Claims Analysis
Total Claims: 30
Claim 1
Independent Claim
112 words
A method for forming a storage capacitor in a liquid crystal display (LCD) device, said device having a pixel electrode situated on a protective layer, comprising the steps of: first forming a first capacitor electrode upon a substrate; second forming, in sequence, an insulating layer, an amorphous silicon layer and the protective layer above said first capacitor electrode, said amorphous silicon layer being an etch stop layer; etching said protective and amorphous silicon layers so as to form etched layers; and third forming a conductive layer, over said etched layers, as a second capacitor electrode so as to form the storage capacitor and connecting the second capacitor electrode to the pixel electrode.
Claim 2
Independent Claim
112 words
A method for forming a storage capacitor in a liquid crystal display (LCD) device, said device having a pixel electrode situated on a protective layer, comprising the steps of: first forming a first capacitor electrode upon a substrate; second forming, in sequence, an insulating layer, an amorphous silicon layer and the protective layer above said first capacitor electrode, said amorphous silicon layer being an etch stop layer; etching said protective and amorphous silicon layers so as to form etched layers; and third forming a conductive layer, over said etched layers, as a second capacitor electrode so as to form the storage capacitor and connecting the second capacitor electrode to the pixel electrode.
Claim 3
Dependent Claim
38 words
The method of claim 1 wherein the etching step further comprises the step of etching the protective and amorphous silicon layers so as to expose a pre-defined area of the insulating layer situated above the first capacitor electrode.
Claim 4
Dependent Claim
37 words
The method of claim 2 wherein the second forming step comprises the step of forming the amorphous silicon layer simultaneously with a formation of an amorphous silicon layer of a thin film transistor in said LCD device.
Claim 5
Dependent Claim
36 words
The method of claim 3 further comprising the step of anodizing the first capacitor electrode, so as to form an anodized layer on a surface of the first capacitor electrode, prior to forming the insulating layer.
Claim 6
Independent Claim
107 words
A method for forming a storage capacitor in a liquid crystal display (LCD) device, said device having a pixel electrode situated on a protective layer, comprising the steps of: forming a first capacitor electrode upon a substrate; forming, in sequence, an insulating layer, an amorphous silicon layer and the protective layer above said first capacitor electrode; said amorphous silicon layer being an etch stop layer; etching said protective layer so as to form an etched layer; and forming a conductive layer, over said etched layer, as a second capacitor electrode so as to form the storage capacitor and connecting the second capacitor electrode to the pixel electrode.
Claim 7
Independent Claim
107 words
A method for forming a storage capacitor in a liquid crystal display (LCD) device, said device having a pixel electrode situated on a protective layer, comprising the steps of: forming a first capacitor electrode upon a substrate; forming, in sequence, an insulating layer, an amorphous silicon layer and the protective layer above said first capacitor electrode; said amorphous silicon layer being an etch stop layer; etching said protective layer so as to form an etched layer; and forming a conductive layer, over said etched layer, as a second capacitor electrode so as to form the storage capacitor and connecting the second capacitor electrode to the pixel electrode.
Claim 8
Dependent Claim
30 words
The method of claim 5 wherein the etching step further comprises the step of etching the protective layer so as to expose a pre-defined area of the amorphous silicon layer.
Claim 9
Dependent Claim
37 words
The method of claim 6 wherein the second forming step comprises the step of forming the amorphous silicon layer simultaneously with a formation of an amorphous silicon layer of a thin film transistor in said LCD device.
Claim 10
Dependent Claim
36 words
The method of claim 7 further comprising the step of anodizing the first capacitor electrode, so as to form an anodized layer on a surface of the first capacitor electrode, prior to forming the insulating layer.
Claim 11
Independent Claim
114 words
A method for forming a storage capacitor in a liquid crystal display (LCD) device, said device having a pixel electrode situated on a protective layer, comprising the steps of: first forming a first capacitor electrode upon a substrate; second forming, in sequence, an insulating layer, a first conductive layer as an etch stop layer, and the protective layer above said first capacitor electrode; etching said protective layer so as to form an etched layer; and third forming a second conductive layer, over said etched layer and connected to the first conductive layer, as a second capacitor electrode so as to form the storage capacitor and connecting said second capacitor electrode to the pixel electrode.
Claim 12
Independent Claim
114 words
A method for forming a storage capacitor in a liquid crystal display (LCD) device, said device having a pixel electrode situated on a protective layer, comprising the steps of: first forming a first capacitor electrode upon a substrate; second forming, in sequence, an insulating layer, a first conductive layer as an etch stop layer, and the protective layer above said first capacitor electrode; etching said protective layer so as to form an etched layer; and third forming a second conductive layer, over said etched layer and connected to the first conductive layer, as a second capacitor electrode so as to form the storage capacitor and connecting said second capacitor electrode to the pixel electrode.
Claim 13
Dependent Claim
42 words
The method of claim 9 wherein the second forming step comprises the step of forming the first conductive layer as a conductive metallic layer simultaneously with a formation of source and drain electrodes of a thin film transistor in said LCD device.
Claim 14
Dependent Claim
40 words
The method of claim 10 wherein the etching step further comprises the step of etching the protective layer so as to expose a pre-defined area of the first conductive layer situated on the insulating layer above the first capacitor electrode.
