US5821034A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for forming micro patterns of semiconductor devices
Assignee: SK Hynix Inc
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Filing: 1996-09-27
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Granted: 1998-10-13
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Expires: 2016-09-27
Abstract
Abstract A method for forming micro patterns of a semiconductor device which uses a dipole illumination aperture adapted to transmit the spatial frequency components of light only in the X-axis direction and a dipole illumination aperture adapted to transmit the spatial frequency components of light only in the Y-axis direction, thereby obtaining the same effect as in the case using two sheets of masks to provide an increase in process margin.
Inventors
- 👤 Hyeong Soo Kim
- 👤 Chang Mun Lim
- 👤 Ki Ho Baik
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 22:34
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70091; H; H10; H10P; H10P95/00; G03F7/70125; G03F7/70425; G03F7/70466
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
99 words
A method for forming micro patterns of a semiconductor device having spatial frequencies of both horizontal and vertical axes, the method comprising: conducting a primary light exposure using a dipole illumination aperture adapted to condense only horizontal spatial frequency components of light; and conducting a secondary light exposure using a second dipole illumination aperture adapted to condense only vertical spatial frequency components of light, thereby forming the micro patterns; wherein each of the first and second dipole illumination apertures has a distance between poles thereof that varies in accordance with the spatial frequency of the patterns to be obtained.
Claim 2
Independent Claim
99 words
A method for forming micro patterns of a semiconductor device having spatial frequencies of both horizontal and vertical axes, the method comprising: conducting a primary light exposure using a dipole illumination aperture adapted to condense only horizontal spatial frequency components of light; and conducting a secondary light exposure using a second dipole illumination aperture adapted to condense only vertical spatial frequency components of light, thereby forming the micro patterns; wherein each of the first and second dipole illumination apertures has a distance between poles thereof that varies in accordance with the spatial frequency of the patterns to be obtained.
Claim 3
Dependent Claim
26 words
The method in accordance with claim 1, wherein: the light used in the light exposure has a wavelength band ranging from 50 nm to 800 nm.
Claim 4
Dependent Claim
20 words
The method in accordance with claim 1, wherein: the light exposure uses a conventional mask or a phase shift mask.
Claim 5
Dependent Claim
29 words
The method in accordance with claim 1, wherein: the distance between poles is larger than 0, but equal to or smaller than the value of "aperture diameter--2×pole diameter. "
References Cited (Backward Citations)
US4859548A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-10-12 | 2002-04-13 | 2002-10-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-10-12 | 2006-04-13 | 2006-10-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-10-12 | 2010-04-13 | 2010-10-13 | $7700.00 | Window Closed / Lapsed |