directed to said second object, and having a negative refractive power, a rear lens disposed nearest to said second object, having a concave surface directed to said first object, and having a negative refractive power, and an intermediate lens group disposed between said front lens in the second lens group and said rear lens in the second lens group and having at least two negative lenses; a third lens group disposed between said second lens group and said second object and having a positive refractive power; a fourth lens group disposed between said third lens group and said second object and having a negative refractive power; a fifth lens group disposed between said fourth lens group and said second object and having a positive refractive power; and a sixth lens group disposed between said fifth lens group and said second object and having a positive refractive power, wherein said fourth lens group comprises a biconcave lens, a first negative lens disposed on said first object side of said biconcave lens and having a concave surface directed to said second object, and a second negative lens disposed on said second object side of said biconcave lens and having a concave surface directed to said first object, and wherein said fifth lens group comprises a negative meniscus lens and a first positive lens disposed adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens; illuminating a mask prepared as said first object with light having a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 79

A method for fabricating at least semiconductor devices or liquid crystal display devices, comprising the steps of: preparing a projection optical system for projecting an image of a first object onto a second object, said projection optical system comprising: a first lens group disposed between said first object and said second object and having a positive refractive power; a second lens group disposed between said first lens group and said second object and not including a positive lens, wherein said second lens group comprises, a front lens disposed nearest to said first object, having a concave surface directed to said second object, and having a negative refractive power, a rear lens disposed nearest to said second object, having a concave surface directed to said first object, and having a negative refractive power, and an intermediate lens group disposed between said front lens in the second lens group and said rear lens in the second lens group and having at least two negative lenses; a third lens group disposed between said second lens group and said second object and having a positive refractive power; a fourth lens group disposed between said third lens group and said second object and having a negative refractive power; a fifth lens group disposed between said fourth lens group and said second object and having a positive refractive power; and a sixth lens group disposed between said fifth lens group and said second object and having a positive refractive power, wherein said fourth lens group comprises a biconcave lens, a first negative lens disposed on said first object side of said biconcave lens and having a concave surface directed to said second object, and a second negative lens disposed on said second object side of said biconcave lens and having a concave surface directed to said first object, and wherein said fifth lens group comprises a negative meniscus lens and a first positive lens disposed adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens; illuminating a mask prepared as said first object with light having a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 81

A method for fabricating at least semiconductor devices or liquid crystal display devices, comprising the steps of: preparing a projection optical system for protecting an image of a first object onto a second object, said projection optical system comprising: a first lens group disposed between said first object and said second object and having a positive refractive power; a second lens group disposed between said first lens group and said second object and not including a positive lens, wherein said second lens group comprises, a front lens disposed nearest to said first object, having a concave surface directed to said second object, and having a negative refractive power, a rear lens disposed nearest to said second object, having a concave surface directed to said first object, and having a negative refractive power, and an intermediate lens group disposed between said front lens in the second lens group and said rear lens in the second lens group and having at least two negative lenses; a third lens group disposed between said second lens group and said second object and having a positive refractive power; a fourth lens group disposed between said third lens group and said second object and having a negative refractive power; a fifth lens group disposed between said fourth lens group and said second object and having a positive refractive power; and a sixth lens group disposed between said fifth lens group and said second object and having a positive refractive power, wherein said fourth lens group comprises a biconcave lens, a first negative lens disposed on said first object side of said biconcave lens and having a concave surface directed to said second object, and a second negative lens disposed on said second object side of said biconcave lens and having a concave surface directed to said first object, and wherein said fifth lens group comprises a negative meniscus lens and a first positive lens disposed adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens, wherein said fifth lens group satisfies the following condition: 0<(r.sub.5p -r.sub.5n)/(r.sub.5p +r.sub.5n)<1 where r 5n is a radius of curvature of said concave surface of said negative meniscus lens in said fifth lens group and r 5p a radius of curvature of said convex surface opposed to the concave surface of said negative meniscus lens, in said first positive lens in said fifth lens group, wherein said fifth lens group comprises at least one second positive lens on the side of a convex surface of said negative meniscus lens, wherein said fifth lens group comprises at least one third positive lens on the opposite side to said negative meniscus lens with respect to said first positive lens disposed adjacent to the concave surface of said negative meniscus lens, wherein said projection optical system satisfies the following conditions: 0.1<f.sub.1 /f.sub.3 <17 0.05<f.sub.2 /f.sub.4 <7 0.01<f.sub.5 /L<0.9 0.02<f.sub.6 /L<1.6 1.1<f.sub.2m /f.sub.2 <9 where f 1 is a focal length of said first lens group, f 2 a focal length of said second lens group, f 3 a focal length of said third lens group, f 4 a focal length of said fourth lens group, f 5 a focal length of said fifth lens group, f 2m a focal length of said sixth lens group, f 2 a composite focal length of the intermediate lens group in said second lens group, and L a distance from said first object to said second object, wherein said projection optical system satisfies the following condition; 1.0<I/L where I is an axial distance from said first object to a first object side focal point of the whole of said projection optical system and L the distance from said first object to said second object, wherein said fifth lens group comprises a negative lens disposed nearest to said second object and having a concave surface directed to said second object, wherein said sixth lens group satisfies the following condition: 0.50<d.sub.6 /r.sub.6F <1.50 where r 6F is a radius of curvature of a lens surface nearest to the first object in said sixth lens group and d 6 an axial distance from the lens surface nearest to the first object in said sixth lens group to the second object, and wherein said fifth lens group satisfies the following condition: 0.30<(r.sub.5F -r.sub.5R)/(r.sub.5F +r.sub.5R)<1.28 where r 5F is a radius of curvature of a first-object-side lens surface of said negative lens disposed nearest to said second object an said fifth lens group and r 5R a radius of curvature of the second-object-side lens surface of said negative lens disposed nearest to said second object in said fifth lens group illuminating a mask prepared as said first object with light having a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 82