Claim 15
Dependent Claim
36 words
The method of claim 11 further comprising the step of anodizing the first capacitor electrode, so as to form an anodized layer on a surface of the first capacitor electrode, prior to forming the insulating layer.
Claim 16
Dependent Claim
103 words
A liquid crystal display (LCD) device having a storage capacitor connected to a pixel electrode formed on a protective layer, the storage capacitor having a first electrode situated on a substrate, the capacitor comprising: an insulating layer, an amorphous silicon layer and the protective layer which are successively formed above said first capacitor electrode, wherein the amorphous silicon layer is an etch stop layer; the protective and amorphous silicon layers are etched so as to form etched layers; and a conductive layer is formed, over the etched layers, as a second capacitor electrode of the storage capacitor and connected to the pixel electrode.
Claim 17
Dependent Claim
103 words
A liquid crystal display (LCD) device having a storage capacitor connected to a pixel electrode formed on a protective layer, the storage capacitor having a first electrode situated on a substrate, the capacitor comprising: an insulating layer, an amorphous silicon layer and the protective layer which are successively formed above said first capacitor electrode, wherein the amorphous silicon layer is an etch stop layer; the protective and amorphous silicon layers are etched so as to form etched layers; and a conductive layer is formed, over the etched layers, as a second capacitor electrode of the storage capacitor and connected to the pixel electrode.
Claim 18
Dependent Claim
33 words
The LCD device of claim 13 wherein the protective and amorphous silicon layers are both etched so as to expose a pre-defined area of the insulating layer situated above the first capacitor electrode.
Claim 19
Dependent Claim
31 words
The LCD device of claim 14 wherein the amorphous silicon layer is formed simultaneously while an amorphous silicon layer of a thin film transistor is being formed in the LCD device.
Claim 20
Dependent Claim
26 words
The LCD device of claim 15 wherein an anodized layer is formed on a surface of the first capacitor electrode prior to forming the insulating layer.
Claim 21
Dependent Claim
101 words
A liquid crystal display (LCD) device having a storage capacitor connected to a pixel electrode formed on a protective layer, the storage capacitor having a first electrode situated on a substrate, the capacitor comprising: an insulating layer, an amorphous silicon layer and the protective layer which are successively formed above said first capacitor electrode, wherein the amorphous silicon layer is an etch stop layer; the protective layer is etched so as to form an etched layer; and a conductive layer is formed, over the etched layer, as a second capacitor electrode of the storage capacitor and connected to the pixel electrode.
Claim 22
Dependent Claim
101 words
A liquid crystal display (LCD) device having a storage capacitor connected to a pixel electrode formed on a protective layer, the storage capacitor having a first electrode situated on a substrate, the capacitor comprising: an insulating layer, an amorphous silicon layer and the protective layer which are successively formed above said first capacitor electrode, wherein the amorphous silicon layer is an etch stop layer; the protective layer is etched so as to form an etched layer; and a conductive layer is formed, over the etched layer, as a second capacitor electrode of the storage capacitor and connected to the pixel electrode.
Claim 23
Dependent Claim
24 words
The LCD device of claim 17 wherein the protective layer is etched so as to expose a pre-defined area of the amorphous silicon layer.
Claim 24
Dependent Claim
31 words
The LCD device of claim 18 wherein the amorphous silicon layer is formed simultaneously while an amorphous silicon layer of a thin film transistor is being formed in the LCD device.
Claim 25
Dependent Claim
26 words
The LCD device of claim 19 wherein an anodized layer is formed on a surface of the first capacitor electrode prior to forming the insulating layer.
Claim 26
Dependent Claim
95 words
A liquid crystal display (LCD) device having a storage capacitor connected to a pixel electrode formed on a protective layer, the storage capacitor having a first electrode situated on a substrate, the capacitor comprising: an insulating layer, a first conductive layer as an etch stop layer, and the protective layer successively formed above said first capacitor electrode; the protective layer being etched so as to form an etched layer; and a second conductive layer being formed, over the etched layer, as a second capacitor electrode of the storage capacitor and connected to the pixel electrode.
Claim 27
Dependent Claim
95 words
A liquid crystal display (LCD) device having a storage capacitor connected to a pixel electrode formed on a protective layer, the storage capacitor having a first electrode situated on a substrate, the capacitor comprising: an insulating layer, a first conductive layer as an etch stop layer, and the protective layer successively formed above said first capacitor electrode; the protective layer being etched so as to form an etched layer; and a second conductive layer being formed, over the etched layer, as a second capacitor electrode of the storage capacitor and connected to the pixel electrode.
Claim 28
Dependent Claim
37 words
The LCD device of claim 21 wherein the first conductive layer is a conductive metallic layer which is simultaneously formed while source and drain electrodes of a thin film transistor in said LCD device are being formed.
Claim 29
Dependent Claim
34 words
The LCD device of claim 22 wherein the protective layer is etched so as to expose a pre-defined area of the first conductive layer situated on the insulating layer above the first capacitor electrode.
Claim 30
Dependent Claim
26 words
The LCD device of claim 23 wherein an anodized layer is formed on a surface of the first capacitor electrode prior to forming the insulating layer.