EP0357425A2 — An exposure apparatus

Claim 1

Independent Claim 84 words

An exposure apparatus usable with synchrotron radiation generating means in which electrons are injected into a ring to produce synchrotron radiation, comprising: exposure means for exposing a wafer through a mask to the synchrotron radiation introduced through a window from the synchrotron radiation generating means; detecting means for detecting intensity distribution of the synchrotron radiation; and control means for controlling said exposure means on the basis of the intensity distribution provided by said detecting means immediately after the electrons are injected into the ring.

Claim 2

Dependent Claim 84 words

An exposure apparatus usable with synchrotron radiation generating means in which electrons are injected into a ring to produce synchrotron radiation, comprising: exposure means for exposing a wafer through a mask to the synchrotron radiation introduced through a window from the synchrotron radiation generating means; detecting means for detecting intensity distribution of the synchrotron radiation; and control means for controlling said exposure means on the basis of the intensity distribution provided by said detecting means immediately after the electrons are injected into the ring.

Claim 3

Dependent Claim 32 words

An apparatus according to Claim 1, wherein said control means controls said exposure means on the basis of intensity distribution of the synchrotron radiation immediately after mounting or exchanging of said window.

Claim 4

Dependent Claim 26 words

An apparatus according to Claim 1, wherein said intensity detecting means includes a wafer carrying stage for carrying the wafer and an X-ray detector mounted thereon.

Claim 5

Dependent Claim 38 words

An apparatus according to Claim 1, wherein said exposure means includes a shutter for controlling quantity of the radiation, and wherein said control means controls the shutter in accordance with a result of detection by said intensity detector.

Claim 6

Dependent Claim 54 words

An X-ray exposure apparatus using synchrotron radiation, comprising: means for detecting an intensity of X-rays after electrons are injected to generate the synchrotron radiation; and means for calculating an X-ray intensity during exposure operation on the basis of a result of detection by said detecting means and an attenuation curve of the injected electrons.

Claim 7

Dependent Claim 54 words

An X-ray exposure apparatus using synchrotron radiation, comprising: means for detecting an intensity of X-rays after electrons are injected to generate the synchrotron radiation; and means for calculating an X-ray intensity during exposure operation on the basis of a result of detection by said detecting means and an attenuation curve of the injected electrons.

Claim 8

Dependent Claim 70 words

An exposure apparatus, comprising: a shutter for controlling exposure period; a sensor for detecting intensity of exposure radiation; a controller for controlling said shutter; a signal processor for calculating a cumulative amount of exposure on the basis of intensity detection of the exposure radiation by said sensor upon actuation of said shutter by said controller, and for supplying the cumulative amount of exposure to said controller as an information signal.

Claim 9

Dependent Claim 70 words

An exposure apparatus, comprising: a shutter for controlling exposure period; a sensor for detecting intensity of exposure radiation; a controller for controlling said shutter; a signal processor for calculating a cumulative amount of exposure on the basis of intensity detection of the exposure radiation by said sensor upon actuation of said shutter by said controller, and for supplying the cumulative amount of exposure to said controller as an information signal.

Claim 10

Dependent Claim 24 words

An apparatus according to Claim 6, wherein said sensor is capable of determining the amount of exposure at any position in an exposure area.

Claim 11

Dependent Claim 27 words

An apparatus according to Claim 5, wherein said controller corrects its control of said shutter on the basis of the cumulative amount of exposure fed back thereto.

Claim 12

Dependent Claim 73 words

An exposure apparatus, comprising: a shutter for controlling an exposure period; a semiconductor sensor for detecting intensity of exposure radiation; a wafer stage; a wafer stage driver for driving said wafer stage; a shutter driver for closing and opening said shutter; calculating means for receiving an output of said semiconductor sensor in synchronism with opening and closing of said shutter and for processing the output to calculate an intensity of the exposure radiation.

Claim 13

Dependent Claim 73 words

An exposure apparatus, comprising: a shutter for controlling an exposure period; a semiconductor sensor for detecting intensity of exposure radiation; a wafer stage; a wafer stage driver for driving said wafer stage; a shutter driver for closing and opening said shutter; calculating means for receiving an output of said semiconductor sensor in synchronism with opening and closing of said shutter and for processing the output to calculate an intensity of the exposure radiation.

Claim 14

Dependent Claim 30 words

An apparatus according to Claim 9, wherein said calculating means determines the intensity by storing and processing information from said semiconductor sensor immediately before and after actuation of said shutter.

Claim 15

Dependent Claim 29 words

An apparatus according to Claim 9, wherein said wafer stage, upon detection by said sensor, retracts the wafer so that the wafer is not exposed to the exposure radiation.

