Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
106 words
A process for preparing a metal-containing thin film, the process comprising the steps of: electrodepositing a layer of Cu x In y Ga z Se n (x=0-2, y=0-2, z=0-2, n=0-3) on a substrate, the electrodeposition proceeding at a DC voltage of approximately 1-10 V and an AC voltage of approximately 0.2-5.0 V at 1-100 KHz superimposed upon said DC voltage; and depositing a sufficient amount of either In+Se or Cu+Se on said layer of Cu x In y Ga z Se n by vapor deposition to produce a thin film of Cu(In,Ga)Se 2 on the substrate wherein said thin film has stoichiometric ratios of approximately Cu=1-1.2:(In,Ga)=1-1.2:Se=2-2.5.
Claim 2
Dependent Claim
106 words
A process for preparing a metal-containing thin film, the process comprising the steps of: electrodepositing a layer of Cu x In y Ga z Se n (x=0-2, y=0-2, z=0-2, n=0-3) on a substrate, the electrodeposition proceeding at a DC voltage of approximately 1-10 V and an AC voltage of approximately 0.2-5.0 V at 1-100 KHz superimposed upon said DC voltage; and depositing a sufficient amount of either In+Se or Cu+Se on said layer of Cu x In y Ga z Se n by vapor deposition to produce a thin film of Cu(In,Ga)Se 2 on the substrate wherein said thin film has stoichiometric ratios of approximately Cu=1-1.2:(In,Ga)=1-1.2:Se=2-2.5.
Claim 3
Dependent Claim
27 words
The process of claim 1 wherein said layer of Cu x In y Ga z Se n (x=0-2, y=0-2, z=0-2, n=0-3) comprises In 1-2 Se 1-3 .
Claim 4
Dependent Claim
27 words
The process of claim 1 wherein said layer of Cu x In y Ga z Se n (x=0-2, y=0-2, z=0-2, n=0-3) comprises Cu 1-2 Se 1-3 .
Claim 5
Dependent Claim
29 words
The process of claim 1 wherein said layer of Cu x In y Ga z Se n (x=0-2, y=0-2, z=0-2, n=0-3) comprises Cu 1-2 In 1-2 Se 1-3 .
Claim 6
Dependent Claim
35 words
The process of claim 1 wherein said layer of Cu x In y Ga z Se n (x=0-2, y=0-2, z=0-2, n=0-3) comprises Cu 1-2 In 1-2 Ga 0 .01-1 Se 1-3 (x=1-2, y=1-2, z=0.01-1, n=1-3).
Claim 7
Dependent Claim
13 words
The process of claim 1 wherein the vapor deposition comprises physical vapor deposition.
Claim 8
Dependent Claim
18 words
The process of claim 6 wherein the physical vapor deposition proceeds at a temperature of approximately 550° C.
Claim 9
Dependent Claim
33 words
The process of claim 1 wherein the electrodeposition proceeds in an aqueous electrodeposition solution, said DC voltage is approximately 1-5 volts, and said AC voltage is approximately 0.3-1.0 volts at approximately 10-30 KHz.
Claim 10
Dependent Claim
25 words
The process of claim 8 wherein said DC voltage is approximately 2 volts and said AC voltage is approximately 0.45 volts at approximately 18.1 KHz.
Claim 11
Dependent Claim
49 words
The process of claim 1 wherein said DC voltage is approximately 3-10 volts, and the electrodeposition proceeds in an electrodeposition solution comprising at least one organic solvent, and the electrodeposition further proceeds at an AC voltage of approximately 0.2-5.0 volts at approximately 1-100 KHz superimposed upon said DC voltage.
Claim 12
Dependent Claim
17 words
The process of claim 10 wherein said AC voltage is approximately 0.45 volts at approximately 18.1 KHz.
Claim 13
Dependent Claim
44 words
The process of claim 1 wherein the electrodeposition step proceeds in an electrodeposition solution comprising at least one supporting electrolyte for raising the conductivity of the electrodeposition solution and increasing the deposition rate of the Cu x In y Ga z Se n layer.
Claim 14
Dependent Claim
28 words
The process of claim 12 wherein said supporting electrolyte comprises at least one compound selected from the group consisting of NaCl, LiCl, and Na 2 SO 4 .
Claim 15
Dependent Claim
41 words
The process of claim 1 further comprising the steps of: depositing a CdS layer on the Cu x In y Ga z Se n film by chemical bath deposition; and depositing a ZnO layer on the CdS layer by RF sputtering.
Claim 16
Dependent Claim
68 words
A process for preparing a solar cell precursor thin film, the process comprising the steps of: (a) providing an electrodeposition solution containing copper, indium, gallium, and selenium ions; (b) immersing a substrate into said electrodeposition solution; and (c) electroplating said copper, indium, gallium, and selenium ions simultaneously onto said substrate by applying a cathodic potential thereto of 1-10 VDC voltage and 0.2-5.0 VAC at 1-100 KHZ superimposed thereon.
Claim 17
Dependent Claim
68 words
A process for preparing a solar cell precursor thin film, the process comprising the steps of: (a) providing an electrodeposition solution containing copper, indium, gallium, and selenium ions; (b) immersing a substrate into said electrodeposition solution; and (c) electroplating said copper, indium, gallium, and selenium ions simultaneously onto said substrate by applying a cathodic potential thereto of 1-10 VDC voltage and 0.2-5.0 VAC at 1-100 KHZ superimposed thereon.
Claim 18
Dependent Claim
16 words
The process according to claim 15, wherein said electrodeposition solution includes at least one organic solvent.
Claim 19
Dependent Claim
23 words
The process according to claim 16, wherein said cathodic potential is approximately 2 VDC and approximately 0.45 VAC at 10-30 KHz superimposed thereon.
Claim 20
Dependent Claim
22 words
The process according to claim 15, wherein said cathodic potential is approximately 1-5 VDC and 0.3-1.0 VAC at 10-30 KHz superimposed thereon.
Claim 21
Dependent Claim
41 words
The process according to claim 18, wherein said electrodeposition solution comprises approximately 2.49 gm/l Cu(NO 3 ) 2 .6H 2 O, 26.7 gm/l InCl 3 , 10.2 gm/l Ga(NO 3 ) 3 , and 4.0 gm/l H 2 SeO 3 ).
Claim 22
Dependent Claim
16 words
The process according to claim 19, wherein said electrodeposition solution includes at least one organic solvent.