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US5811870A Expired / Lapsed US ⏱️ 0.0 years remaining

Antifuse structure

Assignee: GlobalFoundries Inc
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Filing: 1997-05-02
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Granted: 1998-09-22
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Expires: 2017-05-02
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Abstract

Abstract According to the preferred embodiment, an antifuse structure and method for personalizing a semiconductor device is provided that overcomes the limitations of the prior art. The preferred embodiment antifuse comprises a two layer transformable insulator core between two electrodes. The transformable core is normally non-conductive but can be transformed into a conductive material by supplying a sufficient voltage across the electrodes. The two layer core preferably comprises an injector layer and a dielectric layer. The injector layer preferably comprises a two phase material such as silicon rich nitride or silicon rich oxide. Initially, the injector layer and dielectric layer are non-conductive. When a sufficient voltage is applied the core fuses together and becomes conductive.

Inventors

  • 👤 Arup Bhattacharyya
  • 👤 Robert M. Geffken
  • 👤 Chung H. Lam
  • 👤 Robert K. Leidy

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 09:20
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/40; H10W20/49; H10W20/491; H10W20/01; H10W20/071; H10W20/093; H10W20/094

Claims Analysis

Total Claims: 22
Claim 1
Independent Claim 69 words
An antifuse structure, comprising: a) a pair of electrodes; b) a dielectric layer between said electrodes; and c) an injector layer between said electrodes and adjacent said dielectric layer, said injector layer injecting charge into said dielectric layer when a voltage bias is applied to said pair of electrodes, said injecting charge permanently changing the conductivity characteristics of said dielectric layer such that said dielectric layer is substantially conductive.
Claim 2
Dependent Claim 69 words
An antifuse structure, comprising: a) a pair of electrodes; b) a dielectric layer between said electrodes; and c) an injector layer between said electrodes and adjacent said dielectric layer, said injector layer injecting charge into said dielectric layer when a voltage bias is applied to said pair of electrodes, said injecting charge permanently changing the conductivity characteristics of said dielectric layer such that said dielectric layer is substantially conductive.
Claim 3
Dependent Claim 41 words
The antifuse of claim 1 wherein said antifuse is disposed adjacent other electrical circuit elements, and wherein said injector layer injects said charge at applied electric fields that do not adversely affect the electrical characteristics of said other electrical circuit elements.
Claim 4
Dependent Claim 12 words
The antifuse of claim 1 wherein said dielectric layer comprises silicon dioxide.
Claim 5
Dependent Claim 12 words
The antifuse of claim 1 wherein said dielectric layer comprises silicon nitride.
Claim 6
Dependent Claim 13 words
The antifuse of claim 1 wherein said injector layer comprises silicon rich oxide.
Claim 7
Dependent Claim 19 words
The antifuse of claim 5 wherein said silicon rich oxide has an apparent dielectric constant of greater than 12.
Claim 8
Dependent Claim 19 words
The antifuse of claim 5 wherein said silicon rich oxide has an apparent dielectric constant between 14 and 25.
Claim 9
Dependent Claim 13 words
The antifuse of claim 1 wherein said injector layer comprises silicon rich nitride.
Claim 10
Dependent Claim 19 words
The antifuse of claim 8 wherein said silicon rich nitride has an apparent dielectric constant of greater than 12.
Claim 11
Dependent Claim 19 words
The antifuse of claim 8 wherein said silicon rich nitride has an apparent dielectric constant between 14 and 20.
Claim 12
Dependent Claim 80 words
An antifuse structure, comprising: a) a pair of electrodes; and b) a first dielectric layer disposed between said pair of electrodes; and c) a silicon rich dielectric layer disposed between said first dielectric layer and one of said electrodes, said silicon rich dielectric layer having an apparent dielectric constant greater than 12, said silicon rich dielectric layer injecting charge into said first dielectric layer to alter its conductivity characteristics sufficiently to electrically couple said pair of electrodes to one another.
Claim 13
Dependent Claim 80 words
An antifuse structure, comprising: a) a pair of electrodes; and b) a first dielectric layer disposed between said pair of electrodes; and c) a silicon rich dielectric layer disposed between said first dielectric layer and one of said electrodes, said silicon rich dielectric layer having an apparent dielectric constant greater than 12, said silicon rich dielectric layer injecting charge into said first dielectric layer to alter its conductivity characteristics sufficiently to electrically couple said pair of electrodes to one another.
Claim 14
Dependent Claim 15 words
The antifuse of claim 11 wherein said silicon rich dielectric layer comprises silicon rich nitride.
Claim 15
Dependent Claim 15 words
The antifuse of claim 11 wherein said silicon rich dielectric layer comprises silicon rich oxide.
Claim 16
Dependent Claim 17 words
The antifuse of claim 11 wherein at least one of said pair of electrodes comprises doped silicon.
Claim 17
Dependent Claim 16 words
The antifuse of claim 11 wherein at least one of said pair of electrodes comprises tungsten.
Claim 18
Dependent Claim 16 words
The antifuse of claim 11 wherein at least one of said pair of electrodes comprises aluminum.
Claim 19
Dependent Claim 16 words
The antifuse of claim 11 wherein at least one of said pair of electrodes comprises copper.
Claim 20
Dependent Claim 16 words
The antifuse of claim 11 wherein at least one of said pair of electrodes comprises polysilicon.
Claim 21
Dependent Claim 18 words
The antifuse of claim 11 wherein at least one of said pair of electrodes comprises an interlevel interconnect.
Claim 22
Dependent Claim 19 words
The antifuse of claim 11 wherein at least one of said pair of electrodes comprises a doped semiconductor region.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2001-09-21 2002-03-23 2002-09-22 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2005-09-21 2006-03-23 2006-09-22 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2009-09-21 2010-03-23 2010-09-22 $7700.00 Window Closed / Lapsed

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