A method for fabricating at least semiconductor devices or liquid crystal display devices, comprising the steps of: preparing a projection optical system for protecting an image of a first object onto a second object, said projection optical system comprising: a first lens group disposed between said first object and said second object and having a positive refractive power; a second lens group disposed between said first lens group and said second object and not including a positive lens, wherein said second lens group comprises, a front lens disposed nearest to said first object, having a concave surface directed to said second object, and having a negative refractive power, a rear lens disposed nearest to said second object, having a concave surface directed to said first object, and having a negative refractive power, and an intermediate lens group disposed between said front lens in the second lens group and said rear lens in the second lens group and having at least two negative lenses; a third lens group disposed between said second lens group and said second object and having a positive refractive power; a fourth lens group disposed between said third lens group and said second object and having a negative refractive power; a fifth lens group disposed between said fourth lens group and said second object and having a positive refractive power; and a sixth lens group disposed between said fifth lens group and said second object and having a positive refractive power, wherein said fourth lens group comprises a biconcave lens, a first negative lens disposed on said first object side of said biconcave lens and having a concave surface directed to said second object, and a second negative lens disposed on said second object side of said biconcave lens and having a concave surface directed to said first object, and wherein said fifth lens group comprises a negative meniscus lens and a first positive lens disposed adjacent to a concave surface of said negative meniscus lens and having a convex surface opposed to the concave surface of said negative meniscus lens, wherein said fifth lens group satisfies the following condition: 0<(r.sub.5p -r.sub.5n)/(r.sub.5p +r.sub.5n)<1 where r 5n is a radius of curvature of said concave surface of said negative meniscus lens in said fifth lens group and r 5p a radius of curvature of said convex surface opposed to the concave surface of said negative meniscus lens, in said first positive lens in said fifth lens group, wherein said fifth lens group comprises at least one second positive lens on the side of a convex surface of said negative meniscus lens, wherein said fifth lens group comprises at least one third positive lens on the opposite side to said negative meniscus lens with respect to said first positive lens disposed adjacent to the concave surface of said negative meniscus lens, wherein said projection optical system satisfies the following conditions: 0.1<f.sub.1 /f.sub.3 <17 0.05<f.sub.2 /f.sub.4 <7 0.01<f.sub.5 /L<0.9 0.02<f.sub.6 /L<1.6 1.1<f.sub.2m /f.sub.2 <9 where f 1 is a focal length of said first lens group, f 2 a focal length of said second lens group, f 3 a focal length of said third lens group, f 4 a focal length of said fourth lens group, f 5 a focal length of said fifth lens group, f 2m a focal length of said sixth lens group, f 2 a composite focal length of the intermediate lens group in said second lens group, and L a distance from said first object to said second object, wherein said projection optical system satisfies the following condition; 1.0<I/L where I is an axial distance from said first object to a first object side focal point of the whole of said projection optical system and L the distance from said first object to said second object, wherein said fifth lens group comprises a negative lens disposed nearest to said second object and having a concave surface directed to said second object, wherein said sixth lens group satisfies the following condition: 0.50<d.sub.6 /r.sub.6F <1.50 where r 6F is a radius of curvature of a lens surface nearest to the first object in said sixth lens group and d 6 an axial distance from the lens surface nearest to the first object in said sixth lens group to the second object, and wherein said fifth lens group satisfies the following condition: 0.30<(r.sub.5F -r.sub.5R)/(r.sub.5F +r.sub.5R)<1.28 where r 5F is a radius of curvature of a first-object-side lens surface of said negative lens disposed nearest to said second object an said fifth lens group and r 5R a radius of curvature of the second-object-side lens surface of said negative lens disposed nearest to said second object in said fifth lens group illuminating a mask prepared as said first object with light having a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 89

