Patent US5822043A successfully refreshed from Google Patents.
US5822043A
Expired / Lapsed
US
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Exposure method and projection exposure apparatus using the same
Assignee: Canon Inc
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Filing: 1994-11-03
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Granted: 1998-10-13
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Expires: 2014-11-03
Abstract
Abstract An exposure method includes the steps of illuminating an original with exposure light having a size b with respect to a scan direction, and projecting a pattern of the illuminated original onto a substrate with a projection magnification N op , and scanning the original and the substrate In the scan direction at a speed ratio N st different from the projection magnification N op wherein the speed ratio N st corresponds to the ratio between the speed of the substrate and the speed of the original and, when the minimum linewidth of an image of the pattern with respect to the scan direction is denoted by Δl. a relation 0<|N op -N st |·b<Δl is satisfied.
Inventors
- 👤 Ryuichi Ebinuma
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 13:45
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70358; G03F9/00; G03F9/70
Claims Analysis
Total Claims: 55
Claim 1
Independent Claim
118 words
An exposure method, comprising the steps of: illuminating an original with exposure light having a size b with respect to a scan direction, and projecting a pattern of the illuminated original onto a substrate with a projection magnification N op ; and scanning the original and the substrate in the scan direction at a speed ratio N st different from the projection magnification N op , wherein the speed ratio N st corresponds to the ratio between the speed of the substrata and the speed of the original and, when the minimum linewidth of an image of the pattern with respect to the scan direction is denoted by Δl, a relation 0<|N op -N st |·b<Δl is satisfied.
Claim 2
Dependent Claim
118 words
An exposure method, comprising the steps of: illuminating an original with exposure light having a size b with respect to a scan direction, and projecting a pattern of the illuminated original onto a substrate with a projection magnification N op ; and scanning the original and the substrate in the scan direction at a speed ratio N st different from the projection magnification N op , wherein the speed ratio N st corresponds to the ratio between the speed of the substrata and the speed of the original and, when the minimum linewidth of an image of the pattern with respect to the scan direction is denoted by Δl, a relation 0<|N op -N st |·b<Δl is satisfied.
Claim 3
Dependent Claim
22 words
A method according to claim 1, wherein said illuminating step includes changing the size b of the exposure light during the scan.
Claim 4
Dependent Claim
28 words
A method according to claim 1, wherein said illuminating step includes changing an intensity distribution of the exposure light with respect to the scan direction, during the scan.
Claim 5
Dependent Claim
20 words
A method according to claim 1, wherein said scanning step includes changing the speed ratio N st during the scan.
Claim 6
Dependent Claim
20 words
A method according to claim 4, wherein said projecting step includes changing the projection magnification N op during the scan.
Claim 7
Dependent Claim
22 words
A method according to claim 4, wherein said illuminating step includes changing the size b of the exposure light during the scan.
Claim 8
Dependent Claim
28 words
A method according to claim 4, wherein said illuminating step includes changing an intensity distribution of the exposure light with respect to the scan direction, during the scan.
Claim 9
Dependent Claim
22 words
A method according to claim 5, wherein said illuminating step includes changing the size b of the exposure light during the scan.
Claim 10
Dependent Claim
28 words
A method according to claim 5, wherein said illuminating step includes changing an intensity distribution of the exposure light with respect to the scan direction, during the scan.
Claim 11
Dependent Claim
20 words
A method according to claim 1, wherein said projecting step includes changing the projection magnification N op during the scan.
Claim 12
Dependent Claim
22 words
A method according to claim 10, wherein said illuminating step includes changing the size b of the exposure light during the scan.
Claim 13
Dependent Claim
28 words
A method according to claim 10, wherein said illuminating step includes changing an intensity distribution of the exposure light with respect to the scan direction, during the scan.
Claim 14
Dependent Claim
16 words
A method according to claim 1, wherein a relation |N op -N st |·b<0.72·Δl is satisfied.
Claim 15
Dependent Claim
49 words
A method according to claim 1, further comprising discriminating whether a relation |N op -N st |·b<Δl is satisfied and discontinuing the scanning exposure when the relation is not satisfied, wherein said discriminating step and said discontinuing step are carried out before said illuminating step and said scanning step.
Claim 16
Dependent Claim
78 words
An exposure method, comprising the steps of: illuminating an original with exposure light and projecting, by a projection optical system, a pattern of the illuminated original onto a substrate with a projection magnification of the projection optical system; scanning the original and the substrate in a scan direction; and changing the projection magnification during the scan, by adjusting the projection optical system, so that an image of the pattern is superposed on a pattern region on the substrate.
Claim 17
Dependent Claim
78 words
An exposure method, comprising the steps of: illuminating an original with exposure light and projecting, by a projection optical system, a pattern of the illuminated original onto a substrate with a projection magnification of the projection optical system; scanning the original and the substrate in a scan direction; and changing the projection magnification during the scan, by adjusting the projection optical system, so that an image of the pattern is superposed on a pattern region on the substrate.
