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US5710057A Expired / Lapsed US ⏱️ 0.0 years remaining

SOI fabrication method

Assignee: Individual
•
Filing: 1996-07-12
•
Granted: 1998-01-20
•
Expires: 2016-07-12
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Abstract

Abstract A first region of a seed substrate is separated from a bonded handle substrate by etching and/or fracturing a second region of the seed substrate. A third region of the seed substrate remains bonded to the handle wafer. Etching and etch ant distribution are facilitated by capillary action in trenches formed in the seed substrate prior to bonding of the handle substrate. A portion of the second region may be removed by undercut etching prior to handle bonding. Elevated pressure and etchant composition are used to suppress bubble formation during etching. Alternatively, pressure from bubble formation is used to fracture a portion of the second region. First, second, and third regions are defined by a variety of methods.

Inventors

  • 👤 Donald M. Kenney

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 07:32
CPC Classifications
H; H10; H10P; H10P90/00; H10P90/19; H10P90/1904; H10P90/1906; H10P90/1914; H10P95/00; H10P95/11; H10W; H10W10/00; H10W10/10; H10W10/181; H10P72/00; H10P72/70; H10P72/74; H10P72/7432; Y; Y10; Y10S; Y10S117/00; Y10S117/915; Y10S148/00; Y10S148/012

Claims Analysis

Total Claims: 23
Claim 1
Independent Claim 56 words
A method of forming a bonded structure comprising the steps of: (a) providing a seed substrate having first, second, and third regions; (b) forming a groove in said seed substrate; (c) bonding a handle substrate to said third region; (d) removing and/or fracturing said second region, whereby said first region is detached from the third region.
Claim 2
Independent Claim 56 words
A method of forming a bonded structure comprising the steps of: (a) providing a seed substrate having first, second, and third regions; (b) forming a groove in said seed substrate; (c) bonding a handle substrate to said third region; (d) removing and/or fracturing said second region, whereby said first region is detached from the third region.
Claim 3
Dependent Claim 14 words
The method of claim 1 in which said groove extends into the second region.
Claim 4
Dependent Claim 14 words
The method of claim 2 in which said groove extends into the first region.
Claim 5
Dependent Claim 26 words
The method of claim 1 in which a portion of said second region is removed so as to undercut said third region prior to step (c).
Claim 6
Dependent Claim 18 words
The method of claim 1 further including use of the detached first region as a new seed substrate.
Claim 7
Dependent Claim 13 words
The method of claim 1 including etching the second region at elevated pressure.
Claim 8
Dependent Claim 21 words
The method of claim 1 in which a first sidewall spacer is used to define the thickness of the third region.
Claim 9
Dependent Claim 21 words
The method of claim 7 in which a second sidewall spacer is used to define the thickness of the second region.
Claim 10
Independent Claim 59 words
A method of forming a bonded semiconductor on semiconductor structure comprising the steps of: (a) providing a seed substrate having first, second, and third regions; (b) forming a groove in said seed substrate; (c) bonding a handle substrate to said third region; (d) removing and/or fracturing said second region, whereby said first region is detached from the third region.
Claim 11
Independent Claim 59 words
A method of forming a bonded semiconductor on semiconductor structure comprising the steps of: (a) providing a seed substrate having first, second, and third regions; (b) forming a groove in said seed substrate; (c) bonding a handle substrate to said third region; (d) removing and/or fracturing said second region, whereby said first region is detached from the third region.
Claim 12
Dependent Claim 14 words
The method of claim 9 in which said groove extends into the second region.
Claim 13
Dependent Claim 14 words
The method of claim 10 in which said groove extends into the first region.
Claim 14
Dependent Claim 26 words
The method of claim 9 in which a portion of said second region is removed so as to undercut said third region prior to step (c).
Claim 15
Dependent Claim 18 words
The method of claim 9 further including use of the detached first region as a new seed substrate.
Claim 16
Dependent Claim 13 words
The method of claim 9 including etching the second region at elevated pressure.
Claim 17
Independent Claim 59 words
A method of forming a bonded semiconductor on insulator structure comprising the steps of: (a) providing a seed substrate having first, second, and third regions; (b) forming a groove in said seed substrate; (c) bonding a handle substrate to said third region; (d) removing and/or fracturing said second region, whereby said first region is detached from the third region.
Claim 18
Independent Claim 59 words
A method of forming a bonded semiconductor on insulator structure comprising the steps of: (a) providing a seed substrate having first, second, and third regions; (b) forming a groove in said seed substrate; (c) bonding a handle substrate to said third region; (d) removing and/or fracturing said second region, whereby said first region is detached from the third region.
Claim 19
Dependent Claim 14 words
The method of claim 15 in which said groove extends into the second region.
Claim 20
Dependent Claim 14 words
The method of claim 16 in which said groove extends into the first region.
Claim 21
Dependent Claim 26 words
The method of claim 15 in which a portion of said second region is removed so as to undercut said third region prior to step (c).
Claim 22
Dependent Claim 18 words
The method of claim 15 further including use of the detached first region as a new seed substrate.
Claim 23
Dependent Claim 13 words
The method of claim 15 including etching the second region at elevated pressure.

References Cited (Backward Citations)

US3332137A Cited
US5362682A Cited
US4445965A Cited
US4475980A Cited
US4883561A Cited
US5641381A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2001-01-19 2001-07-21 2002-01-20 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2005-01-19 2005-07-21 2006-01-20 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2009-01-19 2009-07-21 2010-01-20 $7700.00 Window Closed / Lapsed

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