US5377251A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Exposure apparatus
Assignee: Canon Inc
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Filing: 1994-02-28
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Granted: 1994-12-27
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Expires: 2014-02-28
Abstract
Abstract An exposure method for manufacture of semiconductor devices, includes moving a shutter having an edge so that the edge is related to a predetermined exposure region; projecting an exposure beam to the edge of the shutter and to at least a portion of the exposure region; determining a position of a shadow of the edge of the shutter formed by the exposure beam with respect to a predetermined coordinate system related to movement of a movable chuck; adjusting the shutter in accordance with the determination; placing a substrate on the chuck; moving the chuck so that the substrate is related to the exposure region; and controlling the exposure of the substrate with the exposure beam through the shutter.
Inventors
- 👤 Nobutoshi Mizusawa
- 👤 Ryuichi Ebinuma
- 👤 Hiroshi Kurosawa
- 👤 Koji Uda
- 👤 Takao Kariya
- 👤 Shumichi Uzawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 17:50
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70008; G03F7/70058; G03F7/702
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
134 words
An exposure method, comprising the steps of: illuminating a predetermined exposure zone with illumination light having a non-uniform illuminance distribution substantially along a predetermined direction and with respect to the predetermined exposure zone; measuring a two-dimensional illuminance distribution upon the predetermined exposure zone; determining the direction of non-uniformness of the illuminance distribution of the illumination light on the basis of said measurement; adjusting a relative positional relationship between the illumination light and a shutter mechanism having an edge movable in a direction, so as to substantially register the determined direction of the non-uniformness of the illumination light with the direction of movement of the edge of the shutter mechanism; and adjusting, through the shutter mechanism, exposure time at each portion of the exposure zone so as to attain uniform exposure of the exposure zone.
Claim 2
Dependent Claim
134 words
An exposure method, comprising the steps of: illuminating a predetermined exposure zone with illumination light having a non-uniform illuminance distribution substantially along a predetermined direction and with respect to the predetermined exposure zone; measuring a two-dimensional illuminance distribution upon the predetermined exposure zone; determining the direction of non-uniformness of the illuminance distribution of the illumination light on the basis of said measurement; adjusting a relative positional relationship between the illumination light and a shutter mechanism having an edge movable in a direction, so as to substantially register the determined direction of the non-uniformness of the illumination light with the direction of movement of the edge of the shutter mechanism; and adjusting, through the shutter mechanism, exposure time at each portion of the exposure zone so as to attain uniform exposure of the exposure zone.
Claim 3
Dependent Claim
12 words
A method according to claim 1, wherein the illumination light comprises X-rays.
Claim 4
Dependent Claim
36 words
A method according to claim 1, wherein said method is used with a mask having a pattern and with a wafer, and wherein the pattern of the mask is printed on the wafer through the exposure.
Claim 5
Dependent Claim
156 words
An exposure apparatus, comprising: a light source for providing illumination light for illuminating a predetermined exposure zone, said illumination light having a non-uniform illuminance distribution substantially along a predetermined direction and with respect to the predetermined exposure zone; a detector for measuring a two-dimensional illuminance distribution upon the predetermined exposure zone; computing means for determining the direction of non-uniformness of the illuminance distribution of the illumination light on the basis of the measurement through said detector; a shutter mechanism having an edge which is movable in a direction, for adjusting an exposure time at each portion of the predetermined exposure zone so as to attain uniform exposure of the predetermined exposure zone; and adjusting means for adjusting a relative positional relationship between the shutter mechanism and the illumination light so as to substantially register the direction of non-uniformness, as determined by said computing means, with the direction of movement of said edge of said shutter mechanism.
Claim 6
Dependent Claim
156 words
An exposure apparatus, comprising: a light source for providing illumination light for illuminating a predetermined exposure zone, said illumination light having a non-uniform illuminance distribution substantially along a predetermined direction and with respect to the predetermined exposure zone; a detector for measuring a two-dimensional illuminance distribution upon the predetermined exposure zone; computing means for determining the direction of non-uniformness of the illuminance distribution of the illumination light on the basis of the measurement through said detector; a shutter mechanism having an edge which is movable in a direction, for adjusting an exposure time at each portion of the predetermined exposure zone so as to attain uniform exposure of the predetermined exposure zone; and adjusting means for adjusting a relative positional relationship between the shutter mechanism and the illumination light so as to substantially register the direction of non-uniformness, as determined by said computing means, with the direction of movement of said edge of said shutter mechanism.
Claim 7
Dependent Claim
23 words
An apparatus according to claim 4, further comprising a stage, and wherein said detector is mounted on said stage which is movable two-dimensionally.
Claim 8
Dependent Claim
27 words
An apparatus according to claim 4, wherein said light source comprises a synchrotron radiation source adapted to produce X-rays, and wherein said detector comprises an X-ray detector.
Claim 9
Dependent Claim
35 words
An apparatus according to claim 4, wherein said shutter mechanism has a leading edge effective to start exposure of the exposure zone and a trailing edge effective to stop the exposure of the exposure zone.
Claim 10
Dependent Claim
51 words
An apparatus according to claim 4, wherein said apparatus is used with a mask having a pattern and with a wafer, and wherein said apparatus further comprises a mechanism for holding the mask and the wafer, and wherein the pattern of the mask is printed on the wafer through an exposure.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-12-26 | 1998-06-27 | 1998-12-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-12-26 | 2002-06-27 | 2002-12-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-12-26 | 2006-06-27 | 2006-12-27 | $7700.00 | Window Closed / Lapsed |