Claim 18
Dependent Claim
28 words
A method according to claim 15, wherein said scanning step includes changing a ratio between a scan speed of the original and a scan speed of the substrate.
Claim 19
Dependent Claim
122 words
A projection exposure apparatus comprising: illuminating means for illuminating an original with exposure light having a size b with respect to a scan direction, and projecting a pattern of the illuminated original onto a substrate with a projection magnification N op ; and scanning means for scanning the original and the substrate in the scan direction at a speed ratio N st different from the projection magnification N op , wherein the speed ratio N st corresponds to the ratio between the speed of the substrate and the speed of the original and, when the minimum linewidth of an image of the pattern with respect to the scan direction is denoted by Δl, a relation 0<|N op -N st |·b<Δl is satisfied.
Claim 20
Dependent Claim
122 words
A projection exposure apparatus comprising: illuminating means for illuminating an original with exposure light having a size b with respect to a scan direction, and projecting a pattern of the illuminated original onto a substrate with a projection magnification N op ; and scanning means for scanning the original and the substrate in the scan direction at a speed ratio N st different from the projection magnification N op , wherein the speed ratio N st corresponds to the ratio between the speed of the substrate and the speed of the original and, when the minimum linewidth of an image of the pattern with respect to the scan direction is denoted by Δl, a relation 0<|N op -N st |·b<Δl is satisfied.
Claim 21
Dependent Claim
24 words
An apparatus according to claim 17, wherein said illuminating means comprises means for changing the size b of the exposure light during the scan.
Claim 22
Dependent Claim
30 words
An apparatus according to claim 17, wherein said illuminating means comprises means for changing an intensity distribution of the exposure light with respect to the scan direction, during the scan.
Claim 23
Dependent Claim
22 words
An apparatus according to claim 17 wherein said scanning means comprises means for changing the speed ratio N st during the scan.
Claim 24
Dependent Claim
22 words
An apparatus according to claim 20, wherein said projecting means comprises means for changing the projection magnification N op during the scan.
Claim 25
Dependent Claim
24 words
An apparatus according to claim 20, wherein said illuminating means comprises means for changing the size b of the exposure light during the scan.
Claim 26
Dependent Claim
30 words
An apparatus according to claim 20, wherein said illuminating means comprises means for changing an intensity distribution of the exposure light with respect to the scan direction, during the scan.
Claim 27
Dependent Claim
24 words
An apparatus according to claim 21, wherein said illuminating means comprises means for changing the size b of the exposure light during the scan.
Claim 28
Dependent Claim
30 words
An apparatus according to claim 21, wherein said illuminating means comprises means for changing an intensity distribution of the exposure light with respect to the scan direction, during the scan.
Claim 29
Dependent Claim
22 words
An apparatus according to claim 17, wherein said projecting means comprises means for changing the projection magnification N op during the scan.
Claim 30
Dependent Claim
24 words
An apparatus according to claim 26, wherein said illuminating means comprises means for changing the size b of the exposure light during the scan.
Claim 31
Dependent Claim
30 words
An apparatus according to claim 26, wherein said illuminating means comprises means for changing an intensity distribution of the exposure light with respect to the scan direction, during the scan.
Claim 32
Dependent Claim
16 words
An apparatus according to claim 17, wherein a relation |N op -N st |·b<0.72·Δl is satisfied.
Claim 33
Dependent Claim
54 words
An apparatus according to claim 17, further comprising discriminating means for discriminating whether a relation |N op -N st |·b<Δl is satisfied and discontinuing means for discontinuing the scanning exposure when the relation is not satisfied, wherein said discriminating means and said discontinuing means are operated before said illuminating means and said scanning means.
Claim 34
Dependent Claim
90 words
A projection exposure apparatus comprising: illuminating means for illuminating an original with exposure light and for projecting, by a projection optical system, a pattern of the illuminated original onto a substrate with a projection magnification of the projection optical system; scanning means for scanning the original and the substrate in a scan direction; and changing means for changing the projection magnification during the scan by said scanning means, by adjusting the projection optical system, so that an image of the pattern is superposed on a pattern region on the substrate.
Claim 35
Dependent Claim
90 words
A projection exposure apparatus comprising: illuminating means for illuminating an original with exposure light and for projecting, by a projection optical system, a pattern of the illuminated original onto a substrate with a projection magnification of the projection optical system; scanning means for scanning the original and the substrate in a scan direction; and changing means for changing the projection magnification during the scan by said scanning means, by adjusting the projection optical system, so that an image of the pattern is superposed on a pattern region on the substrate.
Claim 36
Dependent Claim
30 words
An apparatus according to claim 31, wherein said scanning means comprises means for changing a ratio between a scan speed of the original and a scan speed of the substrate.
