Independently controllable shutters and variable area apertures for off axis illumination

Claim 2

An off axis illumination system for photolithographic exposure of a photosensitive film on a device substrate in the manufacture of semiconductor devices comprising: an exposure source for exposing the photosensitive film; a photomask which contains an image of pattern etched into a metallic layer, said photomask being interposed between the exposure source and the photosensitive film to be exposed; a lens system between the photomask and the resist for focusing an illuminated image for patterning into the photosensitive film on the device substrate; and an aperture plate positioned between the exposure source and the photomask, said aperture plate providing apertures that provide off axis illumination by said exposure source of said photomask and having independently controllable shutters to provide variable area apertures, each exposure being separately optimized by adjusting the apertures for a specific lithographic step.

Claim 3

An off axis illumination system for photolithographic exposure of a photosensitive film on a device substrate in the manufacture of semiconductor devices comprising: an exposure source for exposing the photosensitive film; a photomask which contains an image of pattern etched into a metallic layer, said photomask being interposed between the exposure source and the photosensitive film to be exposed; a lens system between the photomask and the resist for focusing an illuminated image for patterning into the photosensitive film on the device substrate; and an aperture plate positioned between the exposure source and the photomask, said aperture plate having independently controllable shutters to provide variable area apertures, each exposure being separately optimized by adjusting the apertures for a particular lithographic step, wherein said aperture plate has a plurality of apertures equally spaced radially about a center of the aperture plate and the independently controllable shutters comprise a butterfly-shaped shutter pivotally mounted at the center of the aperture plate and movable to occlude or partially occlude diametrically opposed apertures.

Claim 4

An off axis illumination system for photolithographic exposure of a photosensitive film on a device substrate in the manufacture of semiconductor devices comprising: an exposure source for exposing the photosensitive film; a photomask which contains an image of pattern etched into a metallic layer, said photomask being interposed between the exposure source and the photosensitive film to be exposed; a lens system between the photomask and the resist for focusing an illuminated image for patterning into the photosensitive film on the device substrate; and an aperture plate positioned between the exposure source and the photomask, said aperture plate having independently controllable shutters to provide variable area apertures, each exposure being separately optimized by adjusting the apertures for a particular lithographic step, wherein said aperture plate has a plurality of apertures equally spaced radially about a center of the aperture plate and the independently controllable shutters comprise a butterfly-shaped shutter pivotally mounted at the center of the aperture plate and movable to occlude or partially occlude diametrically opposed apertures.

Claim 5

An off axis illumination system for photolithographic exposure of a photosensitive film on a device substrate in the manufacture of semiconductor devices comprising: an exposure source for exposing the photosensitive film; a photomask which contains an image of pattern etched into a metallic layer, said photomask being interposed between the exposure source and the photosensitive film to be exposed; a lens system between the photomask and the resist for focusing an illuminated image for patterning into the photosensitive film on the device substrate; and an aperture plate positioned between the source of light and the photomask, said aperture plate having independently controllable shutters to provide variable area apertures, each exposure being separately optimized by adjusting the apertures for a specific lithographic step, wherein said aperture plate has a plurality of apertures equally spaced radially about a center of the aperture plate and the independently controllable shutters comprise a plurality of shutters, one for each of said apertures, pivotally mounted adjacent respective apertures and independently movable to occlude or partially occlude respective ones of said apertures.

Claim 6

An off axis illumination system for photolithographic exposure of a photosensitive film on a device substrate in the manufacture of semiconductor devices comprising: an exposure source for exposing the photosensitive film; a photomask which contains an image of pattern etched into a metallic layer, said photomask being interposed between the exposure source and the photosensitive film to be exposed; a lens system between the photomask and the resist for focusing an illuminated image for patterning into the photosensitive film on the device substrate; and an aperture plate positioned between the source of light and the photomask, said aperture plate having independently controllable shutters to provide variable area apertures, each exposure being separately optimized by adjusting the apertures for a specific lithographic step, wherein said aperture plate has a plurality of apertures equally spaced radially about a center of the aperture plate and the independently controllable shutters comprise a plurality of shutters, one for each of said apertures, pivotally mounted adjacent respective apertures and independently movable to occlude or partially occlude respective ones of said apertures.

Claim 7

The off axis illumination system for photolithographic exposure of a photosensitive film on a device substrate in the manufacture of semiconductor devices as recited in claim 3 wherein said shutters have a plurality of blades which may be rotated to occlude or partially occlude a respective aperture.

Claim 8

The off axis illumination system for photolithographic exposure of a photosensitive film on a device substrate in the manufacture of semiconductor devices as recited in claim 3 wherein said shutters are disks having at least one radially extending slot which may be rotated into registry with a corresponding aperture in said aperture plate.

Claim 9

The off axis illumination system for photolithographic exposure of a photosensitive film on a device substrate in the manufacture of semiconductor devices as recited in claim 3 wherein said shutters are disks having at least one aperture radially displaced from a center of the disk and which may be rotated into registry with a corresponding aperture in said aperture plate.

Claim 10

The off axis illumination system for photolithographic exposure of a photosensitive film on a device substrate in the manufacture of semiconductor devices as recited in claim 6 wherein the disks each have a plurality of apertures of different sizes each radially displaced from the center of the disk, each said aperture partially occluding in different amounts a corresponding aperture on said aperture plate when rotated into registry with the corresponding aperture.

Claim 11

The off axis illumination system for photolithographic exposure of a photosensitive film on a device substrate in the manufacture of semiconductor devices as recited in claim 7 wherein the apertures on the disks are circular holes.

Claim 12

The off axis illumination system for photolithographic exposure of a photosensitive film on a device substrate in the manufacture of semiconductor devices as recited in claim 7 wherein the apertures on the disks are rectangular holes.

Claim 13

The off axis illumination system for photolithographic exposure of a photosensitive film on a device substrate in the manufacture of semiconductor devices as recited in claim 3 wherein said shutters are iris apertures.