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US5710620A
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Projection exposure method and apparatus
Assignee: Nikon Corp
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Filing: 1995-07-24
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Granted: 1998-01-20
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Expires: 2015-07-24
Abstract
Abstract An exposure apparatus comprises an illumination optical system for irradiating an illuminating light onto a mask having a plurality of patterns for which pattern forming conditions differ from one another, and a projection optical system for projecting images of said plurality of patterns onto a photosensitive substrate, a device for compensating imaging errors of pattern images to be projected onto said substrate, and a control system for controlling the operation of said compensating device in accordance with imaging errors of said plurality of pattern images so that said plurality of pattern images may be projected in specified imaging characteristics.
Inventors
- 👤 Tetsuo Taniguchi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 17:14
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70058; G03F7/70091; G03F7/70216; G03F7/70241; G03F7/7025; G03F7/708; G03F7/70858; G03F7/70883; G03F7/70891
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
87 words
A projection exposure apparatus, comprising: an illumination optical system for irradiating illuminating light to a mask having a plurality of patterns, of which forming conditions are different from each other; a projection optical system for projecting images of said plurality of patterns simultaneously onto a photosensitive substrate; a correcting device for simultaneously correcting imaging errors of said pattern images; and a controller for controlling an operation of the correcting device such that each of the imaging errors is corrected so as not to exceed a predetermined value.
Claim 2
Dependent Claim
87 words
A projection exposure apparatus, comprising: an illumination optical system for irradiating illuminating light to a mask having a plurality of patterns, of which forming conditions are different from each other; a projection optical system for projecting images of said plurality of patterns simultaneously onto a photosensitive substrate; a correcting device for simultaneously correcting imaging errors of said pattern images; and a controller for controlling an operation of the correcting device such that each of the imaging errors is corrected so as not to exceed a predetermined value.
Claim 3
Dependent Claim
46 words
An apparatus according to claim 1, wherein said mask includes a pattern comprising a light transparent part and a light shielding part, and a pattern having a phase shifting member which shifts a phase of said illuminating light by about an odd number multiple of ρ.
Claim 4
Dependent Claim
22 words
An apparatus according to claim 1, wherein said plurality of patterns on said mask have finesses which are different from each other.
Claim 5
Dependent Claim
43 words
All apparatus according to claim 1, further comprising an input device for inputting information corresponding to each of said forming conditions of said patterns, said controller including a calculator which calculates the imaging errors of said pattern images based on the inputted information.
Claim 6
Dependent Claim
40 words
An apparatus according to claim 1, wherein said correcting device includes a device to relatively move an image plane of said projection optical system and said photosensitive substrate in a direction of an optical axis of said projection optical system.
Claim 7
Dependent Claim
31 words
An apparatus according to claim 1, wherein said correcting device includes at least one of an optical element of said projection optical system and a driving device for moving said mask.
Claim 8
Dependent Claim
43 words
An apparatus according to claim 1, wherein said controller includes a calculator which calculates a correction amount of a single imaging error common to said plurality of pattern images, and an exposing operation is stopped when the common correction amount does not exist.
Claim 9
Dependent Claim
47 words
An apparatus according to claim 1, wherein said controller includes a calculator which calculates variation of the imaging errors of said pattern images, and which determines a correction amount of a single imaging error common to said plurality of pattern images in accordance with the calculation result.
Claim 10
Dependent Claim
68 words
An apparatus according to claim 1, further comprising a device for changing a distribution of intensity of the illumination light on a pupil plane of said illuminating optical system in accordance with the pattern forming conditions on said mask, said controller including a calculator which calculates imaging errors of said pattern images based on a distribution of intensity of the illumination light corresponding to the pattern forming conditions.
Claim 11
Dependent Claim
91 words
A projection exposure apparatus, comprising: a projection optical system for projecting a plurality of pattern images of a mask simultaneously onto a photosensitive substrate, said pattern images having respective distribution states of imaging beams on a pupil plane that are different from each other; a device for detecting a correction amount of a single imaging error common to said pattern images, based on the distribution states of the imaging beams; and an adjusting device for simultaneously changing the imaging conditions of said pattern images in accordance with the detected correction amount.
Claim 12
Dependent Claim
91 words
A projection exposure apparatus, comprising: a projection optical system for projecting a plurality of pattern images of a mask simultaneously onto a photosensitive substrate, said pattern images having respective distribution states of imaging beams on a pupil plane that are different from each other; a device for detecting a correction amount of a single imaging error common to said pattern images, based on the distribution states of the imaging beams; and an adjusting device for simultaneously changing the imaging conditions of said pattern images in accordance with the detected correction amount.
Claim 13
Dependent Claim
49 words
An apparatus according to claim 10, wherein said detecting device includes a calculator which calculates imaging errors of said pattern images in accordance with the distribution states of the imaging beams and aberration of said projection optical system, said correction amount being determined based on the calculated imaging errors.
Claim 14
Dependent Claim
40 words
An apparatus according to claim 10, wherein said adjusting device includes a device to relatively move an image plane of said projection optical system and said photosensitive substrate in a direction of an optical axis of said projection optical system.
Claim 15
Dependent Claim
31 words
An apparatus according to claim 10, wherein said adjusting device includes at least one of an optical element of said projection optical system and a driving device for moving said mask.
Claim 16
Dependent Claim
27 words
An apparatus according to claim 10, further comprising a controller for stopping an exposing operation when the correction amount common to said pattern images does not exist.
Claim 17
Dependent Claim
40 words
An apparatus according to claim 10, wherein said detecting device includes a calculator which calculates variation of the imaging errors of said pattern images, said controller controlling the exposing operation in accordance with a calculation result obtained by said calculator.
Claim 18
Dependent Claim
11 words
A microdevice manufactured using an apparatus as defined in claim 1.
Claim 19
Dependent Claim
11 words
A microdevice manufactured using an apparatus as defined in claim 10.
Claim 20
Dependent Claim
80 words
A projection exposure apparatus, comprising: a projection optical system for projecting images of plural patterns of a mask simultaneously onto a substrate, said patterns having imaging light distributions on a pupil plane that are different from each other; and a device for moving at least one of said mask, an optical element of said projection optical system, and said substrate in accordance with a single correction amount common to said images so as to correct different errors of said images.
Claim 21
Dependent Claim
80 words
A projection exposure apparatus, comprising: a projection optical system for projecting images of plural patterns of a mask simultaneously onto a substrate, said patterns having imaging light distributions on a pupil plane that are different from each other; and a device for moving at least one of said mask, an optical element of said projection optical system, and said substrate in accordance with a single correction amount common to said images so as to correct different errors of said images.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-01-19 | 2001-07-21 | 2002-01-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-01-19 | 2005-07-21 | 2006-01-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-01-19 | 2009-07-21 | 2010-01-20 | $7700.00 | Window Closed / Lapsed |