US5715089A — Exposure method and apparatus therefor

Claim 1

Independent Claim 161 words

An exposure method comprising: illuminating a pattern formed on a mask with illumination light from an illumination optical system, and projecting an image of said pattern to expose a photosensitive substrate through a projection optical system, wherein said pattern is constituted by a transmission portion having a transmittance of about 1 with respect to the illumination light and a phase shift transmission portion which provides a phase difference of about an odd multiple of π with respect to the light transmitted through the transmission portion; and the illumination light is incident on said mask as at least a pair of beams which are inclined with respect to an optical axis of said illumination optical system at substantially equal angles, such that diffracted lights of 0-th order from one of said beams and of a different order from the other of said beams, generated from said pattern, pass through a pupil plane of said projection optical system at substantially the same position.

Claim 2

Dependent Claim 161 words

An exposure method comprising: illuminating a pattern formed on a mask with illumination light from an illumination optical system, and projecting an image of said pattern to expose a photosensitive substrate through a projection optical system, wherein said pattern is constituted by a transmission portion having a transmittance of about 1 with respect to the illumination light and a phase shift transmission portion which provides a phase difference of about an odd multiple of π with respect to the light transmitted through the transmission portion; and the illumination light is incident on said mask as at least a pair of beams which are inclined with respect to an optical axis of said illumination optical system at substantially equal angles, such that diffracted lights of 0-th order from one of said beams and of a different order from the other of said beams, generated from said pattern, pass through a pupil plane of said projection optical system at substantially the same position.

Claim 3

Dependent Claim 61 words

A method according to claim 1, wherein, at a predetermined plane which is substantially coincident with one of a Fourier transform plane of said mask in said illumination optical system and a conjugate plane thereto, the illumination light is limited to a plurality of local regions having respective centers substantially equidistantly shifted from said optical axis of said illumination optical system.

Claim 4

Dependent Claim 26 words

A method according to claim 1, wherein said plurality of beams are disposed substantially symmetrically with respect to said optical axis of said illumination optical system.

Claim 5

Dependent Claim 18 words

A method according to claim 1, wherein said beams have a common area of illumination on said pattern.

Claim 6

Dependent Claim 168 words

An exposure apparatus comprising: an illumination optical system for illuminating a pattern formed on a mask with illumination light; and a projection optical system for projecting an image of said pattern on a photosensitive substrate, wherein said pattern is constituted by a transmission portion having a transmittance of about 1 with respect to the illumination light, and a phase shift transmission portion which provides a phase difference of about an odd multiple of π with respect to the light transmitted through the transmission portion; and said apparatus further includes optical means for forming the illumination light into at least a pair of beams incident on said mask and which are inclined with respect to an optical axis of said illumination optical system at substantially equal angles, such that diffracted lights of 0-th order from one of said beams and of a different order from the other of said beams, generated from said pattern, pass through a pupil plane of said projection optical system at substantially the same position.

Claim 7

Dependent Claim 168 words

An exposure apparatus comprising: an illumination optical system for illuminating a pattern formed on a mask with illumination light; and a projection optical system for projecting an image of said pattern on a photosensitive substrate, wherein said pattern is constituted by a transmission portion having a transmittance of about 1 with respect to the illumination light, and a phase shift transmission portion which provides a phase difference of about an odd multiple of π with respect to the light transmitted through the transmission portion; and said apparatus further includes optical means for forming the illumination light into at least a pair of beams incident on said mask and which are inclined with respect to an optical axis of said illumination optical system at substantially equal angles, such that diffracted lights of 0-th order from one of said beams and of a different order from the other of said beams, generated from said pattern, pass through a pupil plane of said projection optical system at substantially the same position.

Claim 8

Dependent Claim 29 words

An apparatus according to claim 5, wherein said optical means causes said beams to be disposed substantially symmetrically with respect to said optical axis of said illumination optical system.

Claim 9

Dependent Claim 18 words

An apparatus according to claim 5, wherein said beams have a common area of illumination on said pattern.

Claim 10

Dependent Claim 133 words

An exposure method comprising: illuminating a pattern formed on a mask with illumination light from an illumination optical system; and exposing an image of said pattern onto a photosensitive substrate through a projection optical system, wherein said pattern includes a phase shifter portion for shifting a phase of the illumination light by about an odd multiple of π; and the illumination light incident on said mask includes at least a pair of beams which are inclined with respect to an optical axis of said illumination optical system at substantially equal angles, such that diffracted lights of 0-th order from one of said beams and of a different order from the other of said beams, generated from said pattern, pass through a pupil plane of said projection optical system at substantially the same position.

Claim 11

Dependent Claim 133 words

An exposure method comprising: illuminating a pattern formed on a mask with illumination light from an illumination optical system; and exposing an image of said pattern onto a photosensitive substrate through a projection optical system, wherein said pattern includes a phase shifter portion for shifting a phase of the illumination light by about an odd multiple of π; and the illumination light incident on said mask includes at least a pair of beams which are inclined with respect to an optical axis of said illumination optical system at substantially equal angles, such that diffracted lights of 0-th order from one of said beams and of a different order from the other of said beams, generated from said pattern, pass through a pupil plane of said projection optical system at substantially the same position.

Claim 12

Dependent Claim 24 words

A method according to claim 8, wherein said beams are disposed substantially symmetrically with respect to said optical axis of said illumination optical system.

Claim 13

Dependent Claim 61 words

A method according to claim 8, wherein, within a predetermined plane which is substantially coincident with one of a Fourier transform plane of said mask in said illumination optical system and a plane conjugate thereto, the distribution of the illumination light around a local region centered on said optical axis is more intense than a light distribution within the local region.

