US5810963A
Expired / Lapsed
US
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Plasma processing apparatus and method
Assignee: Toshiba Corp
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Filing: 1996-09-27
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Granted: 1998-09-22
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Expires: 2016-09-27
Abstract
Abstract In a conductive plasma process chamber, a susceptor, which serves as an electrode and on which a target substrate is placed, is arranged. During a plasma process, the process chamber is supplied with a process gas while being exhausted, so that the chamber is kept at a constant vacuum pressure. A RF power of 13.56 MHz from an RF power supply is amplified and applied to the susceptor through a directional coupler and a matching circuit. A reflection wave of the RF power reflected by the susceptor is extracted by the directional coupler and is subjected to envelope wave detection by a wave detector, to generate a wave detection signal. The wave detection signal is compared with a reference voltage in a comparator, to determine presence or absence of an occurrence of abnormal discharge. When abnormal discharge occurs, the RF power is cut off for a predetermined period of time and the abnormal discharge is damped.
Inventors
- 👤 Kazuhiro Tomioka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 17:11
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/32174; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/505; C23C16/509; H01J2237/00; H01J2237/02; H01J2237/0203; H01J2237/0206
Claims Analysis
Total Claims: 29
Claim 1
Independent Claim
156 words
A plasma processing apparatus comprising: an airtight process chamber; a support mechanism for supporting a target substrate in said process chamber; an exhaust for exhausting said process chamber and setting said process chamber in a vacuum state; a supply for supplying a process gas into said process chamber; a first electrode for forming an electric field in said process chamber, thereby to turn said process gas into plasma; an RF power supply for supplying an RF power to said first electrode; a matching mechanism for matching impedance of said RF power with impedance of said plasma; an extraction mechanism for extracting a reflection wave of said RF power reflected by said first electrode; a wave detection mechanism for subjecting said reflection wave to envelope wave detection to generate a wave detection signal; and an examination mechanism for determining presence or absence of an occurrence of abnormal discharge, from changes in amplitude of said wave detection signal.
Claim 2
Dependent Claim
156 words
A plasma processing apparatus comprising: an airtight process chamber; a support mechanism for supporting a target substrate in said process chamber; an exhaust for exhausting said process chamber and setting said process chamber in a vacuum state; a supply for supplying a process gas into said process chamber; a first electrode for forming an electric field in said process chamber, thereby to turn said process gas into plasma; an RF power supply for supplying an RF power to said first electrode; a matching mechanism for matching impedance of said RF power with impedance of said plasma; an extraction mechanism for extracting a reflection wave of said RF power reflected by said first electrode; a wave detection mechanism for subjecting said reflection wave to envelope wave detection to generate a wave detection signal; and an examination mechanism for determining presence or absence of an occurrence of abnormal discharge, from changes in amplitude of said wave detection signal.
Claim 3
Dependent Claim
23 words
An apparatus according to claim 1, wherein said examination mechanism comprises a comparator for comparing said wave detection signal with a reference voltage.
Claim 4
Dependent Claim
33 words
An apparatus according to claim 1, further comprising control mechanism for lowering a power value of said RF power for a period of time, when said examination mechanism determines presence of abnormal discharge.
Claim 5
Dependent Claim
43 words
An apparatus according to claim 3, wherein said period of time is set such that said period is equal to or longer than a time period for which abnormal discharge is expected to be maintained and such that said plasma does not disappear.
Claim 6
Dependent Claim
31 words
An apparatus according to claim 3, wherein said control mechanism cuts off supply of said RF power for said period of time, when said examination mechanism determines presence of abnormal discharge.
Claim 7
Dependent Claim
48 words
An apparatus according to claim 3, further comprising a mechanism for setting power values of said RF power not to be controlled by said control mechanism by a time when impedance of said RF power is matched with impedance of said plasma by said matching mechanism at first.
Claim 8
Dependent Claim
26 words
An apparatus according to claim 1, further comprising a mechanism for monitoring the number of occurrences of abnormal discharge, which are determined by said examination mechanism.
Claim 9
Dependent Claim
166 words
A plasma processing apparatus comprising: an airtight process chamber; a support mechanism for supporting a target substrate in said process chamber; an exhaust for exhausting said process chamber and setting said process chamber in a vacuum state; a supply for supplying a process gas into said process chamber; a first electrode for forming an electric field in said process chamber, thereby to turn said process gas into plasma; an RF power supply for supplying an RF power to said first electrode; a mechanism for radiating a microwave into said plasma; an extraction mechanism for extracting a reflection wave of said microwave reflected by said plasma or extracting a passing wave of said microwave passing through said plasma; a wave detection mechanism for subjecting said reflection wave or said passing wave to envelope wave detection to generate a wave detection signal; and an examination mechanism for determining presence or absence of an occurrence of abnormal discharge, from changes in amplitude or phase of said wave detection signal.
Claim 10
Dependent Claim
166 words
A plasma processing apparatus comprising: an airtight process chamber; a support mechanism for supporting a target substrate in said process chamber; an exhaust for exhausting said process chamber and setting said process chamber in a vacuum state; a supply for supplying a process gas into said process chamber; a first electrode for forming an electric field in said process chamber, thereby to turn said process gas into plasma; an RF power supply for supplying an RF power to said first electrode; a mechanism for radiating a microwave into said plasma; an extraction mechanism for extracting a reflection wave of said microwave reflected by said plasma or extracting a passing wave of said microwave passing through said plasma; a wave detection mechanism for subjecting said reflection wave or said passing wave to envelope wave detection to generate a wave detection signal; and an examination mechanism for determining presence or absence of an occurrence of abnormal discharge, from changes in amplitude or phase of said wave detection signal.