Claim 37
Independent Claim
129 words
A device manufacturing method for manufacturing a device, said method comprising the steps of: illuminating an original with exposure light having a size b with respect to a scan direction, and projecting a pattern of the illuminated original onto a substrate with a projection magnification N op ; and scanning the original and the substrate in the scan direction at a speed ratio N st different from the projection magnification N op , to manufacture a device, wherein the speed ratio N st corresponds to the ratio between the speed of the substrate and the speed of the original and, when the minimum linewidth of an image of the pattern with respect to the scan direction is denoted by Δl, a relation 0<|N op -N st |·b<Δl is satisfied.
Claim 38
Independent Claim
129 words
A device manufacturing method for manufacturing a device, said method comprising the steps of: illuminating an original with exposure light having a size b with respect to a scan direction, and projecting a pattern of the illuminated original onto a substrate with a projection magnification N op ; and scanning the original and the substrate in the scan direction at a speed ratio N st different from the projection magnification N op , to manufacture a device, wherein the speed ratio N st corresponds to the ratio between the speed of the substrate and the speed of the original and, when the minimum linewidth of an image of the pattern with respect to the scan direction is denoted by Δl, a relation 0<|N op -N st |·b<Δl is satisfied.
Claim 39
Dependent Claim
22 words
A method according to claim 33, wherein said illuminating step includes changing the size b of the exposure light during the scan.
Claim 40
Independent Claim
29 words
A method according to 33, wherein said illuminating step includes means for changing an intensity distribution of the exposure light with respect to the scan direction, during the scan.
Claim 41
Independent Claim
29 words
A method according to 33, wherein said illuminating step includes means for changing an intensity distribution of the exposure light with respect to the scan direction, during the scan.
Claim 42
Dependent Claim
20 words
A method according to claim 33, wherein said scanning step includes changing the speed ratio N st during the scan.
Claim 43
Dependent Claim
20 words
A method according to claim 36, wherein said projecting step includes changing the projection magnification N op during the scan.
Claim 44
Dependent Claim
22 words
A method according to claim 36, wherein said illuminating step includes changing the size b of the exposure light during the scan.
Claim 45
Dependent Claim
28 words
A method according to claim 36, wherein said illuminating step includes changing an intensity distribution of the exposure light with respect to the scan direction, during the scan.
Claim 46
Dependent Claim
22 words
A method according to claim 37, wherein said illuminating step includes changing the size b of the exposure light during the scan.
Claim 47
Dependent Claim
28 words
A method according to claim 37, wherein said illuminating step includes changing an intensity distribution of the exposure light with respect to the scan direction, during the scan.
Claim 48
Dependent Claim
20 words
A method according to claim 33, wherein said projecting step includes changing the projection magnification N op during the scan.
Claim 49
Dependent Claim
22 words
A method according to claim 42, wherein said illuminating step includes changing the size b of the exposure light during the scan.
Claim 50
Dependent Claim
28 words
A method according to claim 42, wherein said illuminating step includes changing an intensity distribution of the exposure light with respect to the scan direction, during the scan.
Claim 51
Dependent Claim
16 words
A method according to claim 33, wherein a relation |N op -N st |·b<0.72·Δl is satisfied.
Claim 52
Dependent Claim
49 words
A method according to claim 33, further comprising discriminating whether a relation |N op -N st |·b<Δl is satisfied and discontinuing the scanning exposure when the relation is not satisfied, wherein said discriminating step and said discontinuing step are carried out before said illuminating step and said scanning step.
Claim 53
Independent Claim
88 words
A device manufacturing method for manufacturing a device, said method comprising the steps of: illuminating an original with exposure light and projecting, by a projection optical system, a pattern of the illuminated original onto a substrate with a projection magnification of the projection system; scanning the original and the substrate in a scan direction, to manufacture a device; and changing the projection magnification during the scan, by adjusting the projection optical system, so that an image of the pattern is superposed on a pattern region on the substrate.
Claim 54
Independent Claim
88 words
A device manufacturing method for manufacturing a device, said method comprising the steps of: illuminating an original with exposure light and projecting, by a projection optical system, a pattern of the illuminated original onto a substrate with a projection magnification of the projection system; scanning the original and the substrate in a scan direction, to manufacture a device; and changing the projection magnification during the scan, by adjusting the projection optical system, so that an image of the pattern is superposed on a pattern region on the substrate.
Claim 55
Dependent Claim
27 words
A method according to claim 47, wherein said scanning step includes changing a ratio between a scan speed of the original and a scan of the substrate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-10-12 | 2002-04-13 | 2002-10-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-10-12 | 2006-04-13 | 2006-10-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-10-12 | 2010-04-13 | 2010-10-13 | $7700.00 | Window Closed / Lapsed |