Claim 14

Dependent Claim 32 words

A method according to claim 8, wherein a distribution of the illumination light within a Fourier transform plane of said mask in said illumination optical system is limited to an annular shape.

Claim 15

Dependent Claim 18 words

A method according to claim 8, wherein said beams have a common area of illumination on said pattern.

Claim 16

Dependent Claim 66 words

An exposure apparatus, comprising: a member for holding a mask having a pattern which includes a phase shift portion for shifting a phase of light; an illumination system for illuminating the pattern with light beam illumination having increased light intensity distribution within four areas relative to a portion including a predetermined point; and a projection system for projecting an image of the pattern on a substrate.

Claim 17

Dependent Claim 66 words

An exposure apparatus, comprising: a member for holding a mask having a pattern which includes a phase shift portion for shifting a phase of light; an illumination system for illuminating the pattern with light beam illumination having increased light intensity distribution within four areas relative to a portion including a predetermined point; and a projection system for projecting an image of the pattern on a substrate.

Claim 18

Dependent Claim 40 words

An apparatus according to claim 13, wherein said predetermined point is on an optical axis of said illumination optical system, and said pattern has components along orthogonal first and second axes which intersect with each other at said predetermined point.

Claim 19

Dependent Claim 28 words

An apparatus according to claim 13, wherein said illumination system has an optical integrator for forming a plurality of light source images within each of said four areas.

Claim 20

Dependent Claim 83 words

An exposure apparatus, comprising: a member for holding a mask having a pattern which includes a phase shift portion for shifting a phase of light; an illumination system for illuminating the pattern with light beam illumination having a light intensity distribution which, in an area outside a portion including a center of the distribution, has an increased light intensity relative to said portion including the center of the distribution; and a projection system for projecting an image of the pattern on a substrate.

Claim 21

Dependent Claim 83 words

An exposure apparatus, comprising: a member for holding a mask having a pattern which includes a phase shift portion for shifting a phase of light; an illumination system for illuminating the pattern with light beam illumination having a light intensity distribution which, in an area outside a portion including a center of the distribution, has an increased light intensity relative to said portion including the center of the distribution; and a projection system for projecting an image of the pattern on a substrate.

Claim 22

Dependent Claim 64 words

An exposure apparatus, comprising: a member for holding a mask having a pattern which includes a phase shift portion for shifting a phase of light; an illumination system for illuminating the pattern with light beams from at least two limited areas separated by axes in orthogonal first and second directions; and a projection system for projecting an image of the pattern on a substrate.

Claim 23

Dependent Claim 64 words

An exposure apparatus, comprising: a member for holding a mask having a pattern which includes a phase shift portion for shifting a phase of light; an illumination system for illuminating the pattern with light beams from at least two limited areas separated by axes in orthogonal first and second directions; and a projection system for projecting an image of the pattern on a substrate.

Claim 24

Dependent Claim 63 words

An exposure apparatus, comprising: a member for holding a mask having a pattern that is formed along a predetermined direction and that includes a phase shift portion for shifting a phase of light; an illumination system for illuminating the pattern obliquely, from different directions with respect to the mask; and a projection system for projecting an image of the pattern on a substrate.

Claim 25

Dependent Claim 63 words

An exposure apparatus, comprising: a member for holding a mask having a pattern that is formed along a predetermined direction and that includes a phase shift portion for shifting a phase of light; an illumination system for illuminating the pattern obliquely, from different directions with respect to the mask; and a projection system for projecting an image of the pattern on a substrate.

Claim 26

Dependent Claim 31 words

An exposure apparatus according to claim 18, wherein the illumination system illuminates the pattern with at least a pair of light beams from different oblique directions with respect to the mask.

Claim 27

Dependent Claim 139 words

An exposure apparatus, comprising: an illumination optical system for illuminating a pattern formed on a mask with illumination light; and a projection optical system for projecting an image of said pattern on a photosensitive substrate, wherein said pattern includes a phase shifter portion for shifting a phase of the illumination light by about an odd multiple of π; and an optical member for forming the illumination light into at least a pair of beams incident on said mask and which are inclined with respect to an optical axis of said illumination optical system at substantially equal angles, such that diffracted lights of 0-th order from one of said beams and of a different order from the other of said beams, generated from said pattern, pass through a pupil plane of said projection optical system at substantially the same position.

Claim 28

Dependent Claim 139 words

An exposure apparatus, comprising: an illumination optical system for illuminating a pattern formed on a mask with illumination light; and a projection optical system for projecting an image of said pattern on a photosensitive substrate, wherein said pattern includes a phase shifter portion for shifting a phase of the illumination light by about an odd multiple of π; and an optical member for forming the illumination light into at least a pair of beams incident on said mask and which are inclined with respect to an optical axis of said illumination optical system at substantially equal angles, such that diffracted lights of 0-th order from one of said beams and of a different order from the other of said beams, generated from said pattern, pass through a pupil plane of said projection optical system at substantially the same position.

Claim 29

Dependent Claim 63 words

An apparatus according to claim 20, wherein said optical member causes said beams to be disposed substantially symmetrically with respect to said optical axis of said illumination optical system. a6 projection optical system. The illumination light passing through a predetermined plane which is substantially coincident with a Fourier transform plane of the mask in the illumination optical system or a conjugate plane thereto,

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	2001-02-02	2001-08-04	2002-02-03	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	2005-02-02	2005-08-04	2006-02-03	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	2009-02-02	2009-08-04	2010-02-03	$7700.00	Window Closed / Lapsed

Exposure method and apparatus therefor

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