Claim 16

Dependent Claim 27 words

An apparatus according to Claim 9, further comprising an auxiliary shutter for preventing the wafer from being exposed to the radiation during the detection by said sensor.

Claim 17

Dependent Claim 153 words

An exposure apparatus usable with an exposure radiation source, comprising: a stage for supporting a member to be exposed; optical control means for controlling radiation to be projected to the member from the exposure radiation source; optical detecting means for detecting intensity of the radiation of the radiation source or the intensity of the radiation on a surface to be exposed of said member; driving profile determining means, coupled with said optical control means and said optical detecting means, for determining a driving profile of said optical control means with the intensity on the surface as a function of a position of the surface and of the intensity of the radiation source into account so as to provide a uniform amount of exposure in the surface; and driving profile compensating means for expanding or contracting a time axis of the driving profile in accordance with change of the intensity of the radiation source.

Claim 18

Dependent Claim 153 words

An exposure apparatus usable with an exposure radiation source, comprising: a stage for supporting a member to be exposed; optical control means for controlling radiation to be projected to the member from the exposure radiation source; optical detecting means for detecting intensity of the radiation of the radiation source or the intensity of the radiation on a surface to be exposed of said member; driving profile determining means, coupled with said optical control means and said optical detecting means, for determining a driving profile of said optical control means with the intensity on the surface as a function of a position of the surface and of the intensity of the radiation source into account so as to provide a uniform amount of exposure in the surface; and driving profile compensating means for expanding or contracting a time axis of the driving profile in accordance with change of the intensity of the radiation source.

Claim 19

Dependent Claim 23 words

An apparatus according to Claim 13, wherein the radiation source is an X-ray source, and said optical control means includes a movable aperture.

Claim 20

Dependent Claim 27 words

An apparatus according to Claim 13, wherein the radiation source is a synchrotron radiation source, and said optical control means includes an actuator for swinging a mirror.

Claim 21

Dependent Claim 102 words

An exposure apparatus usable with a radiation source, comprising: a stage for supporting a member to be exposed; exposure control means disposed in a radiation path between the radiation source and said stage and including a movable member for selectively limiting the radiation from said radiation source to the member; means for determining driving speed for providing a constant amount of exposure for the member despite attenuation, with time, of an intensity of the radiation to the member; and driving means for driving said movable member of said exposure control means in accordance with the driving speed determined by said determining means.

Claim 22

Dependent Claim 102 words

An exposure apparatus usable with a radiation source, comprising: a stage for supporting a member to be exposed; exposure control means disposed in a radiation path between the radiation source and said stage and including a movable member for selectively limiting the radiation from said radiation source to the member; means for determining driving speed for providing a constant amount of exposure for the member despite attenuation, with time, of an intensity of the radiation to the member; and driving means for driving said movable member of said exposure control means in accordance with the driving speed determined by said determining means.

Claim 23

Dependent Claim 16 words

An apparatus according to Claim 16, wherein said exposure control means includes a movable aperture stop.

Claim 24

Dependent Claim 15 words

An apparatus according to Claim 16, wherein said exposure control means includes a movable mirror.

Claim 25

Dependent Claim 97 words

An exposure apparatus usable with a radiation source, comprising: a stage for supporting a member to be exposed; exposure control means disposed in a radiation path between the radiation source and said stage and including a movable member for selectively limiting the radiation from said radiation source to the member; means for determining a driving speed for providing a constant amount of exposure of the member despite attenuation, with time, of an intensity of the radiation to the member; and driving means for driving said stage in accordance with the driving speed determined by said determining means.

Claim 26

Dependent Claim 97 words

An exposure apparatus usable with a radiation source, comprising: a stage for supporting a member to be exposed; exposure control means disposed in a radiation path between the radiation source and said stage and including a movable member for selectively limiting the radiation from said radiation source to the member; means for determining a driving speed for providing a constant amount of exposure of the member despite attenuation, with time, of an intensity of the radiation to the member; and driving means for driving said stage in accordance with the driving speed determined by said determining means.

Claim 27

Dependent Claim 52 words

An X-ray exposure apparatus for transferring a pattern of a mask onto a member coated with sensitive resist by synchrotron radiation, comprising: first detecting means for detecting an intensity of X-rays, corresponding to an exposure area; and second detecting means, disposed outside the exposure area, for detecting attenuation of the synchrotron radiation.

Claim 28

Dependent Claim 52 words

An X-ray exposure apparatus for transferring a pattern of a mask onto a member coated with sensitive resist by synchrotron radiation, comprising: first detecting means for detecting an intensity of X-rays, corresponding to an exposure area; and second detecting means, disposed outside the exposure area, for detecting attenuation of the synchrotron radiation.

An exposure apparatus

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