Claim 11
Dependent Claim
23 words
An apparatus according to claim 8, wherein said examination mechanism comprises a comparator for comparing said wave detection signal with a reference voltage.
Claim 12
Dependent Claim
34 words
An apparatus according to claim 8, further comprising a control mechanism for lowering a power value of said RF power for a period of time, when said examination mechanism determines presence of abnormal discharge.
Claim 13
Dependent Claim
43 words
An apparatus according to claim 10, wherein said period of time is set such that said period is equal to or longer than a time period for which abnormal discharge is expected to be maintained and such that said plasma does not disappear.
Claim 14
Dependent Claim
31 words
An apparatus according to claim 10, wherein said control mechanism cuts off supply of said RF power for said period of time, when said examination mechanism determines presence of abnormal discharge.
Claim 15
Dependent Claim
126 words
A plasma processing method comprising the steps of: placing a target substrate in an airtight process chamber; supplying a process gas into said process chamber; supplying an RF power to a first electrode, thereby to generate an electric field in said process chamber and turn said process gas into plasma; matching impedance of said RF power with impedance of said plasma; subjecting said target substrate placed in said process chamber to a process, using said plasma; extracting a reflection wave of said RF power reflected by said first electrode; subjecting said reflection wave to envelope wave detection thereby to generate a wave detection signal; and examining and determining presence or absence of an occurrence of abnormal discharge, from changes in amplitude of said wave detection signal.
Claim 16
Dependent Claim
126 words
A plasma processing method comprising the steps of: placing a target substrate in an airtight process chamber; supplying a process gas into said process chamber; supplying an RF power to a first electrode, thereby to generate an electric field in said process chamber and turn said process gas into plasma; matching impedance of said RF power with impedance of said plasma; subjecting said target substrate placed in said process chamber to a process, using said plasma; extracting a reflection wave of said RF power reflected by said first electrode; subjecting said reflection wave to envelope wave detection thereby to generate a wave detection signal; and examining and determining presence or absence of an occurrence of abnormal discharge, from changes in amplitude of said wave detection signal.
Claim 17
Dependent Claim
34 words
A method according to claim 13, wherein said wave detection signal is compared with a reference voltage in said step of examining, thereby to determine presence or absence of an occurrence of abnormal discharge.
Claim 18
Dependent Claim
41 words
A method according to claim 13, further comprising a step of controlling and lowering a power value of said RF power for a period of time, when presence of an occurrence of abnormal discharge is determined in said step of examining.
Claim 19
Dependent Claim
43 words
A method according to claim 15, wherein said period of time is set such that said period is equal to or longer than a time period for which abnormal discharge is expected to be maintained and such that said plasma does not disappear.
Claim 20
Dependent Claim
38 words
A method according to claim 15, wherein supply of said RF power is cut off for said period of time in said step of controlling, when an occurrence of abnormal discharge is determined in said step of examining.
Claim 21
Dependent Claim
54 words
A method according to claim 15, wherein power values of said RF power are not controlled in said step of matching, regardless of presence or absence of an occurrence of abnormal discharge, by a time when impedance of said RF power is matched with impedance of said plasma by said matching mechanism at first.
Claim 22
Dependent Claim
27 words
A method according to claim 16, further comprising a step of monitoring the number of occurrences of abnormal discharge, which are determined in said step of examining.
Claim 23
Dependent Claim
51 words
A method according to claim 19, further comprising a step of selecting whether or not a treatment step of recovering a damage caused by abnormal discharge is performed on said target substrate, on the basis of the number of occurrences of abnormal discharge, which is obtained in said step of monitoring.
Claim 24
Dependent Claim
139 words
A plasma processing method comprising the steps of: placing a target substrate in an airtight process chamber; supplying a process gas into said process chamber; supplying an RF power to a first electrode thereby to generate an electric field in said process chamber and turn said process gas into plasma; subjecting said target substrate placed in said process chamber to a process, using said plasma; radiating a microwave into said plasma; extracting a reflection wave of said RF power reflected by said first electrode or extracting a passing wave of said microwave passing through said plasma; subjecting said reflection wave or said passing wave to envelope wave detection thereby to generate a wave detection signal; and examining and determining presence or absence of an occurrence of abnormal discharge, from changes in amplitude or phase of said wave detection signal.
Claim 25
Dependent Claim
139 words
A plasma processing method comprising the steps of: placing a target substrate in an airtight process chamber; supplying a process gas into said process chamber; supplying an RF power to a first electrode thereby to generate an electric field in said process chamber and turn said process gas into plasma; subjecting said target substrate placed in said process chamber to a process, using said plasma; radiating a microwave into said plasma; extracting a reflection wave of said RF power reflected by said first electrode or extracting a passing wave of said microwave passing through said plasma; subjecting said reflection wave or said passing wave to envelope wave detection thereby to generate a wave detection signal; and examining and determining presence or absence of an occurrence of abnormal discharge, from changes in amplitude or phase of said wave detection signal.
Claim 26
Dependent Claim
34 words
A method according to claim 21, wherein said wave detection signal is compared with a reference voltage in said step of examining, thereby to determine presence or absence of an occurrence of abnormal discharge.
Claim 27
Dependent Claim
41 words
A method according to claim 21, further comprising a step of controlling and lowering a power value of said RF power for a period of time, when presence of an occurrence of abnormal discharge is determined in said step of examining.
Claim 28
Dependent Claim
43 words
A method according to claim 23, wherein said period of time is set such that said period is equal to or longer than a time period for which abnormal discharge is expected to be maintained and such that said plasma does not disappear.
Claim 29
Dependent Claim
37 words
A method according to claim 23, wherein supply of said RF power is cut off for said period of time in said step controlling, when an occurrence of abnormal discharge is determined in said step of examining.
References Cited (Backward Citations)
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