A method for fabricating at least semiconductor devices or liquid crystal display devices, comprising the steps of: preparing a projection optical system for projecting an image of a first object onto a second object, said projection optical system comprising: a first lens group disposed between said first object and said second object and having a positive refractive power; a second lens group disposed between said first lens group and said second object and not including a positive lens, wherein said second lens group comprises, a front lens disposed nearest to said first object, having a concave surface directed to said second object, and having a negative refractive power, a rear lens disposed nearest to said second object, having a concave surface directed to said first object, and having a negative refractive power, and an intermediate lens group disposed between said front lens in said second lens group and said rear lens in said second lens group and having at least two negative lenses; a third lens group disposed between said second lens group and said second object and having a positive refractive power; a fourth lens group disposed between said third lens group and said second object and having a negative refractive power; a fifth lens group disposed between said fourth lens group and said second object and having a positive refractive power; and a sixth lens group disposed between said fifth lens group and said second object and having a positive refractive power; wherein said fourth lens group comprises a biconcave lens, a first negative lens disposed on said first object side of said biconcave lens and having a concave surface directed to said second object, and a second negative lens disposed on said second object side of said biconcave lens and having a concave surface directed to said first object, wherein said fifth lens group comprises a negative lens disposed nearest to said second object and having a concave surface directed to said second object, and wherein said fifth lens group satisfies the following condition: 0.30<(r.sub.5F -r.sub.5R)/(r.sub.5F +r.sub.5R)<1.28 where r 5F is a radius of curvature of a first-object-side-lens surface of said negative lens disposed nearest to said second object in said fifth lens group and r 5R a radius of curvature of the second-object-side lens surface of said negative lens disposed nearest to said second object in said fifth lens group illuminating a mask prepared as said first object with light having a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.

Claim 90

A method for fabricating at least semiconductor devices or liquid crystal display devices, comprising the steps of: preparing a projection optical system for projecting an image of a first object onto a second object, said projection optical system comprising: a first lens group disposed between said first object and said second object and having a positive refractive power; a second lens group disposed between said first lens group and said second object and not including a positive lens, wherein said second lens group comprises, a front lens disposed nearest to said first object, having a concave surface directed to said second object, and having a negative refractive power, a rear lens disposed nearest to said second object, having a concave surface directed to said first object, and having a negative refractive power, and an intermediate lens group disposed between said front lens in said second lens group and said rear lens in said second lens group and having at least two negative lenses; a third lens group disposed between said second lens group and said second object and having a positive refractive power; a fourth lens group disposed between said third lens group and said second object and having a negative refractive power; a fifth lens group disposed between said fourth lens group and said second object and having a positive refractive power; and a sixth lens group disposed between said fifth lens group and said second object and having a positive refractive power; wherein said fourth lens group comprises a biconcave lens, a first negative lens disposed on said first object side of said biconcave lens and having a concave surface directed to said second object, and a second negative lens disposed on said second object side of said biconcave lens and having a concave surface directed to said first object, wherein said fifth lens group comprises a negative lens disposed nearest to said second object and having a concave surface directed to said second object, and wherein said fifth lens group satisfies the following condition: 0.30<(r.sub.5F -r.sub.5R)/(r.sub.5F +r.sub.5R)<1.28 where r 5F is a radius of curvature of a first-object-side-lens surface of said negative lens disposed nearest to said second object in said fifth lens group and r 5R a radius of curvature of the second-object-side lens surface of said negative lens disposed nearest to said second object in said fifth lens group illuminating a mask prepared as said first object with light having a predetermined wavelength, said mask being formed a predetermined pattern thereon; and projecting an image of the pattern on said mask onto a photosensitive substrate prepared as said second object through said projection optical system, thereby performing an exposure process.